EP0785296B1 - Elektroplattieren von Nickel auf Nickel-Ferrit Vorrichtungen - Google Patents
Elektroplattieren von Nickel auf Nickel-Ferrit Vorrichtungen Download PDFInfo
- Publication number
- EP0785296B1 EP0785296B1 EP19960309396 EP96309396A EP0785296B1 EP 0785296 B1 EP0785296 B1 EP 0785296B1 EP 19960309396 EP19960309396 EP 19960309396 EP 96309396 A EP96309396 A EP 96309396A EP 0785296 B1 EP0785296 B1 EP 0785296B1
- Authority
- EP
- European Patent Office
- Prior art keywords
- nickel
- acid
- ferrite
- conductor
- substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 title claims description 82
- 229910052759 nickel Inorganic materials 0.000 title claims description 38
- NQNBVCBUOCNRFZ-UHFFFAOYSA-N nickel ferrite Chemical compound [Ni]=O.O=[Fe]O[Fe]=O NQNBVCBUOCNRFZ-UHFFFAOYSA-N 0.000 title claims description 15
- 238000009713 electroplating Methods 0.000 title claims description 8
- 238000007747 plating Methods 0.000 claims description 22
- 239000004020 conductor Substances 0.000 claims description 21
- 239000000758 substrate Substances 0.000 claims description 18
- KGBXLFKZBHKPEV-UHFFFAOYSA-N boric acid Chemical compound OB(O)O KGBXLFKZBHKPEV-UHFFFAOYSA-N 0.000 claims description 13
- 239000004327 boric acid Substances 0.000 claims description 13
- KRKNYBCHXYNGOX-UHFFFAOYSA-N citric acid Chemical compound OC(=O)CC(O)(C(O)=O)CC(O)=O KRKNYBCHXYNGOX-UHFFFAOYSA-N 0.000 claims description 12
- 239000000872 buffer Substances 0.000 claims description 11
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 claims description 9
- 238000000034 method Methods 0.000 claims description 9
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 8
- 229910052802 copper Inorganic materials 0.000 claims description 8
- 239000010949 copper Substances 0.000 claims description 8
- 229910052751 metal Inorganic materials 0.000 claims description 8
- 239000002184 metal Substances 0.000 claims description 8
- 229910000859 α-Fe Inorganic materials 0.000 claims description 8
- AEMRFAOFKBGASW-UHFFFAOYSA-N Glycolic acid Chemical compound OCC(O)=O AEMRFAOFKBGASW-UHFFFAOYSA-N 0.000 claims description 6
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 claims description 6
- 230000002378 acidificating effect Effects 0.000 claims description 6
- 150000002815 nickel Chemical class 0.000 claims description 6
- KDYFGRWQOYBRFD-UHFFFAOYSA-N Succinic acid Natural products OC(=O)CCC(O)=O KDYFGRWQOYBRFD-UHFFFAOYSA-N 0.000 claims description 4
- KERTUBUCQCSNJU-UHFFFAOYSA-L nickel(2+);disulfamate Chemical compound [Ni+2].NS([O-])(=O)=O.NS([O-])(=O)=O KERTUBUCQCSNJU-UHFFFAOYSA-L 0.000 claims description 4
- 229910021586 Nickel(II) chloride Inorganic materials 0.000 claims description 3
- FEWJPZIEWOKRBE-UHFFFAOYSA-N Tartaric acid Natural products [H+].[H+].[O-]C(=O)C(O)C(O)C([O-])=O FEWJPZIEWOKRBE-UHFFFAOYSA-N 0.000 claims description 3
- 229910000147 aluminium phosphate Inorganic materials 0.000 claims description 3
- QMMRZOWCJAIUJA-UHFFFAOYSA-L nickel dichloride Chemical compound Cl[Ni]Cl QMMRZOWCJAIUJA-UHFFFAOYSA-L 0.000 claims description 3
- SWELZOZIOHGSPA-UHFFFAOYSA-N palladium silver Chemical compound [Pd].[Ag] SWELZOZIOHGSPA-UHFFFAOYSA-N 0.000 claims description 3
- 239000011975 tartaric acid Substances 0.000 claims description 3
- 235000002906 tartaric acid Nutrition 0.000 claims description 3
- FEWJPZIEWOKRBE-JCYAYHJZSA-N Dextrotartaric acid Chemical compound OC(=O)[C@H](O)[C@@H](O)C(O)=O FEWJPZIEWOKRBE-JCYAYHJZSA-N 0.000 claims description 2
- 229910001252 Pd alloy Inorganic materials 0.000 claims description 2
- KDYFGRWQOYBRFD-NUQCWPJISA-N butanedioic acid Chemical compound O[14C](=O)CC[14C](O)=O KDYFGRWQOYBRFD-NUQCWPJISA-N 0.000 claims description 2
- -1 nickel fluoroborate Chemical compound 0.000 claims description 2
- LGQLOGILCSXPEA-UHFFFAOYSA-L nickel sulfate Chemical compound [Ni+2].[O-]S([O-])(=O)=O LGQLOGILCSXPEA-UHFFFAOYSA-L 0.000 claims description 2
