EP0838045A1 - Fabrication d'une plaque d'impression portant un photopolymere - Google Patents
Fabrication d'une plaque d'impression portant un photopolymereInfo
- Publication number
- EP0838045A1 EP0838045A1 EP96923595A EP96923595A EP0838045A1 EP 0838045 A1 EP0838045 A1 EP 0838045A1 EP 96923595 A EP96923595 A EP 96923595A EP 96923595 A EP96923595 A EP 96923595A EP 0838045 A1 EP0838045 A1 EP 0838045A1
- Authority
- EP
- European Patent Office
- Prior art keywords
- processing solution
- ultrafiltration
- plate
- polymeric material
- process according
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D61/00—Processes of separation using semi-permeable membranes, e.g. dialysis, osmosis or ultrafiltration; Apparatus, accessories or auxiliary operations specially adapted therefor
- B01D61/14—Ultrafiltration; Microfiltration
- B01D61/145—Ultrafiltration
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F1/00—Treatment of water, waste water, or sewage
- C02F1/44—Treatment of water, waste water, or sewage by dialysis, osmosis or reverse osmosis
- C02F1/444—Treatment of water, waste water, or sewage by dialysis, osmosis or reverse osmosis by ultrafiltration or microfiltration
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/30—Imagewise removal using liquid means
- G03F7/3092—Recovery of material; Waste processing
Definitions
- This invention relates broadly to the commercial printing industry, and more specifically to systems of the photopolymer type for making printing plates.
- Photopolymer printing technology such as the FLEX-LITE SPLASHTM brand systems recently introduced by the owner of this invention, Polyfibron Technologies, Inc., involves making a flexographic printing plate by exposing a predetermined image onto a photosensitive polymeric material, which is then etched with a process solution to expose the image in a raised pattern on the printing plate. Polymer that is removed from the plate during the etching process becomes dissolved in a process or wash solution that is used to flush the printing plate.
- an improved process of making a photopolymer printing plate includes steps of (a) exposing a photopolymer material to light that is applied in a predetermined image pattern; (b) washing the polymer with a processing solution in order to cause polymeric material from portions of the polymer that are determined by the image pattern to dissolve from the polymer into the processing solution; and (c) removing the dissolved polymeric material from the processing solution on the molecular level by ultrafiltration, whereby the polymeric material may be efficiently recovered without the need for conventional recovery techniques such as distillation or flocculation. This allows the filtrate to be reused to process additional photopolymer plates.
- An improved system for making and recovering effluent from a photopolymer printing plate includes, according to a second aspect of the invention, an exposure system for exposing a surface of a photopolymer material to light that is applied in a predetermined image pattern; a washout system for washing the unexposed polymer with a processing solution in order to cause polymeric material from portions of the polymer that are determined by the image pattern to dissolve from the surface into the processing solution; and an ultrafiltration system for removing the dissolved polymeric material from the processing solution on the molecular level by ultrafiltration, whereby the polymeric material may be efficiently recovered without the need for conventional recovery techniques such as distillation or flocculation.
- FIG. 1 is a schematic diagram depicting an improved system for recovering effluent from a photopolymer printing plate according to the preferred embodiment of the invention.
- an improved system 10 for making a photopolymer type printing plate includes the actual plate making system 12, which includes, in an arrangement that is well known in this area of technology, an exposure system for exposing a photopolymer material plate to light that is applied in a predetermined image pattern, and a washout system for washing the plate with a processing solution in order to cause polymeric material from portions of the plate that are determined by the image pattern to dissolve from the plate into the processing solution.
- System 10 further includes a conduit 14 for passing the process solution that has the dissolved polymeric material therein to a holding tank 40, as may be seen in FIGURE 1.
- System 10 further includes, as may also be seen in FIGURE 1, an ultrafiltration system 24 for removing the dissolved polymeric material from the processing solution on the molecular level by ultrafiltration, so that the polymeric material may be efficiently recovered without the need for conventional recovery techniques, such as distillation or flocculation.
- Ultrafiltration system 24 includes an intake conduit 22, through which processing solution is drawn from the tank 40 by means of pump 28 and forced into an intake port of an ultrafilter 26, as may also be seen in FIGURE 1. The pressure at the intake port of the ultrafilter 26 is monitored by a pressure gauge 30.
- a second, recirculation conduit 32 is communicated at a first end with a recirculation port of the ultrafilter 26, which is of the cross flow type, and at a second end with a holding tank 40.
- a pressure gauge 34 and temperature gauge 36 is interposed within the conduit 32, as may be seen in FIGURE 1.
- Ultrafilter 26 further has a permeate port to which a third conduit 38 is communicated, as may be seen in FIGURE 1.
- a large volume of processing fluid is circulated within one side of the ultrafilter 26 thorough the intake conduit 22 and the recirculation conduit 32. A relatively small amount of clean, filtered permeate fluid is emitted from the permeate port and is taken away for reuse by the permeate conduit 38.
- the processing solution used in the plate making system 12 is preferably acidic, having a pH that is substantially within the range of 1.0 to 4.0, with a more preferred range of about 2.0 to 2.5 and a most preferred level of about 2.0.
- the temperature of the solution at the ultrafilter 26 is preferably within the range of about 75 to about 95 degrees Fahrenheit.
- plate making system 12 utilizes photo sensitized plates that are predominantly polyurethane, and that produce polymers in the processing solution that have a number average molecular weight (Mn) of about 29,500, and a weight average molecular weight of about 80,200.
- Mn number average molecular weight
- the invention embraces the concept of using ultrafiltration to remove such molecules from the processing solution, meaning that a membrane having a nominal molecular weight cut-off of about 10,000 to about 40,000 could be used.
