EP1133639A1 - Controleur de pompe pour appareil de pompage de precision - Google Patents

Controleur de pompe pour appareil de pompage de precision

Info

Publication number
EP1133639A1
EP1133639A1 EP99965911A EP99965911A EP1133639A1 EP 1133639 A1 EP1133639 A1 EP 1133639A1 EP 99965911 A EP99965911 A EP 99965911A EP 99965911 A EP99965911 A EP 99965911A EP 1133639 A1 EP1133639 A1 EP 1133639A1
Authority
EP
European Patent Office
Prior art keywords
fluid
chamber
dispensation
pump
feed
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
EP99965911A
Other languages
German (de)
English (en)
Other versions
EP1133639B1 (fr
Inventor
Raymond A. Zagar
Robert F. Mcloughlin
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Entegris Inc
Original Assignee
Millipore Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Millipore Corp filed Critical Millipore Corp
Publication of EP1133639A1 publication Critical patent/EP1133639A1/fr
Application granted granted Critical
Publication of EP1133639B1 publication Critical patent/EP1133639B1/fr
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
    • F04B—POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS
    • F04B13/00—Pumps specially modified to deliver fixed or variable measured quantities
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
    • F04B—POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS
    • F04B43/00—Machines, pumps, or pumping installations having flexible working members
    • F04B43/02—Machines, pumps, or pumping installations having flexible working members having plate-like flexible members, e.g. diaphragms
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
    • F04B—POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS
    • F04B49/00—Control, e.g. of pump delivery, or pump pressure of, or safety measures for, machines, pumps, or pumping installations, not otherwise provided for, or of interest apart from, groups F04B1/00 - F04B47/00
    • F04B49/06—Control using electricity
    • F04B49/065—Control using electricity and making use of computers
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
    • F04B—POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS
    • F04B7/00—Piston machines or pumps characterised by having positively-driven valving
    • F04B7/0076—Piston machines or pumps characterised by having positively-driven valving the members being actuated by electro-magnetic means
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
    • F04B—POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS
    • F04B2201/00—Pump parameters
    • F04B2201/02—Piston parameters
    • F04B2201/0201—Position of the piston
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
    • F04B—POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS
    • F04B2201/00—Pump parameters
    • F04B2201/06—Valve parameters
    • F04B2201/0601—Opening times
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
    • F04B—POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS
    • F04B2205/00—Fluid parameters
    • F04B2205/03—Pressure in the compression chamber

