EP0775570A2 - Appareil de modelage par photosolidification avec exposition d'intensité homogène sur la surface exposée - Google Patents

Appareil de modelage par photosolidification avec exposition d'intensité homogène sur la surface exposée Download PDF

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Publication number
EP0775570A2
EP0775570A2 EP96308436A EP96308436A EP0775570A2 EP 0775570 A2 EP0775570 A2 EP 0775570A2 EP 96308436 A EP96308436 A EP 96308436A EP 96308436 A EP96308436 A EP 96308436A EP 0775570 A2 EP0775570 A2 EP 0775570A2
Authority
EP
European Patent Office
Prior art keywords
light
photo
modeling apparatus
exposing
liquid
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
EP96308436A
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German (de)
English (en)
Other versions
EP0775570A3 (fr
Inventor
Seiji Hayano
Takeo Nakagawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
CMET Inc
RIKEN Institute of Physical and Chemical Research
Original Assignee
CMET Inc
RIKEN Institute of Physical and Chemical Research
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Publication date
Application filed by CMET Inc, RIKEN Institute of Physical and Chemical Research filed Critical CMET Inc
Publication of EP0775570A2 publication Critical patent/EP0775570A2/fr
Publication of EP0775570A3 publication Critical patent/EP0775570A3/fr
Withdrawn legal-status Critical Current

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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C64/00—Additive manufacturing, i.e. manufacturing of three-dimensional [3D] objects by additive deposition, additive agglomeration or additive layering, e.g. by 3D printing, stereolithography or selective laser sintering
    • B29C64/10—Processes of additive manufacturing
    • B29C64/106—Processes of additive manufacturing using only liquids or viscous materials, e.g. depositing a continuous bead of viscous material
    • B29C64/124—Processes of additive manufacturing using only liquids or viscous materials, e.g. depositing a continuous bead of viscous material using layers of liquid which are selectively solidified
    • B29C64/129—Processes of additive manufacturing using only liquids or viscous materials, e.g. depositing a continuous bead of viscous material using layers of liquid which are selectively solidified characterised by the energy source therefor, e.g. by global irradiation combined with a mask

