EP1019578B1 - Traitement de tissus industriels - Google Patents
Traitement de tissus industriels Download PDFInfo
- Publication number
- EP1019578B1 EP1019578B1 EP98942921A EP98942921A EP1019578B1 EP 1019578 B1 EP1019578 B1 EP 1019578B1 EP 98942921 A EP98942921 A EP 98942921A EP 98942921 A EP98942921 A EP 98942921A EP 1019578 B1 EP1019578 B1 EP 1019578B1
- Authority
- EP
- European Patent Office
- Prior art keywords
- fabric
- treatment
- treated
- areas
- emitter
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 239000004744 fabric Substances 0.000 title claims description 84
- 238000011282 treatment Methods 0.000 title claims description 41
- 238000000034 method Methods 0.000 claims description 31
- 230000005855 radiation Effects 0.000 claims description 18
- 238000000576 coating method Methods 0.000 claims description 10
- 239000011248 coating agent Substances 0.000 claims description 9
- 230000000694 effects Effects 0.000 claims description 9
- 230000002209 hydrophobic effect Effects 0.000 claims description 9
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 claims description 8
- 239000000463 material Substances 0.000 claims description 8
- 239000000758 substrate Substances 0.000 claims description 8
- 238000005530 etching Methods 0.000 claims description 6
- 238000002679 ablation Methods 0.000 claims description 5
- 239000012528 membrane Substances 0.000 claims description 5
- 229910021529 ammonia Inorganic materials 0.000 claims description 4
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 claims description 3
- KPUWHANPEXNPJT-UHFFFAOYSA-N disiloxane Chemical class [SiH3]O[SiH3] KPUWHANPEXNPJT-UHFFFAOYSA-N 0.000 claims description 3
- 239000011888 foil Substances 0.000 claims description 3
- 229910000077 silane Inorganic materials 0.000 claims description 3
- TXEYQDLBPFQVAA-UHFFFAOYSA-N tetrafluoromethane Chemical compound FC(F)(F)F TXEYQDLBPFQVAA-UHFFFAOYSA-N 0.000 claims description 3
- 239000004753 textile Substances 0.000 claims description 2
- 239000004952 Polyamide Substances 0.000 claims 1
- 239000011159 matrix material Substances 0.000 claims 1
- 229920002647 polyamide Polymers 0.000 claims 1
- 229920000728 polyester Polymers 0.000 claims 1
- 229920000642 polymer Polymers 0.000 claims 1
- 229920000098 polyolefin Polymers 0.000 claims 1
- 239000010410 layer Substances 0.000 description 9
- 238000009832 plasma treatment Methods 0.000 description 6
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 6
- 230000004048 modification Effects 0.000 description 5
- 238000012986 modification Methods 0.000 description 5
- 239000012634 fragment Substances 0.000 description 3
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 2
- 239000003570 air Substances 0.000 description 2
- 230000015556 catabolic process Effects 0.000 description 2
- 239000002131 composite material Substances 0.000 description 2
- 230000003750 conditioning effect Effects 0.000 description 2
- 239000000356 contaminant Substances 0.000 description 2
- 238000010494 dissociation reaction Methods 0.000 description 2
- 230000005593 dissociations Effects 0.000 description 2
- 230000005670 electromagnetic radiation Effects 0.000 description 2
- 238000004049 embossing Methods 0.000 description 2
- 238000000227 grinding Methods 0.000 description 2
- 230000005660 hydrophilic surface Effects 0.000 description 2
- 230000000873 masking effect Effects 0.000 description 2
- 239000002952 polymeric resin Substances 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- 239000010703 silicon Substances 0.000 description 2
- 239000002344 surface layer Substances 0.000 description 2
- 229920003002 synthetic resin Polymers 0.000 description 2
- BFKJFAAPBSQJPD-UHFFFAOYSA-N tetrafluoroethene Chemical group FC(F)=C(F)F BFKJFAAPBSQJPD-UHFFFAOYSA-N 0.000 description 2
- 238000009736 wetting Methods 0.000 description 2
- 239000004696 Poly ether ether ketone Substances 0.000 description 1
- 229910007159 Si(CH3)4 Inorganic materials 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 239000012080 ambient air Substances 0.000 description 1
