EP0792515A1 - Procede de fabrication d'une suspension chimio-mecanique destinee au polissage et la suspension elle-meme - Google Patents
Procede de fabrication d'une suspension chimio-mecanique destinee au polissage et la suspension elle-memeInfo
- Publication number
- EP0792515A1 EP0792515A1 EP95938941A EP95938941A EP0792515A1 EP 0792515 A1 EP0792515 A1 EP 0792515A1 EP 95938941 A EP95938941 A EP 95938941A EP 95938941 A EP95938941 A EP 95938941A EP 0792515 A1 EP0792515 A1 EP 0792515A1
- Authority
- EP
- European Patent Office
- Prior art keywords
- cmp
- slurry
- surfactant
- abrasive particles
- ferric salt
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Ceased
Links
- 239000002002 slurry Substances 0.000 title claims abstract description 46
- 238000005498 polishing Methods 0.000 title claims abstract description 23
- 238000004519 manufacturing process Methods 0.000 title claims description 5
- 239000002245 particle Substances 0.000 claims abstract description 44
- 239000004094 surface-active agent Substances 0.000 claims abstract description 20
- 239000007800 oxidant agent Substances 0.000 claims abstract description 15
- 239000000375 suspending agent Substances 0.000 claims abstract description 11
- VCJMYUPGQJHHFU-UHFFFAOYSA-N iron(III) nitrate Inorganic materials [Fe+3].[O-][N+]([O-])=O.[O-][N+]([O-])=O.[O-][N+]([O-])=O VCJMYUPGQJHHFU-UHFFFAOYSA-N 0.000 claims description 26
- 238000000034 method Methods 0.000 claims description 20
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 claims description 17
- 239000000203 mixture Substances 0.000 claims description 15
- DNIAPMSPPWPWGF-UHFFFAOYSA-N Propylene glycol Chemical compound CC(O)CO DNIAPMSPPWPWGF-UHFFFAOYSA-N 0.000 claims description 12
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 12
- 150000003839 salts Chemical class 0.000 claims description 11
- 238000002156 mixing Methods 0.000 claims description 10
- 230000032683 aging Effects 0.000 claims description 9
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 8
- 229910052593 corundum Inorganic materials 0.000 claims description 7
- 229910001845 yogo sapphire Inorganic materials 0.000 claims description 7
- LXCFILQKKLGQFO-UHFFFAOYSA-N methylparaben Chemical compound COC(=O)C1=CC=C(O)C=C1 LXCFILQKKLGQFO-UHFFFAOYSA-N 0.000 claims description 6
- 239000000377 silicon dioxide Substances 0.000 claims description 6
- 239000012141 concentrate Substances 0.000 claims description 4
- 229960004063 propylene glycol Drugs 0.000 claims description 4
- 235000013772 propylene glycol Nutrition 0.000 claims description 4
- 229910021578 Iron(III) chloride Inorganic materials 0.000 claims description 3
- 229910052581 Si3N4 Inorganic materials 0.000 claims description 3
- CETPSERCERDGAM-UHFFFAOYSA-N ceric oxide Chemical compound O=[Ce]=O CETPSERCERDGAM-UHFFFAOYSA-N 0.000 claims description 3
- 229910000422 cerium(IV) oxide Inorganic materials 0.000 claims description 3
- RBTARNINKXHZNM-UHFFFAOYSA-K iron trichloride Chemical compound Cl[Fe](Cl)Cl RBTARNINKXHZNM-UHFFFAOYSA-K 0.000 claims description 3
- 239000004292 methyl p-hydroxybenzoate Substances 0.000 claims description 3
- 235000010270 methyl p-hydroxybenzoate Nutrition 0.000 claims description 3
- 229960002216 methylparaben Drugs 0.000 claims description 3
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 claims description 2
- 239000011248 coating agent Substances 0.000 claims 2
- 238000000576 coating method Methods 0.000 claims 2
- 229910052681 coesite Inorganic materials 0.000 claims 1
- 229910052906 cristobalite Inorganic materials 0.000 claims 1
- 239000008367 deionised water Substances 0.000 claims 1
- 229910021641 deionized water Inorganic materials 0.000 claims 1
- 229910003465 moissanite Inorganic materials 0.000 claims 1
- 229910010271 silicon carbide Inorganic materials 0.000 claims 1
- 229910052682 stishovite Inorganic materials 0.000 claims 1
- 229910052905 tridymite Inorganic materials 0.000 claims 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 abstract description 32
- 229910052721 tungsten Inorganic materials 0.000 abstract description 32
- 239000010937 tungsten Substances 0.000 abstract description 32
- 238000002474 experimental method Methods 0.000 description 25
- 235000012431 wafers Nutrition 0.000 description 20
