EP1309849A2 - Procede d'interpolation de bases de donnees destine a la mesure optique de microstructures a diffraction - Google Patents

Procede d'interpolation de bases de donnees destine a la mesure optique de microstructures a diffraction

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Publication number
EP1309849A2
EP1309849A2 EP01957510A EP01957510A EP1309849A2 EP 1309849 A2 EP1309849 A2 EP 1309849A2 EP 01957510 A EP01957510 A EP 01957510A EP 01957510 A EP01957510 A EP 01957510A EP 1309849 A2 EP1309849 A2 EP 1309849A2
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European Patent Office
Prior art keywords
inteφolation
sample
measurement
optical
parameters
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German (de)
English (en)
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Kenneth C. Johnson
Fred E. Stanke
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Therma Wave Inc
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Therma Wave Inc
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    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00Optical elements other than lenses
    • G02B5/18Diffraction gratings
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/47Scattering, i.e. diffuse reflection
    • G01N21/4788Diffraction
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84Systems specially adapted for particular applications
    • G01N21/88Investigating the presence of flaws or contamination
    • G01N21/95Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N21/9501Semiconductor wafers
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84Systems specially adapted for particular applications
    • G01N21/88Investigating the presence of flaws or contamination
    • G01N21/95Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N21/956Inspecting patterns on the surface of objects

Definitions

  • the present invention relates to optical measurement of parameters of interest on samples having diffractive structures thereon, and in particular relates to improvements in real-time analysis of the measured optical signal characteristics from a sample to determine parameter values for that sample.
  • Optical measurement methods are typically used for high-speed, non-destructive measurement of such structures. With such methods, a small area on a measurement sample is illuminated with optical radiation comprising one or more wavelengths, and the sample properties over the illuminated area are determined by measuring characteristics of radiation reflected or diffracted by the sample (e.g., reflection intensity, polarization state, or angular distribution).
  • This disclosure relates to the measurement of a sample comprising a diffractive structure formed on or in a substrate, wherein lateral material inhomogeneities in the structure give rise to optical diffraction effects. If the lateral inhomogeneities are periodic with a period significantly smaller than the illuminating wavelengths, then diffracted orders other than the zeroth order may all be evanescent and not directly observable, or may be scattered outside the detection instrument's field of view. But the lateral structure geometry can nevertheless significantly affect the zeroth-order reflectivity, making it possible to measure structure features much smaller than the illuminating wavelengths.
  • the components of the characteristic might, for example, represent reflectivities at different wavelengths or collection angles.
  • the measurement process comprises the following steps: First, a set of trial values of the measurement parameters is selected. Then, based on these values a computer- representable model of the measurement sample structure (including its optical materials and geometry) is constructed. The electromagnetic interaction between the sample structure and illuminating radiation is numerically simulated to calculate a predicted optical signal characteristic, which is compared to the measured signal characteristic. An automated fitting optimization algorithm iteratively adjusts the trial parameter values and repeats the above process to minimize the discrepancy between the measured and predicted signal characteristic. (The optimization algorithm might typically minimize the mean-square error of the signal characteristic components.)
  • ILS Inverse Least Squares
  • PCR Principal Component Regression
  • PLS Partial Least Squares
  • the linear coefficients of the approximate model are determined by a multivariate statistical analysis technique that minimizes the mean-square error between exact and approximate data points in a "calibration" data set.
  • the calibration data may be generated either from empirical measurements or from exact theoretical modeling simulations. This is done prior to measurement, so the calibration process does not impact measurement time.
  • the various linear models (ILS, PCR, PLS) differ in the type of statistical analysis method employed.
  • the linear approximation can only be applied over a limited range of measurement parameter values; and second, within this range the approximate model does not generally provide an exact fit to the calibration data points. (If the calibration data is empirically determined, one may not want the model to exactly fit the data, because the data could be corrupted by experimental noise. But if the data is determined from a theoretical model it would be preferable to use an approximation model that at least fits the calibration data points.) These deficiencies can be partially remedied by using a non-linear (e.g., quadratic) functional approximation (Ref. 7). This approach mitigates, but does not eliminate, the limitations of linear models.
  • a non-linear (e.g., quadratic) functional approximation Ref. 7
  • the parameter range limit of functional (linear or non-linear) approximation models can be extended by the method of "range splitting", wherein the full parameter range is split into a number of subranges, and a different approximate model is used for each subrange (Ref. 7).
  • the method is illustrated conceptually in Fig. 1 (cf. Fig. 2 in Ref. 7), which represents the relationship between a measurement parameter x, such as a linewidth parameter, and an optical signal characteristic y, such as the zeroth- order sample reflectivity at a particular collection angle and wavelength.
  • a measurement parameter x such as a linewidth parameter
  • an optical signal characteristic y such as the zeroth- order sample reflectivity at a particular collection angle and wavelength.
  • a set of calibration data points (e.g., point 101) is generated, either empirically or by theoretical modeling.
