EP1042526A1

EP1042526A1 - Magnetron sputtering source

Info

Publication number: EP1042526A1
Application number: EP98958140A
Authority: EP
Inventors: Walter Haag; Pius Grünenfelder; Urs Schwendener; Markus Schlegel; Siegfried Krassnitzer
Original assignee: Balzers Hochvakuum AG
Current assignee: Oerlikon Surface Solutions AG Pfaeffikon
Priority date: 1997-12-17
Filing date: 1998-12-15
Publication date: 2000-10-11
Also published as: HK1033344A1; US6454920B1; JP2004091927A; CN100529168C; DE19881914D2; JP2002508447A; WO1999031290A1; KR100487059B1; JP3794919B2; CN1896301A; CN1776006A; CN1239737C; US6284106B1; KR20090009987A; US20020036133A1; KR20040053356A; US6093293A; EP2119810A3; KR100915497B1; EP2119810A2

Abstract

Disclosed is a magnetron sputtering source, comprising at least two long targets (3a, 3b, 3c) which are electrically insulated from each other and arranged next to each other in a longitudinal direction. The lateral spacing is substantially smaller than the corresponding spreading of the targets (3a, 3b, 3c). Each target has its own electrical connection (5a, 5b, 5c). Anodes (7a, 7b) are provided preferably between the targets (3a, 3b, 3c).

Description

Magnetron sputter source

The present invention relates to a magnetron sputtering source according to claims 1 and 31, a vacuum chamber with such a source according to claim 20, a vacuum treatment system with such a chamber, according to claim 22, an operating method for such a system according to claim 27 and uses thereof.

Basically, the present invention is based on the need for large-area, in particular rectangular, substrates with an area to be coated of at least 900 cm ² with a homogeneous one

Sputter coating layer thickness distribution, in particular also reactive. Such substrates are used in particular for the production of flat screens, generally based on thin glass substrates, thinner than 1 mm, in particular for TFT panels or for plasma display panels (PDP).

When magnetron sputter coating large areas, even larger sputter areas and therefore targets are usually required, unless the sputter source and substrate are moved relatively to each other. Problems arise regarding this

(a) Uniformity of the process conditions on the large-area target, quite pronounced with reactive sputter coating

(b) Erosion profile

(c) cooling (d) Essentially exposure to atmospheric pressure and coolant pressure of the large targets.

To solve the mechanical load problem (d), relatively thick target plates must be used, which reduces the magnetic field penetration and thus the electron trap effect for a given electrical power. However, if this is increased, cooling problems arise (c). This is mainly because large-area targets can only be contacted with a cooling medium with great effort, and also because the target is obstructed by rear installations for magnets. Furthermore, it is known that in magnetron sputtering, reactive or non-reactive, the target arrangement, usually consisting of a target plate of material to be sputtered defining the sputtering surface and a carrier plate bonded to it, is sputter eroded along so-called "race tracks". One or more circumferential erosion trenches are formed on the sputtering surface, due to the magnetic fields created along the target in the form of tunnels, which create circumferential zones of increased plasma density. These result from the high electron density in the area of the magnetron magnetic fields (electron traps) rotating around the tunnel. These "race tracks" already result in an inhomogeneous layer thickness distribution on relatively small-area substrates to be coated, which are arranged in front of the magnetron sputter source. In addition, the target material is poorly used because the sputter erosion along the "race tracks" means that target areas outside these tracks are sputtered less, which results in a wave-like or trench-shaped erosion profile. Due to the "race tracks", the actual sputtering area of a large-area target remains small compared to the substrate area. To eliminate the effects of the "race tracks" mentioned on the coating, the sputtering source and the substrate to be coated could be moved relative to one another as mentioned, but this led to a reduced coating rate per unit of time. Again, operation with locally higher sputtering performance would be opposed to cooling problems with relatively moving systems.

Basically, there are four problem areas (a), (b) and (c), (d) for the desired goal, the separate solutions of which each result in aggravated problems with respect to the other; the solutions run counter to each other.

The aim of the present invention is to create a magnet sputter source by means of which the abovementioned problems are eliminated and which can be expanded practically to any size and which enables, in particular, a homogeneous coating thickness distribution on at least one large-area substrate which is stationary with respect to the source to ensure economically. The source should further allow sensitive reactive processes at high deposition or coating rates if the process conditions are very uniform. As is known, inhomogeneous "race tracks" effects lead to pronounced problems in reactive processes because of the large plasma density gradients.

This is achieved by the magnetron sputter source according to the invention, in which at least two, preferably more than two, electrically isolated long target arrangements are arranged alongside one another along the side, at a distance which is substantially smaller than the width dimension of the target arrangements, and in that each of the target arrangements has its own has electrical connection, an anode arrangement being further provided. The targets of the target arrangements are preferably rounded at the corners, following the "race tracks" tracks.

In such a magnetron sputtering source according to the invention, the layer thickness distribution deposited on an overlying substrate can already be significantly improved with an independently set electrical supply for the individual target arrangements. The source according to the invention can be modularly adapted to any sizes of substrates to be coated.

The anode arrangement - if not temporarily formed by target arrangements itself, compare operation according to FIG. 2 or 3 - can be provided on the outside with respect to the overall arrangement, but more preferably comprises anodes along the side between the target arrangements and / or on the end side of the target arrangements, preferably particularly alongside.

A stationary magnet arrangement is preferably further provided at the source; this is preferably formed by a magnetic frame running around the target arrangements or, particularly preferably, by frames running around the target arrangements. Although it may be entirely possible and sensible to implement the magnets on or on the frame or on the stationary magnet arrangement at least in part by controllable electromagnets, the magnets of the arrangement or of the frame or frames are preferably realized by permanent magnets.

