EP0758480A1 - Procede de reticulation par rayonnement de produits en forme de boyaux - Google Patents

Procede de reticulation par rayonnement de produits en forme de boyaux

Info

Publication number
EP0758480A1
EP0758480A1 EP96901683A EP96901683A EP0758480A1 EP 0758480 A1 EP0758480 A1 EP 0758480A1 EP 96901683 A EP96901683 A EP 96901683A EP 96901683 A EP96901683 A EP 96901683A EP 0758480 A1 EP0758480 A1 EP 0758480A1
Authority
EP
European Patent Office
Prior art keywords
electron
strand
accelerator
guiding units
branching device
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
EP96901683A
Other languages
German (de)
English (en)
Inventor
Gerhard Gielenz
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Huber and Suhner AG
Original Assignee
Huber and Suhner AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Huber and Suhner AG filed Critical Huber and Suhner AG
Publication of EP0758480A1 publication Critical patent/EP0758480A1/fr
Withdrawn legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
    • H01B13/00—Apparatus or processes specially adapted for manufacturing conductors or cables
    • H01B13/003—Apparatus or processes specially adapted for manufacturing conductors or cables using irradiation

Definitions

  • the present invention relates to a method for electron beam crosslinking of extrudates according to the preamble of claim 1.
  • the insulated cable is axially rotating, for example, in a single pass through the beam field of an electron accelerator, for example 1 to 3 MeV energy passed through.
  • an electron accelerator for example 1 to 3 MeV energy passed through.
  • the axial rotation of the cable can be omitted by passing the cable through the beam field of the accelerator at least twice, for example the first time with a predetermined surface line above and the second time with this surface line of the cable facing down.
  • the improved use of the beam field also results in an additional increase in the production speed.
  • this method results in an uneven distribution of the radiation dose over the cable circumference with two pronounced maxima on the two outer circular segments of the insulation or the cable sheath, which are irradiated from both sides, with this inhomogeneity in the energy distribution with increasing overall diameter and greater wall thicknesses gets bigger and bigger over the circumference of the cable sheath.
  • FIG. 1 shows a schematic representation of a first variant of a plant for carrying out the method according to the invention
  • FIG. 2 shows a schematic illustration to explain the mode of operation of a pulsed branching device according to the invention
  • FIG. 3 shows a schematic representation of a second variant of a plant for carrying out the method according to the invention.
  • 4 and 5 are schematic representations to explain the operation of a system according to the invention.
  • the systems according to FIGS. 1 and 3 serve to irradiate the insulating sheaths of cables 12 or other strand-like goods, and bring about a so-called radiation-chemical crosslinking of the materials used, which can be, for example, polyolefins, elastomers or other radiation-crosslinkable polymer materials or blends of such materials that are used in the manufacture of cable insulation and sheaths, hoses, pipes and the like can be used.
  • the system according to FIG. 1 comprises a known electron accelerator 1, the beam outlet tube 2 of which is connected to a branching device 3, to which two individual beam guiding units 41, 42 are connected, whereby several such units can also be connected to the device 3 ⁇ nen.
  • the units 41, 42 each comprise a deflection device 51 or 52 and a scanner unit 61 or 62, each of which has a deflection device 71 or 72 for expanding the electron beam and a subsequent scanner 81 or 82.
  • the units 41 and 42 are arranged relative to one another in such a way that the directions of the two electron beams, which reach the product plane through the electron exit window 91 or 92 of the scanners 81, 82, form an angle between 60 ° and 120 °.
  • an electron baffle plate 10 In the area between the exit windows 91 and 92 at the ends of the units 41 and 42 there is an electron baffle plate 10 below the product plane 11, in which the product 12 to be crosslinked is located.
  • the deflection devices 51, 52 are each connected to the branching device 3 via a tube section 121, 122.
  • the beam guiding units 41 and 42 also each have a tube section 131 and 132, respectively, which are inserted between the components 51 and 71 or 52 and 72 in the manner shown in FIG.
  • the exit windows 91 and 92 are located at the ends of the scanners 81 and 82.
  • the electron accelerator 1 together with the branching device 3 generates two beam currents, preferably in the energy range between 0.5 MeV and 5 MeV. If necessary, however, several currents of the same strength can also be generated according to the same principle with an adapted branching device 3.
  • the stream guiding units 41 and 42 direct the currents to two, but possibly also several scanners 81 and 82, respectively.
  • the electrons pass from the electron source 141 through the accelerator tube 151 until they exit from the windows 91, 92 in a high vacuum and are guided through the beam guiding units 41, 42.
  • the scanners 81, 82 are arranged geometrically such that the emitted electron beams irradiate the circumferential product from different sides, preferably in the same plane and with the same beam strength, by using multiple deflection with a radiation field device (product handling) known per se suitable roller and / or roller systems, the product is passed through the radiation zone at least twice at different angles.
  • a radiation field device product handling
  • the main exit axes of the two electron exit windows 91, 92 are preferably in one and the same plane and at an angle of 90 ° to one another.
  • the two scanners 81, 82 can also be in two different planes S, S "(FIG. 5) and at an angle between 60 ° and 120 ° to one another.
  • the branching device 3 comprises a high vacuum chamber with a central inlet flange (16) and two outlet flanges (171; 172), which are arranged in the reverse Y-shape.
  • directly downstream deflection devices analog 51, 52 can bring about a further widening of the angle before the two or more partial flows are directed centrally into the beam guiding units 41, 42 and guided alternately or alternately onto the product level 11 become.
  • the beam chopper 20 according to FIG. 2 is preferably controlled via an AC voltage unit 19 which is synchronized with the control unit 19 'of a pulsed electron source 141 via galvanically isolating means 19 ".