  • the x parameter range is split into two (or more) subranges 102 and 103, and the set of calibration points is separated into corresponding subsets 104 and 105, depending on which subrange each point is in.
  • a statistical analysis technique is applied to each subset to generate a separate approximation model (e.g., a linear model) for each subrange, such as linear model 106 for subrange 102 and model
  • the range-splitting method has additional deficiencies.
  • the functional approximation is continuous and smooth within each subrange, it may exhibit discontinuities between subranges (such as discontinuity 108 in Fig. 1). These discontinuities can create numerical instabilities in optimization algorithms that estimate measurement parameters from optical signal data. The discontinuities can also be problematic for process monitoring and control because small changes in process conditions could result in large, discontinuous jumps in measurements.
  • Another drawback of the range-splitting model is the large number of required calibration points and the large amount of data that must be stored in the model. In the Fig. 1 illustration, each subrange uses a simple linear approximation model of the form
  • a and b are calibration coefficients. At least two calibration points per subrange are required to determine a and b (generally, more than two are used to provide good statistical sampling over each subrange), and two coefficients (a and b) must be stored for each subrange. If there are M subranges the total number of calibration points must be at least 2 M, and the number of calibration coefficients is 2 M. Considering a more general situation in which there are N measurement parameters x l5 x 2 , ... x N , the linear approximation would take the form
  • Fig. 2 illustrates a parameter space spanned by two parameters, x ⁇ and x 2 .
  • the Xi range is split into three subranges 201, 202, and 203, and the x 2 subrange is split into three subranges 204, 205, and 206.
  • the optical signal characteristic (y) comprises multiple signal components (e.g., for different wavelengths)
  • the number of calibration coefficients will increase in proportion to the number of components.
  • a nonlinear (e.g., quadratic) subrange model is used, the number of calibration points and coefficients would be vastly larger.
  • Another measurement approach Minimum Mean Square Error analysis
  • MMSE Ref s 2-9, 11, 13, 15
  • MMSE Ref s 2-9, 11, 13, 15
  • a database of pre-computed theoretical optical signal characteristics representing a large variety of measurement structures is searched and compared to a samples' measured optical signal, and the best-fitting comparison (in terms of a mean-square-error fitting criterion) determines the measurement result.
  • the above-noted references relate primarily to scatterometry and spectroscopy, but MMSE-type techniques have also been applied in the context of ellipsometry; see Ref s. 12 and 16.
  • the MMSE method is capable of modeling strong nonlinearities in the optical signal.
  • the invention is a method for measuring parameters of interest of a sample comprising a diffractive structure, wherein the method employs a database-search technique in combination with interpolation to avoid the tradeoff between measurement resolution and accuracy.
  • a theoretical model is provided, from which a theoretical optical response characteristic of the diffractive structure is calculable as a function of a set of one or more "interpolation parameters" corresponding to measurement parameters.
  • the theoretical model comprises two primary components: a method for translating any trial set of interpolation parameter values into a computer-representable model of the diffractive structure (including its optical materials and geometry), and a method for numerically simulating electromagnetic interactions within the diffractive structure to calculate the theoretical response characteristic.
  • a database of "interpolation points" and corresponding optical response characteristics is generated. Each interpolation point is defined by a specific interpolation parameter set consisting of specific values of the interpolation parameters.
  • the theoretical model is applied to each interpolation point to calculate its corresponding theoretical optical response characteristic, which is stored in the database.
  • the database is used by an "interpolation model", which calculates an interpolated optical response characteristic as a function of the interpolation parameter set.
  • the interpolation model provides an approximation to the theoretical model, but without the computational overhead. Given any trial interpolation parameter set within a defined parameter domain, the interpolation model computes an approximate corresponding optical response characteristic by interpolating (or perhaps extrapolating) on the database.
  • the parameter domain is typically limited by the database, although extrapolation can sometimes be used to extend the domain outside of the database limits.
  • the term "interpolation” can be broadly construed herein to include extrapolation.)
  • the diffractive structure's internal geometry need not be modeled, and electromagnetic interactions within the structure need not be simulated, in the interpolation model.
  • the interpolation model represents a substantially continuous function mapping the interpolation parameter set to the optical response characteristic - it does not exhibit the discontinuities or discretization of prior-art methods such as range-splitting and MMSE. Furthermore, although the interpolation is an approximation, the interpolated optical response characteristic accurately matches the theoretical optical response characteristic at the interpolation points represented in the database. Thus it does not suffer the accuracy limitation of prior-art functional approximation methods.
  • the term "interpolation” broadly connotes a fitting function that fits the interpolation points. A portion of the fitting function might actually be extrapolated, so in this context the distinction between "interpolation” and "extrapolation” is not significant.
  • the interpolation model is used by a fitting optimization algorithm that determines measurement parameters of a sample based on a measured optical signal characteristic of the sample.
  • the theoretical optical response characteristic which is approximated by the interpolation model, does not necessarily correspond directly to the optical signal characteristic or to a measurable quantity.