- 229920003235 aromatic polyamide Polymers 0.000 description 1
- JUPQTSLXMOCDHR-UHFFFAOYSA-N benzene-1,4-diol;bis(4-fluorophenyl)methanone Chemical compound OC1=CC=C(O)C=C1.C1=CC(F)=CC=C1C(=O)C1=CC=C(F)C=C1 JUPQTSLXMOCDHR-UHFFFAOYSA-N 0.000 description 1
- 125000002843 carboxylic acid group Chemical group 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 238000006731 degradation reaction Methods 0.000 description 1
- 229910003460 diamond Inorganic materials 0.000 description 1
- 239000010432 diamond Substances 0.000 description 1
- 230000003628 erosive effect Effects 0.000 description 1
- 239000012065 filter cake Substances 0.000 description 1
- 238000001914 filtration Methods 0.000 description 1
- 238000013532 laser treatment Methods 0.000 description 1
- 230000014759 maintenance of location Effects 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- -1 or of any yarn Substances 0.000 description 1
- 238000000059 patterning Methods 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 229920002530 polyetherether ketone Polymers 0.000 description 1
- 229920000307 polymer substrate Polymers 0.000 description 1
- 239000000047 product Substances 0.000 description 1
- 230000000644 propagated effect Effects 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 238000007789 sealing Methods 0.000 description 1
- 150000004756 silanes Chemical class 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 238000004381 surface treatment Methods 0.000 description 1
- 239000002352 surface water Substances 0.000 description 1
- CZDYPVPMEAXLPK-UHFFFAOYSA-N tetramethylsilane Chemical compound C[Si](C)(C)C CZDYPVPMEAXLPK-UHFFFAOYSA-N 0.000 description 1
- 230000003685 thermal hair damage Effects 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 230000010148 water-pollination Effects 0.000 description 1
Images
Classifications
-
- D—TEXTILES; PAPER
- D06—TREATMENT OF TEXTILES OR THE LIKE; LAUNDERING; FLEXIBLE MATERIALS NOT OTHERWISE PROVIDED FOR
- D06M—TREATMENT, NOT PROVIDED FOR ELSEWHERE IN CLASS D06, OF FIBRES, THREADS, YARNS, FABRICS, FEATHERS OR FIBROUS GOODS MADE FROM SUCH MATERIALS
- D06M10/00—Physical treatment of fibres, threads, yarns, fabrics, or fibrous goods made from such materials, e.g. ultrasonic, corona discharge, irradiation, electric currents, or magnetic fields; Physical treatment combined with treatment with chemical compounds or elements
- D06M10/005—Laser beam treatment
-
- D—TEXTILES; PAPER
- D06—TREATMENT OF TEXTILES OR THE LIKE; LAUNDERING; FLEXIBLE MATERIALS NOT OTHERWISE PROVIDED FOR
- D06M—TREATMENT, NOT PROVIDED FOR ELSEWHERE IN CLASS D06, OF FIBRES, THREADS, YARNS, FABRICS, FEATHERS OR FIBROUS GOODS MADE FROM SUCH MATERIALS
- D06M10/00—Physical treatment of fibres, threads, yarns, fabrics, or fibrous goods made from such materials, e.g. ultrasonic, corona discharge, irradiation, electric currents, or magnetic fields; Physical treatment combined with treatment with chemical compounds or elements
- D06M10/001—Treatment with visible light, infrared or ultraviolet, X-rays
-
- D—TEXTILES; PAPER
- D06—TREATMENT OF TEXTILES OR THE LIKE; LAUNDERING; FLEXIBLE MATERIALS NOT OTHERWISE PROVIDED FOR
- D06M—TREATMENT, NOT PROVIDED FOR ELSEWHERE IN CLASS D06, OF FIBRES, THREADS, YARNS, FABRICS, FEATHERS OR FIBROUS GOODS MADE FROM SUCH MATERIALS
- D06M10/00—Physical treatment of fibres, threads, yarns, fabrics, or fibrous goods made from such materials, e.g. ultrasonic, corona discharge, irradiation, electric currents, or magnetic fields; Physical treatment combined with treatment with chemical compounds or elements
- D06M10/04—Physical treatment combined with treatment with chemical compounds or elements
-
- D—TEXTILES; PAPER
- D21—PAPER-MAKING; PRODUCTION OF CELLULOSE
- D21F—PAPER-MAKING MACHINES; METHODS OF PRODUCING PAPER THEREON
- D21F1/00—Wet end of machines for making continuous webs of paper
- D21F1/0027—Screen-cloths
Definitions
- This invention relates to the treatment of industrial fabrics.
