EP1133639A1 - Controleur de pompe pour appareil de pompage de precision - Google Patents
Controleur de pompe pour appareil de pompage de precisionInfo
- Publication number
- EP1133639A1 EP1133639A1 EP99965911A EP99965911A EP1133639A1 EP 1133639 A1 EP1133639 A1 EP 1133639A1 EP 99965911 A EP99965911 A EP 99965911A EP 99965911 A EP99965911 A EP 99965911A EP 1133639 A1 EP1133639 A1 EP 1133639A1
- Authority
- EP
- European Patent Office
- Prior art keywords
- fluid
- chamber
- dispensation
- pump
- feed
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
- F04B—POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS
- F04B13/00—Pumps specially modified to deliver fixed or variable measured quantities
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
- F04B—POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS
- F04B43/00—Machines, pumps, or pumping installations having flexible working members
- F04B43/02—Machines, pumps, or pumping installations having flexible working members having plate-like flexible members, e.g. diaphragms
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
- F04B—POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS
- F04B49/00—Control, e.g. of pump delivery, or pump pressure of, or safety measures for, machines, pumps, or pumping installations, not otherwise provided for, or of interest apart from, groups F04B1/00 - F04B47/00
- F04B49/06—Control using electricity
- F04B49/065—Control using electricity and making use of computers
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
- F04B—POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS
- F04B7/00—Piston machines or pumps characterised by having positively-driven valving
- F04B7/0076—Piston machines or pumps characterised by having positively-driven valving the members being actuated by electro-magnetic means
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
- F04B—POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS
- F04B2201/00—Pump parameters
- F04B2201/02—Piston parameters
- F04B2201/0201—Position of the piston
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
- F04B—POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS
- F04B2201/00—Pump parameters
- F04B2201/06—Valve parameters
- F04B2201/0601—Opening times
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
- F04B—POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS
- F04B2205/00—Fluid parameters
- F04B2205/03—Pressure in the compression chamber
Definitions
- This invention relates generally to precision pumping apparatus and, more
- semiconductor wafers during processing typically require a flatness across the surface
- centrifugal force to the edges of the wafer has to be controlled in order to ensure that
- the processing liquid is applied uniformly. It is also critical to control the rate and
- pumping apparatus may also contribute to the problem of the double or stuttered
- the pumping apparatus precisely controls the dispensing amount and/or rate
- controller may precisely control the timing of the control valves with respect to each
- the pump controller in accordance with
- FIG. 1 is a block diagram illustrating a pumping apparatus including a pump controller in accordance with the invention
- Figure 2 is a block diagram illustrating a two-stage pumping apparatus
- Figure 3 is a timing diagram illustrating the conventional sequence for dispensing fluids
- Figure 4 is a timing diagram illustrating a sequence for dispensing fluids in accordance with the invention.
- Figure 5 is a flowchart illustrating a method for controlling a pumping apparatus to dispense low viscosity fluids in accordance with the invention.
- the invention is particularly applicable to a pumping apparatus which
- FIG. 1 is a block diagram illustrating a pumping apparatus 10 including a
- the pumping apparatus 10 may be any pump controller in accordance with the invention.
- the pumping apparatus 10 may be any pump controller in accordance with the invention.
- the pumping apparatus 10 may be any pump controller in accordance with the invention.
- the pumping apparatus 10 may be any pump controller in accordance with the invention.
- the pumping apparatus 10 may be any pump controller in accordance with the invention.
- the pumping apparatus 10 may be any pump controller in accordance with the invention.
- a low viscosity fluid which may have a viscosity of less than 5 centipoire
- (cPs) may be dispensed at a low flow rate of about 0.5 milliliters per second, but the
- invention is not limited to dispensing low viscosity fluids or low flow rate fluids.
- pump 12 is a two-stage pump since the dispensing of the fluid includes a first feed and
- memory in the computer 16 may be executed by a processor (not shown) in the
- the operation of the pump may also be controlled by a software application
- the software application 20 may control, for example, the opening and closing
- the pump 12 may draw fluid from the reservoir 14 into
- the fluid may then be filtered through a filter and
- the fluid may be dispensed through a filter 22 onto the wafer 18 in precise
- stage pump 12 will be described in order to better understand the invention.