  • a predicted optical signal characteristic is calculable from the optical response characteristic by means of a computationally efficient algorithm that, like interpolation, does not require that the diffractive structure's internal geometry be modeled or that electromagnetic interactions within the structure be simulated.
  • the optimization algorithm automatically selects a succession of trial interpolation parameter sets, applies the interpolation model to calculate corresponding interpolated optical response characteristics, and from these calculates corresponding predicted optical signal characteristics, which are compared to the measured optical signal characteristic.
  • the algorithm selects the trial parameter sets, based on a comparison error minimization method, to iteratively reduce a defined comparison error metric until a defined termination criterion is satisfied.
  • the measured optical signal characteristic is acquired with a measurement instrument comprising an optical sensor system, which detects radiation diffracted from the sample.
  • the instrument further comprises computational hardware that applies the fitting optimization algorithm to measured signal data and generates measurement results. Subsequent to results generation, the instrument may also generate a computational or graphical representation of the diffractive structure's geometry. However, this representation is not necessarily required to calculate a corresponding predicted optical response or signal characteristic, and it need not correspond to a particular parameter set in the database.
  • Fig. 1 illustrates the "range-splitting" method of the prior art.
  • Fig. 2 illustrates a two-dimensional parameter space.
  • Fig. 3A illustrates a measurement sample comprising a diffractive, line-space grating structure.
  • Fig. 3B illustrates a diffractive structure comprising a two-dimensional array of holes.
  • Fig. 4 illustrates a plan view of a sample comprising two reflecting zones.
  • Fig. 5 A illustrates a measurement sample comprising a layered structure with one diffractive layer.
  • Fig. 5B illustrates a measurement sample comprising a layered structure with two diffractive layers.
  • Fig. 6A illustrates a plot of a measurement sample's complex reflection coefficient r as a function of a measurement parameter, x.
  • Fig. 6B illustrates the reflectivity signal
  • R r 2 corresponding to the reflection coefficient of Fig. 6A
  • Fig. 7 illustrates piecewise-linear interpolation on an optical response characteristic.
  • Fig. 8 illustrates the selection of trial parameter sets for refinement in the fitting optimization algorithm.
  • the measurement instrument :
  • the measurement instrument comprises a radiation source, illumination optics for conveying the radiation to a measurement sample, collection optics for conveying radiation reflected or diffracted from the sample to an optical sensor system, and computational hardware that controls the instrument and translates optical signal data from the sensor system into measurement results.
  • the instrument collects signal data as a function of one or more control variables such as wavelength, illumination and collection directions (each direction being characterized by polar and azimuthal angles relative to the sample), illumination polarization state, and the collection optics' polarization characteristics.
  • An instrument may scan a control variable or may have multiple sensor channels that simultaneously sample multiple values of the variable.
  • the illumination wavelength may be scanned, or the system may use broadband illumination in conjunction with a spectrometer detector to simultaneously sense multiple wavelength signals.
  • each sensor channel responds to radiation comprising a non-zero range of wavelengths, angles, and polarization states, and the fitting optimization algorithm may need to take this into account to obtain a good fit between predicted and measured signal characteristics.
  • the measurement sample :
  • the measurement sample is a periodic, line-space grating structure whose geometry is invariant with respect to translation in a particular direction.
  • Fig. 3 A illustrates a line-space structure comprising grating lines formed on a flat substrate.
  • the structure is translationally invariant in the Z direction, and it has a preiodicity dimension A in the X direction.
  • the structure geometry is fully characterized by its two-dimensional cross-section in an X-Y plane.
  • Fig. 3B illustrates another type of measurement sample comprising a two- dimensional array of holes in a substrate.
  • the geometry can be described in terms of a
  • grating cell which is repeated periodically in the X-Z plane, and is characterized in terms of two fundamental periods, ⁇ i and ⁇ 2 .
  • Periodic structures such as those illustrated in Fig's. 3 A and 3B have the property that, when illuminated by a narrow beam of radiation, the back-scattered radiation comprises a discrete set of narrow beams, or "diffracted orders". These orders include the specularaly reflected ("zeroth order") component of the scattered radiation. Generally, structures with smaller periods produce fewer orders, and if the periodicity is sufficiently fine no orders other than the zeroth order will propagate from the structure.
  • the measurement instrument may be configured to selectively exclude, or accept, a particular diffracted order or orders. In typical applications, only the zeroth order is used.
  • Fig. 4 illustrates a plan view of a sample comprising two reflecting zones, a first zone 401 comprising a diffractive line- space structure, and a second adjacent zone 402 that is laterally homogeneous.
  • the illuminating radiation covers a measurement spot 403 that straddles both zones.
  • the measurement sample is typically a layered structure, such as that illustrated cross-sectionally in Fig. 5 A or 5B.
  • Fig. 5 A illustrates a sample comprising a diffractive structure 501 sandwiched between a non-diffractive substructure 501 and a non-diffractive superstructure 503.
  • the non-diffractive structures may each comprise multiple layers, which may be homogeneous or may have refractive index gradients, but which are typically laterally homogeneous (i.e., the refractive index only varies in the direction normal to the substrate).
