EP1129374A1 - Tuning of optical devices - Google Patents
Tuning of optical devicesInfo
- Publication number
- EP1129374A1 EP1129374A1 EP99957721A EP99957721A EP1129374A1 EP 1129374 A1 EP1129374 A1 EP 1129374A1 EP 99957721 A EP99957721 A EP 99957721A EP 99957721 A EP99957721 A EP 99957721A EP 1129374 A1 EP1129374 A1 EP 1129374A1
- Authority
- EP
- European Patent Office
- Prior art keywords
- waveguide
- tuning
- heating
- thermal
- substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/24—Coupling light guides
- G02B6/26—Optical coupling means
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
- G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
- G02B6/13—Integrated optical circuits characterised by the manufacturing method
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
- G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
- G02B2006/12083—Constructional arrangements
- G02B2006/12107—Grating
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
- G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
- G02B2006/12133—Functions
- G02B2006/12159—Interferometer
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
- G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
- G02B2006/12166—Manufacturing methods
- G02B2006/12169—Annealing
- G02B2006/12171—Annealing using a laser beam
Definitions
- the present invention relates to the thermal processing of waveguides so as to alter their properties. Raokgronnd of the Invention
- planar optical waveguide devices are well known. These normally are constructed by depositing layers on top of a silicon substrate with portions of the deposited (and etched) layers being made photosensitive and subsequently being subjected to light of a wavelength selected to manipulate their optical properties. In this manner, often extremely complex optical waveguide devices can be built up on a silicone substrate . It is desirable to provide for a system of post processing of the optical waveguide so as to tune the properties of any complex device of which the waveguide forms part.
- a method of tuning an optical device incorporating a waveguide comprising the step of applying a localised heating to the device in order to change the optical properties of the waveguide.
- the localised heating can be applied by means of a laser device such as a UV or Infra Red laser device.
- the device may comprise the waveguide formed on a substrate.
- the method can e.g. be utilised in the tuning of one arm of an interferometric device.
- the localised heating can be used to cause thermal relaxation, thermal diffusion or induce structural changes in the device.
- the method can be used to write a grating structure into the waveguide.
- Fig. 1 illustrates schematically the process of thermal process of waveguides
- Fig. 2 illustrates an example application in a MZI type device
- Fig. 3 illustrates an alternative form of processing of a waveguide type device.
- Fig. 4 illustrates the relation between ⁇ stress an( ⁇ fo rm i n a method embodying the present invention. Descript n of Preferred and Other Embo ime s
- Suitable thermally sensitive waveguides including a negative index grating within a germanosilicate planar waveguide, can be produced by utilizing a hollow cathode plasma enhanced chemical vapour deposition (HCPECVD) process such as that outlined in M V Bazylenko, M Gross, A Simonian, P L Chu, Journal of Vacuum Science and Technology, A14 , (2) pp336-345, 1996 and J Canning, D Moss, M Aslund, M Bazylenko, Election Letters, 34(4) pp366-367 (1998) .
- HCPECVD hollow cathode plasma enhanced chemical vapour deposition
- the localised heating is preferably in the region of the waveguide 1 so as to alter its optical properties.
- the thermal processing utilised is designed to have minimal other effects on the waveguide 1.
- a UN laser if a UN laser is to be utilised then may be utilised on the silicon substrate 2 which is opaque to UN rays, as illustrated by arrow 10, whilst for a IR laser may be utilised from above the waveguide 1 as illustrated by arrow 12.
- the localised heating can be utilised to cause localised changes in the device 14.
- the changes can include thermal relaxation of internal stresses, thermal diffusion of material or thermal damage of material layers.
- Fig. 2 illustrates an add- drop multiplexer 10 constructed utilizing a Mach-Zehnder principle which can be initially constructed on a wafer and subsequently tuned by means of thermal rather than UV tuning of the arms at the points eg. 11, 12.
- an opaque layer eg. 15 can be formed over the waveguide 100 so as to minimise photosensitive alternations in the area of waveguide 100.
- the utilisation of local heating can have a number of uses. Firstly, as noted previously, there is its utilisation to change waveguide properties. Such utilisation would be ideal for example in Mach-Zehnder type devices. Other devices could include multimode devices wherein each arm can be thermally processed so as to adjust properties .
- An alternative use for localised thermal heating is the localised heating of the substrate/wafer to control or release stresses through annealing or damaging of the wafer.
- it is known to construct optical waveguide devices having internal waveguide structures utilizing plasma enhanced chemical vapour deposition processes on a silicon substrate.
- Unfortunately often non- symmetrical birefringence effects will result form the formation process.
- the first birefringent effect denoted ⁇ f orm will be due to the circumference characteristics of the waveguide.
- the second effect denoted ⁇ st ress will be due to several stresses associated with the thermal coefficient mismatch of the substrate and deposited layer.
- localised thermal heating of the above described structure could thus provide a method to alter the overall birefringence in the waveguide by either releasing existing stresses or introducing further stresses.
- the localised thermal heating can be utilised as a form of annealing so as to slowly anneal the whole of a wafer whilst simultaneously measuring the waveguide properties.
- the whole of the substrate can be thermally annealed on a mount with localised heating providing for a more precise annealing than that available through the utilisation of general convection heating.
- the thermal annealing can be closely monitored and altered at any particular point .
- the principle of localised thermal heating can be extended to the actual direct writing of thermally created device structures utilizing a small spot size for thermally induced rather than optically induced alternation of the waveguide. Again, this can be utilised for post processing of a waveguide so as to perform tuning or, alternatively, for the construction of more complex waveguide devices.
- An example application is a process of polarisation control by heating of a substrate.