- 230000007547 defect Effects 0.000 description 17
- 230000008569 process Effects 0.000 description 9
- 238000012360 testing method Methods 0.000 description 8
- 238000005299 abrasion Methods 0.000 description 6
- VTLYFUHAOXGGBS-UHFFFAOYSA-N Fe3+ Chemical compound [Fe+3] VTLYFUHAOXGGBS-UHFFFAOYSA-N 0.000 description 5
- 238000009826 distribution Methods 0.000 description 5
- 239000000463 material Substances 0.000 description 5
- 230000003647 oxidation Effects 0.000 description 5
- 238000007254 oxidation reaction Methods 0.000 description 5
- 239000000126 substance Substances 0.000 description 5
- 230000000694 effects Effects 0.000 description 4
- 230000003287 optical effect Effects 0.000 description 4
- 238000012545 processing Methods 0.000 description 4
- 235000012239 silicon dioxide Nutrition 0.000 description 4
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 3
- PEDCQBHIVMGVHV-UHFFFAOYSA-N Glycerine Chemical compound OCC(O)CO PEDCQBHIVMGVHV-UHFFFAOYSA-N 0.000 description 3
- 230000008901 benefit Effects 0.000 description 3
- 230000007423 decrease Effects 0.000 description 3
- 229910001447 ferric ion Inorganic materials 0.000 description 3
- 238000005259 measurement Methods 0.000 description 3
- 238000006748 scratching Methods 0.000 description 3
- 230000002393 scratching effect Effects 0.000 description 3
- 239000007787 solid Substances 0.000 description 3
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 2
- BOTDANWDWHJENH-UHFFFAOYSA-N Tetraethyl orthosilicate Chemical compound CCO[Si](OCC)(OCC)OCC BOTDANWDWHJENH-UHFFFAOYSA-N 0.000 description 2
- 238000013019 agitation Methods 0.000 description 2
- 230000003247 decreasing effect Effects 0.000 description 2
- 239000012895 dilution Substances 0.000 description 2
- 238000010790 dilution Methods 0.000 description 2
- 230000006872 improvement Effects 0.000 description 2
- 239000010410 layer Substances 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- 239000010703 silicon Substances 0.000 description 2
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 2
- -1 3 wt% Chemical compound 0.000 description 1
- FPFSGDXIBUDDKZ-UHFFFAOYSA-N 3-decyl-2-hydroxycyclopent-2-en-1-one Chemical compound CCCCCCCCCCC1=C(O)C(=O)CC1 FPFSGDXIBUDDKZ-UHFFFAOYSA-N 0.000 description 1
- 101100096664 Drosophila melanogaster B52 gene Proteins 0.000 description 1
- 239000002202 Polyethylene glycol Substances 0.000 description 1
- 239000003082 abrasive agent Substances 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 230000009471 action Effects 0.000 description 1
- 238000005054 agglomeration Methods 0.000 description 1
- 230000002776 aggregation Effects 0.000 description 1
- 125000001931 aliphatic group Chemical group 0.000 description 1
- 150000008051 alkyl sulfates Chemical class 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- 239000007900 aqueous suspension Substances 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 230000018109 developmental process Effects 0.000 description 1
- 238000007865 diluting Methods 0.000 description 1
- 230000003292 diminished effect Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- 230000007717 exclusion Effects 0.000 description 1
- 229940032296 ferric chloride Drugs 0.000 description 1
- 229940044631 ferric chloride hexahydrate Drugs 0.000 description 1
- 150000002334 glycols Chemical class 0.000 description 1
- 239000004615 ingredient Substances 0.000 description 1
- 239000011229 interlayer Substances 0.000 description 1
- NQXWGWZJXJUMQB-UHFFFAOYSA-K iron trichloride hexahydrate Chemical compound O.O.O.O.O.O.[Cl-].Cl[Fe+]Cl NQXWGWZJXJUMQB-UHFFFAOYSA-K 0.000 description 1
- 230000007246 mechanism Effects 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- 238000001465 metallisation Methods 0.000 description 1
- 239000011268 mixed slurry Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- QGLKJKCYBOYXKC-UHFFFAOYSA-N nonaoxidotritungsten Chemical compound O=[W]1(=O)O[W](=O)(=O)O[W](=O)(=O)O1 QGLKJKCYBOYXKC-UHFFFAOYSA-N 0.000 description 1
- 150000004686 pentahydrates Chemical class 0.000 description 1
- 229920000570 polyether Polymers 0.000 description 1
- 229920001223 polyethylene glycol Polymers 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 239000000243 solution Substances 0.000 description 1