  • the electrons generated in this way are packaged in the accelerator tube 151 accelerated and directed alternately into the beam guiding units 41 or 42 via the branching device with the beam chopper 20.
  • four such successive electron packets are on their way before (E1, E2, E3, E4) and after (E1 ' ( E2 ', E3', E4 ') passing the branching device 3 shown.
  • the frequency of the beam chopper can either be in a low range, for example from 1 to 50 Hz, or in a high range, for example from 500 Hz to 100 kHz, in order to avoid interference or resonance effects with the deflection frequency of the units 71 , 72 (FIG. 1), which operate, for example, at a frequency in the range between 100 and 200 Hz.
  • this branching device can also be operated with a non-pulsed, continuous electron beam, the deflection function of the AC voltage unit 19 then having to be designed such that the time between the two reversal points of the scanned beam, that of the center point, would correspond to the two outlet flanges 171, 172 of the high vacuum chamber, is minimized.
  • the energy loss that is inevitably directed to the vacuum chamber between the two outlet openings must be dissipated by a corresponding design of the wall 21 with a cooling device. In this case, the two units 19 'and 19 "are omitted.
  • the system according to FIG. 3 comprises a known high-voltage part 22 of an electron accelerator in the voltage range from 0.5 MV to 5 MV, which can be arranged either vertically or, as also indicated in the figure, also horizontally (22 * ), and on the latter High-voltage connection 23 is connected to a branching device 24 with two accelerator tubes 151, 152, each of which has an electron source 141 or 142 in the upper end region.
  • the housing of the branching device 24 ' is filled with a suitable insulating medium 27, such as SF5 gas (sulfur hexafluoride).
  • the system according to FIG. 3 has two beam guiding units 41, 42, which are constructed similarly to the units 41, 42 according to FIG. 1, so that similar elements are given the same reference numerals in both figures. This applies in particular to elements 51, 61, 71, 81, 91, 121, 131 and 52, 62, 72, 82, 92, 122, 132.
  • each of the beam guiding units 41 and 42 is connected to the accelerator tubes 151, 152 via an electron focusing device 251, 252, each of which has a deflection device 51 or 52 and a scanner unit 61 or 62.
  • the units 41 and 42 are arranged relative to one another in such a way that the directions of the two electron beams that exit through the electron exit windows 91 and 92 form an angle between 60 ° and 120 °.
  • the focusing devices 251, 252 are each connected to the accelerator tubes 151 and 152 via a tube section 261, 262.
  • the electron exit windows 91 and 92 are located at the ends of the scanners 81 and 82, respectively.
  • the high voltage part 22 together with the electron sources 141, 142 and the accelerator tubes 151, 152 generates two beam currents, preferably in the energy range between 0.5 MeV and 5 MeV. If necessary, however, several approximately equally strong currents can be generated according to the same principle with adapted branching device 24, 24 'and a corresponding number of electron sources and accelerator tubes.
  • the streams are directed to two, but possibly also a plurality of scanners 81, 82 by the beam guiding units 41, 42.
  • the electrons run from the electron sources 141, 142 through the accelerator tubes 151, 152 until they exit the windows 91, 92 in a high vacuum and are guided through the beam guiding units.
  • the windows 91, 92 have the thinnest foils, for example made of aluminum or titanium, according to the prior art.
  • these scanners 81, 82 are arranged geometrically in such a way that, similarly to the embodiment according to FIG. 1, the emitted electron beams irradiate the circulating product from different sides, at the same time, preferably in the same plane and with approximately the same beam strength, in that the product is guided through the radiation zone or product plane 11 at least twice at different angles by multiple deflection.
  • the two-scanner system according to FIG. 3, in which the main exit axes of the two windows 91, 92 are likewise preferably offset in one and the same plane and at an angle of 90 ° to one another, has advantages similar to those Design according to FIG. 1.
  • the two scanners 81, 82 can in principle be in two different planes S, S '(FIG. 5) and at an angle between 60 ° and 120 ° to one another.
  • the deflection devices 51, 52 (FIG. 1 or 3) have a high vacuum chamber, in which the inlet flange and the outlet flange are arranged at an angle corresponding to the desired deflection angle, and two correspondingly designed electromagnets, which are arranged opposite one another from the outside cal coils with cores, which are operated by means of direct voltage and are positioned around the vacuum unit in such a way that the electron beam incident concentrically on the inlet flange is bent in accordance with the geometric deflection radius of the unit and concentrically enters the subsequent high vacuum component 131, 132.
  • FIG. 4 shows a schematic representation of a cable in cross section, the insulating sleeve 28 around a cable core 29 having a thickness D that is only slightly smaller than the necessary penetration distance H of the electron beam E directed by the scanner 81 (FIG. 1 or 3).
  • the scanner 81 FIG. 1 or 3
  • the beam direction of the beam E which preferably forms an angle of 90 ° with the beam direction of the electron beam E.
  • This figure also applies analogously to hoses and pipes.
  • FIG. 5 shows that, according to the invention, the main axes of the scanner units 61 and 62 can be in the same plane of symmetry S, which runs across one and the same zone of the product plane 11.
  • the invention can however, they can also be used in a system in which the main axes of the scanner units 61, 62 'are located in two parallel planes S and S'.
  • Another advantage of the system according to the invention is that the dimensions of the bunker, which is necessary to shield the resulting undesired electromagnetic radiation, are significantly smaller than in systems with two electron accelerators and offset scanners.
  • the systems according to the invention can be operated in an excellent manner, for example in the energy range from 0.5 MeV to 3.0 MeV, with currents in the order of 20 to 100 mA and a beam power of 50 to 250 kW, preferably around 100 to 150 kW.