By the respective design of the mentioned stationary magnet arrangement, preferably the permanent magnet frame, what that As a result of the magnetic field generated by them on the directly adjacent target arrangements, the aforementioned layer thickness distribution on the substrate and, in addition, the degree of utilization of the long targets provided can be further improved by targeted shaping of the "race tracks".

Furthermore, magnet arrangements are preferably provided below each of the at least two target arrangements. These can be designed to be stationary in location and fixed in time in order to form the tunnel-shaped magnetic field on each of the target arrangements. More preferably, they are designed such that they cause a temporal variation of the magnetic field pattern on the target arrangements. With regard to the formation and generation of the magnetic field pattern, according to the invention in each case on the target arrangements, reference is made to EP-A-0 603 587 and US-A-5 399 253 by the same applicant, the disclosure content of which in this regard forms an integral part of the present description is explained.

According to FIG. 2 of EP-A-0 603 587, the position of the magnetic field pattern and thus the zones of high plasma density can be changed as a whole, but this is far preferred, but not or only slightly changed, however, according to FIGS. 2 and 3 of the document mentioned, the position of the apex - the location of the highest plasma density - changed.

In any case, selectively controlled electromagnets, locally stationary or moving, can be provided for changing the position of the zones or the apexes on the magnet arrangements, depending on the target arrangements. This magnet arrangement is preferably implemented by driven permanent magnets. A preferred, moving magnet arrangement is realized by at least two magnet rollers which extend longitudinally, are driven and rotatably mounted under the target arrangements, again preferably with permanent magnets, as shown on a single target, FIGS. 3 and 4 of EP-A-0 603 587.

The magnetic rollers are driven in pendulum mode, with a pendulum amplitude preferably <τ / 4. With regard to this technique and its effects, reference is again made in full to the aforementioned EP 0 603 587 and US-A-5 399 253, which are also declared in this regard to be an integral part of the present application description.

It is therefore preferred to provide at least two driven and rotatably mounted permanent magnet rollers which extend along the longitudinal dimension of the target arrangement.

It is preferred

- With the electrical target arrangement supply

- With the field of the stationary magnet arrangement mentioned, in particular the frame mentioned

- With the field-time-varying magnet arrangement depending on the target arrangements, preferably the magnet rollers

a set of influencing variables is provided which, in combination, permits the most extensive optimization of the deposited layer density distribution, in particular its homogenization. In addition, a high degree of target material utilization is achieved. It is highly advantageous that the plasma zones are preferably not shifted while scanning, with the vertex shifting of the magnetic field at the target arrangements, but the plasma density distribution is wobbled within the zones.

In order to continue to be able to apply the highest possible sputtering performance, the target arrangements are cooled as best as possible by being mounted on a support base, on the surface of which, on the base side, covering cooling medium channels which are largely covered and which are sealed off from the surface by means of foils, are arranged. This makes it possible to dissipate heat over a large area, in that, due to the cooling medium pressure, the foils mentioned press on and press against the target arrangements to be cooled.

A support base, preferably at least partially made of an electrically insulating material, preferably plastic, is preferably provided on the magnetron sputtering source according to the invention, on which, in addition to the mentioned target arrangements, anodes and, if present, the stationary magnet arrangement, preferably permanent magnet frames, the magnet - Arrangement under the target arrangements, preferably the movable permanent magnet arrangements, in particular the rollers mentioned, and the cooling medium channels are included. The support base is designed and mounted so that it separates the vacuum atmosphere and the outside atmosphere. This allows the target arrangement to be designed more flexibly with regard to mechanical stress caused by pressure.

A further optimization or manipulated variable for the aforementioned large-area coating thickness distribution results from the fact that gas outlet openings, which communicate with a gas distribution system, are provided, distributed along the long sides of the target arrangement. This gives the opportunity create reactive gas and / or working gas with a specifically adjusted distribution in the process space provided above the source according to the invention of a vacuum treatment chamber or system according to the invention.

The rectangular target arrangements are preferably spaced apart from one another by at most 15%, preferably at most by 10%, preferably at most by 7% of their width dimension.

In a preferred embodiment, the lateral distance between the individual target arrangements is d

1 mm <d <230 mm, preferably

7 mm <d <20 mm.

The width B of the individual target arrangements is preferably

60 mm <B <350 mm, preferably

80 mm <B ≤ 200 mm

and their length L preferably

400 mm <L <2000 mm.

The length of the individual target arrangements is at least the same with respect to their width, preferably much longer. Although the sputtering surfaces of the individual long target arrangements, preferably flat or already pre-profiled, are preferably arranged along a plane, it is entirely possible, in particular the lateral sputtering surfaces, to be closer to the substrate to be coated than that to be arranged in the middle, if necessary also inclined, in order to - if necessary - additionally compensate for edge effects on the coating thickness distribution.

The electrons of the magnetron plasma circulate along the "race tracks" in a direction determined by a magnetic field and an electric field in the target surface area. It has now been recognized that the guidance of the electron path or its influencing and thus the influencing of the erosion trenches formed on the target surfaces can be optimized in a targeted manner in that the magnetic field provided along the longitudinal extent of the target arrangement, i.e. is not only varied in terms of time, but is trained in different locations. In the case of preferably provided magnetic frames - preferably one, more preferably one permanent magnet frame each - this is achieved in any case by the positioning and / or the selected strength of the magnets provided on the frame and / or, if the magnet arrangement is provided, below the target arrangements, preferably the mentioned permanent magnet rollers, by correspondingly varied strength and / or relative position of magnets on the magnet arrangement. Because the electrons move according to the magnetic field polarity in a given direction of rotation, it was observed that apparently due to drag forces, the electrons, especially in the narrow side areas of the target arrangements and according to their direction of movement, in areas diagonally opposite one another

Corner parts are pushed outwards. It is therefore particularly preferred that, in the case of provided magnetic frames, the field strength generated by the frame magnets be designed mirror-symmetrically to the target “rectangle” diagonal in different locations. In a preferred embodiment of the source according to the invention, the target arrangements are held by means of linear bayonet closures, in particular in combination with their cooling via pressurized foils of the type mentioned above. The arrangements, after relieving the pressure on the cooling medium channels, can thus be replaced very simply, the vast majority of The rear of the target arrangement remains free for cooling, and there are no fastening elements for the target arrangements exposed against the process space.