- industrial fabrics includes within its scope all forms of papermaking machine fabrics, including dryer fabrics, press felts (including extended nip press belts),shoe press sleeves, corrugator machine press belts, and also to conveyer belts, printing blankets, silicon wafer grinding belts, and filter cloths.
- the surface characteristics of such fabrics may be influenced by treatment, for example to adjust the wetting characteristics of the fabric, or in a composite fabric of two or more layers, of at least one layer of the fabric.
- the treatment may for example render at least one surface of the fabric hydrophobic, or alternatively hydrophilic. Either of these alternatives has advantages in particular circumstances for handling paper webs, filter cakes, or drained or expressed water.
- the surface conditioning resulting from such plasma treatment suffers from some disadvantages.
- the conditioning may be insufficiently durable in certain conditions, especially wet conditions, and most particularly where high temperatures are experienced.
- plasma treatment requires the provision of expensive apparatus for maintaining an atmosphere in the treatment area below atmosphere pressure, as it has so far only been found to be possible to carry out plasma treatment at atmospheric pressure on a restricted scale under laboratory conditions. Also, all and the whole of any material subjected to plasma treatment is treated during exposure to the plasma; it is not possible to selectively expose certain surfaces or area to treatment, and leave other areas untreated.
- EP-A-0513538 discloses an apparatus for treatment of substrates wherein a substrate is treated by irradiation by a high power UV emitter, through a mask which allows selected areas of the substrate to be either sheilded from or exposed to the UV radiation.
- US 5017423 discloses a method and apparatus for treating a textile substrate by means of a laser device which operates to selectively fuse, melt or remove surface layers of the substrate. This treatment may be applied to both sides of the substrate and may include an optical expansion device for collimating the laser emissions.
- WO91/16492 relates to chemical treatment of papermaking belts having a cured photo-sensitive polymeric resin therein, by coating compounds which retard degradation of the photosensitive polymeric resin is intended to be selectively exposed to light of a selected wavelength to cure the resin, possibly using a mask.
- An object of the invention is to provide a method of treatment of industrial fabrics, as above defined, which enables at least some of the mentioned limitations of plasma treatment to be overcome and can also be applied to yarns, fibres, strips and membranes, etc.
- Preferred objects are to enable treatment to be carried out at atmospheric pressure, and to enable surfaces and areas of surfaces to be selectively treated or untreated, including contagious areas.
- a method of treating an industrial fabric comprises modifying at least part of at least one surface of such fabric, or of any yarn, layer strip membrane or the like forming or to form part of such a fabric wherein said part is treated using a high energy UV excimer or ablation emitter to selectively etc. areas of said part using said emitter, characterised in that said treatment is carried out in an atmosphere containing one or more of a silane, a siloxane, perfluoro carbon, tetrafluoroethylene or ammonia.
- the invention also provides an industrial fabric, as hereinbefore defined, wherein at least part of such a fabric has been modified by treatment with high energy electromagnetic radiation, and such fabric including at least some yarns, fibres, strips or membranes or the like which have been so treated.
- the high energy electromagnetic radiation is preferably UV excimer radiation which may be applied using a excimer or a ablation laser, or a UV excimer lamp.
- the modification of the surface or part of a surface is preferably carried out at a submicron scale, by etching the surface using the laser.