  • Fig. 5B illustrates a sample type in which the substructure 502 contains a second diffractive layer. Depending on how the method of the invention is applied, the subject
  • diffractive structure of the method may be interpreted as the sample as a whole (or more specifically, a portion of the sample in the vicinity of the measurement spot), or as a component of the sample.
  • the subject diffractive structure could be the diffractive zone 401 in Fig. 4, or the diffractive layer 501 in Fig. 5 A or 5B.
  • a model of the diffractive structure including its optical materials and geometry
  • a model of the electromagnetic interactions within the diffractive sample which determine the sample's diffractive optical properties.
  • the subject theoretical model of the invention method does not necessarily characterize the sample as a whole - it characterizes the subject diffractive structure, which may only be one of a number of components of the sample; and the subject theoretical model may itself be a component of a broader theoretical model that characterizes the whole sample.
  • the measurement sample structure is typically represented computationally as a function of one or more "sample parameters” (e.g., linewidth, layer thicknesses, material parameters), some of which are known in advance and some of which are determined by measurement. Of the latter “measurement parameters”, some or all are associated with the subject diffractive structure - these are termed “interpolation parameters” herein.
  • sample parameters e.g., linewidth, layer thicknesses, material parameters
  • the theoretical model Given any particular interpolation parameter set, the theoretical model generates a computational representation of the diffractive structure; it performs a numerical simulation of electromagnetic propagation of radiation through the interior of the diffractive structure; and based on the electromagnetic simulation it calculates a theoretical optical response characteristic of the diffractive structure.
  • This response characteristic may, in some applications, need to be combined with optical response characteristics of other components of the sample (e.g. the non-diffractive structure 402 of Fig. 4 or the substructure 502 or super structure 503 of Fig. 5A or 5B) to characterize the whole sample.
  • This combining process may include modeling electromagnetic interactions at the interfaces between the components (i.e., applying boundary conditions).
  • the processes of generating the other components' response characteristics and combining them with the subject diffractive structure's response characteristic do not require that the diffractive structure's internal geometry (e.g. profile shape) be modeled or that the electromagnetic propagation within the diffractive structure be simulated.
  • the optical response characteristic could comprise a measurable quantity such as reflectivity.
  • the response characteristic comprises complex reflectance coefficients (or generalizations of the complex reflectance coefficient, which will be discussed below), which are not directly measurable.
  • the measurable reflectivity is a real-valued quantity that is calculable from the complex reflectance coefficient.
  • the "signal characteristic” is a measurable quantity that can be obtained from, or is calculable from, a signal generated by the measurement instrument's optical sensor system.
  • the signal characteristic depends on the instrument's optical characteristics, as well as the sample. For example, the polarization characteristics of the illuminating radiation or of the collection optics may need to be taken into account in calculating the predicted signal.
  • the instrument's optical characteristics, such as polarization may be controlled during data acquisition, and may be represented by instrument calibration quantities that can vary from instrument to instrument.
  • the measurable signal characteristic depends on the entire sample structure and the instrument characteristics - it cannot generally be separated into components associated with individual sample components or with the instrument, whereas such a separation can often be performed with complex reflectance-type quantities. (Reflecting samples that exhibit significant polarizing properties can be characterized in terms of a "reflectance Jones matrix", which is a generalization of the complex reflectance coefficient. See Section 27.7 in Ref. 17 for a description of the Jones matrix.)
  • the A, B, and C terms in this expression are "mixing coefficients" which may be sample parameters or functions of sample parameters. (They may also be functions of the instrument's optical properties.)
  • the r terms are the optical response characteristics of the reflecting zones.
  • the mixing model calculates R, an "effective reflectivity", which corresponds to a measurable signal characteristic of the sample.
  • Fig. 4 illustrates a two-zone sample comprising a diffracting zone 401 and a non-diffracting zone 402.
  • the subject theoretical model of the present invention calculates r ⁇ as a function of interpolation parameters.
  • This theoretical model is a component of a broader theoretical model - the mixing model - that computes the sample's signal characteristic R by combining ri with the optical response characteristics of the other adjoining zone or zones, in accordance with Eq. 3.
  • Multi-layer structures such as those illustrated in Fig's. 5A and 5B can be similarly partitioned into separate components (layers, in this case), each represented by its own optical response characteristic.
  • Theoretical models for these types of structures typically represent the illumination and diffracted radiation as plane-wave expansions.
  • a plane wave is a simplifying mathematical abstraction that is infinite in spatial and temporal extent. Each plane wave has a specific direction of propagation, wavelength, and polarization state. When a periodic structure is illuminated with a plane wave, it scatters the illumination into a discrete set of plane waves, or
  • diffracted orders which may include both transmitted and reflected orders.
  • the undeviated transmitted order is termed the "zeroth transmitted order”
  • specularly reflected reflected order is termed the "zeroth reflected order”.
  • the ratios of the diffracted orders' complex amplitudes to the incident plane wave's complex amplitude are termed "complex scattering coefficients”.