A preferred source according to the invention has more than two target arrangements, preferably five or more.

By using a magnetron sputter source according to the invention on a sputter coating chamber, on which, spaced apart in this respect, a substrate carrier is provided for at least one preferably planar substrate to be sputter-coated, it is possible to achieve an optimally low ratio V _QS between sputtered source areas F _Q and the substrate surface to be coated To realize F _s , for which applies:

V _QS <3, preferably

V _QS <2, particularly preferred

1.5 <V _QS <2.

This significantly increases the efficiency of the source. This is further achieved in a sputter coating chamber according to the invention with the source mentioned to an even greater extent in that the distance D between the new surface of the magnetron sputtering source and the substrate essentially equal to the width of one of the long target arrangements is selected, preferably to

60 mm <D <250 mm,

preferably 80 mm <D <160 mm.

In a vacuum coating system according to the invention with the mentioned sputter coating chamber according to the invention and thus the magnetron sputter source according to the invention, the target arrangements are each connected to an electrical generator or current sources, which generators can be controlled independently of one another.

In a further embodiment, or, if appropriate, when a plurality of target arrangements are provided combined with the aforementioned generator arrangement, at least two of the intended target arrangements can be connected to the outputs of a common AC generator.

The generators for the respectively independent electrical supply of the target arrangements can be "pure" DC generators, AC generators, generators for the generation of superimposed DC and AC signals or pulsed DC signals, in particular in the case of DC generators between the generator and the respective target arrangement a chopper unit can be provided, by means of which the target arrangement, clocked on the generator output or with a lower resistance, is connected to a reference potential of the generator. With regard to this technique, reference is made in full to EP-A-0 564 789 or US application No. 08/887 091 by the same applicant. Furthermore, gas outlet openings provided along the side of the target arrangements are connected to a reactive gas tank and / or a working gas tank, such as for argon, and the gas outlets can preferably be adjusted independently of one another with respect to gas flow along different longitudinal sides of the target arrangement.

The inventive sputter coating system with at least three long target arrangements is preferably operated in such a way that the laterally external target arrangements are operated with 5 to 35% more sputtering power, preferably with 10 to 20%, than the internal target arrangements. The above-mentioned “scanning” of the target arrangements with regard to the position of the plasma zones and, in particular, the preferred “wobble” of the apex position of the tunnel magnetic fields and thus the plasma density distribution, particularly preferably realized by means of the mentioned magnetic rollers, in pendulum operation, is preferably carried out with a frequency of 1 to 4 Hz, preferably of approximately 2 Hz. The roller pendulum amplitude is preferably φ <π / 4. The coating thickness distribution on the substrate is optimized even further by specifically designing the path / time profiles for the position shift mentioned.

It should be emphasized here that the generators connected to the target arrangements can also be controlled for delivery in time and in mutually dependent manner of modulated output signals.

Furthermore, the electrical supply to the target arrangements and / or the distributed gas inlet and / or the magnetic field distribution is controlled or modulated in time so that the Substrate results in a desired layer thickness distribution, preferably a homogeneous.

The magnetron sputter source is preferably with a power density p of

1 W / cm ² <p <30 W / cm ² ,

in particular for the reactive deposition of layers, preferably made of metallic targets, in particular with ITO layers

1 W / cm ² <p <5 W / cm ²

and preferably for sputter coating of metal layers

15 W / cm ² <p <30 W / cm ²

operated.

As was recognized in connection with the development of the above-mentioned magnetron sputtering source according to the invention, it is fundamentally advantageous, in particular in the case of target plate arrangements which are substantially longer than wide, to design the magnetic field strength of the magnetron field differently in the longitudinal direction of the target arrangements and in particular in their side region .

However, this finding is generally applicable to long magnetrons.

For a long magnetron source according to the invention, which includes a temporally variable, preferably moving magnet system, preferably a permanent system, it is therefore proposed to assign a magnetic frame to the target arrangement, preferably a permanent magnet frame and, measured in a given spatial direction, form the field strength of the frame magnets along the longitudinal sides of the target arrangement differently. To compensate for the aforementioned drift forces acting on the revolving electrons, it is proposed to design this field strength locally in a manner that is essentially mirror-symmetrical to the target diagonal.

The present invention in all of its aspects is particularly suitable for the sputter coating of substrates, in particular of large areas and preferably planing

Substrates by a reactive process, preferably from metallic targets, preferably with an ITO layer (indium tin oxide). The invention is furthermore particularly suitable for the coating of substrates, in particular glass substrates, in the context of the production of flat panel displays, in particular TFT or PDP panels, which basically opens up the possibility of using large substrates, for example also semiconductor substrates, very efficiently and with lowest reject rates reactive or non-reactive sputter coating, but especially reactive.

In the case of reactive sputter coating processes in particular, in the case of ITO coating, low discharge voltages are essential for achieving high layer quality, in particular low layer resistances, even without a tempering step. This is achieved by the source according to the invention.