- 150000003467 sulfuric acid derivatives Chemical class 0.000 description 1
- 239000000725 suspension Substances 0.000 description 1
- 238000010998 test method Methods 0.000 description 1
- 229910001930 tungsten oxide Inorganic materials 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/31—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to form insulating layers thereon, e.g. for masking or by using photolithographic techniques; After treatment of these layers; Selection of materials for these layers
- H01L21/3205—Deposition of non-insulating-, e.g. conductive- or resistive-, layers on insulating layers; After-treatment of these layers
- H01L21/321—After treatment
- H01L21/32115—Planarisation
- H01L21/3212—Planarisation by chemical mechanical polishing [CMP]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/31—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to form insulating layers thereon, e.g. for masking or by using photolithographic techniques; After treatment of these layers; Selection of materials for these layers
- H01L21/3205—Deposition of non-insulating-, e.g. conductive- or resistive-, layers on insulating layers; After-treatment of these layers
- H01L21/321—After treatment
Definitions
- a polishing slurry composition and its method of making for planarization of silicon semiconductor wafers by mechanical polishing of the wafer More particularly,
- composition for polishing a wafer having tungsten lines and vias through silicon dioxide dielectric layers where the slurry has a high removal rate selectivity for the tungsten in relation to the silicon dioxide removal rate.
- Integrated circuit complexity has continued to evolve placing increasingly more demanding speci ications on the processes used in their manufacture.
- the requirement for increasing the density of active devices on an individual chip has escalated, the requirement for greater flatness, over long distance and short distance, on the surfaces, top and bottom, of the wafer has also evolved.
- a flat surface is desirable for several reasons. Flatness is a requirement for cooperation with the optical focusing characteristics of optical stepper devices. As the optical lens requirements for increased resolution has increased, the depth of field of the lens has decreased. Also, attachment of the interconnection metallization to their underlayer is improved if the metal is not required to pass over abrupt underlying steps. In addition, flatness improves ability to fill via holes and lines through apertures in the dielectric.
- CMP chemical-mechanical polishing
- CMP enhances the removal of surface material over large distances and short distances by simultaneously abrading the surface while a chemical etchant selectively attacks the surface.
- CMP is becoming a preferred method of planarizing tungsten interconnects, vias and contacts.
- CMP tungsten processing has shown significantly improved process windows and defect levels over standard tungsten dry etch-back processing.
- One significant advantage of CMP tungsten processing is that it has a highly selective polish rate for tungsten as compared to the dielectric. This selectivity allows for over-polishing while still achieving a flat tungsten
- a feature of this invention is that it provides a stable polish rate over a wide
- FIG. 2 is a normalized plot of removal rate for various wt% of Fe(NO 3 ) 3 •
- FIG. 3 is a chart depicting the average total defect count for slurries made by different mixing sequences.
- FIG. 4 is a chart depicting the oxide removal rate and tungsten selectivity for different slurry batches.
- FIG. 5 is chart of tungsten removal rate and uniformity for different ferric salt oxidizers.
- FIG. 6 is a graph of the general shape of the change in defect count as a function of aging for the slurry of this invention.
- Our slurry comprises abrasive particles of a selected diameter, a ferric salt oxidizer and a suspension agent. We have also discovered that it is beneficial to follow an order of adding and of mixing the slurry components for optimum results.
- the suspension agent should be mixed thoroughly with the abrasive particle aqueous concentrate before adding diluted oxidizer up to the final volume.