- the etching may effect pitting or scoring the surface to provide grooves, hollows or protrusions at the selected scale or expose ionised material.
- Such modification can alter the wetting characteristics of the surface, for example by providing keying or electrostatic attraction for water adhesion to render a surface hydrophilic; alternatively such modification can micro-planarise a surface by removing small scale irregularities, removing such keying points, to enhance the hydrophobic properties of the surface.
- Such detailed modification can be carried out without charring of polymeric materials used in the fabric, or incurring other thermal damage to surrounding non-radiated regions.
- the intensity of laser irradiation may be varied to thereby alter the nature of the surface e.g. by making it more hydrophobic or hydrophilic depending on the type of material being treated.
- the process may be carried out in selected atmospheres, such as those containing a silane, e.g. Si(CH 3 ) 4 ; a siloxane (Si (OCH 3 ) 4 ) or a perfluorocarbon (cg 1-6C perfluoroalkane); or tetrafluoroethylene; ammonia, or a combination of any one or more of the above.
- a silane e.g. Si(CH 3 ) 4
- Si (OCH 3 ) 4 siloxane
- perfluorocarbon cg 1-6C perfluoroalkane
- ammonia or a combination of any one or more of the above.
- Surface modification according to the invention may be used to remove localised areas, on any required scale, of coatings to expose a substrate surface.
- a method of treating an industrial fabric, as hereinbefore defined, or of a yarn comprising modifying at least part of at least one surface of such a fabric or yarn, comprising exposing said part of said surface to radiation from an excimer UV emitting device.
- the UV emitting device is preferably one with a relatively wide beam to enable simultaneous treatment of a substantial area of such fabric or yarn.
- a plurality of such UV emitting devices may be provided in an array to direct their respective beams each over part of a greater area of the fabric or yarns to be treated, e.g. subjecting the whole width, and a few metres of the length of a papermachine fabric, to simultaneous treatment.
- the fabric or a multiple yarn feed may be advanced at a preselected speed through the zone effected by the UV emitting devices, to subject all parts of the device to treatment for a dwell period governed by the advance speed of the fabric or yarns and the length of the treatment zone in the directions of advance.
- pattern masks of any desired detail down to the limit imposed by diffraction effects may be used to control the arrangement of areas exposed to and shielded from the radiation.
- the wavelength of UV radiation is typically around 200-250nm
- details such as spots on a micron or submicron scale may be created by using a mask with apertures of a suitable scale.
- the patterns may of course be provided on any suitable scale, for example allowing myriad pin-point, or full area exposures over certain areas and completely masking others to provided patterns of hydrophilic or hydrophobic treated areas to effect the properties of the paper web being produced.
- the UV treatment need not be undertaken under a special atmosphere, and thus may be carried out under standard pressure using ambient air composition. Safety considerations may require provision of shielding to prevent exposure of workers to excessive dosages of UV radiation.
- the UV treatment proceeds by way of dissociation of the molecules of the surface, and provision may be needed for confinement or evacuation of the radicals generated.
- the UV excimer emitter or emitters can produce radiation in a narrow waveband, and may typically be emitted at 222nm.
- the treatment may for example create hydrophilic surfaces by dissociating carboxylic bonds, leaving unsaturated carboxylic and/or ketone bonds exposed at the surface.
- the UV radiation may also or instead etch the surface in a submicron scale due to molecular breakdown, and this can be used to produce micron or submicron scale pitting using a pin-hole mask.
- treatment apparatus for use in the method of the invention comprises a fabric dispensing roll 10, and a fabric take up roll 11.
- Untreated fabric 12 is unwound from roll 10, and passes through a treatment station 13. After treatment in station 13, the treated fabric is wound up on roll 11.
- Treatment station 13 is shown diagrammatically as comprising an enclosure or cabinet through which the fabric is passed, with an inlet slot 14 and an outlet slot 15, which preferably have provision for sealing. This enables an atmosphere to be maintained in the enclosure other than ordinary air, and/or at below or above ambient atmospheric pressure or temperature, as required by the particular treatment.