Suppression of are discharges is also effectively implemented.

The invention is subsequently explained using figures, for example. Show it: 1 shows a magnetron sputter source according to the invention, operated electrically in a first variant;

Fig. 2 shows schematically the sputtering source according to the invention

1 in a further electrical circuit configuration;

3 shows a further electrical circuit configuration of the sputter source according to the invention, shown in analogy to FIG. 1;

4 shows a detail of a magnet sputter source according to the invention in a cross-sectional representation;

5 is a top view of a linear bayonet lock, as is preferably used at the source according to FIG. 4,

6 simplifies a top view of a section of a magnetron source according to the invention;

7 shows a plan view of a preferred embodiment of a permanent magnet roller preferably provided on the magnetron sputter source according to the invention according to FIG. A;

8 schematically shows a sputter coating system according to the invention;

9 shows an erosion profile on one of the target arrangements of the source according to the invention;

10 determined on a source according to the invention with five target arrangements, the distribution of the material sputtered from the source; 11 is a layer thickness relief on a 530 x 630 mm ² -

Glass substrate coated with a source according to the invention.

1 schematically shows a magnetron sputtering source 1 according to the invention in its basic configuration. It comprises at least two, as shown for example three, long target arrangements 3a to 3c. The further units known to be provided on a magnetron sputter source, such as magnetic field sources, cooling devices etc., are not shown in FIG. 1. The source 1 has its own electrical connection 5 on each of the target arrangements 3. Preferably between the longitudinally spaced apart target arrangements 3, e.g. strip-shaped, anodes 7a, 7b provided.

The fact that the target arrangements 3 are electrically insulated from one another and each have electrical connections 5 makes their independent electrical connection possible, as is subsequently also described in connection with FIGS. 2 and 3.

According to FIG. 1, each of the target arrangements 3 is connected to a generator 9, which generators can be controlled independently of one another and which also do not necessarily have to belong to the same type. As shown schematically, all generators, or if necessary mixed, can be formed by DC generators, AC generators, AC and DC generators, generators for delivering pulsed DC signals or as DC generators with chopper units provided between the generator output and the respective target arrangement with regard to their structure and mode of operation, reference is made in full to the aforementioned EP-A-0 564 789 or US application No. 08/887 091. The anodes 7 can also be operated electrically as desired. This is done by operating them, as shown with the generator 12, for example on DC, AC or DC with superimposed AC or pulsed DC voltage, if necessary again via one of the mentioned chopper units, or, as in 12a shown on

Reference potential can be laid. By varying the electrical cathode, i.e. Target arrangement operation, and possibly additionally the electrical anode operation, distributed over the source area formed by the target arrangements, the distribution of sputtered material and consequently the distribution on a substrate (not shown) arranged above the source can be adjusted.

In this case, the generators 9 can be modulated in time in a mutual dependency, as represented by the modulation inputs MOD, in order to modulate the electrical operating conditions over the target arrangements in a targeted, traveling wave-like manner.

2 and 3, while maintaining the position symbols for source parts already described, further electrical connection options of the inventive source 1 are shown, in which (not shown) an anode arrangement can be dispensed with.

2 and 3, target arrangements 3 are each connected in pairs to the inputs of AC generators 15a, 15b and 17a, 17b, with generators 15 and 17 possibly also AC-superimposed DC signals or pulsed DC signals can deliver. Again, the generators 15, 17 are optionally modulated, for example an AC output signal, practically as a carrier signal, with an amplitude modulation. 2, one of the target arrangements (3b) is connected to an input of each of the generators 15a and 15b, the target arrangements 3 according to FIG. 3 are connected in pairs via the generators 17, it being entirely possible, as shown in dashed lines at 19 shown, in the sense of "common mode" signals, both in the embodiment according to FIG. 2 and also according to that of FIG. 3, to put individual target arrangement groups together on different potentials. 2 or 3, the generators are operated in a preferred embodiment at a frequency of 12 to 45 kHz. With regard to a "common mode" potential, such as the ground potential entered in FIG. 2, target arrangements connected in pairs to a generator are alternately placed on positive and negative potentials.

It can be seen from the illustrations in FIGS. 1 to 3 that the magnetron source according to the invention allows a very high flexibility to operate the individual target arrangements 3 electrically and thus to selectively design the distribution of sputtered material in the process space 10 and material deposited on a substrate.

4 shows a cross-sectional representation of a magnetron sputtering source according to the invention in a preferred embodiment in sections. According to FIG. 4, the target arrangements each comprise a target plate 3 _al or 3 _bl made of material to be sputtered, which are each bonded to a back plate 3 _a2 or 3 _b2 . With the aid of linear bayonet catches 20, the target arrangements 3 are held on a metal cooling plate 23 on their lateral periphery and / or in their central region. The design of the linear bayonet catches results from FIG. 5. According to this, a hollow rail 25 is provided either on the target arrangement 3 or on the cooling plate 23, U-shaped in cross section, with inwardly bent U-legs 27, on which, at a distance, indentations 29 are incorporated . On the other of the two parts, preferably on the target arrangement 3, a linear rail 31 is provided with a T-shaped cross-section, on which the end parts of the crossbeam 33 have shaped portions 34. The two parts are hooked to one another by introducing the formations 34 into the formations 29 and moving them linearly in the direction S. Of course, it is possible, in the sense of a reversal, to provide moldings on the hollow rail which, correspondingly, engage in moldings on the rail 31.