- FIG. 2 is a block diagram illustrating more details of the two-stage pump 12
- the two-stage pump 12 may be employed.
- the two-stage pump 12 may be employed.
- the two-stage pump 12 may be employed.
- the feed and filtration stage 30 include a feed and filtration stage 30 and a dispensing stage 32.
- the feed and filtration stage 30 includes a feed and filtration stage 30 and a dispensing stage 32.
- stage 30 may include a feed chamber 34 which may draw fluid from a fluid supply
- the inlet valve 36 is closed.
- a feed valve 38 controls whether a vacuum, a positive feed pressure
- diaphragm is pulled against a wall of the feed chamber and pulls fluid into the feed
- a feed pressure may be applied to
- a vent valve 42 may be opened as
- isolation valve 44 and a barrier valve 50 are opened to permit the fluid to flow through
- the isolation valve 44 to isolate the feed and filtration stage from the dispensing stage, the isolation valve 44
- barrier valve 50 may be closed. To vent unwanted air from the system or
- the filter 46 may include a vent valve 48. As the fluid is
- the fluid then flows through a barrier valve 50 into a dispensing chamber 52 in
- barrier valve 50 is closed, a purge valve 54 is opened and the fluid in the dispensing
- the dispensing diaphragm may be between the dispensing chamber and a hydraulic fluid
- the hydraulic fluid may be pressurized or de-
- a dispensing pump 60 which may include a piston 62, a lead screw 64
- stepper motor is engaged which engages the lead screw and pressurizes the
- the hydraulic fluid in turn pushes the dispensing diaphragm into the
- dispensing chamber 52 which pressurizes the fluid in the dispensing chamber 52 or
- valve 68 are opened. If the outlet valve 68 is open, then an accurate amount of the
- Figure 3 is a timing diagram illustrating the conventional sequence for
- the dispensing process may include a sequence of
- stages i.e., steps such as a ready stage 70, a dispense stage 72, a suckback stage 74, a
- the barrier and isolate valves are opened while the
- outlet valve is shut to bring the system and feed chamber to an equilibrium pressure
- barrier valves close, the outlet valve is opened and the motor in the dispensing pump is started. Due to the relative incompressibility of the fluid being dispensed and the
- outlet valve is open.
- the closure of the barrier valve may increase the pressure in the
- dispensing chamber by a predetermined amount, which may be about 2 - 3 psi.
- fluid may be dispensed onto the wafer.
- the inlet valve is closed, the isolate valve is opened, the
- the isolate valve may
- the isolate valve is opened, the barrier valve
- the purge stage the isolate valve is closed, the feed pump does not apply pressure or a
- dispense pump is moved forward to remove air bubbles from the dispensing chamber.
- valve remains open to continue the removal of air from the dispensing chamber.
- stuttered dispensing may occur since the outlet valve takes more time to open than the starting of the motor and therefore the motor may be initially pushing the fluid through
- Figure 4 is a timing diagram illustrating a method for dispensing fluids in
- the method changes the manner of controlling of the valves and
- the barrier valve is not closed at the
- barrier valve is closed at the beginning of the vent stage and kept closed during the
- the dispense motor may be reversed to back out the piston 62 some predetermined distance to
- each step of the stepper motor may reduce the pressure by about 0J psi.
- the closure of the barrier valve increases the pressure by 2 psi, then the motor may be
- the pressure decrease caused by each step of the motor may be
- the fluid onto the wafer may occur.
- the motor may be further reversed a predetermined additional distance so that
- the motor may be moved forward just prior to dispensing to adjust the dispense
- valve and the start of the motor are changed to avoid the stuttering dispense problem.
- valve is a mechanical device that requires a finite period of time to
- the motor may start more quickly than the outlet valve may
- valve is completely open when the motor is started which achieves a good dispense.
- the predetermined period of time may be, for example, between 50 and 75 mS and
- This predetermined period of time may also be
- the dispense motor is no
- controlled amount of fluid may be dispensed onto the wafer.
- valves and motors in the pumping apparatus are identical to the valves and motors in the pumping apparatus.