  • complex scattering coefficients These include reflectance scattering coefficients for reflected orders and transmittance scattering coefficients for transmitted orders).
  • Each order is characterized by two scalar scattering coefficients corresponding to two constituent polarization components of the order (e.g., orthogonal linear polarization components). Furthermore, each of these coefficients depends on the polarization state of the incident illumination, so considering two independent incident polarization states, each order will actually have four associated scalar scattering coefficients corresponding to any particular wavelength and incidence direction.
  • a theoretical optical model of the sample will calculate the complex scattering coefficients of one or more diffracted orders as a function of the incident plane wave's direction, wavelength, and polarization state.
  • the aggregation of the individual complex scattering coefficients could constitute the structure's optical response characteristic.
  • the subject diffractive structure is an individual layer component in a layered structure, such as element 501 in Fig. 5 A or 5B
  • the optical response characteristic could comprise a "scattering matrix", which represents a linear relationship between complex amplitudes of electromagnetic field components at the diffractive layers two bounding surfaces, 504 and 505.
  • Other layers in the sample may be similarly represented by scattering matrices.
  • the multiple scattering matrices of the different layers may be combined to form a composite scattering matrix for the entire sample, from which the scattering coefficients are readily obtained.
  • S- matrices scattering matrices
  • Ref. 18 an algorithm for combining scattering matrices (S- matrices) of adjacent layers is described in Ref. 18 (see especially equation 15A).
  • S-matrix or R-matrix formulations described in this published article could be used to define a diffractive layer's optical response characteristic.
  • the process of combining the optical response characteristics is much simpler and quicker than the computation of the layers' response characteristics themselves (at least for diffractive layers), and could potentially be performed during a real-time measurement process.
  • the subject theoretical model of the invention could be a component of a hierarchy of theoretical optical models.
  • the subject theoretical model could calculate an optical response characteristic (e.g., an S-matrix) characterizing diffractive layer 501 in the multilayer structure of Fig. 5 A or 5B.
  • This model would be a component of a second-tier theoretical model that calculates an optical response characteristic for the entire multilayer structure.
  • This structure may represent just one of multiple reflecting zones, such as zone 401 in Fig. 4, and the structure's corresponding second-tier theoretical model may be a component of a third-tier theoretical model (e.g. a mixing model) that calculates a diffraction response characteristic for the entire multi-zone measurement sample.
  • a third-tier theoretical model e.g. a mixing model
  • the interpolation database The theoretical model is applied to each of a plurality of "interpolation points", each point defined by a specific interpolation parameter set consisting of specific values of the interpolation parameters. For each interpolation point, a corresponding optical response characteristic of the diffractive structure is calculated and stored in the database.
  • each stored optical response characteristic comprises a plurality of complex reflectance coefficients or scattering matrices associated with different illumination wavelengths, incidence directions, and polarization states, but all associated with the same diffractive structure configuration (materials and geometry).
  • the computational representation of the associated structure geometry e.g., profile shape) is not required for subsequent measurement processes and need not be stored in the database.
  • the interpolation model uses the database to estimate the optical response characteristic for interpolation parameter sets that are not necessarily represented in the database.
  • the interpolation model defines a continuous function relating any trial interpolation set to a corresponding optical response characteristic, and in a preferred embodiment the response function is also smooth (i.e., continuously differentiable).
  • the continuity and smoothness may be limited by practical limitations such as data discretization, but the function is "substantially continuous” in the sense that any actual discontinuities are insignificant in comparison to the data discretization in the database.
  • the interpolation function substantially matches the theoretical optical response characteristic at the database interpolation points, in the sense that any slight mismatch is insignificant from the perspective of measurement performance.
  • the interpolation function is defined over a parameter domain that typically covers the database interpolation points.
  • the parameter domain may possibly be extended by extrapolation.
  • the accuracy of extrapolation is usually very poor, but in some cases the functional dependence of the optical response characteristic on a particular interpolation parameter may be very nearly linear, in which case extrapolation may be reliably applied to that parameter.
  • the interpolation function will exhibit accuracy errors at interpolation parameter sets that do not correspond to interpolation points, but these errors can be mitigated by interpolating on an optical response characteristic, such as complex reflectance, that is related to the (complex-valued) electromagnetic field amplitudes, rather than a signal-related response characteristic.
  • an optical response characteristic such as complex reflectance
  • Figs. 6A and 6B illustrates a plot of a measurement sample's complex reflection coefficient r (for some particular wavelength, incidence direction, and polarization state) as a function of a measurement parameter, x (e.g., linewidth).
  • x e.g., linewidth
  • Li the vicinity of the zero crossing 605 the signal plot 603 is very nonlinear, resulting in a poor interpolation fit; whereas the interpolation fit on the complex reflection coefficient is very accurate near the zero crossing. (The accuracy of the signal interpolation could be improved by using a nonlinear interpolating function. But regardless of what interpolation method is used, the interpolation fit would generally be better when applied to complex reflection coefficient.)
  • interpolation is piecewise-linear interpolation, which is illustrated in Fig. 7.