The target arrangements 3 are only clamped to the cooling plate 23 by pressurizing a cooling medium in cooling channels 35 in the cooling plate 23. These channels 35 extend along the predominant surface area of the target arrangement surface lying against the cooling plate 23. The cooling channels 35, as mentioned above with a pressurized liquid cooling medium, are sealed off against the target arrangements 3, as described in detail for example in CH-A-687 427 by the same applicant, by a film-like membrane 37. The foils 37 lie fully under the cooling medium pressure on the underside of the back plate 3 _a2 or 3 _b2 . Only when the cooling medium is pressurized is the target arrangement immovably clamped in the bayonet lock. To remove the target arrangements 3, the cooling system, as a whole or the respective cooling system, is relieved of pressure, whereupon the target arrangements can be easily pushed out and removed or replaced. Anode strips 39 run alongside the target arrangements 3. The anode strips and the cooling plate 23 are mounted on a support base 41, which is preferably at least partially made of insulating material, preferably plastic. The base 41 separates the vacuum atmosphere in the process space 10 from the ambient or normal atmosphere in the space 11.

In the support base 41, on the atmospheric pressure side, for example, two permanent magnet rollers 43 extending over the longitudinal extent of the target arrangements are rotatably mounted and are (not shown) driven in an oscillating manner by drive motors. In pendulum mode, they preferably perform a 180 ° - angle of rotation pendulum movement - ω43 -. Permanent magnets 45 are embedded in the permanent magnet rollers 43 along their longitudinal extension, preferably diametrically.

In the support base 41 there is also a permanent magnet frame 47 for each target arrangement 3, again on the atmosphere side, which essentially, and as can be seen in FIG. 6, runs below and along the peripheral region of the respective target arrangement 3.

In particular, open along the long sides of the target arrangement

6, and as shown in dashed lines in FIG. 4, which are preferably controllable independently of one another in rows with respect to gas flow. This is shown schematically in FIG. 4 with control valves 51, which are provided in a connection between the lines 49 and a gas tank arrangement 53 with a working gas, such as argon and / or with a reactive gas. With regard to the operation and design of the magnetic magnet rollers 43, reference is once again made in full to the disclosure content of EP-0 603 587 and US-A-5 399 253.

FIG. 6 shows a simplified and partial view of a magnetron source according to the invention as shown in FIG. 4. As already shown with reference to FIG. 4, a permanent magnet frame 47 is provided under each of the target arrangements 3. The magnetic frame 47 is preferably designed such that, viewed in a spatial direction, for example in accordance with H _z from FIG. 4, the magnetic field generated by the permanent magnet frame, as shown in FIG. 6 with x, is local along the long sides of the target arrangements 3 changes. In a preferred embodiment, the magnets provided on the longitudinal legs 471 _x and 471 _{2 of} the frame 47 are divided into several zones, as shown in FIG. 6, for example, into four zones. In the diagram in FIG. 6, the field strength of the permanent magnets provided in the individual zones Z ₁ to Z ₄ is shown qualitatively over the coordinate x and thus the field strength distribution in the direction x. Furthermore, the permanent magnet dipole directions are shown in the respective zones Z.

The same permanent magnet zones are preferably provided on the legs 471 _{x 2} , but with mirror images with respect to the diagonal D _{t of} the long target arrangement 3.

Through targeted design of the local magnetic field distribution, which are generated by the permanent magnet frames 47 on the target arrangements 3, it is possible to optimize the path of the rotating electrons and thus the location and formation of the erosion trenches on the individual target arrangements. This takes into account, in particular, the worked path deformations. Permanent magnet zones Z _B , which preferably correspond to zone Z ₂ , are provided on the broad sides of the target frame 47. As already mentioned, a single target source according to FIGS. 4 and 6 and 7 is also inventive.

The magnetic field H which varies locally in the x-direction above the respective target arrangements 3 and which, due to the magnetic roller pendulum movement, also varies in time, is determined by the choice of the field strength of the permanent magnets provided, as in zones Z _{1 (} Z ₂ , Z ₄ and / or by choosing the spatial dipole

Orientation, as in zone Z ₃ , and / or the position (distance from the target arrangement) specifically designed.

As has been mentioned, at least two permanent magnet rollers 43 are preferably provided on each of the target arrangements 3 provided on the sputter source according to the invention. Such is shown in Fig. 7.

Different permanent magnet zones, for example Z to Z ' ₄ , are preferably also provided on the rollers 43. 7 qualitatively shows the course of the locally varying permanent magnet field H _R (x) along the intended rollers, and as preferably designed.

At the source according to the invention, the local and temporal distribution of the sputtering rate is therefore determined by targeted local and / or temporal distribution of the electrical supply of the individual target arrangements and / or targeted local and / or temporal variation of the magnetron magnetic field on the individual target arrangements and / or by targeted local and / or temporal variation or design of the gas injection conditions at the inlet openings 49 optimized. In the preferred embodiment, which was explained with reference to FIGS. 4 to 7, all these sizes are preferably used in combination in order to selectively design the coating thickness distribution on a sputter-coated substrate, in particular a tarpaulin, particularly preferably to form it homogeneously.

FIG. 8 schematically shows a sputter coating system 50 according to the invention with a sputter coating chamber 60 according to the invention, therein, likewise schematically shown, a magnetron sputter source according to the invention

10. As shown in a preferred embodiment, the schematically illustrated source 10 has six target arrangements 3 and is furthermore preferably configured as explained with reference to FIGS. 4 to 7. The source according to the invention with its target arrangements is operated by independent electrical - possibly modulatable - feeds, as shown in block 62. Furthermore, the gas injection conditions, which can be modulated, are selectively adjusted, in particular along the longitudinal dimensions of the target arrangements, as illustrated with the control valve block 64, in order to admit a working and / or reactive gas from the gas tank 53 into the process space.