Definitions

  • This invention relates generally to precision pumping apparatus and, more
  • semiconductor wafers during processing typically require a flatness across the surface
  • centrifugal force to the edges of the wafer has to be controlled in order to ensure that
  • the processing liquid is applied uniformly. It is also critical to control the rate and
  • pumping apparatus may also contribute to the problem of the double or stuttered
  • the pumping apparatus precisely controls the dispensing amount and/or rate
  • controller may precisely control the timing of the control valves with respect to each
  • the pump controller in accordance with
  • FIG. 1 is a block diagram illustrating a pumping apparatus including a pump controller in accordance with the invention
  • Figure 2 is a block diagram illustrating a two-stage pumping apparatus
  • Figure 3 is a timing diagram illustrating the conventional sequence for dispensing fluids
  • Figure 4 is a timing diagram illustrating a sequence for dispensing fluids in accordance with the invention.
  • Figure 5 is a flowchart illustrating a method for controlling a pumping apparatus to dispense low viscosity fluids in accordance with the invention.
  • the invention is particularly applicable to a pumping apparatus which
  • FIG. 1 is a block diagram illustrating a pumping apparatus 10 including a
  • the pumping apparatus 10 may be any pump controller in accordance with the invention.
  • the pumping apparatus 10 may be any pump controller in accordance with the invention.
  • the pumping apparatus 10 may be any pump controller in accordance with the invention.
  • the pumping apparatus 10 may be any pump controller in accordance with the invention.
  • the pumping apparatus 10 may be any pump controller in accordance with the invention.
  • the pumping apparatus 10 may be any pump controller in accordance with the invention.
  • a low viscosity fluid which may have a viscosity of less than 5 centipoire
  • (cPs) may be dispensed at a low flow rate of about 0.5 milliliters per second, but the
  • invention is not limited to dispensing low viscosity fluids or low flow rate fluids.
  • pump 12 is a two-stage pump since the dispensing of the fluid includes a first feed and
  • memory in the computer 16 may be executed by a processor (not shown) in the
  • the operation of the pump may also be controlled by a software application
  • the software application 20 may control, for example, the opening and closing
  • the pump 12 may draw fluid from the reservoir 14 into
  • the fluid may then be filtered through a filter and
  • the fluid may be dispensed through a filter 22 onto the wafer 18 in precise
  • stage pump 12 will be described in order to better understand the invention.
  • FIG. 2 is a block diagram illustrating more details of the two-stage pump 12
  • the two-stage pump 12 may be employed.
  • the two-stage pump 12 may be employed.
  • the two-stage pump 12 may be employed.
  • the feed and filtration stage 30 include a feed and filtration stage 30 and a dispensing stage 32.
  • the feed and filtration stage 30 includes a feed and filtration stage 30 and a dispensing stage 32.
  • stage 30 may include a feed chamber 34 which may draw fluid from a fluid supply
  • the inlet valve 36 is closed.
  • a feed valve 38 controls whether a vacuum, a positive feed pressure
  • diaphragm is pulled against a wall of the feed chamber and pulls fluid into the feed
  • a feed pressure may be applied to
  • a vent valve 42 may be opened as
  • isolation valve 44 and a barrier valve 50 are opened to permit the fluid to flow through
  • the isolation valve 44 to isolate the feed and filtration stage from the dispensing stage, the isolation valve 44
  • barrier valve 50 may be closed. To vent unwanted air from the system or
  • the filter 46 may include a vent valve 48. As the fluid is
  • the fluid then flows through a barrier valve 50 into a dispensing chamber 52 in
  • barrier valve 50 is closed, a purge valve 54 is opened and the fluid in the dispensing
  • the dispensing diaphragm may be between the dispensing chamber and a hydraulic fluid
  • the hydraulic fluid may be pressurized or de-
  • a dispensing pump 60 which may include a piston 62, a lead screw 64
  • stepper motor is engaged which engages the lead screw and pressurizes the
  • the hydraulic fluid in turn pushes the dispensing diaphragm into the
  • dispensing chamber 52 which pressurizes the fluid in the dispensing chamber 52 or
  • valve 68 are opened. If the outlet valve 68 is open, then an accurate amount of the
  • Figure 3 is a timing diagram illustrating the conventional sequence for
  • the dispensing process may include a sequence of
  • stages i.e., steps such as a ready stage 70, a dispense stage 72, a suckback stage 74, a
  • the barrier and isolate valves are opened while the
  • outlet valve is shut to bring the system and feed chamber to an equilibrium pressure
  • barrier valves close, the outlet valve is opened and the motor in the dispensing pump is started. Due to the relative incompressibility of the fluid being dispensed and the
  • outlet valve is open.
  • the closure of the barrier valve may increase the pressure in the
  • dispensing chamber by a predetermined amount, which may be about 2 - 3 psi.
  • fluid may be dispensed onto the wafer.
  • the inlet valve is closed, the isolate valve is opened, the
  • the isolate valve may
  • the isolate valve is opened, the barrier valve
  • the purge stage the isolate valve is closed, the feed pump does not apply pressure or a
  • dispense pump is moved forward to remove air bubbles from the dispensing chamber.
  • valve remains open to continue the removal of air from the dispensing chamber.
  • stuttered dispensing may occur since the outlet valve takes more time to open than the starting of the motor and therefore the motor may be initially pushing the fluid through
  • Figure 4 is a timing diagram illustrating a method for dispensing fluids in
  • the method changes the manner of controlling of the valves and
  • the barrier valve is not closed at the
  • barrier valve is closed at the beginning of the vent stage and kept closed during the
  • the dispense motor may be reversed to back out the piston 62 some predetermined distance to
  • each step of the stepper motor may reduce the pressure by about 0J psi.
  • the closure of the barrier valve increases the pressure by 2 psi, then the motor may be
  • the pressure decrease caused by each step of the motor may be
  • the fluid onto the wafer may occur.
  • the motor may be further reversed a predetermined additional distance so that
  • the motor may be moved forward just prior to dispensing to adjust the dispense
  • valve and the start of the motor are changed to avoid the stuttering dispense problem.
  • valve is a mechanical device that requires a finite period of time to
  • the motor may start more quickly than the outlet valve may
  • valve is completely open when the motor is started which achieves a good dispense.
  • the predetermined period of time may be, for example, between 50 and 75 mS and
  • This predetermined period of time may also be
  • the dispense motor is no
  • controlled amount of fluid may be dispensed onto the wafer.
  • valves and motors in the pumping apparatus are identical to the valves and motors in the pumping apparatus.
  • Figure 5 is a flowchart illustrating a method 100 for controlling the dispensing
  • the barrier valve is closed at the end of the filtering stage which increases
  • step 104 during the static purge stage, the
  • dispense motor is reversed a predetermined distance to compensate for the pressure
  • step 106 the motor may
  • step 108 the pump is now ready for dispensing.
  • step 110 the outlet valve is
  • step 112 the dispense motor is started some predetermined period of
  • step 114 The method is then completed.

