EP0502303B1 - Process for treating objects with a gas comprising fluor, and apparatus for carrying out the process - Google Patents
Process for treating objects with a gas comprising fluor, and apparatus for carrying out the process Download PDFInfo
- Publication number
- EP0502303B1 EP0502303B1 EP92101160A EP92101160A EP0502303B1 EP 0502303 B1 EP0502303 B1 EP 0502303B1 EP 92101160 A EP92101160 A EP 92101160A EP 92101160 A EP92101160 A EP 92101160A EP 0502303 B1 EP0502303 B1 EP 0502303B1
- Authority
- EP
- European Patent Office
- Prior art keywords
- storage container
- gas
- fluorine
- reaction chamber
- reaction
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 238000000034 method Methods 0.000 title description 4
- 238000006243 chemical reaction Methods 0.000 claims description 39
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 claims description 28
- 229910052731 fluorine Inorganic materials 0.000 claims description 28
- 239000011737 fluorine Substances 0.000 claims description 28
- 230000000903 blocking effect Effects 0.000 claims 1
- 239000007789 gas Substances 0.000 description 14
- 239000003054 catalyst Substances 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 238000011010 flushing procedure Methods 0.000 description 2
- 239000011261 inert gas Substances 0.000 description 2
- 239000012495 reaction gas Substances 0.000 description 2
- 230000003213 activating effect Effects 0.000 description 1
- 239000003570 air Substances 0.000 description 1
- 239000012080 ambient air Substances 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 125000001153 fluoro group Chemical group F* 0.000 description 1
Images
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C9/00—Apparatus or plant for applying liquid or other fluent material to surfaces by means not covered by any preceding group, or in which the means of applying the liquid or other fluent material is not important
- B05C9/08—Apparatus or plant for applying liquid or other fluent material to surfaces by means not covered by any preceding group, or in which the means of applying the liquid or other fluent material is not important for applying liquid or other fluent material and performing an auxiliary operation
- B05C9/10—Apparatus or plant for applying liquid or other fluent material to surfaces by means not covered by any preceding group, or in which the means of applying the liquid or other fluent material is not important for applying liquid or other fluent material and performing an auxiliary operation the auxiliary operation being performed before the application
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D3/00—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials
- B05D3/04—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by exposure to gases
- B05D3/0433—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by exposure to gases the gas being a reactive gas
- B05D3/044—Pretreatment
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C8/00—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals
- C23C8/06—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using gases
Definitions
- the invention relates to a device for treating objects in a gas-tight reaction chamber designed for working under reduced pressure with a fluorine-containing gas, in which a storage container to be kept under negative pressure is provided for setting the required fluorine concentration in the gas.
- a device of the above kind is the subject of US-A-3,998,180.
- the known device has a reaction chamber into which reaction gas can be passed from a storage container.
- the performance of the known system is limited in that after each fluorine treatment, the treatment gas must first be pumped out of the reaction chamber back into the storage container and then the reaction chamber must be ventilated before the treated parts can be removed from it and new parts can be filled in.
- the disposal of the fluorine gas is also complex in the known device, since many valves have to be switched for this purpose.
- US-A-4,994,308 also already shows a device with a reaction chamber which is divided into two areas by a wall, but which are connected to one another in terms of pressure via a passage in the wall.
- this document does not show a storage container for preparing and holding the reaction gas.
- it does not allow a higher output than the device mentioned at the beginning, since parts can only be treated simultaneously in the two areas of the reaction chamber.
- the invention is based on the problem of designing a fluorine treatment plant in such a way that it is as small as possible It is possible to rule out the occurrence of fluorine and which has the highest possible performance.
- a second reaction chamber is provided, the reaction chambers are connected to one another on the inlet side and the outlet side by a line having shut-off devices, that the storage container is arranged between the reaction chambers on the lines and the line on the outlet side has a disposal system connection and that in each case a pressure sensor is arranged on the reaction chambers and the storage container for activating the disposal system.
- Such a device offers very high security against the escape of fluorine with little effort. Leakages lead to the inflow of ambient air into the device and therefore to a very easily detectable reduction in the vacuum.
- the device according to the invention therefore does not require a double-walled reaction chamber.
- the performance of the device is particularly high because two reaction chambers are provided parallel to the storage container. This makes it possible to unload and load or maintain one reaction chamber while pretreatment with fluorine takes place in the other reaction chamber.
- the invention permits numerous embodiments. To further clarify its basic principle, a device designed according to the invention is shown as a circuit diagram in the drawing and is described below.
- two reaction chambers 2, 3 are arranged on both sides of a storage container 1.
- the inputs of the reaction chambers 2, 3 and the input of the storage container 1 are connected to a line 4, via which 5 fluorine or a source 6 can supply inert gas from a fluorine storage container.
- the outlets of the reaction chambers 2, 3 and the outlet of the storage container 1 are also connected to a common line 7.
- the storage container 1 is evacuated to, for example, 0.1 bar using a vacuum pump 8.