The drive block 65 represents the drive, which may be path / time modulable, for the permanent magnet rollers provided on the source according to the invention, by means of which the desired roller pendulum movements can be set, preferably selectively.

A substrate carrier 66 is provided in the chamber 60 according to the invention, in particular for receiving a plan to be loaded. layering substrate. Due to the possibilities given by the source according to the invention to optimally adjust the temporal and spatial distribution of the material dusted by the source 10, in particular a uniform distribution averaged over time, in particular also in the edge regions of the source, it is possible to determine the ratio V _{QS of} the sputtering area F _{Q of} the source for the substrate surface to be coated F _{s to be designed} surprisingly small, preferably to

V _QS <3,

preferably

V _QS <2,

and preferably

1.5 <V _QS <2.

This measure indicates that the material dusted from the source is used with a high degree of efficiency by only correspondingly little of the dusted material not hitting the substrate surface to be coated. This is particularly reinforced by the fact that the distance D between the substrate surface to be sputter-coated and the new surface of the magnetron source 10 can be chosen to be small, owing to the large-area distribution of the source plasma, essentially equal to the width B (see FIG. 4) of the sputtering surfaces Target arrangements 3 and preferably too

60 mm <D <250 mm

preferably 80 mm <D <160 mm. The feasibility of the small distances D mentioned results in a high coating rate with high atomization utilization, and thus a highly economical coating.

In the system shown in FIG. 8, the generators 62 are preferably used to operate the outermost target arrangements at the side with a higher sputtering capacity, preferably with 5 to 35% more, particularly preferably with 10 to 20% more sputtering capacity than the ones located further inside Target arrangements. Furthermore, the permanent magnet rollers provided at the source 10 according to FIG. 4 are preferably operated in a pendulum mode with a pendulum frequency of 1 to 4 Hz, preferably at approximately 2 Hz.

The magnetron sputter source, sputter chamber or system according to the invention, in particular in preferred operation, are particularly suitable for magnetron sputter coating of large-area, in particular planar substrates, with a coating of high quality, with a desired distribution of the coating thickness, in particular with a homogeneous thickness distribution with high economy. This is largely based on the process conditions distributed uniformly over a large area at the source according to the invention. The invention can thus be used for the coating of large-area semiconductor substrates, but in particular for the coating of substrates of flat display panels, in particular of TFT or PDP panels. The invention is used in particular for the reactive coating of the substrates mentioned, in particular with ITO layers, or for the metal coating of the substrates mentioned by means of non-reactive sputter coating. In the following, for example, preferred design variables are compiled on the source or chamber or system according to the invention. 1. Geometry

1.1 At the source

• Lateral distance d according to FIG. 4: at most 15%, preferably at most 10%, preferably at most 7% of the width dimension B of the target arrangements and / or

1 mm <d <230 mm, preferably

7 mm <d <20 mm.

New surfaces of the target arrangements along a plane;

Width B of the target arrangements:

60 mm <B <350 mm, preferably

80 mm <B <200 mm.

• Length of the target arrangements L: at least B, preferably much longer, preferably

400 mm <L <2000 mm.

End areas of the targets: e.g. semicircular.

1.2 Source / substrate:

Ratio V _{QS of} the expansion of the sputtering area F _Q to expansion of the substrate surface F _s to be coated:

V _QS <3, preferably

V _QS <2, preferably at all

1.5 <V ^ <2. • Smallest distance between new source area and coating area D:

60 mm <D <250 mm, preferably

80 mm <D <160 mm.

• Substrate sizes: for example 750 x 630 mm ² , coated with a source with a sputtering area of: 920 x 900 mm ² , or

Substrate size: 1100 x 900 mm ² with a sputtering area of the source of: 1300 x 1200 mm ² .

1.3 Cooling:

Ratio of sputter area to cooling surface V _sκ :

1.2 <V _sκ <1.5.

2. Company sizes

Target temperature T:

40 ° C <T <150 ° C,

preferably

60 ° C <T <130 ° C.

Sputtering power per sputtering surface unit: 10 to 30 W / cm ² ,

preferably 15 to 20 W / cm ² .

Laterally outermost target arrangements each preferably with 5 to 35% more sputtering power, preferably with 10 to 20% more sputtering power per unit area. • Pendulum frequency of the magnetic rollers: 1 to 4 Hz, preferably approx. 2 Hz.

Results: The following coating rates were achieved:

ITO: 20 Ä / sec.

AI: 130 to 160 Ä / sec.

• Cr: 140 Ä / sec.

• Ti: 100 Ä / sec.

• Ta: 106 Ä / sec.

9 shows the erosion profile on a 15 cm wide sputtering surface of one of the target arrangements on the source according to the invention. The extremely uniform removal is recognizable, by which the "race tracks" or erosion trenches can hardly be recognized.

10 shows the resulting coating rate distribution for ITO sputter coatings on a source according to the invention with five target arrangements, each with sputtering areas with a width B of 150 mm. With this distribution, layer thickness deviations of only ± 3.8% result on a substrate, arranged at a distance D of 120 mm from the source surface.

11 shows the resulting layer thickness distribution on a large-area glass substrate which was coated as follows:

- total sputtering power p _tot : 2 kW. - Sputtering time: 100 sec.

- Sputter rate R: 26 Ä / sec, relative: 13 Ä / sec. kW.

- Source with six target arrangements, on which the outermost arrangements were operated with 10 or 15% higher sputtering power (p ₁₇ p ₆ ):

- substrate size: 650 x 550 mm 2 '

In Fig. 11, the edge areas of the substrate, which were above the target arrangements operated at higher power, are written. With ITO coating, the averaged 267 nm thick layer results in deviations of layer thickness of + 6.3

^* 0.

