EP1243795A1 - A two-stage vacuum pump - Google Patents
A two-stage vacuum pump Download PDFInfo
- Publication number
- EP1243795A1 EP1243795A1 EP02356050A EP02356050A EP1243795A1 EP 1243795 A1 EP1243795 A1 EP 1243795A1 EP 02356050 A EP02356050 A EP 02356050A EP 02356050 A EP02356050 A EP 02356050A EP 1243795 A1 EP1243795 A1 EP 1243795A1
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- European Patent Office
- Prior art keywords
- pump
- gases
- vacuum
- pumped
- pumping system
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Classifications
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
- F04B—POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS
- F04B41/00—Pumping installations or systems specially adapted for elastic fluids
- F04B41/06—Combinations of two or more pumps
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
- F04B—POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS
- F04B37/00—Pumps having pertinent characteristics not provided for in, or of interest apart from, groups F04B25/00 - F04B35/00
- F04B37/10—Pumps having pertinent characteristics not provided for in, or of interest apart from, groups F04B25/00 - F04B35/00 for special use
- F04B37/14—Pumps having pertinent characteristics not provided for in, or of interest apart from, groups F04B25/00 - F04B35/00 for special use to obtain high vacuum
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
- F04B—POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS
- F04B45/00—Pumps or pumping installations having flexible working members and specially adapted for elastic fluids
- F04B45/04—Pumps or pumping installations having flexible working members and specially adapted for elastic fluids having plate-like flexible members, e.g. diaphragms
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
- F04C—ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT PUMPS
- F04C23/00—Combinations of two or more pumps, each being of rotary-piston or oscillating-piston type, specially adapted for elastic fluids; Pumping installations specially adapted for elastic fluids; Multi-stage pumps specially adapted for elastic fluids
- F04C23/001—Combinations of two or more pumps, each being of rotary-piston or oscillating-piston type, specially adapted for elastic fluids; Pumping installations specially adapted for elastic fluids; Multi-stage pumps specially adapted for elastic fluids of similar working principle
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
- F04C—ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT PUMPS
- F04C23/00—Combinations of two or more pumps, each being of rotary-piston or oscillating-piston type, specially adapted for elastic fluids; Pumping installations specially adapted for elastic fluids; Multi-stage pumps specially adapted for elastic fluids
- F04C23/005—Combinations of two or more pumps, each being of rotary-piston or oscillating-piston type, specially adapted for elastic fluids; Pumping installations specially adapted for elastic fluids; Multi-stage pumps specially adapted for elastic fluids of dissimilar working principle
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
- F04C—ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT PUMPS
- F04C25/00—Adaptations of pumps for special use of pumps for elastic fluids
- F04C25/02—Adaptations of pumps for special use of pumps for elastic fluids for producing high vacuum
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
- F04C—ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT PUMPS
- F04C18/00—Rotary-piston pumps specially adapted for elastic fluids
- F04C18/08—Rotary-piston pumps specially adapted for elastic fluids of intermeshing-engagement type, i.e. with engagement of co-operating members similar to that of toothed gearing
- F04C18/12—Rotary-piston pumps specially adapted for elastic fluids of intermeshing-engagement type, i.e. with engagement of co-operating members similar to that of toothed gearing of other than internal-axis type
- F04C18/123—Rotary-piston pumps specially adapted for elastic fluids of intermeshing-engagement type, i.e. with engagement of co-operating members similar to that of toothed gearing of other than internal-axis type with radially or approximately radially from the rotor body extending tooth-like elements, co-operating with recesses in the other rotor, e.g. one tooth
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
- F04C—ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT PUMPS
- F04C18/00—Rotary-piston pumps specially adapted for elastic fluids
- F04C18/08—Rotary-piston pumps specially adapted for elastic fluids of intermeshing-engagement type, i.e. with engagement of co-operating members similar to that of toothed gearing
- F04C18/12—Rotary-piston pumps specially adapted for elastic fluids of intermeshing-engagement type, i.e. with engagement of co-operating members similar to that of toothed gearing of other than internal-axis type
- F04C18/126—Rotary-piston pumps specially adapted for elastic fluids of intermeshing-engagement type, i.e. with engagement of co-operating members similar to that of toothed gearing of other than internal-axis type with radially from the rotor body extending elements, not necessarily co-operating with corresponding recesses in the other rotor, e.g. lobes, Roots type
Definitions
- the present invention relates to pumping systems using multi-stage Roots type dry pump vacuum or type multi-lobe "claw", in which the inlet of the primary pump receives the gases to be pumped and the output of the primary pump discharges gases pumped to the atmosphere or to a recycling system pumped gases.
- the vacuum pumping system To create and maintain the vacuum in the vacuum vessel, the vacuum pumping system must first pump a relatively large gas flow to create the vacuum; in one second, the vacuum pumping system extracted from the enclosure to empties the residual gases or the treatment gases introduced voluntarily in the vacuum enclosure during the various stages of manufacturing processes in a controlled atmosphere. Gas flows to pumping by the vacuum pumping system are then lower.
- the treatment gases introduced voluntarily in the vacuum vessel are frequently gases expensive, and there is an advantage in recycling these gases at the outlet of the vacuum pumping system, by a gas recycling system pumped, to then reintroduce them in a controlled manner into the vacuum vessel. It is therefore necessary not to contaminate these gas as they pass through the vacuum pumping system, and that's a second reason why we have to use pumps Roots or claw dry primers, rather than pumps traditional oil seal primers.
- the inlet of the primary pump receives the gases to be pumped, either directly from the vacuum enclosure, either indirectly by a secondary pump which can be a pump turbomolecular.
- the primary pump delivers the pumped gases directly to the atmosphere or directly to a system of recycling of pumped gases.
- these very pure gases are used at low pressure in the vacuum vessel, and are evacuated by a multi-stage primary dry pump pumping system Roots type or multi-lobe claw type. So the document US 4 504 201 A describes a multi-stage pump of the Roots type and two claw floors. The top floor pushes the atmosphere.
- the gas to be evacuated is sucked by the first stage of the pump then compressed in the stages following until reaching a pressure slightly higher than the atmospheric pressure at the exit of the top floor and so be released to the atmosphere or returned to a recycling system for pumped gases.
- Rapid blocking and destruction of the pump is due blockage of the last stage of the pump, stage which drives the gas at a pressure close to atmospheric pressure.
- the structure of the dry primary pumps includes a stator in which rotate two mechanically coupled rotors and laterally offset from each other.
- the rotors are held by bearings, and are separated from the stator by the gas slide contained in the mechanical clearances between the rotor and the stator or pump body.