- Laser means 16 are disposed at the treatment station 13, and may comprise a bank of laser projectors directed towards at least the upper surface of the fabric 12.
- a further bank of lasers, not shown, may be mounted below the fabric, to be directed at the underside of the fabric 12.
- the lasers preferably comprise excimer lasers, but may be ablation lasers, and are preferably fourth harmonic UV lasers with a beam wave length of up to 320nm, typically 224-226nm, with a beam of size 20 microns minimum size 1 micron, preferably masked to be larger or smaller, e.g. submicron dimensions; and may fire 10 pulses per second.
- ablation lasers may be a harmonic YAG laser apparatus, preferably a Q-switched YAG laser used in conjunction with frequency tripling or quadrupling crystals, e.g. Nd:YAG lasers.
- YAG lasers need no gas environments and emit e.g. UV frequency light.
- Excimer lasers require a gas environment in which to ablate.
- the lasers operate in accordance with a predetermined program to provide e.g. pitting or scoring of the fabric surface, in predefined areas or over the entire surface, or localised removal of a coating over such areas.
- areas where treatment is not required may be masked e.g. by a foil cut-out pattern.
- Fig. 2 shows a cross-section through a sample of treated fabric, the fabric comprising a single woven layer made up of warp threads 20, and interwoven weft threads 21a, 21b, 21c in each repeat, each floated over two warp threads and below one warp thread 20.
- Weft thread 21a is shown in cross-section and is etched at 23, (scale exaggerated) by incident laser beams 24.
- the other threads 21b, 21c etc. are similarly etched by the incident laser beams.
- This provides a surface of the fabric as a whole which is modified by the pits 23 to provide a roughened surface at e.g. the submicron scale. This can provide a key for adhesion of a water layer by surface tension, and thus increase the hydrophilic properties of the surface.
- Fig. 3 is a similar view of another sample of treated fabric, comprising a single woven layer made up of warp threads 30 and interwoven weft threads 31a, 31b, 31c in each repeat.
- the woven layer is provided on its upper surface with a coating 32.
- localised areas 33 are removed by incident laser beams 34 (the scale is again exaggerated). This has the effect of modifying the properties, e.g. the adhesion or water retaining properties of the coating 32 by exposing the underlying fabric layer in treated areas of the fabric.
- Fabrics treated by lasers in accordance with the method of the invention may be used as filter fabrics, e.g. in belt filters, barrel-neck filters and the like, and also as papermachine clothing, notably press felts, dryer belts, shoe press sleeves, corrugator belts, and also conveyer belts and silicon wafer grinding belts.
- hydrophilic surfaces for filter media it is for example advantageous to provide hydrophilic surfaces for filter media to obtain improved cake release where moisture is present in the material being filtered. This moisture will form a very thin film of water of the surface of the filter which improves cake release. Conversely, in high temperature gas filtration there will be little or no moisture, and the best cake release is then achieved using a hydrophobic coating.
- Another use for hydrophilic media is in papermachine forming fabrics or dryer fabrics to improve adhesion between the paper web and the fabric.
- a filter belt or papermachine clothing appropriately treated by the method of the invention, wherein for example the laser means etch away the top surface layer or coating, and any contaminants, leaving a chemically activated or deactivated surface on e.g. a polymer substrate which is either hydrophilic or hydrophobic, or which can be rendered so by subsequent exposure to e.g. air, silanes, ammonia or fluorocarbons.
- the method according to the invention can also for example be used to treat the underside of a papermachine forming fabric to render the surface hydrophilic and thereby reduce rewetting of the paper web, particularly towards the end of the forming section prior to the pick-up position where the web is transferred to the press section.
- This can increase web dryness by 0.5-3.0%, which results in significant cost savings for the papermaker as less energy has to be used in the dryer section to remove water.
- selected areas on the paper-contacting side of a papermachine fabric may be laser treated by the method according to the invention, to form a pattern of hydrophilic areas. This creates a corresponding textured pattern in the paper or tissue product.