Landscapes

  • Health & Medical Sciences (AREA)
  • General Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Particle Accelerators (AREA)
  • Heating, Cooling, Or Curing Plastics Or The Like In General (AREA)

Abstract

Pour réticuler, au moyen de faisceaux d'électrons, la gaine isolante d'un câble électrique (12), deux flux de rayonnements sont produits par un accélérateur d'électrons (1). Ces deux flux de rayonnements sont amenés au câble de deux côtés, chacun par une unité de guidage de rayonnements (41, 42), dans des directions perpendiculaires. L'exposition aux rayonnements peut avoir lieu dans le même plan diamétral ou dans la même zone diamétrale du câble (12) et avec la même intensité, sans causer d'échauffement excessif de l'âme du câble. L'installation servant à exécuter la réticulation par faisceaux d'électrons peut comporter un hacheur de faisceaux.
EP96901683A 1995-03-03 1996-02-15 Procede de reticulation par rayonnement de produits en forme de boyaux Withdrawn EP0758480A1 (fr)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
CH613/95 1995-03-03
CH61395 1995-03-03
PCT/CH1996/000052 WO1996027887A1 (fr) 1995-03-03 1996-02-15 Procede de reticulation par rayonnement de produits en forme de boyaux

Publications (1)

Publication Number Publication Date
EP0758480A1 true EP0758480A1 (fr) 1997-02-19

Family

ID=4191073

Family Applications (1)

Application Number Title Priority Date Filing Date
EP96901683A Withdrawn EP0758480A1 (fr) 1995-03-03 1996-02-15 Procede de reticulation par rayonnement de produits en forme de boyaux

Country Status (5)

Country Link
EP (1) EP0758480A1 (fr)
JP (1) JPH09512507A (fr)
CN (1) CN1146822A (fr)
AU (1) AU4618096A (fr)
WO (1) WO1996027887A1 (fr)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20050052082A (en) * 2003-11-29 2005-06-02 Samsung Electronics Co Ltd A composite cooking apparatus
CN101308714B (zh) * 2007-05-17 2010-11-10 上海长顺电梯电缆有限公司 一种低烟无卤阻燃电梯随行电缆的制备方法
CN102231305A (zh) * 2011-04-20 2011-11-02 江苏达胜加速器制造有限公司 一种辐照电缆的方法
CN102290145A (zh) * 2011-06-16 2011-12-21 江苏达胜加速器制造有限公司 一种电缆辐照装置
CN106229082B (zh) * 2016-08-30 2018-01-16 中广核达胜加速器技术有限公司 一种线缆辐照品质保护装置
CN113363017B (zh) * 2021-06-29 2022-11-18 中国核电工程有限公司 一种电缆加工方法及加工系统

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1306742A (en) * 1970-01-16 1973-02-14 British Insulated Callenders Manufacture of high voltage insulated electric conductors
DE3014399A1 (de) * 1980-04-11 1981-10-15 Siemens AG, 1000 Berlin und 8000 München Vorrichtung zurstrahlenvernetzung

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
See references of WO9627887A1 *

Also Published As

Publication number Publication date
CN1146822A (zh) 1997-04-02
JPH09512507A (ja) 1997-12-16
AU4618096A (en) 1996-09-23
WO1996027887A1 (fr) 1996-09-12

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