Definitions

  • This invention relates to a photo-solidification modeling apparatus which is disclosed in an article titled "Automatic method for fabricating a three-dimensional plastic model with photo-hardening polymer", Rev. Sci. Instrum. 52(11), Nov. 1981.
  • a process of exposing a desired region of a liquid photo-hardening polymer surface to a light is repeatedly performed.
  • a method of controlling a spot light beam radiation position in the X- and Y-axis directions is mainly used.
  • the spot beam radiation type has a disadvantage that the light exposure time per liquid surface is increased.
  • the technique of Japanese Laid-Open Patent Publication No. 1-263031 has been proposed.
  • a liquid-crystal panel is disposed above the liquid surface, and a transparent region and an opaque region of the liquid-crystal panel are controlled to define the light exposure region.
  • surface type light exposure is performed, so that the light exposure time required per liquid surface is reduced.
  • the thickness as solidified may be varied, or the solidified object may be distorted. Thus, it is required to have a sufficiently uniform exposure intensity distribution.
  • an object of the present invention to provide a surface exposure type photo-solidification modeling apparatus in which the exposure intensity distribution in the surface is uniform.
  • a photo-solidification modeling apparatus of an intensity homogenized surface exposure type which comprises a device for exposing a desired region of a surface of a photo-solidifying liquid to a light, a device for moving a solidified layer which has been exposed to the light by the exposing device and solidified, away from the liquid surface, and a device for repeating the light exposure by the exposing device and the movement by the moving device, the exposing device including a light source, a device for homogenizing the intensity distribution of the light emitted from the light source, and a device for projecting an image on the liquid surface by the light emitted from the light source.
  • the liquid surface is exposed to the light in a state of a uniform intensity distribution of the light emitted from the light source.
  • the inconveniences that the solidification thickness is varied, or that the solidified object is distorted, can be prevented.
  • FIG. 1 shows a photo-solidification modeling apparatus according to a first embodiment of the present invention.
  • the apparatus includes a tank 7 having an open top and adapted to store a photo-solidifying liquid 10 therein.
  • a Z-table 8 is vertically movable in the tank 7.
  • the apparatus also includes a laser generator 1, a mirror 2, and a beam homogenizer 3.
  • a laser beam emitted from the laser generator 1 has a Gaussian distribution as shown in graph (1) in FIG. 1.
  • the ordinate shows a beam intensity
  • the abscissa a distance within the A-B section.
  • the beam homogenizer 3 homogenizes the light intensity distribution of the laser beam, and, for example, a rod homogenizer manufactured by Sigma Koki Co., Ltd. is suitably used.
  • This homogenizer comprises a glass rod, and by utilizing the action of inner reflection at the peripheral surface of the rod, an output beam intensity in the periphery where the input beam intensity is small, is increased. As a result, the intensity distribution of the output laser beam is sufficiently homogenized.
  • the output laser beam of which intensity distribution has been homogenized is expanded by a beam expander 4.
  • the intensity distribution in the cross section of the expanded laser beam is homogenized as shown in graph (2).
  • the beam thus expanded and having homogenized intensity distribution is incident on a D. M. D. (Digital Micromirror Device) 5.
  • the D. M. D. 5 is constructed by covering a surface of a RAM of CMOS with micromirrors corresponding to each cell. For example, one constructed by covering the surface of 2.3 cm 2 of CMOS with micromirrors of 768 x 576, is available. An angle of each mirror is changed by a write signal to the RAM of CMOS, so that a reflected image can be formed by a signal to each cell.
  • the reflected image formed by the D. M. D. 5 is clearly projected on a liquid surface 10a by a convex lens 6.
  • the surface 10a can be exposed to a light at one time.
  • light exposure and movement of the Z-table 8, as one set of operation are repeated. Consequently, the solid product 9 is fabricated in the tank 7.
  • the intensity distribution in the liquid surface 10a is made uniform by the beam homogenizer 3, thus preventing the problem that the solidification thickness is varied by portions or that the solidifying degree is varied so that the solidified object 9 is distorted.
  • the D. M. D. 5 is adapted to project an image and has no direct influence on the intensity distribution.
  • FIG. 2 shows a photo-solidification modeling apparatus according to a second embodiment of the present invention.
  • an ultraviolet lamp 11 is used instead of the laser generator 1.
  • the beam homogenizer 3 homogenizes the intensity distribution of ultraviolet light emitted from the ultraviolet lamp 11.
  • an image is formed by a liquid crystal panel 12, not by the D. M. D. Therefore, a mirror 15 is used instead of the D. M. D., and the liquid crystal panel 12 is disposed above the liquid surface.
  • the intensity distribution of the light incident on the liquid crystal panel 12 is homogenized by the beam homogenizer 3, so that the same effect with the first embodiment can be obtained.
  • the liquid surface to be irradiated is not limited to the top surface of the liquid, but a bottom or a side surface may be irradiated by using a transparent tank 7.
  • the Z-table 8 is moved upwardly, and in a method of irradiating the side surface, the table is moved laterally.
  • the liquid surface may be changed. In this case, it is possible to take a method of stacking thin liquid films one on another. In this way as well, solidified layers can be moved relative to the liquid surface to be stacked one on another successively.
  • the present invention can be applied to any of the above methods.
  • the invention can eliminate the disadvantage of the method in which the surface is exposed at one time while utilizing the advantage of that method, so that a solid object with high accuracy may be fabricated in a short time.