- the dissipation of calories in a stage of the pump is carried out, for a very small part, by conduction across the rotor axis towards the pump body, and for a preponderant part by conduction through the gas slide between the rotor and the stator.
- the problem proposed by the present invention is to design a new vacuum pumping system structure to avoid destruction of the dry primary pump in the case of pumping gas with low thermal conductivity, in using known multi-stage dry primary pumps without modify them, also keeping the same technique possible recycling, thus avoiding the development of a new pump.
- a system vacuum pump comprises a primary pump Roots or claw type multi-stage dryer, pump inlet primary receiving the gases to be pumped and the pump outlet primary pumping the pumped gases towards the atmosphere or towards a pumped gas recycling system.
- the system vacuum pumping system includes an additional pump whose inlet is connected to the output of the primary pump and whose output back to the atmosphere or to the gas recycling system pumps.
- a vacuum hose is connected in parallel on the additional pump, and includes a non-return valve allowing gas from the primary pump to pass.
- the pump additional is a dry pump of technology other than Roots or claw and adapted to safely support the elevation of temperature due to the final compression of the pumped gases.
- the pump additional is a diaphragm pump.
- the additional pump is a piston pump.
- the additional pump must be sized to be able to pump all of the gas flow through the system vacuum pumping during the vacuum pumping steps at low pressure, for example to pump the process gas flow during the low pressure manufacturing process steps in a vacuum enclosure.
- the additional pump can be sized to be just capable of pumping said flow of gas during the steps of pumping a vacuum at low pressure.
- the drain line must be dimensioned way to let through the important gas flow during the stages for vacuuming an empty enclosure.
- the vacuum pumping system according to the invention can be connected to a vacuum enclosure containing or in which are injected gases with low thermal conductivity.
- Low thermal conductivity gases may include argon or xenon.
- the pumped gases are discharged at the outlet of the vacuum pumping system in a gas recycling system pumps.
- the pumped gas recycling system extracts and recycles said gases with low thermal conductivity, to reinject them from controlled manner in the vacuum vessel.
- a vacuum pumping system in the embodiment illustrated schematically on Figure 1, includes a primary pump 1 dry multi-stage Roots type or claw, whose inlet 2 receives the gases to be pumped from a vacuum chamber 3, and the outlet 4 of which discharges the gases pumped to an output stage 5 comprising an additional pump 6 and a drain line 7.
- the additional pump 6 has an inlet 8 connected to the outlet 4 of the primary pump 1, and has an outlet 9 which back to the outside atmosphere or to a system of recycling of pumped gases 10.
- Pre-hose 7 is connected in parallel on additional pump 6, i.e. its input is connected to input 8 of additional pump 6 and to output 4 of the primary pump 1, and its output is connected to the output 9 of the additional pump 6 and to the atmosphere or to the recycling of pumped gases 10.
- the evacuation pipe 7 includes a non-return valve 11, which allows the gases of entry to exit while prohibiting their movement from the exit to the entrance. Thus, the non-return valve 11 allows passage gases from outlet 4 of the primary pump 1.
- the additional pump 6 is a dry pump of technology different from the Roots or claw technologies used for primary pump 1, and is adapted to support without damage the temperature rise due to the final compression of the gases pumped before being discharged to the atmosphere or to the pumped gas recycling system 10.
- a first example of an additional pump that can suitable is a diaphragm pump, as shown schematically in Figure 3. It is understood that such a pump to membranes is a dry pump, that is to say in which the joint sealing of the pump is not achieved by a liquid volume. It is also understood that the membrane pump structure does not does not have a rotor isolated from the stator by the blade of pumped gases.
- a second example of an additional pump that may be suitable is a piston pump, which is a well-known structure in the state of the art. In such a piston pump, there is also, no rotor isolated from the stator by a blade of pumped gases.
- the additional pump 6 must be dimensioned so as to be able to pump the entire process gas flow through the vacuum pumping system during the pumping stages from vacuum to low pressure. During these stages where the pumped gas is low pressure, the gas flow is relatively low. So it is enough that the additional pump be sized to be fair capable of pumping said gas flow, so that inlet 8 of the additional pump 6 is at a much lower pressure at atmospheric pressure, and the primary pump 1 must thus achieve a reduced compression ratio which consequently reduces the heating of the gases passing through it and the heating which results on its constituent parts.
- the additional pump 6 is capable of pumping the entire gaseous flow of the operating regime normal, the non-return valve 11 ensuring the maintenance of the pressure difference between inlet 8 and outlet 9 of the pump additional 6.
- Pre-hose 7 is required to allow pass the gas flow at a higher flow rate than the primary pump 1 must evacuate at the start of emptying of a vacuum chamber 3.
- the gases being pumped generally do not include low gas thermal conductivity, and the compression that the last stage of primary pump 1 is lower than that the vacuum pumping system must perform in operating mode normal, i.e. when the pressure in the vacuum vessel 3 is very low.
- the primary pump 1 is thus capable of ensuring that only the step of vacuuming the vacuum chamber 3, through the priming line 7, and the additional pump 6 has not significant effect on the functioning of the system.
- the pipeline 7 should be dimensioned so that the significant gas flow during the steps of feed-through the vacuum chamber 3.
- the pumped gas recycling system 10 generates a gas flow recycled.
- the flow of recycled gas is sent through a pipeline of recycling 110 to a piloted gas source 12 which is itself connected to the vacuum enclosure 3 by an injection pipe 13 to inject into the vacuum vessel 3 appropriate quantities of gas during programmed operating steps.
- the primary pump 1 is for example a multi-stage dry pump Roots type, as illustrated more clearly on Figure 2.
- the stator 14 defines a succession of compression chambers, for example the compression chambers 15, 16 and 17, in which rotate Roots type compression lobes carried by two rotors parallel such as the rotor 20 mechanically coupled, with gas passage pipes to let gases pass successively between the adjacent compression chambers.
- Rotors such as rotor 20 are mounted parts rotating on bearings, and a play is necessarily present between the compression lobes and the walls of the stator 14. A blade therefore exists between the compression lobes of the rotors and the stator mass 14. In the case of pumping gas at low heat conduction, the gas blade effectively insulates the lobes compression of the rotors relative to the stator, and therefore opposes at the passage of heat energy from the rotors to stator 14. It this results in the heating of rotors such as rotor 20.
- This heating is more accentuated in the last floor 17 of the primary pump, stage where the most compression occurs important gas.