  • a single, scalar-valued optical response characteristic y is interpolated over a single, scalar- valued measurement parameter
  • the parameter is sampled in the database at uniformly-spaced parameter values, ⁇ [0], ⁇ [l], - x x [M] (wherein M is the number of sampling intervals), and y is linearly interpolated between the database values.
  • the ⁇ x l , y ⁇ pairs represented in the database are the "interpolation points", two of which are indicated in the figure as 701 and 702.
  • the corresponding interpolated y value denoted Y , is calculated by the following procedure. First, assuming that X x is within the sampling range (xr[0] ⁇ X, ⁇ x ] ), find an interpolation interval containing X, ,
  • the optical response characteristic y may be a composite entity such as a vector or a matrix.
  • the components of y may, for example, correspond to different scattering matrix coefficients and different combinations of wavelength, incidence direction, and polarization.
  • Each component x t of x is sampled in the database at uniformly- spaced values x-[0] , x[l] , ... x t [M t ] (wherein M i is the number of sampling intervals for x. ).
  • the database parameter range comprises a multi-dimensional array of "sampling grid cells", each cell being bounded in each i-th dimension by two successive parameter values ,[ ,] and x i [j i + 1] .
  • the interpolation algorithm approximates y as a multilinear function of x in each grid cell.
  • X ⁇ X 1 , X 2 ,... X N ⁇
  • the corresponding interpolated y value, denoted Y is calculated by the following procedure. First, find a grid cell containing Z , .[; ⁇ ] ⁇ Z,. ⁇ x,.[; ⁇ +l] Eq. 10
  • C i [k, , k 2 , ... k N ] represents linear interpolation coefficients of y with respect to parameter values x l ,...x i , which are spatially sampled at the grid cell limits of parameter values ⁇ . +1 ,...x N .
  • C i [k 1 ,k 2 ,...k N ] is generated from C M [k, , k 2 , ... k N ] by applying the one- dimensional interpolation method to the i - th parameter dimension ( x. ),
  • the derivatives of the interpolated quantity Y with respect to X t can be easily calculated using the above formalism. As will be seen later, the derivative information can be used to significantly enhance the runtime performance of the fitting optimization algorithm.
  • Improved interpolation accuracy can be obtained by using a multi-cubic, rather than multilinear, interpolating function in each grid cell.
  • a hybrid approach may be used in which linear interpolation is used for some parameters, and cubic interpolation is used for others.
  • the one-dimensional cubic interpolation case can be illustrated with reference to Fig. 7.
  • the interpolated value Y is approximated as a cubic function of X, .
  • the coefficients of the cubic function are chosen so that the interpolation fits both the database y values and the finite-difference derivatives of y with respect to x, at the interpolation interval boundaries.
  • the derivative y f (x 1 [j]) at point -f ] is estimated as
  • the one-dimensional cubic interpolation algorithm proceeds as follows. First, Z x is assumed to be within an interior sampling interval, T ⁇ Z ⁇ T ⁇ + l] 1 ⁇ 7 ⁇ -1 Eq.16
  • a three-point quadratic fit may be applied in the boundary intervals.
  • the term y(x 1 [j -1]) in Eq. 23 is undefined (i.e., not in the database), so the C x [-1] term is omitted and the C 0] , C x [l] , and C, [2] terms are quadratic functions of t with quadratic coefficients selected so that the interpolated Y value matches the database when X, is equal to O] , x x [l] , or x, [2] .
  • This fit function is used in the interval x,[0] ⁇ X, ⁇ x l] .
  • the quadratic fit function can be extrapolated for values Z x ⁇ x 1 [0] .
  • U cubic interpolation is applied in the adjacent interval (x l] ⁇ Z j ⁇ X j [2]) the interpolated Y value will be both continuous and continuously differentiable (smooth) with respect to Z x at X t - [l] .
  • the interpolation coefficients ( C N [k t , k 2 , ...] ) are preferably not pre- computed, but generated in real time during the measurement process so that the interpolation relies only on optical response data stored in the database. Furthermore, derivatives of Y with respect to Z can also be computed in real time. The interpolation method does not require that any extraneous data such as interpolation coefficients or derivatives be stored in the database.
  • interpolation methods for example linear or quadratic interpolation on a triangular or simplex-shaped sampling grid, or multi-dimensional spline interpolation, could also be used.
  • the above methods may appear to be constraining, in that parameters are all sampled at uniform intervals over a rectangular region of parameter space.
  • the algorithm designer has a great degree of freedom in how the interpolation parameters are defined, which largely offsets this limitation.
  • the linewidth can be represented as a nonlinear function of a uniformly-sampled interpolation parameter, with the functional mapping chosen so that small linewidths are sampled more finely than large linewidths.
  • the primary distinguishing features of the interpolation method are that it defines a substantially continuous function of interpolation parameters over a parameter domain that includes the interpolation points, and the interpolated optical response characteristic substantially matches the theoretical optical response characteristic at the interpolation points.