- planarization results can be still further improved if the completely mixed slurry is allowed to age for one day or more before being used in that scratch count is still further diminished. While one day of aging improves the scratch results, significant further improvement is obtained with longer aging of more than three days
- the abrasive particles can be any of the commonly used abrasives such as alumina ( Al 2 O 3 ), silicon carbide (SiC), Ceria (CeO 2 ), silicon nitride (Si 3 N 4 ) and silicon dioxide (SiO 2 ).
- alumina Al 2 O 3
- SiC silicon carbide
- CeO 2 Ceria
- Si 3 N 4 silicon nitride
- SiO 2 silicon dioxide
- the median diameter of the prior art slurry particles are 0.400 microns, but for our slu ⁇ y we prefer a median particle size of less than 0.4 microns, preferably 0.220 microns.
- the preferred distribution of particle size is much tighter than in the prior art also.
- Our preferred distribution is a one sigma deviation of 0.050 microns or less. We have determined through experimentation that both of these dimensions are important to
- the particle sizes used in prior CMP slurries were in the range of 0.4 to 0.7 micron diameter or larger with little attention to the tightness of the distribution.
- the preferred oxidizer is a ferric salt, selected from the group consisting of Fe(NO 3 ) 3 • 9H,O, FeCl 3 • 6H 2 O, Fej(SO 4 ) 3 • 5H 2 O, and FeNH 4 (SO 4 ) 2 • 12H 2 O.
- the suspension agent is preferably an aqueous based surfactant to improve the colloidal behavior of the abrasive particles in the H 2 O system. For the purposes of this
- the suspension agent can also be formulated from the following classes: 1 ) glycols such as ethylene glycol, propylene glycol and glycerol;
- polyethcrs such as polyethylene glycol
- the oxidizer component has other members of the class. Representative
- Fe (III) compounds such as the following: Ferric chloride hexahydrate, FeCl, • 6H,O
- Dummy Wafers Tungsten Dummy wafers identical to test monitors described above, except for the W thickness pre- measurement. Oxide dummv wafers coated with 2500 A
- Metrology tool Prometrix RS-55. Pre and post polish measurements taken on 49 sites across each wafer with 9mm edge exclusion. Slurry agitation: Constant agitation during testing. PROCESS PARAMETERS
- Process Cycle variable time, 5 psi, 25 rpm carrier, 100 rpm table, 150 ml/min slu ⁇ y flow.
- Loading Sequence For each of seven slurry mixture text compositions selected, perform polish test on 8 tungsten dummy wafers for 220 sec and 4 tungsten Test Monitor wafers for 60 seconds.
- Test Compositions Al 2 O 3 -- 1 wt%, 2 wt%, 3 wt%, 4 wt%, 5 wt%, 6 wt% and 7 wt%.
- the Fe(NO 3 ) 3 • 9H 2 O is fixed at 5 wt% for all slurries used in Experiment 1. This experiment, as shown in FIG. 1, has a nearly constant W removal rate of 450 ⁇ A/min — 490 ⁇ A/min from 2-6 wt% of abrasion particles of Al,O 3 . Below 2 wt%
- the removal rate is substantially reduced.
- the removal rate is essentially independent of the alumina concentration. This suggests that the removal rate depends more on the oxidation rate of the elemental tungsten near the surface and that at these wt% of particles the tungsten oxide is being removed about as fast as its being formed. It is not understood why the curve shows a removal rate drop-off at the percentages above 6 wt%.
- the prior CMP tungsten polishing publications teach that the polishing rate is linearly proportional to the concentration of the alumina particles in the concentration range of 3 to 7 wt. percent. However, our experiment shows that the lower
- FIG. 2 for Experiment 2 shows the results of W removal rate plotted normalized against removal rate for 5 wt% Fe(NO 3 ) 3 • 9H 2 O.
- the results show a strong W removal rate dependence on concentration of Fe 3+ between 3 wt% to 5 wt% ferric nitrate.
- the removal rate is nearly constant for a fixed 2.8 wt% alumina concentration.
- surfactant used was a commercially available aqueous mixture of propylene glycol and methyl paraben from Universal Photonics Inc., sold under trade name EVERFLO.
- the order of mixing the slurry components also had an unexpected effect on the results.
- Batch A Surfactant was added to container holding alumina and ferric nitrate, previously diluted to near the final volume.