- fluorine is allowed to flow into the storage container 1 until a fluorine sensor 9 on the storage container 1 indicates the required fluorine concentration and the fluorine supply is then shut off.
- the pressure in the storage container 1 then rose to 0.2 bar, for example, due to the fluorine supply.
- the objects to be treated are, for example, placed in the reaction chamber 2 and the reaction chamber 2 is then closed in a gastight manner. Subsequently, the reaction chamber 2 is evacuated with the vacuum pump 8 and the gas is pumped from the storage container 1 with the vacuum pump 8 via lines 10, 11 into the reaction chamber 2, so that the fluorine pretreatment can begin in it.
- reaction chamber 3 can already be filled with objects to be treated and evacuated by means of a vacuum pump 12.
- the gas is pumped back into the storage container 1 with the vacuum pump 8. This is followed by a flushing process with inert gas from the source 6.
- the flushing gas with fluorine residues is fed from the vacuum pump 8 to a disposal system 13 which has a catalyst 14 and a gas scrubber 15.
- a further vacuum pump 16 is connected behind the disposal system 13, which ensures that there is negative pressure in the entire system even during disposal.
- the flushed and therefore fluorine-free reaction chamber 2 can be vented and opened after being disconnected from the source 6 and the vacuum pump 8.
- the fluorine concentration reduced by reactions with the objects to be treated and residual air in the reaction chambers 2, 3 can be raised again to the required value and the gas can then be closed and evacuated by means of the vacuum pump Pump 12 into the reaction chamber 3.
- the required supply of fluorine in the storage container 1 necessarily reduces the negative pressure in the storage container 1.
- Pressure sensors 17, 18, 19 in the reaction chambers 2, 3 and the storage container 1 respond as soon as the negative pressure reaches a value of, for example, 0.9 bar has decreased.
- all the fluorine-containing gas is disposed of from the plant via the disposal plant 13 and mixed again in the storage container 1 fluorine-containing gas with the correct fluorine concentration and a vacuum of 0.2 bar.
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Treating Waste Gases (AREA)
- Processing Of Solid Wastes (AREA)
- Physical Or Chemical Processes And Apparatus (AREA)
Description
Die Erfindung betrifft eine Vorrichtung zur Behandlung von Gegenständen in einer zum Arbeiten unter Unterdruck ausgelegten, gasdichten Reaktionskammer mit einem Fluor enthaltenden Gas, bei der ein unter Unterdruck zu haltender Speicherbehälter zur Einstellung der erforderlichen Fluorkonzentration in dem Gas vorgesehen ist.The invention relates to a device for treating objects in a gas-tight reaction chamber designed for working under reduced pressure with a fluorine-containing gas, in which a storage container to be kept under negative pressure is provided for setting the required fluorine concentration in the gas.
Eine Vorrichtung der vorstehenden Art ist Gegenstand der US-A-3,998,180. Die bekannte Vorrichtung hat eine Reaktionskammer, in welche aus einem Speicherbehälter Reaktionsgas geleitet werden kann. Die Leistung der bekannten Anlage ist dadurch begrenzt, daß nach jeder Fluorbehandlung das Behandlungsgas zunächst aus der Reaktionskammer zurück in den Speicherbehälter gepumpt und dann die Reaktionskammer belüftet werden muß, bevor die behandelten Teile ihr entnommen und neue Teile eingefüllt werden können. Auch die Entsorgung des Fluorgases ist bei der bekannten Vorrichtung aufwendig, da hierzu viele Ventile geschaltet werden müssen.A device of the above kind is the subject of US-A-3,998,180. The known device has a reaction chamber into which reaction gas can be passed from a storage container. The performance of the known system is limited in that after each fluorine treatment, the treatment gas must first be pumped out of the reaction chamber back into the storage container and then the reaction chamber must be ventilated before the treated parts can be removed from it and new parts can be filled in. The disposal of the fluorine gas is also complex in the known device, since many valves have to be switched for this purpose.
Die US-A-4,994,308 zeigt auch schon eine Vorrichtung mit einer Reaktionskammer, welche durch eine Wand in zwei Bereiche unterteilt ist, die jedoch über einen Durchlaß in der Wand druckmäßig miteinander Verbindung haben. Diese Schrift zeigt jedoch keinen Speicherbehälter zum Zubereiten und Bereithalten des Reaktionsgases. Weiterhin erlaubt sie keine höhere Leistung als die eingangs genannte Vorrichtung, da in den beiden Bereichen der Reaktionskammer Teile nur gleichzeitig behandelt werden können.US-A-4,994,308 also already shows a device with a reaction chamber which is divided into two areas by a wall, but which are connected to one another in terms of pressure via a passage in the wall. However, this document does not show a storage container for preparing and holding the reaction gas. Furthermore, it does not allow a higher output than the device mentioned at the beginning, since parts can only be treated simultaneously in the two areas of the reaction chamber.