- 229910000363 nickel(II) sulfate Inorganic materials 0.000 claims description 2
- 230000003139 buffering effect Effects 0.000 claims 1
- 239000011248 coating agent Substances 0.000 description 5
- 238000000576 coating method Methods 0.000 description 5
- 229910052782 aluminium Inorganic materials 0.000 description 4
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 4
- 238000004519 manufacturing process Methods 0.000 description 4
- 229910001053 Nickel-zinc ferrite Inorganic materials 0.000 description 3
- 230000015572 biosynthetic process Effects 0.000 description 2
- BDAGIHXWWSANSR-UHFFFAOYSA-N methanoic acid Natural products OC=O BDAGIHXWWSANSR-UHFFFAOYSA-N 0.000 description 2
- RNAMYOYQYRYFQY-UHFFFAOYSA-N 2-(4,4-difluoropiperidin-1-yl)-6-methoxy-n-(1-propan-2-ylpiperidin-4-yl)-7-(3-pyrrolidin-1-ylpropoxy)quinazolin-4-amine Chemical compound N1=C(N2CCC(F)(F)CC2)N=C2C=C(OCCCN3CCCC3)C(OC)=CC2=C1NC1CCN(C(C)C)CC1 RNAMYOYQYRYFQY-UHFFFAOYSA-N 0.000 description 1
- OSWFIVFLDKOXQC-UHFFFAOYSA-N 4-(3-methoxyphenyl)aniline Chemical compound COC1=CC=CC(C=2C=CC(N)=CC=2)=C1 OSWFIVFLDKOXQC-UHFFFAOYSA-N 0.000 description 1
- 229910006147 SO3NH2 Inorganic materials 0.000 description 1
- 239000006172 buffering agent Substances 0.000 description 1
- 238000010344 co-firing Methods 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 230000002939 deleterious effect Effects 0.000 description 1
- 239000002659 electrodeposit Substances 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 235000019253 formic acid Nutrition 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 125000004435 hydrogen atom Chemical class [H]* 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 239000001384 succinic acid Substances 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/12—Electroplating: Baths therefor from solutions of nickel or cobalt
Definitions
- This invention relates to electroplating and, in particular, to electroplating a nickel layer on a nickel ferrite device.
- nickel layer on conductors disposed on a nickel ferrite substrate In the manufacture of circuits containing magnetic components, it is sometimes necessary to electroplate a nickel layer on conductors disposed on a nickel ferrite substrate. For example, in the fabrication of integrated power modules it is desirable to electroplate nickel onto copper conductors disposed on nickel zinc ferrite substrates.
- the nickel-plated conductors provide a surface that is wire-bondable with aluminum wire so that additional components can be directly connected to circuit components on the ferrite substrate.
- U.S. 3,960,674 discloses a process of electroplating nickel on to conductive metal patterns formed on a non-conductive ferrite substrate.
- boric acid in conventional nickel plating baths is responsible for excessive lateral growth in the electroplating of nickel on nickel ferrite substrates. While nickel baths without boric acid do not yield acceptable electrodeposits, the boric acid interacts with the ferrite substrate to cause excessive lateral growth. Applicants further discovered that by eliminating the boric acid and adding another acidic plating buffer such as citric acid, one can obtain isotropic nickel plating and produce a wire-bondable surface.
- FIG. 1 is a schematic cross section of a nickel ferrite substrate 10, such as nickel zinc ferrite, bearing a conductor 11, such as copper.
- a coating of nickel 12 has been coated on the conductor using a conventional nickel plating bath.
- the plated nickel on either side of the conductor 11 extends substantially farther than the thickness of the nickel on top of the conductor. This lateral extension illustrates excessive lateral growth, and one can readily see that such growth limits the close spacing of conductors.