- the inventors have also discovered that, for unknown reasons, near perfect filtration can be achieved with a membrane that has a nominal molecular weight cut-off that is substantially greater than 40,000. This is a result of the product forming a second dynamic layer over the initial membrane material.
- ultrafilter 26 can produce optimal filtration of the processing solution at a nominal molecular weight cut-off that is within the range of about 50,000 to about 100,000. Most preferably, filter 26 has a nominal molecular weight cut off of 60,000 to 70,000.
- a membrane having a nominal molecular weight cut off of 60,000 can be obtained as Model AES 100 from Advanced Membrane Technologies of San Diego, California. Advanced Membrane Technologies also supplies a membrane having a nominal molecular weight cut off of 70,000 under the Model Code AF 100.
- the flow capacity of ultrafilter 26 and the life of the membrane itself are increased when compared to a membrane that has a lower nominal molecular weight cut off. For example, it has been determined that an ultrafilter 26 based upon the Model AES 100 membrane described above will have a life of 1 year or greater, which is considered to be outstanding in this area of technology.
Landscapes
- Engineering & Computer Science (AREA)
- Water Supply & Treatment (AREA)
- Environmental & Geological Engineering (AREA)
- Chemical & Material Sciences (AREA)
- General Physics & Mathematics (AREA)
- Physics & Mathematics (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Life Sciences & Earth Sciences (AREA)
- Hydrology & Water Resources (AREA)
- Organic Chemistry (AREA)
- Separation Using Semi-Permeable Membranes (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Manufacture Or Reproduction Of Printing Formes (AREA)
- Printing Plates And Materials Therefor (AREA)
Abstract
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US50230795A | 1995-07-13 | 1995-07-13 | |
US502307 | 1995-07-13 | ||
PCT/US1996/011185 WO1997003382A1 (fr) | 1995-07-13 | 1996-07-02 | Fabrication d'une plaque d'impression portant un photopolymere |
Publications (2)
Publication Number | Publication Date |
---|---|
EP0838045A1 true EP0838045A1 (fr) | 1998-04-29 |
EP0838045A4 EP0838045A4 (fr) | 1998-10-28 |
Family
ID=23997231
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
EP96923595A Withdrawn EP0838045A4 (fr) | 1995-07-13 | 1996-07-02 | Fabrication d'une plaque d'impression portant un photopolymere |
Country Status (5)
Country | Link |
---|---|
EP (1) | EP0838045A4 (fr) |
JP (1) | JPH11509010A (fr) |
AU (1) | AU6406896A (fr) |
CA (1) | CA2226966A1 (fr) |
WO (1) | WO1997003382A1 (fr) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US8083947B2 (en) * | 2009-02-24 | 2011-12-27 | Eastman Kodak Company | Polymer-containing solvent purifying process |
GB2509986B (en) * | 2013-01-22 | 2018-01-10 | Dantex Graphics Ltd | Processing waste washout liquid |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE3143106A1 (de) * | 1981-10-30 | 1983-05-11 | Basf Ag, 6700 Ludwigshafen | Verfahren und vorrichtung zur regenerierung waessrigerauswaschloesungen von wasserentwickelbaren photosensitiven aufzeichnungsmaterialien |
Family Cites Families (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0004326B1 (fr) * | 1978-03-18 | 1982-09-29 | Hoechst Aktiengesellschaft | Dispositif pour le développement de plaques à imprimer muni d'un réservoir pour le liquide de traitement |
DE3782205T2 (de) * | 1986-07-23 | 1993-02-25 | Sumitomo Heavy Industries | Behandlung einer photoresistmaterialien enthaltenden abfalloesung. |
EP0430233B1 (fr) * | 1989-11-30 | 1998-04-22 | Toyo Boseki Kabushiki Kaisha | Procédé et appareil pour le développement des plaques photopolymères |
US5171767A (en) * | 1991-05-06 | 1992-12-15 | Rohm And Haas Company | Utrafiltration process for the recovery of polymeric latices from whitewater |
US5328805A (en) * | 1992-08-28 | 1994-07-12 | W. R. Grace & Co.-Conn. | Aqueous developable photosensitive polyurethane-(meth)acrylate |
US5811224A (en) * | 1994-08-24 | 1998-09-22 | Bayer Corporation | Process for rejuvenating developer in printing plate development |
-
1996
- 1996-07-02 JP JP9505866A patent/JPH11509010A/ja active Pending
- 1996-07-02 EP EP96923595A patent/EP0838045A4/fr not_active Withdrawn
- 1996-07-02 AU AU64068/96A patent/AU6406896A/en not_active Abandoned
- 1996-07-02 CA CA 2226966 patent/CA2226966A1/fr not_active Abandoned
- 1996-07-02 WO PCT/US1996/011185 patent/WO1997003382A1/fr not_active Application Discontinuation
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE3143106A1 (de) * | 1981-10-30 | 1983-05-11 | Basf Ag, 6700 Ludwigshafen | Verfahren und vorrichtung zur regenerierung waessrigerauswaschloesungen von wasserentwickelbaren photosensitiven aufzeichnungsmaterialien |
Non-Patent Citations (1)
Title |
---|
See also references of WO9703382A1 * |
Also Published As
Publication number | Publication date |
---|---|
AU6406896A (en) | 1997-02-10 |
JPH11509010A (ja) | 1999-08-03 |
WO1997003382A1 (fr) | 1997-01-30 |
EP0838045A4 (fr) | 1998-10-28 |
CA2226966A1 (fr) | 1997-01-30 |
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Legal Events
Date | Code | Title | Description |
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PUAI | Public reference made under article 153(3) epc to a published international application that has entered the european phase |
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Free format text: STATUS: THE APPLICATION IS DEEMED TO BE WITHDRAWN |
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18D | Application deemed to be withdrawn |
Effective date: 20000501 |