  • the fitting optimization algorithm iteratively compares the measured optical signal characteristic of the measurement sample with a plurality of predicted optical signal characteristics determined from corresponding interpolated optical response characteristics to find a best-fit parameter set, which defines the measured parameters of the sample.
  • the predicted optical signal characteristic is determined from the interpolated optical response characteristic, which is obtained from the interpolation model.
  • the optical response characteristic is a quantity or composition of quantities such as complex reflectance coefficients from which the signal characteristic is calculated in real time (i.e. after acquiring the measured signal). This calculation involves several steps. First, if the optical response characteristic represented in the interpolation database only characterizes a component of the sample (such as diffractive reflecting zone 401 in Fig. 4 or the diffractive layer 501 in Fig.
  • the interpolated characteristic would need to be combined with optical response characteristics of other sample components to obtain a combined optical response characteristic of the sample as a whole.
  • the other components' response characteristics might be similarly obtained from their own interpolation models, or might be obtained directly from theory in real time. (For example, a non-diffractive layer's optical response characteristic can be computed from theory very easily and quickly.)
  • polarizing properties of the instrument's illumination and collection optics may be separately represented by Jones matrices (or alternatively, Mueller matrices), which would be combined with the sample's response characteristic to calculate a Jones (or Mueller) matrix of the entire optical system (illumination optics, sample, and collection optics). If the polarization or other characteristics of the instrument are varied as the measurement signal is acquired, this calculation may be repeated for each of a number of instrument configurations.
  • an ellisometer typically has a polarization-modulating element, and its measured signal characteristic is typically a composition of signals associated with various states of the modulating element.
  • the optical system's response characteristic is used to calculate the predicted signal characteristic by effectively simulating the electromagnetic field intensity on the optical sensor elements.
  • Each sensor element may respond to radiation comprising a range of wavelengths or corresponding to a range of incidence or collection directions at the sample, so this calculation may comprise a summation over wavelengths or directions.
  • the directional summation may represent a coherent, incoherent, or partially coherent superposition of optical response components corresponding to different incidence or collection directions.
  • the instrument-related data that enters into the predicted signal calculation may include factors such as optical calibrations and the illumination source intensity, which vary between instruments and with time. But rather than incorporating all of these factors in the predicted signal characteristic, at least some of these factors are more typically applied in an inverse manner to the sensor signal data to obtain a measured signal characteristic such as an "effective" reflectivity or Stokes vector that has minimal instrument dependence and is primarily a function of only the sample.
  • the signal characteristic comprises reflectivity data or ellipsometric quantities such as tan ⁇ and cos ⁇ (Refs 12, 16), which characterize the sample independently of the instrument.
  • tan ⁇ and cos ⁇ reflectivity data or ellipsometric quantities
  • cos ⁇ cos ⁇
  • “Mueller matrix” components are suitable signal characteristics, from this perspective.
  • the Mueller matrix for a conventional rotating-polarizer ellipsometer contains two independent, dimensionless factors, cos(2 ⁇ ) and sin(2 ⁇ )cos( ⁇ ) , which have a linear dependence on the sensor signals.
  • a signal characteristic such as "effective reflectivity" (e.g. R in Eq.
  • the "effective" quantity is a summation or average over reflecting zones, or over wavelengths or incidence directions.
  • the predicted and measured optical signal response characteristics are compared, and the comparison fit error is typically quantified in terms of a "fit metric" such as a chi-square metric ( ⁇ 2 ), which is defined as
  • y denotes a measurable signal characteristic comprising multiple signal components y .
  • x denotes a set of measurement parameters (e.g., film thicknesses, linewidth, etc.);
  • y pred (x) denotes the predicted signal for ;
  • yTM eas represents the measured signal characteristic;
  • wt j is a non-negative weighting factor.
  • the definition of y TM eas may incorporate factors such as the instrument's optical calibrations and the illumination source intensity, as well as the sensor signal data.
  • yf p ed (x) may also include such instrument- related factors, as well as the sample parameter dependence.
  • the algorithm designer has some degree of freedom in allocating the instrument-related factors between y eas and y pred (x) (e.g., by applying a common additive shift or dividing a common factor out of both terms).
  • the ⁇ 2 metric has the property that is is always non-negative, and is zero if and only if there is a perfect match between yf p ed (x) and yTM"" for all j .
  • the objective of a fitting optimization algorithm based on the ⁇ 2 metric is to find a measured parameter set x that minimizes ⁇ 2 . If wt j is set to 1 in Eq. 24, ⁇ 2 is similar to the fit metric employed by MMSE algorithms; however measurement precision can be optimized by defining wt j to be the reciprocal variance of yTM eas ,
  • ⁇ 2 (y pred (x) - y meas ) ⁇ (coy y pred ( , x) + coy y meas y 1 (y pred (x) - y meas )
  • y pred (x) and y meas are column matrices comprising the y pred (x) and y e s elements; cov y pred (p) and covy me s are associated covariance matrices; and the "T" superscript indicates matrix transposition.
  • the fitting optimization algorithm iteratively adjusts x to minimize ⁇ 2 .