- boric acid contributed to the lateral growth
- samples were plated with nickel using nickel sulfamate baths containing various amounts of boric acid ranging from 30 g/L to below 2 g/L. It was found that at a boric acid concentration of 2 g/L or lower, lateral growth was not observed. However, the resulting nickel coating was not wire-bondable to aluminum.
- FIG. 2 is a schematic cross section of a nickel ferrite substrate 20 bearing a metal conductor 21 electroplated with nickel 22 from a buffered nickel plating bath free of boric acid. As illustrated, the lateral growth of nickel is substantially the same as the vertical growth, so the plating is isotropic.
- the nickel ferrite substrate 20 can comprise any nickel-containing ferrite, but is preferably a ferrite of the form Ni 1-x Zn x Fe 2 O 4 , NiFe 2-x Al x O 4 and Ni 1-x Cd x Fe x O 4 where x can vary from zero to nearly 1.
- the metal conductor 21 can be any metal which can be adhered to the nickel-ferrite substrate as by co-firing (silver-palladium) or by electroplating to a co-fired metal (e.g., copper electroplated to silver-palladium alloy).
- the nickel plating bath comprises a solution of nickel salt in an acidic buffer having a pH of about 3 or less which contains less than 2 g/L of boric acid.
- Preferred nickel salts include nickel sulfate, nickel sulfamate, nickel chloride and nickel fluoroborate.
- Preferred acidic buffers include citric acid, acetic acid, phosphoric acid, succinic acid, glycolic acid, and tartaric acid.
- a nickel plating bath was made of the following composition: Compound Amount (g/L) Ni(SO 3 NH 2 ) 2 ⁇ 4H 2 O 383 NiCl 2 ⁇ 6H 2 O 11 Citric Acid 10
- Nickel ferrite samples with copper conductors were plated at (22mA/cm 2 ) with a pH of about 1.9 and a temperature in the range 35-45°C. No lateral growth was observed. The sample was plated to a thickness of 20 ⁇ m. Lateral growth was measured to be about 20 ⁇ m, which means that plating was isotropic. The appearance was acceptable, and the coating was wire-bondable to aluminum wire.
- Nickel plating baths having the same type and concentration of nickel salts as Example 1, but with the buffers indicated below, were prepared.
- Nickel ferrite samples with copper conductors pre-plated for IS minutes at 27mA/cm 2 ) were also prepared and plated with nickel in the baths at 35°C.
- Table I below indicates the concentration of buffer, the plating current, the pH of the bath, whether the nickel exhibited excessive lateral growth (i.e., anisotropic growth), and whether the nickel coating was wire-bondable to aluminum. Buffer Buffer Concen.
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Electroplating Methods And Accessories (AREA)
- Electroplating And Plating Baths Therefor (AREA)
Claims (6)
- Verfahren zum Elektroplattieren von Nickel auf eine Nickel-Ferrit-Vorrichtung mit folgenden Schritten:ein Substrat mit Ferrit, welches Nickel umfaßt, wird bereitgestellt;ein metallischer Leiter wird an das Substrat anhaften lassen;das Substrat und der Leiter werden in ein Nickel-Plattierungsbad eingetaucht, welches Nickel-Salz und eine Puffersäure, die im wesentlichen frei von Borsäure ist, umfaßt, um das Bad auf einen pH-Wert von etwa 3 oder weniger zu puffern;ein elektrischer Strom wird durch den Leiter fließen lassen, um eine gewünschte Dicke des Nickels an dem Leiter isotropisch zu elektroplattieren.
- Verfahren nach Anspruch 1, dadurch gekennzeichnet, daß das Ferrit, welches Nickel aufweist, ein Ferrit umfaßt, das aus einer Gruppe gewählt wird, die aus Ni1-xZnxFe2O4, NiFe2-xAlxO4 und Ni1-xCdxFe2O4 besteht, wobei 0<X<1.
- Verfahren nach Anspruch 1, dadurch gekennzeichnet, daß das Metall Kupfer umfaßt.
- Verfahren nach Anspruch 1, dadurch gekennzeichnet, daß das Metall eine Silber-Palladium-Legierung umfaßt.
- Verfahren nach Anspruch 1, dadurch gekennzeichnet, daß das Nickel-Salz ein Nickel-Salz umfaßt, das aus der Gruppe gewählt wird, die Nickelsulfat, Nickelsulfamat, Nickelchlorid und Nickelfluroprochat umfaßt.
- Verfahren nach Anspruch 1, dadurch gekennzeichnet, daß die Puffersäure einen Puffer umfaßt, der aus der Gruppe gewählt wird, die Zitronensäure, Essigsäure, Phosphorsäure, Bernsteinsäure, Glycolsäure und Weinsäure umfaßt.