- the vacuum pumping system as illustrated in the figure 1 according to the invention makes it possible to lower the pressure at outlet 4 of the primary pump 1, thereby reducing overheating of the top stage of the primary pump 1.
- This effect is particularly advantageous during pumping gas with low thermal conduction, and prevents destruction primary pump 1.
- the operation of the system according to the invention is the following: at the start of pumping of the gases present in an enclosure at vacuum 3, the primary pump 1 sucks the gases at its inlet 2 and the compresses to discharge them at its outlet 4 at pressure close to the atmospheric pressure.
- the gas flow is significant, and the pumped gas mixtures generally contain good gases coefficient of thermal conduction.
- Primary pump type 1 Multi-stage Roots is thus capable of ensuring the pumping of this gas flow, during a vacuuming step.
- the gas driven back to its outlet 4 mainly pass through the hose 7 to through the non-return valve 11, to escape towards the atmosphere.
- the additional pump 6 sees only a weak pass portion of the discharged gas flow, its pumping capacity being scaled down.
- the process steps can be carried out under vacuum, by example for the manufacture of semiconductors.
- process are injected into the vacuum enclosure 3 by the gas source 12 through the injection pipe 13.
- These process gases can be insulating gases such as argon or xenon, in the stages where these gases are used for example in sources of light emitting in the deep ultraviolet.
- the gas flows pumped being weak, the additional pump 6 is capable of ensuring the pumping of all the gas flow leaving the primary pump 1 by output 4, and no flow flows through the drain line 7.
- the additional pump 6 produces a pressure lowering at its inlet 8, i.e. at the outlet 4 of the primary pump 1.
- the primary pump 1 is thus capable of withstand the presence of gases with low thermal conductivity such than argon or xenon in the flow of pumped gases, without exaggerated heating of its elements.
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- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- General Engineering & Computer Science (AREA)
- Applications Or Details Of Rotary Compressors (AREA)
- Compressors, Vaccum Pumps And Other Relevant Systems (AREA)
- Compressor (AREA)
- Reciprocating Pumps (AREA)
Abstract
Description
La présente invention concerne les systèmes de pompage à vide à pompe primaire sèche de type Roots multi-étagée ou de type multi-lobe "claw", dans lesquels l'entrée de la pompe primaire reçoit les gaz à pomper et la sortie de la pompe primaire refoule les gaz pompés vers l'atmosphère ou vers un système de recyclage des gaz pompés.The present invention relates to pumping systems using multi-stage Roots type dry pump vacuum or type multi-lobe "claw", in which the inlet of the primary pump receives the gases to be pumped and the output of the primary pump discharges gases pumped to the atmosphere or to a recycling system pumped gases.
Dans diverses industries telles que l'industrie du semi-conducteur, on utilise des procédés de fabrication en atmosphère contrôlée à basse pression, dans une enceinte à vide raccordée à un système de pompage à vide.In various industries such as the semiconductor industry, we use atmospheric manufacturing processes controlled at low pressure, in a vacuum enclosure connected to a vacuum pumping system.
Pour réaliser et maintenir le vide dans l'enceinte à vide, le système de pompage à vide doit, dans un premier temps, pomper un flux de gaz relativement important afin de créer le vide ; dans un second temps, le système de pompage à vide extrait de l'enceinte à vide les gaz résiduels ou les gaz de traitement introduits volontairement dans l'enceinte à vide lors des diverses étapes des procédés de fabrication en atmosphère contrôlée. Les flux de gaz à pomper par le système de pompage à vide sont alors plus faibles.To create and maintain the vacuum in the vacuum vessel, the vacuum pumping system must first pump a relatively large gas flow to create the vacuum; in one second, the vacuum pumping system extracted from the enclosure to empties the residual gases or the treatment gases introduced voluntarily in the vacuum enclosure during the various stages of manufacturing processes in a controlled atmosphere. Gas flows to pumping by the vacuum pumping system are then lower.
Un souci permanent, notamment dans l'industrie du semi-conducteur, est de maintenir une grande pureté des gaz contenus dans l'enceinte à vide. A cet effet, il convient d'éviter la pollution rétrograde provenant du système de pompage à vide. Cela interdit, notamment, l'utilisation de systèmes de pompage à vide comprenant des pompes à anneau liquide. Dans les techniques modernes, les systèmes de pompage à vide sont à base de pompes sèches de type Roots ou claw.A permanent concern, especially in the semiconductor industry, is to maintain a high purity of the gases contained in the vacuum vessel. To this end, the retrograde pollution from the vacuum pumping system. it prohibited, in particular, the use of vacuum pumping systems including liquid ring pumps. In the techniques modern vacuum pumping systems are pump based Roots or claw type dry.
D'autre part, les gaz de traitement introduits volontairement dans l'enceinte à vide sont fréquemment des gaz onéreux, et on trouve avantage à recycler ces gaz en sortie du système de pompage à vide, par un système de recyclage des gaz pompés, pour les réintroduire ensuite de façon contrôlée dans l'enceinte à vide. Il est alors nécessaire de ne pas contaminer ces gaz lors de leur traversée du système de pompage à vide, et c'est une seconde raison pour laquelle on est amené à utiliser des pompes primaires sèches de type Roots ou claw, plutôt que des pompes primaires traditionnelles à joint d'huile. On the other hand, the treatment gases introduced voluntarily in the vacuum vessel are frequently gases expensive, and there is an advantage in recycling these gases at the outlet of the vacuum pumping system, by a gas recycling system pumped, to then reintroduce them in a controlled manner into the vacuum vessel. It is therefore necessary not to contaminate these gas as they pass through the vacuum pumping system, and that's a second reason why we have to use pumps Roots or claw dry primers, rather than pumps traditional oil seal primers.
Ainsi, dans les systèmes connus de pompage à vide à pompe primaire sèche de type Roots ou claw, l'entrée de la pompe primaire reçoit les gaz à pomper, soit directement de l'enceinte à vide, soit indirectement par une pompe secondaire qui peut être une pompe turbomoléculaire. La pompe primaire refoule les gaz pompés directement vers l'atmosphère ou directement vers un système de recyclage des gaz pompés.Thus, in known vacuum pump pump systems dry primary type Roots or claw, the inlet of the primary pump receives the gases to be pumped, either directly from the vacuum enclosure, either indirectly by a secondary pump which can be a pump turbomolecular. The primary pump delivers the pumped gases directly to the atmosphere or directly to a system of recycling of pumped gases.