- GB-A-2,233,334 describes the use of excimer lasers to ablate and etch the surfaces of polymeric materials, and describes the physical effects of laser treatment on a micron- and submicron- scale on the treated surface.
- the present invention makes use of these effects to provide useful surface treatment for industrial fabrics.
- the invention may also be used to laser etch yarns, fibres, strips or membranes or he like which may subsequently be made up into fabrics, or composite belt structures.
- FIGs. 4 to 6 A further embodiment of the invention is illustrated in Figs. 4 to 6.
- FIG. 4 apparatus for UV excimer lamp treatment of industrial fabrics, or yarns, is shown in extemely diagrammatic and simplified form.
- the fabric 110 is payed out from a dispensing roll 111, and is passed through a treatment station 112, and wound up after treatment in a take-up roll 113.
- Treatment station 112 comprises shielding 114, to prevent excessive exposure of workers to ultra violet radiation reflected or diffused from the treatment station.
- the shielding encloses a first bank of UV excimer lamps 115 located above the path of the fabric 110.
- a second bank of UV excimer lamps 116 is located below the part of the fabric 110 so that both surfaces of the fabric may be treated in one pass of the fabric through the treatment station 112.
- An optional mask 117 is located over the fabric 110, and this is used to provide for selective exposure and masking of areas of the fabric from the lamps 115 so that only selected areas of the fabric are treated by the excimer UV light. No corresponding mask is shown below the fabric, but may be provided if desired. Further, either of the banks 115 or 116 of UV excimer lamps may be deactivated if only one surface of the fabric 110 is to be treated.
- the path may be occupied by multiple yarns, dispensed from and taken up by banks of bobbins.
- the yarns can be subjected to UV excimer radiation on one or both sides.
- Fig. 5 shows a small part of a mask 117, in the form of a net of diamond shaped openings 118, and an interconnected grid of lands 119.
- the lands 119 serve to mask areas of the fabric from the UV radiation, which is however admitted by the openings 118.
- This produces a patterned array in the fabric surface of areas, in this case in a network, having differing properties, for example hydrophilic properties in the exposed areas and more hydrophobic properties in the unexposed areas.
- This pattern influences the properties of any paper web processed in the fabric and produces patterning in the paper or tissue produced.
- Fig. 6 shows a fragment of a second mask 117, much enlarged.
- This comprises a sheet 120 of e.g. metal foil provided with myriad of pin hole apertures 121. These allow UV excimer radiation to effect very small areas of the fabric, producing micron and submicron scale pits due to dissociation of molecules leading to erosion of the fabric surface.
- Fig. 7 suggests how a single bank of UV excimer lamps may be used to treat both sides of yarns 122, using a reflector such as a silvered or aluminised mirror 123 to reflect UV radiation passing between the yarns back to the undersides of the yarns.
- the reflector may be formed with flutings or channels on its reflective surface to direct reflected rays and focus them on the yarns 122.
- the UV excimer lamps 115, 116 provide narrow band radiations, e.g. centred on 222nm, this will dissociate surface molecules of e.g. PET, to increase hydrophily of the surface, by generating unsaturated carboxylic acid groups on the surface.
- Other materials which can be treated include aramids, PEEK, etc.
- the invention also provides an industrial fabric as defined hereinbefore treated by the method of the invention, yarns when treated by the method of the invention, and an industrial fabric made from such yarns.
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- Engineering & Computer Science (AREA)
- Textile Engineering (AREA)
- Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Chemical Or Physical Treatment Of Fibers (AREA)
- Treatments Of Macromolecular Shaped Articles (AREA)
Claims (11)
- Procédé de traitement d'un tissu industriel consistant à modifier au moins une partie d'au moins une surface d'un tissu (12) ou d'un quelconque fil, d'une quelconque membrane du type bande formant couche ou analogue, formant ou destiné à former une partie d'un tel tissu, ladite partie étant traitée en utilisant un émetteur excimère ou un émetteur d'ablation à ultraviolet de haute énergie (16) pour attaquer sélectivement des zones de ladite partie en utilisant ledit émetteur (16), caractérisé en ce que ledit traitement est exécuté dans une atmosphère contenant un ou plusieurs des produits comprenant un ou plusieurs d'un silane, un siloxane, un perfluorocarbone, du tétrafluoroéthylène ou de l'ammoniac.