- Figure 5 is a flowchart illustrating a method 100 for controlling the dispensing
- the barrier valve is closed at the end of the filtering stage which increases
- step 104 during the static purge stage, the
- dispense motor is reversed a predetermined distance to compensate for the pressure
- step 106 the motor may
- step 108 the pump is now ready for dispensing.
- step 110 the outlet valve is
- step 112 the dispense motor is started some predetermined period of
- step 114 The method is then completed.
Landscapes
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- General Engineering & Computer Science (AREA)
- Computer Hardware Design (AREA)
- Reciprocating Pumps (AREA)
- Control Of Positive-Displacement Pumps (AREA)
- Details Of Reciprocating Pumps (AREA)
- Control Of Non-Positive-Displacement Pumps (AREA)
- Cleaning Or Drying Semiconductors (AREA)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US10956898P | 1998-11-23 | 1998-11-23 | |
US109568P | 1998-11-23 | ||
PCT/US1999/028002 WO2000031416A1 (fr) | 1998-11-23 | 1999-11-23 | Controleur de pompe pour appareil de pompage de precision |
Publications (2)
Publication Number | Publication Date |
---|---|
EP1133639A1 true EP1133639A1 (fr) | 2001-09-19 |
EP1133639B1 EP1133639B1 (fr) | 2004-06-09 |
Family
ID=22328367
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
EP99965911A Expired - Lifetime EP1133639B1 (fr) | 1998-11-23 | 1999-11-23 | Controleur de pompe pour appareil de pompage de precision |
Country Status (6)
Country | Link |
---|---|
EP (1) | EP1133639B1 (fr) |
CN (2) | CN1175182C (fr) |
AT (1) | ATE268867T1 (fr) |
DE (1) | DE69917927T2 (fr) |
TW (1) | TW593888B (fr) |
WO (1) | WO2000031416A1 (fr) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP2354546A1 (fr) | 2010-02-09 | 2011-08-10 | Vacuubrand Gmbh + Co Kg | Pompe sous vide à membrane |
Families Citing this family (24)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US8172546B2 (en) | 1998-11-23 | 2012-05-08 | Entegris, Inc. | System and method for correcting for pressure variations using a motor |
US6325932B1 (en) | 1999-11-30 | 2001-12-04 | Mykrolis Corporation | Apparatus and method for pumping high viscosity fluid |
EP1540705A4 (fr) * | 2002-07-19 | 2009-12-16 | Entegris Inc | Regulateur de debit de liquide et appareil et systeme de distribution de precision |
KR101212824B1 (ko) * | 2004-11-23 | 2012-12-14 | 엔테그리스, 아이엔씨. | 가변 홈 위치 토출 장치용 시스템 및 방법 |
JP5339915B2 (ja) * | 2005-11-21 | 2013-11-13 | インテグリス・インコーポレーテッド | ポンプの機械式ピストンのピストン制御システムおよび方法 |
US8753097B2 (en) | 2005-11-21 | 2014-06-17 | Entegris, Inc. | Method and system for high viscosity pump |
US8087429B2 (en) | 2005-11-21 | 2012-01-03 | Entegris, Inc. | System and method for a pump with reduced form factor |
WO2007067354A2 (fr) | 2005-12-02 | 2007-06-14 | Entegris, Inc. | Systemes d'entree/sortie, procedes et dispositifs pour assurer l'interface avec un controleur de pompe |
US7850431B2 (en) | 2005-12-02 | 2010-12-14 | Entegris, Inc. | System and method for control of fluid pressure |
JP5355091B2 (ja) * | 2005-12-02 | 2013-11-27 | インテグリス・インコーポレーテッド | モータを用いて圧力変動を補正するためのシステムおよび方法 |
CN101356372B (zh) * | 2005-12-02 | 2012-07-04 | 恩特格里公司 | 用于在泵中进行压力补偿的系统和方法 |