Diverses industries sont amenées à pomper et à recycler des gaz purs à faible conductivité thermique tels que l'argon ou le xénon. C'est notamment le cas dans l'industrie du semi-conducteur où ces gaz sont utilisés dans des sources de lumière émettant dans l'ultraviolet profond pour réaliser des équipements de photolitographie destinés à la fabrication des circuits électroniques de nouvelle génération.Various industries are required to pump and recycle pure gases with low thermal conductivity such as argon or xenon. This is particularly the case in the semiconductor industry where these gases are used in light sources emitting in the deep ultraviolet to make equipment for photolitography for the manufacture of circuits new generation electronics.
Dans ce type d'application, ces gaz très purs sont utilisés à basse pression dans l'enceinte à vide, et sont évacués par un système de pompage à pompe primaire sèche multi-étagée de type Roots ou de type multi-lobe claw. Ainsi, le document US 4 504 201 A décrit une pompe multi-étagée de type Roots et deux étages de type claw. Le dernier étage refoule à l'atmosphère.In this type of application, these very pure gases are used at low pressure in the vacuum vessel, and are evacuated by a multi-stage primary dry pump pumping system Roots type or multi-lobe claw type. So the document US 4 504 201 A describes a multi-stage pump of the Roots type and two claw floors. The top floor pushes the atmosphere.
Dans une pompe multi-étagée, le gaz à évacuer est aspiré par le premier étage de la pompe puis comprimé dans les étages suivants jusqu'à atteindre une pression légèrement supérieure à la pression atmosphérique à la sortie du dernier étage et être ainsi rejeté à l'atmosphère ou refoulé vers un système de recyclage des gaz pompés.In a multi-stage pump, the gas to be evacuated is sucked by the first stage of the pump then compressed in the stages following until reaching a pressure slightly higher than the atmospheric pressure at the exit of the top floor and so be released to the atmosphere or returned to a recycling system for pumped gases.
On a précédemment constaté que les systèmes de pompage à vide connus à pompe sèche multi-étagée de type Roots ou multi-lobe claw présentent un grave inconvénient dans le cas où des gaz purs à faible conductivité thermique tels que l'argon ou le xénon sont introduits dans l'enceinte à vide au cours des étapes de procédé. En effet, la présence dans les gaz pompés d'une forte teneur de gaz pur à faible conductivité thermique tel que l'argon ou le xénon entraíne un blocage et une destruction très rapides de la pompe primaire sèche. It has previously been found that pumping systems using known vacuum with Roots or multi-lobe type multi-stage dry pump claw have a serious drawback in the case where pure gases at low thermal conductivity such as argon or xenon are introduced into the vacuum enclosure during the process steps. Indeed, the presence in the pumped gases of a high gas content pure with low thermal conductivity such as argon or xenon causes very rapid blocking and destruction of the pump dry primary.
Le blocage et la destruction rapides de la pompe sont dus à un blocage du dernier étage de la pompe, étage qui refoule les gaz à une pression voisine de la pression atmosphérique.Rapid blocking and destruction of the pump is due blockage of the last stage of the pump, stage which drives the gas at a pressure close to atmospheric pressure.
L'explication réside dans l'analyse suivante : dans une pompe sèche multi-étagée, quelle que soit sa technologie, le gaz subit plusieurs compressions successives dans les divers étages de la pompe depuis la pression d'aspiration à l'entrée du premier étage jusqu'à la pression atmosphérique en sortie du dernier étage. A chaque étape de compression le gaz s'échauffe et échauffe les parties de pompe voisines. Cependant, cette compression n'est pas régulière, et c'est dans le dernier étage que se produit la plus forte compression. Généralement, on atteint dans le dernier étage une compression supérieure à 5.104 Pa. C'est donc dans le dernier étage que le gaz s'échauffe le plus et que doit donc être dissipée la plus grande part de l'énergie sous forme de calories.The explanation lies in the following analysis: in a multi-stage dry pump, whatever its technology, the gas undergoes several successive compressions in the various stages of the pump since the suction pressure at the inlet of the first stage up to atmospheric pressure at the outlet of the last stage. At each compression stage the gas heats up and heats the neighboring pump parts. However, this compression is not regular, and it is in the last stage that the strongest compression occurs. Generally, a compression greater than 5.10 4 Pa is achieved in the last stage. It is therefore in the last stage that the gas heats up most and that most of the energy must therefore be dissipated in the form of calories .
Or, la structure des pompes primaires sèches comprend un stator dans lequel tournent deux rotors couplés mécaniquement et décalés latéralement l'un par rapport à l'autre. Les rotors sont tenus par des paliers, et sont séparés du stator par la lame de gaz contenue dans les jeux mécaniques entre le rotor et le stator ou corps de pompe. La dissipation des calories dans un étage de la pompe s'effectue, pour une très faible part, par conduction au travers de l'axe du rotor en direction du corps de pompe, et pour une part prépondérante par conduction au travers de la lame de gaz présente entre le rotor et le stator.However, the structure of the dry primary pumps includes a stator in which rotate two mechanically coupled rotors and laterally offset from each other. The rotors are held by bearings, and are separated from the stator by the gas slide contained in the mechanical clearances between the rotor and the stator or pump body. The dissipation of calories in a stage of the pump is carried out, for a very small part, by conduction across the rotor axis towards the pump body, and for a preponderant part by conduction through the gas slide between the rotor and the stator.
Dans le cas du pompage de gaz à faible conductivité thermique, le gaz s'oppose au transfert thermique entre le rotor et le stator. Il en résulte, dans le dernier étage de la pompe primaire multi-étagée, une élévation de la température du rotor très importante et rapide, qui a pour conséquence une dilatation du rotor telle que ce dernier entre en contact avec le stator, entraínant le blocage et la destruction de la pompe primaire.In the case of pumping low conductivity gases thermal, the gas opposes the thermal transfer between the rotor and the stator. This results in the last stage of the pump multi-stage primary, an increase in rotor temperature very large and rapid, which results in dilation of the rotor such that the latter comes into contact with the stator, causing blocking and destruction of the primary pump.
Pour éviter un tel phénomène, on a déjà proposé une solution consistant à injecter dans les étages intermédiaires de la pompe un gaz à forte conductivité thermique comme l'azote ou l'hélium. Cependant, ces gaz additifs se retrouvent alors mélangés au gaz pur, et empêchent un recyclage simple. To avoid such a phenomenon, we have already proposed a solution consisting in injecting into the intermediate stages of the pumps a gas with high thermal conductivity such as nitrogen or helium. However, these additive gases are then mixed with pure gas, and prevent simple recycling.