The present invention in particular avoids the following disadvantages of known sputter sources, in particular for large-area workpiece coatings:

• Because, according to the invention, a uniform distribution of the process conditions over a large magnetron sputtering area is possible, with a high coating rate and high sputtering rate utilization, there is a high level of economy for the coating of large-area substrates, possibly many individual substrates at the same time.

• Because the source according to the invention is sputtered over a large area at the same time, there is a better layer thickness distribution on the substrate and a prevention of sparks (arcing).

Because the problem of reactive gas distribution and / or target erosion distribution is solved in a homogenizing sense, can be positioned much closer to the source to be coated and with much larger areas to be coated relative to the source area, which significantly increases the economy of a sputter coating system with a source according to the invention.

• The problem of plasma density differences between target center and target periphery arising on large-area targets due to the lack of anodes in the target center is eliminated.

• The source can be flexibly adapted to the respective large requirements using modular target arrangements.

• The problem with large-area targets, namely that the process in the center of the target is depleted of reactive gas, is solved since gas inlets 49 are provided distributed over the actual source area.

• Because (see Fig. 4) the support base (41) lies between the process vacuum and atmospheric pressure, it is no longer necessary to provide thick cooling plates (23) which absorb this load, which means that the source is less expensive and in particular a better penetration of the fields of the magnet arrangements (47, 43) provided under the target arrangement (3).

Through selective control of the following distributions:

• Time and / or location, electrical operation of the target arrangements

• time and / or location, magnetic operation of the target arrangements • time and / or location, gas inlet

it is possible to optimally adjust the resulting layer thickness distribution on large-area substrates, in particular to adjust it homogeneously.

• Due to the provided bayonet locks in conjunction with the clamping of the target arrangements via the cooling medium pressure, the target arrangements can be exchanged very simply and quickly and an extremely efficient, large-area cooling is possible.

• Due to the bayonet mountings provided underneath the sputtering surfaces, no holding elements, especially those not related to sputtering material, are accessible from the process space.

Claims

Claims:

1. magnetron sputter source, characterized in that at least two electrically isolated long-target arrangements (3) are arranged alongside one another, at a distance (d) which is substantially smaller than the width dimension (B) of the target arrangements (3), and that each the target arrangement (3) has its own electrical connection (5), an anode arrangement (7) also being provided.

2. Source according to claim 1, characterized in that the anode arrangement comprises anodes along the side between the target arrangements and / or at the end of the target arrangements, preferably along the side.

3. Source according to claim 1, characterized in that a stationary magnet arrangement (47) is provided which preferably has a frame running around the target arrangements

Electro and / or permanent magnets comprise, in particular preferably in each case frames with electro and / or permanent magnets surrounding the target arrangements, the magnets of the frame or frames preferably being permanent magnets.

4. Source according to one of claims 1 to 3, characterized in that magnet arrangements are provided below each of the target arrangements, preferably those which each form a temporal variation of a magnetic field pattern over the sputtering surfaces of the arrangements, preferably by varying the position of the apex of a tunnel-shaped, circumferential magnetic field, and that the magnet arrangements are formed by selectively controlled and / or moving electromagnets and / or by moving permanent magnets, preferably by the latter, particularly preferably by at least two in each case Driven and rotatably mounted magnetic rollers (43) with permanent and / or electromagnets, preferably with permanent magnets, extending along the longitudinal dimensions of the target arrangement.

5. Source according to one of claims 1 to 4, characterized in that the target arrangements (3) are mounted on a carrier base (41) and against them, for each target arrangement (3), the base-side surfaces of which predominantly cover said surface is arranged by means of films (37) closed cooling medium channels (35), preferably in such a way that vacuum pressure can be applied to the base side facing the target arrangements and at the same time atmospheric pressure to the other side of the base.

6. Source according to one of claims 1 to 5, characterized in that the target arrangements (3) and the anode arrangement (7), further optionally the or the stationary magnet arrangement, preferably the or the magnet frame (47) and / or the magnet arrangements below the target arrangements, preferably magnetic rollers, and / or the cooling medium channels (35), in or on a part made of electrically insulating material, preferably made of plastic, of a support base (41) and the base preferably is designed so that vacuum pressure can be applied to the target side and atmospheric pressure to the outside.

7. Source according to claim 6, characterized in that the cooling medium channels are each delimited at their base by a metal plate.

8. Source according to one of claims 1 to 7, characterized in that, distributed along the target arrangement Longitudinal gas outlet openings (49) are provided which communicate with a gas distribution system (64).

9. Source according to one of claims 1 to 8, characterized in that the target arrangements (3) alongside at most

5 15%, preferably at most 10%, preferably at most 7% of their width dimension (B) are spaced apart (d).

10. Source according to one of claims 1 to 9, characterized in that the target arrangements (3) have a longitudinal dimension (L) at least equal to their width dimension, preferably because] considerably longer, that it is preferably

400 mm <L <2000 mm.

11. Source according to one of claims 1 to 10, characterized in that the target arrangements along a distance d of

15 1 mm <d <230 mm

preferably from

7 mm <d <20 mm

form.

12. Source according to one of claims 1 to 11, characterized in that the width B of the target arrangements is:

60 mm <B <350 mm

preferably

80 mm <B <200 mm.

13. Source according to one of claims 1 to 11, characterized in that the new surfaces of the target arrangements (3) are arranged along a plane.

14. Source according to one of claims 1 to 13, characterized in that, measured in a given spatial direction (Z), the strength of the magnetic field (H) along the length of the target arrangement and in its longitudinal edge region is locally different.