- Procédé selon la revendication 1, selon lequel ladite attaque provoque la formation de piqûres ou d'entailles dans ladite surface de manière à former des rainures, des parties en creux ou des parties saillantes ou pour exposer un matériau ionisé.
- Procédé selon la revendication 1, selon lequel un revêtement (32) est prévu sur ladite surface, le revêtement étant éliminé sélectivement par l'étape d'attaque pour exposer une surface du substrat.
- Procédé selon la revendication 2 ou 3, selon lequel l'étape d'attaque réalise l'élimination d'irrégularités de surface.
- Procédé selon l'une quelconque des revendications précédentes, selon lequel ladite étape d'attaque est exécutée à une échelle micrométrique ou inférieure au micromètre.
- Procédé selon l'une quelconque des revendications précédentes, selon lequel des zones, qui ne doivent pas être traitées, sont masquées par un masque en forme de feuille conformée (117).
- Procédé selon l'une quelconque des revendications précédentes, selon lequel le traitement rend ladite surface hydrophobe.
- Procédé selon l'une quelconque des revendications 1 à 6, selon lequel le traitement rend ladite surface hydrophile.
- Procédé selon l'une quelconque des revendications précédentes, selon lequel un matériau de comptage ou un matériau formant matrice est appliqué après traitement aux fils ou fibres textiles traitées.
- Procédé selon l'une quelconque des revendications précédentes, selon lequel lesdites fils ou fibres sont constitués par ou incluent un polymère tel qu'un polyester, un polyamide ou une polyoléfine.
- Procédé selon l'une quelconque des revendications précédentes, selon lequel un réflecteur (123) est situé sur la face du tissu située à l'opposé de l'émetteur (16) pour réfléchir le rayonnement sur la face du tissu non exposée directement à l'émetteur (16).
Applications Claiming Priority (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
GB9720598 | 1997-09-30 | ||
GBGB9720598.3A GB9720598D0 (en) | 1997-09-30 | 1997-09-30 | Treatment of industrial fabrics |
GB9811097 | 1998-05-21 | ||
GBGB9811097.6A GB9811097D0 (en) | 1998-05-21 | 1998-05-21 | Surface treatment of industrial fabrics and yarns |
PCT/GB1998/002785 WO1999016964A1 (fr) | 1997-09-30 | 1998-09-15 | Traitement de tissus industriels |
Publications (2)
Publication Number | Publication Date |
---|---|
EP1019578A1 EP1019578A1 (fr) | 2000-07-19 |
EP1019578B1 true EP1019578B1 (fr) | 2003-01-02 |
Family
ID=26312335
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
EP98942921A Expired - Lifetime EP1019578B1 (fr) | 1997-09-30 | 1998-09-15 | Traitement de tissus industriels |
Country Status (4)
Country | Link |
---|---|
EP (1) | EP1019578B1 (fr) |
AU (1) | AU9088498A (fr) |
DE (1) | DE69810499T2 (fr) |
WO (1) | WO1999016964A1 (fr) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
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DE102016105689A1 (de) | 2016-03-29 | 2017-10-05 | Powerlines Products Gmbh | Vorrichtung zur Nanostrukturierung eines Substrats sowie nanostrukturiertes Substrat |
Families Citing this family (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FI111471B (fi) | 1999-10-13 | 2003-07-31 | Tamfelt Oyj Abp | Siirtohihna paperikonetta varten |
ES2241921T3 (es) | 2002-04-25 | 2005-11-01 | THOMAS JOSEF HEIMBACH GESELLSCHAFT MIT BESCHRANKTER HAFTUNG & CO. | Tamiz de secado y procedimiento para su fabricacion. |