Une autre solution connue consiste à augmenter volontairement les jeux fonctionnels du dernier étage pour abaisser son taux de compression et ainsi diminuer les calories à évacuer. Mais la pompe n'est alors plus capable d'atteindre les performances requises, et il faut alors répartir la perte de taux de compression sur un grand nombre d'étages supplémentaires, ce qui conduit à concevoir une pompe complexe et encombrante.Another known solution is to increase voluntarily the top floor functional games to lower its compression ratio and thus reduce the calories to be evacuated. But the pump is then no longer capable of achieving performance required, and then the loss of compression ratio must be distributed over a large number of additional floors, which leads to design a complex and bulky pump.
On connaít par ailleurs du document DE 37 10 782 A une pompe à vide à deux étages pour pomper un mélange de gaz et de vapeur. Le premier étage est de type pompe à glissement. Le second étage est une pompe à membrane. On pilote les deux étages de pompe de manière à garder la pression intermédiaire entre les étages au-dessous de la pression du point de rosée de la vapeur. Le but est de réduire la pression de vide réalisée.We also know from document DE 37 10 782 A two-stage vacuum pump to pump a mixture of gases and steam. The first stage is of the sliding pump type. The second floor is a diaphragm pump. We control the two pump stages so as to keep the intermediate pressure between the stages below of the dew point pressure of the vapor. The goal is reduce the vacuum pressure achieved.
Le problème proposé par la présente invention est de concevoir une nouvelle structure de système de pompage à vide permettant d'éviter la destruction de la pompe primaire sèche dans le cas de pompage de gaz à faible conductivité thermique, en utilisant des pompes primaires sèches multi-étagées connues sans les modifier, en conservant également la même technique de recyclage éventuel, évitant ainsi de développer une nouvelle pompe.The problem proposed by the present invention is to design a new vacuum pumping system structure to avoid destruction of the dry primary pump in the case of pumping gas with low thermal conductivity, in using known multi-stage dry primary pumps without modify them, also keeping the same technique possible recycling, thus avoiding the development of a new pump.
Pour atteindre ces objets ainsi que d'autres, un système de pompage à vide selon l'invention comprend une pompe primaire sèche multi-étagée de type Roots ou claw, l'entrée de la pompe primaire recevant les gaz à pomper et la sortie de la pompe primaire refoulant les gaz pompés vers l'atmosphère ou vers un système de recyclage des gaz pompés. Selon l'invention, le système de pompage à vide comprend une pompe additionnelle dont l'entrée est raccordée à la sortie de la pompe primaire et dont la sortie refoule vers l'atmosphère ou vers le système de recyclage des gaz pompés. Une canalisation de prévidage est raccordée en parallèle sur la pompe additionnelle, et comporte un clapet anti-retour laissant passer les gaz provenant de la pompe primaire. La pompe additionnelle est une pompe sèche de technologie autre que Roots ou claw et adaptée pour supporter sans dommage l'élévation de température due à la compression finale des gaz pompés. To reach these and other objects, a system vacuum pump according to the invention comprises a primary pump Roots or claw type multi-stage dryer, pump inlet primary receiving the gases to be pumped and the pump outlet primary pumping the pumped gases towards the atmosphere or towards a pumped gas recycling system. According to the invention, the system vacuum pumping system includes an additional pump whose inlet is connected to the output of the primary pump and whose output back to the atmosphere or to the gas recycling system pumps. A vacuum hose is connected in parallel on the additional pump, and includes a non-return valve allowing gas from the primary pump to pass. The pump additional is a dry pump of technology other than Roots or claw and adapted to safely support the elevation of temperature due to the final compression of the pumped gases.
Selon un premier mode de réalisation, la pompe additionnelle est une pompe à membranes.According to a first embodiment, the pump additional is a diaphragm pump.
Selon un autre mode de réalisation, la pompe additionnelle est une pompe à pistons.According to another embodiment, the additional pump is a piston pump.
La pompe additionnelle doit être dimensionnée de façon à être capable de pomper tout le flux de gaz traversant le système de pompage à vide pendant les étapes de pompage d'un vide à basse pression, par exemple pour pomper le flux de gaz de procédé pendant les étapes de procédé de fabrication à basse pression dans une enceinte à vide.The additional pump must be sized to be able to pump all of the gas flow through the system vacuum pumping during the vacuum pumping steps at low pressure, for example to pump the process gas flow during the low pressure manufacturing process steps in a vacuum enclosure.
De préférence, la pompe additionnelle peut être dimensionnée de façon à être juste capable de pomper ledit flux de gaz pendant les étapes de pompage d'un vide à basse pression. On peut ainsi utiliser une pompe additionnelle petite, peu onéreuse et néanmoins suffisante pour supprimer le problème de destruction de la pompe primaire sèche.Preferably, the additional pump can be sized to be just capable of pumping said flow of gas during the steps of pumping a vacuum at low pressure. We can thus use a small, inexpensive and nevertheless sufficient to remove the problem of destruction of the primary pump dries.
La canalisation de prévidage doit être dimensionnée de façon à laisser passer le flux gazeux important au cours des étapes de prévidage d'une enceinte à vide.The drain line must be dimensioned way to let through the important gas flow during the stages for vacuuming an empty enclosure.
Le système de pompage à vide selon l'invention peut être raccordé à une enceinte à vide contenant ou dans laquelle sont injectés des gaz à faible conductivité thermique.The vacuum pumping system according to the invention can be connected to a vacuum enclosure containing or in which are injected gases with low thermal conductivity.
Les gaz à faible conductivité thermique peuvent comprendre l'argon ou le xénon.Low thermal conductivity gases may include argon or xenon.
Avantageusement, les gaz pompés sont refoulés en sortie du système de pompage à vide dans un système de recyclage des gaz pompés. Le système de recyclage des gaz pompés extrait et recycle lesdits gaz à faible conductivité thermique, pour les réinjecter de façon contrôlée dans l'enceinte à vide.Advantageously, the pumped gases are discharged at the outlet of the vacuum pumping system in a gas recycling system pumps. The pumped gas recycling system extracts and recycles said gases with low thermal conductivity, to reinject them from controlled manner in the vacuum vessel.
D'autres objets, caractéristiques et avantages de la présente invention ressortiront de la description suivante de modes de réalisation particuliers, faite en relation avec les figures jointes, parmi lesquelles:
- la figure 1 est une vue générale schématique d'un système de pompage à vide selon un mode de réalisation de l'invention, connecté à une enceinte à vide ;
- la figure 2 est une vue de côté en coupe longitudinale illustrant une structure possible de pompe Roots multi-étagée ; et
- la figure 3 est une vue de côté en coupe longitudinale d'une structure possible de pompe à membranes.