Applications Claiming Priority (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US58107995A | 1995-12-29 | 1995-12-29 | |
| US769189 | 1996-12-18 | ||
| US581079 | 1996-12-18 | ||
| US08/769,189 US5779873A (en) | 1995-12-29 | 1996-12-18 | Electroplating of nickel on nickel ferrite devices |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| EP0785296A1 EP0785296A1 (de) | 1997-07-23 |
| EP0785296B1 true EP0785296B1 (de) | 2000-03-15 |
Family
ID=27078209
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| EP19960309396 Expired - Lifetime EP0785296B1 (de) | 1995-12-29 | 1996-12-23 | Elektroplattieren von Nickel auf Nickel-Ferrit Vorrichtungen |
Country Status (4)
| Country | Link |
|---|---|
| EP (1) | EP0785296B1 (de) |
| JP (1) | JPH09310194A (de) |
| DE (1) | DE69607130T2 (de) |
| MX (1) | MX9700180A (de) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US11835307B2 (en) | 2019-04-12 | 2023-12-05 | Rheem Manufacturing Company | Applying coatings to the interior surfaces of heat exchangers |
Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4737790B2 (ja) * | 1999-10-01 | 2011-08-03 | 株式会社シミズ | ほう酸を含まないニッケルめっき浴 |
| JP2012162786A (ja) * | 2011-02-09 | 2012-08-30 | Kanto Gakuin | 電気ニッケルめっき浴、電気ニッケルめっき方法及び電気ニッケルめっき製品 |
| KR101823194B1 (ko) | 2014-10-16 | 2018-01-29 | 삼성전기주식회사 | 칩 전자부품 및 그 제조방법 |
| CN121538691A (zh) * | 2017-06-23 | 2026-02-17 | 德国艾托特克公司 | 用于在衬底上沉积装饰用镍涂层的镍电镀浴 |
| CN111636077A (zh) * | 2020-06-05 | 2020-09-08 | 成都宏明双新科技股份有限公司 | 一种防陶瓷芯片镀镍或金爬镀的工艺 |
| CN116180169B (zh) * | 2022-12-15 | 2026-03-13 | 厦门大学 | 一种电子电镀添加剂组合物及其在抑制银-铁氧体界面镍横向电沉积中的应用 |
Family Cites Families (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| FR1447970A (fr) * | 1964-10-12 | 1966-08-05 | Renault | Dépôts de chrome décoratif résistant à la corrosion |
| US3960674A (en) * | 1974-12-20 | 1976-06-01 | Western Electric Company, Inc. | Method of depositing a metal on a surface comprising an electrically non-conductive ferrite |
| US4375390A (en) * | 1982-03-15 | 1983-03-01 | Anderson Nathaniel C | Thin film techniques for fabricating narrow track ferrite heads |
| JPS62278293A (ja) * | 1986-05-26 | 1987-12-03 | C Uyemura & Co Ltd | 電子部品の製造方法 |
| JPH0760769B2 (ja) * | 1987-12-18 | 1995-06-28 | 松下電器産業株式会社 | 複合インダクタンス素子 |
| JP2794311B2 (ja) * | 1989-11-21 | 1998-09-03 | ティーディーケイ株式会社 | インピーダンス素子 |
| JP3251370B2 (ja) * | 1992-03-31 | 2002-01-28 | ティーディーケイ株式会社 | 複合積層部品用非磁性フェライトおよび複合積層部品とその製造方法 |
-
1996
- 1996-12-23 DE DE1996607130 patent/DE69607130T2/de not_active Expired - Fee Related
- 1996-12-23 EP EP19960309396 patent/EP0785296B1/de not_active Expired - Lifetime
-
1997
- 1997-01-06 JP JP9000038A patent/JPH09310194A/ja active Pending
- 1997-01-07 MX MX9700180A patent/MX9700180A/es unknown
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US11835307B2 (en) | 2019-04-12 | 2023-12-05 | Rheem Manufacturing Company | Applying coatings to the interior surfaces of heat exchangers |
Also Published As
| Publication number | Publication date |
|---|---|
| DE69607130T2 (de) | 2000-10-19 |
| EP0785296A1 (de) | 1997-07-23 |
| DE69607130D1 (de) | 2000-04-20 |
| MX9700180A (es) | 1997-12-31 |
| JPH09310194A (ja) | 1997-12-02 |
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