US8083498B2 (en) | 2005-12-02 | 2011-12-27 | Entegris, Inc. | System and method for position control of a mechanical piston in a pump |
US7878765B2 (en) * | 2005-12-02 | 2011-02-01 | Entegris, Inc. | System and method for monitoring operation of a pump |
JP5253178B2 (ja) | 2005-12-02 | 2013-07-31 | インテグリス・インコーポレーテッド | ポンプの弁シーケンスのためのシステムおよび方法 |
CN101360678B (zh) * | 2005-12-05 | 2013-01-02 | 恩特格里公司 | 用于泵的误差容积系统和方法 |
TWI402423B (zh) | 2006-02-28 | 2013-07-21 | Entegris Inc | 用於一幫浦操作之系統及方法 |
US7684446B2 (en) | 2006-03-01 | 2010-03-23 | Entegris, Inc. | System and method for multiplexing setpoints |
US7494265B2 (en) | 2006-03-01 | 2009-02-24 | Entegris, Inc. | System and method for controlled mixing of fluids via temperature |
EP2024640A2 (fr) * | 2006-06-02 | 2009-02-18 | Nomet Management Services B.V. | Pompe volumétrique comportant un mécanisme d'entraînement |
CN101936276B (zh) * | 2008-11-20 | 2013-08-21 | 张家口百通环保科技有限公司 | 内燃机尾气净化的后处理系统过程中用于还原剂溶液抽取、计量并释放的计量泵 |
US9421498B2 (en) * | 2012-11-12 | 2016-08-23 | Pall Corporation | Systems and methods for conditioning a filter assembly |
US9656197B2 (en) * | 2012-11-12 | 2017-05-23 | Pall Corporation | Systems and methods for conditioning a filter assembly |
US9739274B2 (en) * | 2013-03-15 | 2017-08-22 | Integrated Designs, L.P. | Pump system and method having a quick change motor drive |
SG10201810172QA (en) * | 2014-05-28 | 2018-12-28 | Entegris Inc | Anti-backlash mechanism for motor-driven components in precision systems and applications |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS59177929A (ja) * | 1983-03-28 | 1984-10-08 | Canon Inc | サツクバツクポンプ |
JP2803859B2 (ja) * | 1989-09-29 | 1998-09-24 | 株式会社日立製作所 | 流動体供給装置およびその制御方法 |
JPH0727150U (ja) * | 1993-10-07 | 1995-05-19 | 大日本スクリーン製造株式会社 | シリカ系被膜形成用塗布液吐出装置 |
EP0863538B1 (fr) * | 1997-03-03 | 2003-05-21 | Tokyo Electron Limited | Appareil et méthode de revêtement |
JP3940854B2 (ja) * | 1997-03-25 | 2007-07-04 | Smc株式会社 | サックバックバルブ |
-
1999
- 1999-11-23 EP EP99965911A patent/EP1133639B1/fr not_active Expired - Lifetime
- 1999-11-23 TW TW088120448A patent/TW593888B/zh not_active IP Right Cessation
- 1999-11-23 WO PCT/US1999/028002 patent/WO2000031416A1/fr active IP Right Grant
- 1999-11-23 CN CNB998150533A patent/CN1175182C/zh not_active Expired - Fee Related
- 1999-11-23 CN CNA2004100791930A patent/CN1590761A/zh active Pending
- 1999-11-23 AT AT99965911T patent/ATE268867T1/de not_active IP Right Cessation
- 1999-11-23 DE DE69917927T patent/DE69917927T2/de not_active Expired - Fee Related
Non-Patent Citations (1)
Title |
---|
See references of WO0031416A1 * |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP2354546A1 (fr) | 2010-02-09 | 2011-08-10 | Vacuubrand Gmbh + Co Kg | Pompe sous vide à membrane |
DE202010002145U1 (de) | 2010-02-09 | 2011-09-07 | Vacuubrand Gmbh + Co Kg | Membranvakuumpumpe |
Also Published As
Publication number | Publication date |
---|---|
TW593888B (en) | 2004-06-21 |
CN1175182C (zh) | 2004-11-10 |
CN1331783A (zh) | 2002-01-16 |
DE69917927T2 (de) | 2005-06-23 |
WO2000031416A1 (fr) | 2000-06-02 |
DE69917927D1 (de) | 2004-07-15 |
ATE268867T1 (de) | 2004-06-15 |
CN1590761A (zh) | 2005-03-09 |
EP1133639B1 (fr) | 2004-06-09 |
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