- Figure 1 is a schematic general view of a vacuum pumping system according to one embodiment of the invention, connected to a vacuum enclosure;
- FIG. 2 is a side view in longitudinal section illustrating a possible structure of a multi-stage Roots pump; and
- Figure 3 is a side view in longitudinal section of a possible membrane pump structure.
Dans le mode de réalisation illustré schématiquement sur
la figure 1, un système de pompage à vide selon l'invention
comprend une pompe primaire 1 sèche multi-étagée de type Roots ou
claw, dont l'entrée 2 reçoit les gaz à pomper provenant d'une
enceinte à vide 3, et dont la sortie 4 refoule les gaz pompés vers
un étage de sortie 5 comprenant une pompe additionnelle 6 et une
canalisation de prévidage 7.In the embodiment illustrated schematically on
Figure 1, a vacuum pumping system according to the invention
includes a primary pump 1 dry multi-stage Roots type or
claw, whose
La pompe additionnelle 6 comporte une entrée 8 raccordée à
la sortie 4 de la pompe primaire 1, et comporte une sortie 9 qui
refoule vers l'atmosphère extérieure ou vers un système de
recyclage des gaz pompés 10.The additional pump 6 has an
La canalisation de prévidage 7 est raccordée en parallèle
sur la pompe additionnelle 6, c'est-à-dire que son entrée est
raccordée à l'entrée 8 de la pompe additionnelle 6 et à la sortie 4
de la pompe primaire 1, et sa sortie est raccordée à la sortie 9 de
la pompe additionnelle 6 et à l'atmosphère ou au système de
recyclage des gaz pompés 10. La canalisation de prévidage 7
comporte un clapet anti-retour 11, qui laisse passer les gaz de
l'entrée vers la sortie tout en interdisant leur circulation de la
sortie vers l'entrée. Ainsi, le clapet anti-retour 11 laisse passer
les gaz provenant de la sortie 4 de la pompe primaire 1.Pre-hose 7 is connected in parallel
on additional pump 6, i.e. its input is
connected to
La pompe additionnelle 6 est une pompe sèche de
technologie différente des technologies Roots ou claw utilisées
pour la pompe primaire 1, et est adaptée pour supporter sans
dommage l'élévation de température due à la compression finale des
gaz pompés avant leur refoulement vers l'atmosphère ou vers le
système de recyclage des gaz pompés 10.The additional pump 6 is a dry pump of
technology different from the Roots or claw technologies used
for primary pump 1, and is adapted to support without
damage the temperature rise due to the final compression of the
gases pumped before being discharged to the atmosphere or to the
pumped
Un premier exemple d'une pompe additionnelle pouvant convenir est une pompe à membranes, telle qu'illustrée schématiquement sur la figure 3. On comprend qu'une telle pompe à membranes est une pompe sèche, c'est-à-dire dans laquelle le joint d'étanchéité de la pompe n'est pas réalisé par un volume liquide. On comprend également que la structure de pompe à membranes ne comporte pas un rotor isolé du stator par la lame de gaz pompés.A first example of an additional pump that can suitable is a diaphragm pump, as shown schematically in Figure 3. It is understood that such a pump to membranes is a dry pump, that is to say in which the joint sealing of the pump is not achieved by a liquid volume. It is also understood that the membrane pump structure does not does not have a rotor isolated from the stator by the blade of pumped gases.
Un second exemple de pompe additionnelle pouvant convenir est une pompe à pistons, qui est une structure bien connue dans l'état de la technique. Dans une telle pompe à pistons, il n'y a pas, non plus, de rotor isolé du stator par une lame de gaz pompés.A second example of an additional pump that may be suitable is a piston pump, which is a well-known structure in the state of the art. In such a piston pump, there is also, no rotor isolated from the stator by a blade of pumped gases.
Il en résulte que, dans l'une et l'autre des technologies de pompe à pistons ou pompe à membranes, toutes les pièces de la pompe peuvent être refroidies par conduction depuis le corps extérieur de la pompe qui est refroidi lui-même par un circuit de refroidissement forcé, de sorte qu'une telle pompe additionnelle est capable d'évacuer la grande quantité de chaleur résultant de la compression finale des gaz pompés.As a result, in either technology piston pump or diaphragm pump, all parts of the pump can be cooled by conduction from the body outside of the pump which is itself cooled by a circuit of forced cooling, so that such an additional pump is able to dissipate the large amount of heat resulting from the final compression of the pumped gases.
La pompe additionnelle 6 doit être dimensionnée de façon à
être capable de pomper tout le flux de gaz de procédé traversant le
système de pompage à vide pendant les étapes de pompage d'un vide à
basse pression. Pendant ces étapes où le gaz pompé est à basse
pression, le flux gazeux est relativement faible. Il suffit donc
que la pompe additionnelle soit dimensionnée de façon à être juste
capable de pomper ledit flux de gaz, de façon que l'entrée 8 de la
pompe additionnelle 6 se trouve à une pression nettement inférieure
à la pression atmosphérique, et la pompe primaire 1 doit ainsi
réaliser un taux de compression réduit qui réduit en conséquence
l'échauffement des gaz qui la traversent et l'échauffement qui en
résulte sur ses parties constitutives. Pour assurer une réduction
satisfaisante de la pression gazeuse à l'entrée 8 de la pompe
additionnelle 6, il suffit que la pompe additionnelle 6 soit
capable de pomper tout le flux gazeux du régime de fonctionnement
normal, le clapet anti-retour 11 assurant le maintien de la
différence de pression entre l'entrée 8 et la sortie 9 de la pompe
additionnelle 6.The additional pump 6 must be dimensioned so as to
be able to pump the entire process gas flow through the
vacuum pumping system during the pumping stages from vacuum to
low pressure. During these stages where the pumped gas is low
pressure, the gas flow is relatively low. So it is enough
that the additional pump be sized to be fair
capable of pumping said gas flow, so that
La canalisation de prévidage 7 est nécessaire pour laisser
passer le flux gazeux à débit supérieur que la pompe primaire 1
doit évacuer en début de vidage d'une enceinte à vide 3. Dans ce
cas, les gaz pompés ne comportent généralement pas de gaz à faible
conductivité thermique, et la compression que doit réaliser le
dernier étage de la pompe primaire 1 est inférieure à celle que le
système de pompage à vide doit réaliser en régime de fonctionnement
normal, c'est-à-dire lorsque la pression dans l'enceinte à vide 3
est très basse. La pompe primaire 1 est ainsi capable d'assurer à