DE102004044572A1 (de) * | 2004-09-15 | 2006-03-30 | Voith Fabrics Patent Gmbh | Papiermaschinenbespannung |
EP2011630A1 (fr) * | 2007-07-03 | 2009-01-07 | F. Hoffmann-La Roche AG | Procédé destiné à la réalisation d'un élément d'analyse |
US7897018B2 (en) | 2007-09-05 | 2011-03-01 | Albany International Corp. | Process for producing papermaker's and industrial fabrics |
US7794555B2 (en) | 2007-09-05 | 2010-09-14 | Albany International Corp. | Formation of a fabric seam by ultrasonic gap welding of a flat woven fabric |
US8088256B2 (en) | 2007-09-05 | 2012-01-03 | Albany International Corp. | Process for producing papermaker's and industrial fabric seam and seam produced by that method |
EP2200812B1 (fr) | 2007-09-05 | 2020-07-15 | Albany International Corp. | Procédé de fabrication d'une couture de tissu utilisée dans l'industrie et la fabrication du papier et couture fabriquée selon ce procédé |
EP2225966A1 (fr) * | 2009-03-04 | 2010-09-08 | Braun GmbH | Soie de brosse à dents et son procédé de fabrication |
DE102012210765A1 (de) * | 2012-06-25 | 2014-01-02 | Voith Patent Gmbh | Verfahren zur Einbringung von Bohrlöchern mit Hilfe von Laserstrahlen in ein flächig ausgebildetes Substrat, insbesondere eine bandförmige Folie |
GB2539508A (en) * | 2015-06-19 | 2016-12-21 | Dst Innovations Ltd | A method for making patterned conductive textiles |
AU2019222771B2 (en) * | 2018-02-15 | 2024-06-13 | Donaldson Company, Inc. | Substrate treatments |
JP6985976B2 (ja) * | 2018-05-09 | 2021-12-22 | 日本フイルコン株式会社 | 工業用織物 |
EP4214357A1 (fr) * | 2020-09-16 | 2023-07-26 | 3M Innovative Properties Company | Bande fibreuse non tissée |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE3679316D1 (de) * | 1985-11-14 | 1991-06-20 | Deutsches Textilforschzentrum | Faser, filament, garn und/oder diese bzw. dieses aufweisende flaechengebilde und/oder haufwerk sowie verfahren zur herstellung derselben bzw. desselben. |
US5073235A (en) * | 1990-04-12 | 1991-12-17 | The Procter & Gamble Company | Process for chemically treating papermaking belts |
DE4113524A1 (de) * | 1991-04-25 | 1992-10-29 | Abb Patent Gmbh | Verfahren zur behandlung von oberflaechen |
AU717573B2 (en) * | 1995-09-28 | 2000-03-30 | Kimberly-Clark Worldwide, Inc. | Sulfonated polymers and method of sulfonating polymers |
-
1998
- 1998-09-15 AU AU90884/98A patent/AU9088498A/en not_active Abandoned
- 1998-09-15 WO PCT/GB1998/002785 patent/WO1999016964A1/fr active IP Right Grant
- 1998-09-15 DE DE69810499T patent/DE69810499T2/de not_active Expired - Lifetime
- 1998-09-15 EP EP98942921A patent/EP1019578B1/fr not_active Expired - Lifetime
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE102016105689A1 (de) | 2016-03-29 | 2017-10-05 | Powerlines Products Gmbh | Vorrichtung zur Nanostrukturierung eines Substrats sowie nanostrukturiertes Substrat |
DE102016105689B4 (de) | 2016-03-29 | 2018-03-01 | Powerlines Products Gmbh | Oberleitungsdraht für Schienenfahrzeuge, Verfahren zum Bearbeiten des Oberleitungsdrahts sowie Vorrichtung zur Nanostrukturierung von mindestens einem Teil der Außenoberfläche des Oberleitungsdrahts |
Also Published As
Publication number | Publication date |
---|---|
DE69810499D1 (de) | 2003-02-06 |
WO1999016964A1 (fr) | 1999-04-08 |
AU9088498A (en) | 1999-04-23 |
EP1019578A1 (fr) | 2000-07-19 |
DE69810499T2 (de) | 2003-10-30 |
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