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Mechanical Engineering (AREA)
  • Optics & Photonics (AREA)
  • Liquid Crystal (AREA)
  • Heating, Cooling, Or Curing Plastics Or The Like In General (AREA)
EP96308436A 1995-11-21 1996-11-21 Appareil de modelage par photosolidification avec exposition d'intensité homogène sur la surface exposée Withdrawn EP0775570A3 (fr)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP302793/95 1995-11-21
JP30279395A JP3556358B2 (ja) 1995-11-21 1995-11-21 均一化された面露光式光硬化造形装置

Publications (2)

Publication Number Publication Date
EP0775570A2 true EP0775570A2 (fr) 1997-05-28
EP0775570A3 EP0775570A3 (fr) 1997-08-20

Family

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Family Applications (1)

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EP96308436A Withdrawn EP0775570A3 (fr) 1995-11-21 1996-11-21 Appareil de modelage par photosolidification avec exposition d'intensité homogène sur la surface exposée

Country Status (2)

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EP (1) EP0775570A3 (fr)
JP (1) JP3556358B2 (fr)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1998006560A1 (fr) * 1996-08-08 1998-02-19 Sri International Appareil de fabrication automatique d'objets tridimensionnels, et procedes d'utilisation associes
WO2001005575A1 (fr) * 1999-07-15 2001-01-25 Edward Jefferson Horne Procede et dispositif de production pour matiere formee polymerisable
DE102014215213A1 (de) 2014-08-01 2015-04-16 BEGO Bremer Goldschlägerei Wilh. Herbst GmbH & Co. KG Stereolithografievorrichtung mit Behälterbaueinheit
DE102014215218A1 (de) 2014-08-01 2016-02-04 BEGO Bremer Goldschlägerei Wilh. Herbst GmbH & Co. KG Stereolithografieeinheit mit homogenisiertem Strahlengang

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3803735B2 (ja) * 1996-02-14 2006-08-02 独立行政法人理化学研究所 リコートと同時に光走査する光固化造形装置
JP4969058B2 (ja) * 2005-05-25 2012-07-04 シーメット株式会社 光学的立体造形装置
EP3613560B1 (fr) * 2018-08-24 2020-07-22 Ivoclar Vivadent AG Procédé de fabrication par dépôt de couches d'un corps moulé par durcissement stéréolithographique de la matière photopolymérisable

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01263031A (ja) 1988-04-15 1989-10-19 Nec Corp ３次元モデル成形機

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62216216A (ja) * 1986-03-18 1987-09-22 Fujitsu Ltd 三日月ビ−ムホモジナイザ−
US4794503A (en) * 1987-09-23 1988-12-27 Fusion Systems Corporation Lamp having improved image resolution
US5026146A (en) * 1989-04-03 1991-06-25 Hug William F System for rapidly producing plastic parts
US5133987A (en) * 1989-10-27 1992-07-28 3D Systems, Inc. Stereolithographic apparatus and method
JP3584942B2 (ja) * 1994-11-15 2004-11-04 Ｊｓｒ株式会社 光造形装置
JPH08192469A (ja) * 1995-01-20 1996-07-30 Ushio Inc 光硬化性樹脂の硬化装置
JPH08313842A (ja) * 1995-05-15 1996-11-29 Nikon Corp 照明光学系および該光学系を備えた露光装置

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01263031A (ja) 1988-04-15 1989-10-19 Nec Corp ３次元モデル成形機

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
"Automatic method for fabricating a three-dimensional plastic model with photo-hardening polymer", REV. SCI., vol. 52, no. 11, November 1981 (1981-11-01)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1998006560A1 (fr) * 1996-08-08 1998-02-19 Sri International Appareil de fabrication automatique d'objets tridimensionnels, et procedes d'utilisation associes
WO2001005575A1 (fr) * 1999-07-15 2001-01-25 Edward Jefferson Horne Procede et dispositif de production pour matiere formee polymerisable
DE102014215213A1 (de) 2014-08-01 2015-04-16 BEGO Bremer Goldschlägerei Wilh. Herbst GmbH & Co. KG Stereolithografievorrichtung mit Behälterbaueinheit
DE102014215218A1 (de) 2014-08-01 2016-02-04 BEGO Bremer Goldschlägerei Wilh. Herbst GmbH & Co. KG Stereolithografieeinheit mit homogenisiertem Strahlengang

Also Published As

Publication number Publication date
JPH09141747A (ja) 1997-06-03
EP0775570A3 (fr) 1997-08-20
JP3556358B2 (ja) 2004-08-18

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