elle seule l'étape de prévidage de l'enceinte à vide 3, à travers
la canalisation de prévidage 7, et la pompe additionnelle 6 n'a pas
d'effet sensible sur le fonctionnement du système. La canalisation
de prévidage 7 doit être dimensionnée de façon à laisser passer le
flux gazeux important au cours des étapes de prévidage de
l'enceinte à vide 3.Pre-hose 7 is required to allow
pass the gas flow at a higher flow rate than the primary pump 1
must evacuate at the start of emptying of a vacuum chamber 3. In this
cases, the gases being pumped generally do not include low gas
thermal conductivity, and the compression that the
last stage of primary pump 1 is lower than that the
vacuum pumping system must perform in operating mode
normal, i.e. when the pressure in the vacuum vessel 3
is very low. The primary pump 1 is thus capable of ensuring that
only the step of vacuuming the vacuum chamber 3, through
the
Dans le mode de réalisation illustré sur la figure 1, le
système de recyclage des gaz pompés 10 génère un flux de gaz
recyclé. Le flux de gaz recyclé est envoyé par une canalisation de
recyclage 110 vers une source de gaz 12 pilotée qui est elle-même
raccordée à l'enceinte à vide 3 par une canalisation d'injection 13
pour injecter dans l'enceinte à vide 3 des quantités appropriées de
gaz au cours d'étapes de fonctionnement programmées.In the embodiment illustrated in FIG. 1, the
pumped
La pompe primaire 1 est par exemple une pompe sèche multi-étagée
de type Roots, telle qu'illustrée de façon plus claire sur
la figure 2. Dans une telle pompe Roots multi-étagée, le stator 14
définit une succession de chambres de compression, par exemple les
chambres de compression 15, 16 et 17, dans lesquelles tournent des
lobes de compression de type Roots portés par deux rotors
parallèles tels que le rotor 20 mécaniquement couplés, avec des
canalisations de passage de gaz pour laisser passer les gaz
successivement entre les chambres de compression adjacentes.The primary pump 1 is for example a multi-stage dry pump
Roots type, as illustrated more clearly on
Figure 2. In such a multi-stage Roots pump, the stator 14
defines a succession of compression chambers, for example the
Les rotors tels que le rotor 20 sont des pièces montées
rotatives sur des paliers, et un jeu est nécessairement présent
entre les lobes de compression et les parois du stator 14. Une lame
gazeuse existe donc entre les lobes de compression des rotors et la
masse du stator 14. Dans le cas du pompage de gaz à faible
conduction thermique, la lame gazeuse isole efficacement les lobes
de compression des rotors par rapport au stator, et s'oppose donc
au passage d'énergie calorifique des rotors vers le stator 14. Il
en résulte un échauffement des rotors tels que le rotor 20.Rotors such as
Cet échauffement est plus accentué dans le dernier étage 17 de la pompe primaire, étage où se produit la compression la plus importante des gaz. This heating is more accentuated in the last floor 17 of the primary pump, stage where the most compression occurs important gas.
Le système de pompage à vide tel qu'illustré sur la figure 1 selon l'invention permet d'abaisser la pression en sortie 4 de la pompe primaire 1, réduisant ainsi l'échauffement du dernier étage de la pompe primaire 1.The vacuum pumping system as illustrated in the figure 1 according to the invention makes it possible to lower the pressure at outlet 4 of the primary pump 1, thereby reducing overheating of the top stage of the primary pump 1.
Cet effet est particulièrement avantageux lors du pompage de gaz à faible conduction thermique, et empêche la destruction rapide de la pompe primaire 1.This effect is particularly advantageous during pumping gas with low thermal conduction, and prevents destruction primary pump 1.
Le fonctionnement du système selon l'invention est le
suivant : en début de pompage des gaz présents dans une enceinte à
vide 3, la pompe primaire 1 aspire les gaz à son entrée 2 et les
comprime pour les refouler à sa sortie 4 à pression voisine de la
pression atmosphérique. Le flux gazeux est important, et les
mélanges gazeux pompés contiennent généralement des gaz à bon
coefficient de conduction thermique. La pompe primaire 1 de type
Roots multi-étagée est ainsi capable d'assurer le pompage de ce
flux gazeux, lors d'une étape de prévidage. Les gaz refoulés à sa
sortie 4 traversent principalement la canalisation de prévidage 7 à
travers le clapet anti-retour 11, pour s'échapper vers
l'atmosphère. La pompe additionnelle 6 ne voit passer qu'une faible
portion du flux gazeux refoulé, sa capacité de pompage étant
réduite.The operation of the system according to the invention is the
following: at the start of pumping of the gases present in an enclosure at
vacuum 3, the primary pump 1 sucks the gases at its
Lorsque la pression basse est établie dans l'enceinte à
vide 3, on peut réaliser les étapes de procédé sous vide, par
exemple pour la fabrication de semi-conducteurs. Au cours de ces
étapes, c'est-à-dire au cours du fonctionnement normal, des gaz de
procédé sont injectés dans l'enceinte à vide 3 par la source de gaz
12 à travers la canalisation d'injection 13. Ces gaz de procédé
peuvent être des gaz isolants tels que l'argon ou le xénon, dans
les étapes où ces gaz servent par exemple dans des sources de
lumière émettant dans l'ultraviolet profond. Les flux gazeux pompés
étant faibles, la pompe additionnelle 6 est capable d'assurer le
pompage de tout le flux gazeux sortant de la pompe primaire 1 par
la sortie 4, et aucun flux ne parcourt la canalisation de prévidage
7. Il en résulte que la pompe additionnelle 6 produit un
abaissement de la pression à son entrée 8, c'est-à-dire à la sortie
4 de la pompe primaire 1. La pompe primaire 1 est ainsi capable de
supporter la présence de gaz à faible conductivité thermique tels
que l'argon ou le xénon dans le flux de gaz pompés, sans
échauffement exagéré de ses éléments.When the low pressure is established in the enclosure to
vacuum 3, the process steps can be carried out under vacuum, by
example for the manufacture of semiconductors. During these
stages, i.e. during normal operation,
process are injected into the vacuum enclosure 3 by the gas source
12 through the injection pipe 13. These process gases
can be insulating gases such as argon or xenon, in
the stages where these gases are used for example in sources of
light emitting in the deep ultraviolet. The gas flows pumped
being weak, the additional pump 6 is capable of ensuring the
pumping of all the gas flow leaving the primary pump 1 by
output 4, and no flow flows through the
Généralement, les gaz pompés à faible conductivité
thermique sont des gaz onéreux, qu'il est intéressant de recycler.