- Batch B Surfactant was added to alumina concentrate. After brief stirring to homogenize the mixture, diluted ferric nitrate was added up to the final volume.
- Batch C Surfactant added to alumina concentrate and mixed by a magnetically driven stirrer for 2 hours, then the diluted oxidizer, ferric nitride, was added to make up the final batch volume.
- B Slu ⁇ y Composition
- Polishing in Strasbaugh carried out at 5 psi spindle down force, 25 rpm spindle rotation, 100 rpm table rotation.
- a polishing pad was wet-idled overnight. The pad was pre-
- FIG. 3 shows that when performing CMP using no surfactant that
- the suspension agent allows the suspension agent to engage and completely coat each alumina panicle by nature of the organic surfactant molecules making the particle surface non-polar. It is believed that this precludes the particle from acquiring a charge from the oxidizer. thereby preventing agglomeration. Accordingly, when the
- the oxide removal rate As seen in FIG. 4, the oxide removal rate
- the scratch count decreases dramatically over the six-day aging period.
- the decrease defect count is decreased to less than 10% from the one-day defect count value.
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Mechanical Treatment Of Semiconductor (AREA)
- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
Abstract
Suspension chimio-mécanique au tungstène, destinée au polissage. Cette suspension se compose de particules abrasives de faible diamètre moyen, la variation de leur diamètre restant très réduite. L'abrasif doit être parfaitement prémélangé à un agent tensioactif en suspension avant l'adjonction de l'agent oxydant.
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US34232694A | 1994-11-18 | 1994-11-18 | |
PCT/US1995/013919 WO1996016436A1 (fr) | 1994-11-18 | 1995-10-23 | Procede de fabrication d'une suspension chimio-mecanique destinee au polissage et la suspension elle-meme |
US342326 | 2003-01-15 |
Publications (1)
Publication Number | Publication Date |
---|---|
EP0792515A1 true EP0792515A1 (fr) | 1997-09-03 |
Family
ID=23341343
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
EP95938941A Ceased EP0792515A1 (fr) | 1994-11-18 | 1995-10-23 | Procede de fabrication d'une suspension chimio-mecanique destinee au polissage et la suspension elle-meme |
Country Status (2)
Country | Link |
---|---|
EP (1) | EP0792515A1 (fr) |
WO (1) | WO1996016436A1 (fr) |
Families Citing this family (35)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5958148A (en) | 1996-07-26 | 1999-09-28 | Speedfam-Ipec Corporation | Method for cleaning workpiece surfaces and monitoring probes during workpiece processing |
WO1998005066A2 (fr) * | 1996-07-26 | 1998-02-05 | Speedfam Corporation | Procede et dispositif de detection et de mesure en cours de fabrication de couches pelliculaires |
JP2008277848A (ja) * | 1996-07-26 | 2008-11-13 | Ekc Technol Inc | 化学機械研磨組成物及び化学機械研磨方法 |
US5872633A (en) * | 1996-07-26 | 1999-02-16 | Speedfam Corporation | Methods and apparatus for detecting removal of thin film layers during planarization |
US6033596A (en) * | 1996-09-24 | 2000-03-07 | Cabot Corporation | Multi-oxidizer slurry for chemical mechanical polishing |
US6039891A (en) * | 1996-09-24 | 2000-03-21 | Cabot Corporation | Multi-oxidizer precursor for chemical mechanical polishing |
US5738800A (en) * | 1996-09-27 | 1998-04-14 | Rodel, Inc. | Composition and method for polishing a composite of silica and silicon nitride |
US5972792A (en) * | 1996-10-18 | 1999-10-26 | Micron Technology, Inc. | Method for chemical-mechanical planarization of a substrate on a fixed-abrasive polishing pad |
WO1998023697A1 (fr) * | 1996-11-26 | 1998-06-04 | Cabot Corporation | Composition et procede de polissage de disques durs |