- An ideal laser source can be diode bar array at 810nm which is absorbed by the substrate and the waveguide.
- a C0/C0 laser can be used to heat the surface and affect the internal waveguides.
- the devices can be tuned either at the waveguide or at the substrate.
- an IR source is used so as to thermally heat and not damage the substrate.
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Optical Integrated Circuits (AREA)
Applications Claiming Priority (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
AUPP716698 | 1998-11-12 | ||
AUPP7167A AUPP716798A0 (en) | 1998-11-12 | 1998-11-12 | Laser tuning and polarization control of planar devices |
AUPP7166A AUPP716698A0 (en) | 1998-11-12 | 1998-11-12 | Birefringence compensation in planar waveguides using negative index changes |
AUPP716798 | 1998-11-12 | ||
PCT/AU1999/000998 WO2000029881A1 (en) | 1998-11-12 | 1999-11-12 | Tuning of optical devices |
Publications (1)
Publication Number | Publication Date |
---|---|
EP1129374A1 true EP1129374A1 (en) | 2001-09-05 |
Family
ID=25645929
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
EP99957721A Withdrawn EP1129374A1 (en) | 1998-11-12 | 1999-11-12 | Tuning of optical devices |
Country Status (5)
Country | Link |
---|---|
EP (1) | EP1129374A1 (ja) |
JP (1) | JP2002530689A (ja) |
KR (1) | KR20010086022A (ja) |
CA (1) | CA2348997A1 (ja) |
WO (1) | WO2000029881A1 (ja) |
Families Citing this family (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CA2217806A1 (en) * | 1997-10-07 | 1999-04-07 | Mark Farries | Grating and method of providing a grating in an ion diffused waveguide |
US6289154B1 (en) * | 1997-11-04 | 2001-09-11 | The Furukawa Electric Co., Ltd. | Grating-type optical component and method of manufacturing the same |
US6356681B1 (en) * | 1999-07-09 | 2002-03-12 | Corning Incorporated | Method and apparatus for trimming the optical path length of optical fiber components |
US6442311B1 (en) * | 1999-07-09 | 2002-08-27 | Agere Systems Guardian Corp. | Optical device having modified transmission characteristics by localized thermal treatment |
US6823110B2 (en) * | 2000-06-14 | 2004-11-23 | 3M Innovative Properties Company | Method to stabilize and adjust the optical path length of waveguide devices |
AUPR230200A0 (en) * | 2000-12-22 | 2001-01-25 | Redfern Optical Components Pty Ltd | Tuning of optical devices |
GB2546966B (en) * | 2016-01-21 | 2021-08-04 | Univ Southampton | Trimming optical device structures |
Family Cites Families (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB8429430D0 (en) * | 1984-11-21 | 1985-01-03 | Gen Electric Co Plc | Optical couplers |
DD286883A5 (de) * | 1989-07-31 | 1991-02-07 | Friedrich-Schiller-Universitaetet,De | Verfahren zur abstimmung und/oder anpassung von integriert-optischen wellenleiterstrukturen und bauelementen |
US5235659A (en) * | 1992-05-05 | 1993-08-10 | At&T Bell Laboratories | Method of making an article comprising an optical waveguide |
US5349437A (en) * | 1992-09-30 | 1994-09-20 | The United States Of America As Represented By The Secretary Of The Navy | Electromagnetic radiation detector utilizing an electromagnetic radiation absorbing element in a Mach-Zehnder interferometer arrangement |
US5495548A (en) * | 1993-02-17 | 1996-02-27 | Her Majesty The Queen In Right Of Canada, As Represented By The Minister Of Communications | Photosensitization of optical fiber and silica waveguides |
JP3374990B2 (ja) * | 1993-04-20 | 2003-02-10 | 日本電信電話株式会社 | 光回路の特性調整方法 |
US5621843A (en) * | 1994-06-09 | 1997-04-15 | Ceramoptec Industries, Inc. | Silica lightguide for UV applications |
US5805751A (en) * | 1995-08-29 | 1998-09-08 | Arroyo Optics, Inc. | Wavelength selective optical couplers |
JPH09145942A (ja) * | 1995-11-22 | 1997-06-06 | Nippon Telegr & Teleph Corp <Ntt> | 屈折率調整方法、屈折率調整可能な光導波路および該光導波路を用いた屈折率調整光導波路の製造方法 |
US5647040A (en) * | 1995-12-14 | 1997-07-08 | Corning Incorporated | Tunable optical coupler using photosensitive glass |
-
1999
- 1999-11-12 JP JP2000582830A patent/JP2002530689A/ja not_active Withdrawn
- 1999-11-12 KR KR1020017005994A patent/KR20010086022A/ko not_active Application Discontinuation
- 1999-11-12 WO PCT/AU1999/000998 patent/WO2000029881A1/en not_active Application Discontinuation
- 1999-11-12 EP EP99957721A patent/EP1129374A1/en not_active Withdrawn
- 1999-11-12 CA CA002348997A patent/CA2348997A1/en not_active Abandoned
Non-Patent Citations (1)
Title |
---|
See references of WO0029881A1 * |
Also Published As
Publication number | Publication date |
---|---|
JP2002530689A (ja) | 2002-09-17 |
CA2348997A1 (en) | 2000-05-25 |
KR20010086022A (ko) | 2001-09-07 |
WO2000029881A1 (en) | 2000-05-25 |
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Legal Events
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STAA | Information on the status of an ep patent application or granted ep patent |
Free format text: STATUS: THE APPLICATION HAS BEEN WITHDRAWN |
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18W | Application withdrawn |
Effective date: 20041006 |