  • x is a "trial measurement parameter set” (i.e. an ordered set of numeric values, one for each measurement parameter), x includes the "trial inte ⁇ olation parameter set", the elements of which correspond to inte ⁇ olation parameters, (x may also include other sample parameters that are not associated with the invention's subject diffractive structure.)
  • the minimization method includes two stages, a preliminary "grid search", and subsequent “refinement”. In the first stage, a multi-dimensional grid of trial measurement parameter sets is defined, and ⁇ 2 is calculated for every point x on the grid. (In this context "grid point” is synonymous with "trial measurement parameter set”.
  • the grid points may, in some embodiments, correspond to the database inte ⁇ olation points.
  • One or more trial parameter sets are selected from the grid for subsequent refinement.
  • Fig. 8 conceptually illustrates the selection process.
  • the grid search scans the grid points for parameter sets that could potentially be close to a global minimum of ⁇ 2 over a parameter domain that includes the grid points. It is not sufficient to just select the grid point with the lowest ⁇ 2 because, as illustrated in Fig. 8, this strategy could yield false results due to the grid's limited sampling density.
  • the curve 801 illustrates ⁇ 2 as a function of a scalar parameter value, .
  • Grid points (e.g. point 802) are represented as squares on curve 801. The lowest ⁇ 2 on the grid is at point 802; but the true minimum (and the correct x value) is located at point 803, which is between grid points 804 and 805.
  • the grid search does not miss the global ⁇ 2 minimum, it first finds all local minima on the grid.
  • the grid local minima are points 802, 805, and 806.
  • the local minima search will typically find a large number of points, such as point 806, which have very poor fits and are obviously not near the correct solution.
  • the bad points are filtered out by applying a ⁇ 2 threshold criterion. But again, due to the database's limited sampling density, it is not sufficient to just exclude all points above the ⁇ 2 threshold. For example, if this strategy were applied, the threshold level 807 in Fig. 8 would exclude the grid point 805 nearest the global minimum 803, but would accept the false minimum 802.
  • the grid search strategy illustrated in Fig. 8 generalizes in a straightforward manner to the more general case where there are multiple measurement parameter values and x is a vector-valued entity spanning a multi-dimensional parameter search range.
  • ⁇ 2 is sampled on a multi-dimensional grid. Local minima are identified, and an uncertainty range for each minimum is determined, based on comparisons of each point's ⁇ 2 value with those of adjacent points (including diagonal adjacencies); and points whose uncertainty ranges extend at least partially below the ⁇ 2 threshold are selected for further refinement.
  • Each selected grid point is used as a "seed" for subsequent refinement.
  • the refinement is performed by an automated minimization algorithm that adjusts x to minimize ⁇ 2 .
  • x is not limited to discrete points represented in the grid or in the inte ⁇ olation database; it can be varied continuously within a defined parameter domain.
  • the minimization algorithm iterates from the seed value until a defined termination criterion is satisfied (e.g., until incremental changes in x , or in ⁇ 2 , fall below a certain threshold).
  • Suitable minimization algorithms include as MATLAB's "lsqnonlin” routine or the EVISL "BCLSF/DBCLSF” or "BCLSJ/DBCLSJ” routines.
  • the runtime performance can be further enhanced by providing the minimizer the first-order derivatives of ⁇ ; with respect to the x components (measurement parameters), along with S j itself.
  • a useful feature of the database inte ⁇ olation method is that these derivatives can be easily computed, and the fitting optimization algorithm should preferably make use of the derivatives.
  • the refinement stage may be divided into several sub-stages using progressively more accurate (though more time-consuming) calculation models. For example, the refinement might be done first using a linear inte ⁇ olation model for the optical response characteristic, and then (after initial termination criteria of the minimization algorithm have been met), the refinement may be continued using cubic inte ⁇ olation. Also, some measurement parameters, such as material-related parameters, might be initially held fixed when the refinement is initiated, and then allowed to vary as the refinement approaches convergence.

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Abstract

Un procédé d'interpolation de bases de données est utilisé pour calculer rapidement une caractéristique prévue de la réponse optique d'une microstructure à diffraction (501) se présentant comme une partie du processus de mesure optique en temps réel. La réponse optique interpolée (602) est une fonction continue et (dans un mode de réalisation préféré) (801) lisse des paramètres de mesure (X); elle est appariée à la réponse optique calculée théoriquement aux points d'interpolation stockés dans la base de données (701, 702).
EP01957510A 2000-08-10 2001-08-09 Procede d'interpolation de bases de donnees destine a la mesure optique de microstructures a diffraction Withdrawn EP1309849A2 (fr)

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US6768967B2 (en) 2004-07-27
US20020038196A1 (en) 2002-03-28
JP2004507719A (ja) 2004-03-11
WO2002014840A2 (fr) 2002-02-21
US7069182B2 (en) 2006-06-27
US6950780B2 (en) 2005-09-27
US20040167722A1 (en) 2004-08-26
WO2002014840A3 (fr) 2002-08-15

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