C'est la raison pour laquelle, en sortie du système, les gaz sont
refoulés dans le système de recyclage des gaz pompés 10, qui lui-même
renvoie les gaz recyclés par la canalisation de recyclage 110
vers la source de gaz 12, pour une réinjection ultérieure dans
l'enceinte à vide 3.Generally, pumped gases with low conductivity
are expensive gases, which it is worth recycling.
This is the reason why, at the outlet of the system, the gases are
returned to the pumped
La présente invention n'est pas limitée aux modes de réalisation qui ont été explicitement décrits, mais elle en inclut les diverses variantes et généralisations qui sont à la portée de l'homme du métier.The present invention is not limited to the modes of which have been explicitly described, but it includes the various variants and generalizations which are within the reach of the skilled person.
Claims (9)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FR0103678 | 2001-03-19 | ||
FR0103678A FR2822200B1 (en) | 2001-03-19 | 2001-03-19 | PUMPING SYSTEM FOR LOW THERMAL CONDUCTIVITY GASES |
Publications (2)
Publication Number | Publication Date |
---|---|
EP1243795A1 true EP1243795A1 (en) | 2002-09-25 |
EP1243795B1 EP1243795B1 (en) | 2004-05-19 |
Family
ID=8861270
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
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EP02356050A Expired - Lifetime EP1243795B1 (en) | 2001-03-19 | 2002-03-13 | A two-stage vacuum pump |
Country Status (6)
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---|---|
US (1) | US6644931B2 (en) |
EP (1) | EP1243795B1 (en) |
JP (1) | JP4166491B2 (en) |
AT (1) | ATE267345T1 (en) |
DE (1) | DE60200493T2 (en) |
FR (1) | FR2822200B1 (en) |
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US10094381B2 (en) * | 2015-06-05 | 2018-10-09 | Agilent Technologies, Inc. | Vacuum pump system with light gas pumping and leak detection apparatus comprising the same |
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FR3098869B1 (en) * | 2019-07-17 | 2021-07-16 | Pfeiffer Vacuum | Pumping group |
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Cited By (21)
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DE102010009083A1 (en) | 2009-03-24 | 2011-05-12 | Vacuubrand Gmbh + Co Kg | Vacuum pump e.g. liquid-sealed vacuum pump, for use as rotary vane pump, has two pumping stages respectively arranged at vacuum side and pressure side, where one of pumping stages is implemented as screw pumping stage with screw pump unit |
DE102010009083B4 (en) * | 2009-03-24 | 2013-09-26 | Vacuubrand Gmbh + Co Kg | vacuum pump |
DE202009003980U1 (en) | 2009-03-24 | 2010-08-19 | Vacuubrand Gmbh + Co Kg | vacuum pump |
EP3842642A1 (en) * | 2010-04-19 | 2021-06-30 | Ebara Corporation | Dry vacuum pump apparatus |
WO2014111471A1 (en) * | 2013-01-21 | 2014-07-24 | Sterling Industry Consult Gmbh | Pump assembly and method for evacuating a vapor-filled chamber |
CN105026758A (en) * | 2013-01-21 | 2015-11-04 | 施特林工业咨询公司 | Pump assembly and method for evacuating a vapor-filled chamber |
RU2666720C2 (en) * | 2014-06-27 | 2018-09-11 | Ателье Буш Са | Method of evacuation in the vacuum pump system and vacuum pump system |
WO2015197138A1 (en) * | 2014-06-27 | 2015-12-30 | Ateliers Busch Sa | Method of pumping in a system of vacuum pumps and system of vacuum pumps |
US11725662B2 (en) | 2014-06-27 | 2023-08-15 | Ateliers Busch Sa | Method of pumping in a system of vacuum pumps and system of vacuum pumps |
US10760573B2 (en) | 2014-06-27 | 2020-09-01 | Ateliers Busch Sa | Method of pumping in a system of vacuum pumps and system of vacuum pumps |
CN106662108A (en) * | 2014-06-27 | 2017-05-10 | 阿特利耶博世股份有限公司 | Method of pumping in system of vacuum pumps and system of vacuum pumps |
AU2014406724B2 (en) * | 2014-09-26 | 2019-09-19 | Ateliers Busch Sa | Vacuum-generating pumping system and pumping method using this pumping system |
RU2670640C1 (en) * | 2014-09-26 | 2018-10-24 | Ателье Буш Са | Pumping system for creating a vacuum and a handling method with the use of this pumping system |
RU2670640C9 (en) * | 2014-09-26 | 2018-12-04 | Ателье Буш Са | Pumping system for creating a vacuum and a handling method with the use of this pumping system |
WO2016045753A1 (en) * | 2014-09-26 | 2016-03-31 | Ateliers Busch Sa | Vacuum-generating pumping system and pumping method using this pumping system |
RU2674297C2 (en) * | 2014-10-02 | 2018-12-06 | Ателье Буш Са | Pumping-out system for creating vacuum and pumping-out method therewith |
CN107002681A (en) * | 2014-10-02 | 2017-08-01 | 阿特利耶博世股份有限公司 | Pumping system and the pumping method using this pumping system for producing vacuum |
AU2014407987B2 (en) * | 2014-10-02 | 2019-10-31 | Ateliers Busch Sa | Pumping system for generating a vacuum and method for pumping by means of this pumping system |
US10808730B2 (en) | 2014-10-02 | 2020-10-20 | Ateliers Busch Sa | Pumping system for generating a vacuum and method for pumping by means of this pumping system |
WO2016050313A1 (en) * | 2014-10-02 | 2016-04-07 | Ateliers Busch Sa | Pumping system for generating a vacuum and method for pumping by means of this pumping system |
CN105889072A (en) * | 2016-06-25 | 2016-08-24 | 余林岚 | Vacuumizing unit applied to anaerobic adhesive processing |
Also Published As
Publication number | Publication date |
---|---|
US6644931B2 (en) | 2003-11-11 |
DE60200493T2 (en) | 2005-08-04 |
ATE267345T1 (en) | 2004-06-15 |
JP2002339864A (en) | 2002-11-27 |
FR2822200A1 (en) | 2002-09-20 |
US20020131870A1 (en) | 2002-09-19 |
JP4166491B2 (en) | 2008-10-15 |
EP1243795B1 (en) | 2004-05-19 |
DE60200493D1 (en) | 2004-06-24 |
FR2822200B1 (en) | 2003-09-26 |
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