US5958288A (en) * | 1996-11-26 | 1999-09-28 | Cabot Corporation | Composition and slurry useful for metal CMP |
US6068787A (en) * | 1996-11-26 | 2000-05-30 | Cabot Corporation | Composition and slurry useful for metal CMP |
SG68005A1 (en) * | 1996-12-02 | 1999-10-19 | Fujimi Inc | Polishing composition |
US5954997A (en) | 1996-12-09 | 1999-09-21 | Cabot Corporation | Chemical mechanical polishing slurry useful for copper substrates |
US6126853A (en) | 1996-12-09 | 2000-10-03 | Cabot Microelectronics Corporation | Chemical mechanical polishing slurry useful for copper substrates |
US6309560B1 (en) * | 1996-12-09 | 2001-10-30 | Cabot Microelectronics Corporation | Chemical mechanical polishing slurry useful for copper substrates |
JPH10204416A (ja) * | 1997-01-21 | 1998-08-04 | Fujimi Inkooporeetetsudo:Kk | 研磨用組成物 |
DE19708652C2 (de) * | 1997-02-21 | 1999-01-07 | Siemens Ag | Schleifmittel und Verfahren zum Polieren von Lichtwellenleiter-Endflächen |
US5916855A (en) * | 1997-03-26 | 1999-06-29 | Advanced Micro Devices, Inc. | Chemical-mechanical polishing slurry formulation and method for tungsten and titanium thin films |
US5993685A (en) * | 1997-04-02 | 1999-11-30 | Advanced Technology Materials | Planarization composition for removing metal films |
US5770103A (en) * | 1997-07-08 | 1998-06-23 | Rodel, Inc. | Composition and method for polishing a composite comprising titanium |
US6736714B2 (en) | 1997-07-30 | 2004-05-18 | Praxair S.T. Technology, Inc. | Polishing silicon wafers |
US6514301B1 (en) | 1998-06-02 | 2003-02-04 | Peripheral Products Inc. | Foam semiconductor polishing belts and pads |
US7718102B2 (en) | 1998-06-02 | 2010-05-18 | Praxair S.T. Technology, Inc. | Froth and method of producing froth |
US6220934B1 (en) | 1998-07-23 | 2001-04-24 | Micron Technology, Inc. | Method for controlling pH during planarization and cleaning of microelectronic substrates |
TW455626B (en) * | 1998-07-23 | 2001-09-21 | Eternal Chemical Co Ltd | Chemical mechanical abrasive composition for use in semiconductor processing |
US6276996B1 (en) | 1998-11-10 | 2001-08-21 | Micron Technology, Inc. | Copper chemical-mechanical polishing process using a fixed abrasive polishing pad and a copper layer chemical-mechanical polishing solution specifically adapted for chemical-mechanical polishing with a fixed abrasive pad |
US6206756B1 (en) | 1998-11-10 | 2001-03-27 | Micron Technology, Inc. | Tungsten chemical-mechanical polishing process using a fixed abrasive polishing pad and a tungsten layer chemical-mechanical polishing solution specifically adapted for chemical-mechanical polishing with a fixed abrasive pad |
TW486514B (en) | 1999-06-16 | 2002-05-11 | Eternal Chemical Co Ltd | Chemical mechanical abrasive composition for use in semiconductor processing |
TW499471B (en) | 1999-09-01 | 2002-08-21 | Eternal Chemical Co Ltd | Chemical mechanical/abrasive composition for semiconductor processing |
CN1125862C (zh) * | 1999-09-20 | 2003-10-29 | 长兴化学工业股份有限公司 | 半导体加工用化学机械研磨组合物 |
US6734110B1 (en) | 1999-10-14 | 2004-05-11 | Taiwan Semiconductor Manufacturing Company | Damascene method employing composite etch stop layer |
US6347978B1 (en) | 1999-10-22 | 2002-02-19 | Cabot Microelectronics Corporation | Composition and method for polishing rigid disks |
US6383065B1 (en) | 2001-01-22 | 2002-05-07 | Cabot Microelectronics Corporation | Catalytic reactive pad for metal CMP |
JP4954398B2 (ja) * | 2001-08-09 | 2012-06-13 | 株式会社フジミインコーポレーテッド | 研磨用組成物およびそれを用いた研磨方法 |
WO2004104122A2 (fr) * | 2003-05-26 | 2004-12-02 | Showa Denko K.K. | Composition et procédé de polissage |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3817727A (en) * | 1972-03-17 | 1974-06-18 | Union Carbide Corp | Abrasive polishing suspensions and method for making same |