Landscapes

  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • General Engineering & Computer Science (AREA)
  • Computer Hardware Design (AREA)
  • Reciprocating Pumps (AREA)
  • Control Of Positive-Displacement Pumps (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
  • Details Of Reciprocating Pumps (AREA)
  • Control Of Non-Positive-Displacement Pumps (AREA)
EP99965911A 1998-11-23 1999-11-23 Controleur de pompe pour appareil de pompage de precision Expired - Lifetime EP1133639B1 (fr)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US10956898P 1998-11-23 1998-11-23
US109568P 1998-11-23
PCT/US1999/028002 WO2000031416A1 (fr) 1998-11-23 1999-11-23 Controleur de pompe pour appareil de pompage de precision

Publications (2)

Publication Number Publication Date
EP1133639A1 true EP1133639A1 (fr) 2001-09-19
EP1133639B1 EP1133639B1 (fr) 2004-06-09

Family

ID=22328367

Family Applications (1)

Application Number Title Priority Date Filing Date
EP99965911A Expired - Lifetime EP1133639B1 (fr) 1998-11-23 1999-11-23 Controleur de pompe pour appareil de pompage de precision

Country Status (6)

Country Link
EP (1) EP1133639B1 (fr)
CN (2) CN1175182C (fr)
AT (1) ATE268867T1 (fr)
DE (1) DE69917927T2 (fr)
TW (1) TW593888B (fr)
WO (1) WO2000031416A1 (fr)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP2354546A1 (fr) 2010-02-09 2011-08-10 Vacuubrand Gmbh + Co Kg Pompe sous vide à membrane