15. Source according to one of claims 1 to 14, characterized in that the target arrangements (3) are jointly assigned to one, preferably one magnetic frame (47), preferably one or each permanent magnet frame, and the position and / or the strength of the magnets of the frame (s) (47) along at least part of the longitudinal sides of the target arrangement is locally different.

16. Source according to one of claims 1 to 15, characterized in that below the target arrangements (3) at least two longitudinally extended, driven, rotatably mounted magnetic rollers (43) are provided, and that the strength and / or position of magnets along at least part of the rollers (43) differs in location, the magnets of the rollers preferably being permanent magnets.

17. Source according to one of claims 1 to 16, characterized in that the target arrangements (3), together or preferably each, are surrounded by magnet frames (47) and that the strength and / or position of the magnets along the frame at least a part of the long sides of the target arrangement is spatially different, namely, viewed on a respective target arrangement, essentially mirror-symmetrical to one of the Long target diagonals (Di), the magnets of the frame or frames preferably being permanent magnets.

18. Source according to one of claims 1 to 17, characterized in that the target arrangements are held by means of linear bayonet closures (25, 32).

19. Source according to one of claims 1 to 18, characterized in that more than two, preferably five and more, target arrangements are provided.

20. Sputter coating chamber with a magnetron sputter source (10) according to one of claims 1 to 19 and a substrate carrier (66) arranged at a distance from the magnetron sputter source for at least one substrate to be sputter-coated, characterized in that for the ratio (V _QS ) of the sputtered Source area F _Q to the substrate surface F _s to be coated applies:

V _QS <3

preferably

V _QS ≤ 2

preferably

1.5 <V _QS ≤ 2.

21. Chamber according to claim 20, characterized in that the distance (D) between the new surface of the magnetron sputter source

(10) and the substrate is substantially equal to the width of one of the long target arrangements (3), preferably is:

60 mm <D <250 mm, preferably 80 mm <D <160 mm.

22. Vacuum coating system with a chamber according to one of claims 20 or 21, characterized in that the target arrangements (3) are connected to independently controllable electrical generators (62).

23. System according to claim 22, characterized in that more than two of the target arrangements (3) are provided and at least two of the provided target arrangements (3) are connected to the outputs of a common AC generator (15, 17).

24. System according to claim 22, characterized in that at least one of the generators (9, 62) provided is a DC generator, an AC generator or a generator for the delivery of DC-superimposed AC or pulsed DC, or that at least at least one of the generators is a DC generator and is connected to the target arrangement (3) via a chopper unit.

25. Plant according to one of claims 22 to 24, characterized in that gas outlet openings (49) are provided alongside at least between part of the target arrangements, which are connected to a reactive gas tank and / or a working gas tank (53).

26. The system as claimed in claim 25, characterized in that at least some of the gas outlets (49) provided along the target arrangements (3) can be controlled independently of others with regard to gas flow (51, 64).

27. Method for operating a system according to one of claims 22 to 26 with at least three long target arrangements (3), characterized in that the laterally outer target arrangements are operated with more sputtering power, preferably with 5 to 35% more sputtering power, preferably with 10 to 20% with respect to the inner target arrangements.

28. A method for operating a system according to one of claims 22 to 26, in which a locally displaceable and / or time-controlled magnet arrangement, preferably formed by at least two rotationally mounted permanent magnet rollers (43), is provided below each of the target arrangements, thereby characterized in that the magnetic field generated on the target arrangements is varied in a cycle of 1 to 4 Hz, preferably the two rollers (43) are operated in pendulum mode, with a pendulum frequency of 1 to 4 Hz, preferably with approximately 2 Hz, preferably with a Angle of rotation amplitude φ <π / 4.

29. The method according to any one of claims 27 or 28, characterized in that by controlling the electrical supply depending on the target arrangements and / or the gas inlet distribution and / or the magnetic field distribution, the distribution of the layer thickness on the substrate over its surface is adjusted, preferably approximately homogeneously sets.

30. The method according to any one of claims 27 to 29, characterized in that the magnetron sputter source with a power density p of

1 W / cm ² <p ≤ 30 W / cm ² operates,

that p is preferably chosen as follows for reactive sputter coating from preferably metallic targets, in particular for such ITO sputter coating: 1 W / cm ² <p <5 W / cm ² ,

for metal sputter coating:

15 W / cm ² <p <30 W / cm ² .

31. Long magnetron source with an essentially rectangular target arrangement, including a temporally variable, preferably moving magnet system, characterized in that the target arrangement comprises a magnet frame (47), preferably a permanent magnet frame, the in a given spatial direction (Z) measured field strength of the magnet frame along the long sides of the target arrangement (x) is locally different.

32. Source according to claim 31, characterized in that the field strength on both long sides of the target arrangement is essentially mirror-symmetrical to the diagonal of the arrangement.

33. Source according to one of claims 31 or 32, characterized in that the magnet system below the target arrangement comprises at least two driven, rotatably mounted magnet rollers (43) extending in the longitudinal direction of the target.

34. Use of the magnetron sputter source according to one of claims 1 to 19 or the chamber according to one of claims 20, 21 or the system according to one of claims 22 to 26 or the source according to one of claims 31 to 33 for reactive sputter coating, preferably from metallic targets , especially for such coating with indium tin oxide (ITO).

35. Use of the magnetron sputter source according to one of claims 1 to 19 or the chamber according to one of claims 20, 21 or the system according to one of claims 22 to 26 or the source according to one of claims 31 to 33 for the coating of flat panel display substrates, in particular TFT or PDP panel substrates, for example made of glass, in particular with a reactive stored layer, in particular an ITO layer.

36. Use according to claim 35 for substrates with a surface F _s to be coated:

F _s > 900 cm ² .