US3922393A (en) * | 1974-07-02 | 1975-11-25 | Du Pont | Process for polishing silicon and germanium semiconductor materials |
US5300813A (en) * | 1992-02-26 | 1994-04-05 | International Business Machines Corporation | Refractory metal capped low resistivity metal conductor lines and vias |
US5340370A (en) * | 1993-11-03 | 1994-08-23 | Intel Corporation | Slurries for chemical mechanical polishing |
-
1995
- 1995-10-23 WO PCT/US1995/013919 patent/WO1996016436A1/fr not_active Application Discontinuation
- 1995-10-23 EP EP95938941A patent/EP0792515A1/fr not_active Ceased
Non-Patent Citations (1)
Title |
---|
See references of WO9616436A1 * |
Also Published As
Publication number | Publication date |
---|---|
WO1996016436A1 (fr) | 1996-05-30 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
EP0792515A1 (fr) | Procede de fabrication d'une suspension chimio-mecanique destinee au polissage et la suspension elle-meme | |
EP0970156B1 (fr) | Formulation sous forme de boue pour le polissage chimiomecanique de films minces de tungstene et de titane et son procede de fabrication | |
KR100690470B1 (ko) | 구리기판의 기계화학적 연마 | |
US6325705B2 (en) | Chemical-mechanical polishing slurry that reduces wafer defects and polishing system | |
RU2573672C2 (ru) | Водная полирующая композиция и способ химико-механического полирования подложек, содержащих пленки диэлектрика оксида кремния и поликремния | |
EP2614123B1 (fr) | Composition aqueuse de polissage et procédé de polissage chimico-mécanique de matériaux de substrat pour dispositifs optiques, mécaniques et électriques | |
KR101134590B1 (ko) | 분산 안정성이 우수한 연마 슬러리의 제조방법 | |
WO2006028759A2 (fr) | Suspension aqueuse contenant des particules de silice modifiees par l'incorporation de metallate | |
WO1993022103A1 (fr) | Compositions et procedes pour polir et aplanir des surfaces | |
EP1416025A1 (fr) | Suspension aqueuse pour polissage mécano-chimique, procédé de polissage chimico-mécanique, procédé de fabrication de dispositifs semi-conducteurs et matériel pour la préparation d'une dispersion aqueuse | |
EP1190006A1 (fr) | Composition de suspension epaisse et polissage chimique et mecanique utilisant cette composition | |
TW201229163A (en) | Process for chemically mechanically polishing substrates containing silicon oxide dielectric films and polysilicon and/or silicon nitride films | |
SG188459A1 (en) | Aqueous polishing compositions containing n-substituted diazenium dioxidesand/or n'-hydroxy-diazenium oxide salts | |
EP2892967B1 (fr) | Composition et procédé de polissage employant une polypyrrolidone | |
EP3692107B1 (fr) | Particules abrasives traitées en surface pour des applications de polissage de tungstène | |
TWI625372B (zh) | 低介電基板之研磨方法 | |
WO2022026355A1 (fr) | Composition de cpm contenant des inhibiteurs anioniques et cationiques | |
KR102654509B1 (ko) | 연마 시 질화물 제거에 선택적인 수성의 실리카 슬러리 및 아민 카복실산 조성물, 및 이의 사용 방법 | |
JP4878728B2 (ja) | Cmp研磨剤および基板の研磨方法 | |
KR100366304B1 (ko) | 반도체 웨이퍼 절연층의 화학적 기계적 연마용 조성물 | |
KR100599855B1 (ko) | 연마용 조성물 | |
CN116333686A (zh) | 化学机械研磨用组合物及研磨方法 | |
KR20210132204A (ko) | Cmp 슬러리에 대한 입자 분산을 개선하는 첨가제 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
PUAI | Public reference made under article 153(3) epc to a published international application that has entered the european phase |
Free format text: ORIGINAL CODE: 0009012 |
|
17P | Request for examination filed |
Effective date: 19970417 |
|
AK | Designated contracting states |
Kind code of ref document: A1 Designated state(s): DE ES FR GB IT NL |
|
17Q | First examination report despatched |
Effective date: 19971205 |
|
STAA | Information on the status of an ep patent application or granted ep patent |
Free format text: STATUS: THE APPLICATION HAS BEEN REFUSED |
|
18R | Application refused |
Effective date: 20021212 |