Families Citing this family (24)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8172546B2 (en) 1998-11-23 2012-05-08 Entegris, Inc. System and method for correcting for pressure variations using a motor
US6325932B1 (en) 1999-11-30 2001-12-04 Mykrolis Corporation Apparatus and method for pumping high viscosity fluid
TWI294792B (en) * 2002-07-19 2008-03-21 Mykrolis Corp Liquid flow controller and precision dispense apparatus and system
US8292598B2 (en) 2004-11-23 2012-10-23 Entegris, Inc. System and method for a variable home position dispense system
WO2007061956A2 (fr) 2005-11-21 2007-05-31 Entegris, Inc. Systeme et procede pour une pompe avec facteur de forme reduit
US8753097B2 (en) 2005-11-21 2014-06-17 Entegris, Inc. Method and system for high viscosity pump
EP1954946B1 (fr) * 2005-11-21 2014-11-05 Entegris, Inc. Systeme et procede permettant de commander la position d'un piston mecanique dans une pompe
WO2007067358A2 (fr) * 2005-12-02 2007-06-14 Entegris, Inc. Système et procédé de compensation de pression dans une pompe
DE602006021614D1 (de) 2005-12-02 2011-06-09 Entegris Inc E/a-systeme, verfahren und einrichtungen zur anschaltung einer pumpensteuerung
US8083498B2 (en) 2005-12-02 2011-12-27 Entegris, Inc. System and method for position control of a mechanical piston in a pump
US7878765B2 (en) * 2005-12-02 2011-02-01 Entegris, Inc. System and method for monitoring operation of a pump
US8025486B2 (en) 2005-12-02 2011-09-27 Entegris, Inc. System and method for valve sequencing in a pump
WO2007067359A2 (fr) * 2005-12-02 2007-06-14 Entegris, Inc. Système et procédé permettant de corriger des variations de pression au moyen d'un moteur
US7850431B2 (en) 2005-12-02 2010-12-14 Entegris, Inc. System and method for control of fluid pressure
JP5345853B2 (ja) * 2005-12-05 2013-11-20 インテグリス・インコーポレーテッド ポンプのための誤差容積システムおよび方法
TWI402423B (zh) 2006-02-28 2013-07-21 Entegris Inc 用於一幫浦操作之系統及方法
US7684446B2 (en) 2006-03-01 2010-03-23 Entegris, Inc. System and method for multiplexing setpoints
US7494265B2 (en) 2006-03-01 2009-02-24 Entegris, Inc. System and method for controlled mixing of fluids via temperature
EP2024640A2 (fr) * 2006-06-02 2009-02-18 Nomet Management Services B.V. Pompe volumétrique comportant un mécanisme d'entraînement
CN101936276B (zh) * 2008-11-20 2013-08-21 张家口百通环保科技有限公司 内燃机尾气净化的后处理系统过程中用于还原剂溶液抽取、计量并释放的计量泵
US9656197B2 (en) * 2012-11-12 2017-05-23 Pall Corporation Systems and methods for conditioning a filter assembly
US9421498B2 (en) * 2012-11-12 2016-08-23 Pall Corporation Systems and methods for conditioning a filter assembly
US9739274B2 (en) * 2013-03-15 2017-08-22 Integrated Designs, L.P. Pump system and method having a quick change motor drive
WO2015184056A1 (fr) * 2014-05-28 2015-12-03 Entegris, Inc. Mécanisme anti-jeu pour éléments à moteur dans des systèmes et des applications de précision

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JPS59177929A (ja) * 1983-03-28 1984-10-08 Canon Inc サツクバツクポンプ
JP2803859B2 (ja) * 1989-09-29 1998-09-24 株式会社日立製作所 流動体供給装置およびその制御方法
JPH0727150U (ja) * 1993-10-07 1995-05-19 大日本スクリーン製造株式会社 シリカ系被膜形成用塗布液吐出装置
DE69814710T2 (de) * 1997-03-03 2004-03-18 Tokyo Electron Ltd. Beschichtungs-Vorrichtung und Verfahren
JP3940854B2 (ja) * 1997-03-25 2007-07-04 Ｓｍｃ株式会社 サックバックバルブ

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Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP2354546A1 (fr) 2010-02-09 2011-08-10 Vacuubrand Gmbh + Co Kg Pompe sous vide à membrane
DE202010002145U1 (de) 2010-02-09 2011-09-07 Vacuubrand Gmbh + Co Kg Membranvakuumpumpe

Also Published As

Publication number Publication date
ATE268867T1 (de) 2004-06-15
CN1590761A (zh) 2005-03-09
TW593888B (en) 2004-06-21
CN1331783A (zh) 2002-01-16
DE69917927T2 (de) 2005-06-23
DE69917927D1 (de) 2004-07-15
WO2000031416A1 (fr) 2000-06-02
CN1175182C (zh) 2004-11-10
EP1133639B1 (fr) 2004-06-09

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