Der Erfindung liegt das Problem zugrunde, eine Fluorbehandlungsanlage so zu gestalten, daß mit möglichst geringem Aufwand ein Austreten von Fluor ausgeschlossen werden kann und die eine möglichst hohe Leistung hat.The invention is based on the problem of designing a fluorine treatment plant in such a way that it is as small as possible It is possible to rule out the occurrence of fluorine and which has the highest possible performance.
Dieses Problem wird erfindungsgemäß dadurch gelöst, daß zusätzlich zu der Reaktionskammer eine zweite Reaktionskammer vorgesehen ist, daß die Reaktionskammern eingangsseitig und ausgangsseitig durch jeweils eine Absperrorgane aufweisende Leitung miteinander verbunden sind, daß zwischen den Reaktionskammern an den Leitungen der Speicherbehälter angeordnet ist und die ausgangsseitige Leitung mit einer Entsorgungsanlage Verbindung hat und daß zur Aktivierung der Entsorgungsanlage an den Reaktionskammern und dem Speicherbehälter jeweils ein Drucksensor angeordnet ist.This problem is solved according to the invention in that, in addition to the reaction chamber, a second reaction chamber is provided, the reaction chambers are connected to one another on the inlet side and the outlet side by a line having shut-off devices, that the storage container is arranged between the reaction chambers on the lines and the line on the outlet side has a disposal system connection and that in each case a pressure sensor is arranged on the reaction chambers and the storage container for activating the disposal system.
Eine solche Vorrichtung bietet mit geringem Aufwand eine sehr große Sicherheit gegen das Austreten von Fluor. Undichtigkeiten führen zu einem Einströmen von Umgebungsluft in die Vorrichtung und daher zu einer sehr leicht feststellbaren Verminderung des Unterdruckes. Die erfindungsgemäße Vorrichtung benötigt deshalb keine doppelwandige Reaktionskammer.Such a device offers very high security against the escape of fluorine with little effort. Leakages lead to the inflow of ambient air into the device and therefore to a very easily detectable reduction in the vacuum. The device according to the invention therefore does not require a double-walled reaction chamber.
Auch bei der Entsorgung der Vorrichtung stehen alle Apparateteile und Leitungen unter Unterdruck, weil hinter der Gasentsorgungsanlage eine Vakuumpumpe zum Absaugen des Gases aus der Reaktionskammer und/oder dem Speicherbehälter bei zu geringem Unterdruck in der Reaktionskammer und/oder dem Speicherbehälter vorgesehen ist.Even when disposing of the device, all parts of the apparatus and lines are under negative pressure, because a vacuum pump is provided behind the gas disposal system for drawing off the gas from the reaction chamber and / or the storage container if the vacuum in the reaction chamber and / or the storage container is too low.
Die Leistung der Vorrichtung ist besonders hoch, weil parallel zum Speicherbehälter zwei Reaktionskammern vorgesehen sind. Dadurch ist es möglich, eine Reaktionskammer zu entladen und zu beschicken oder zu warten, während in der anderen Reaktionskammer die Vorbehandlung mit Fluor stattfindet.The performance of the device is particularly high because two reaction chambers are provided parallel to the storage container. This makes it possible to unload and load or maintain one reaction chamber while pretreatment with fluorine takes place in the other reaction chamber.
Die Erfindung läßt zahlreiche Ausführungsformen zu. Zur weiteren Verdeutlichung ihre Grundprinzips ist in der Zeichnung eine erfindungsgemäß gestaltete Vorrichtung als Schaltplan dargestellt und wird nachfolgend beschrieben.The invention permits numerous embodiments. To further clarify its basic principle, a device designed according to the invention is shown as a circuit diagram in the drawing and is described below.
Im Schaltplan sind zu beiden Seiten eines Speicherbehälters 1 zwei Reaktionskammern 2, 3 angeordnet. Die Eingänge der Reaktionskammern 2, 3 und der Eingang des Speicherbehälters 1 sind an eine Leitung 4 angeschlossen, über die von einem Fluor-Vorratsbehälter 5 Fluor oder von einer Quelle 6 Inertgas zugeführt werden kann.In the circuit diagram, two
Auch die Auslässe der Reaktionskammern 2, 3 und der Auslaß des Speicherbehälters 1 sind an eine gemeinsame Leitung 7 angeschlossen. Zu Beginn des Verfahrens wird mit einer Vakuumpumpe 8 der Speicherbehälter 1 auf beispielsweise 0,1 bar evakuiert. Dann läßt man in den Speicherbehälter 1 so lange Fluor strömen, bis ein Fluorsensor 9 am Speicherbehälter 1 die erforderliche Fluorkonzentration anzeigt und sperrt dann die Fluorzufuhr ab. Der Druck im Speicherbehälter 1 ist dann durch die Fluorzufuhr auf beispielsweise 0,2 bar angestiegen.The outlets of the
Gleichzeitig zu diesen Arbeiten oder auch zuvor oder danach werden beispielsweise in die Reaktionskammer 2 die zu behandelnden Gegenstände eingeräumt und die Reaktionskammer 2 dann gasdicht verschlossen. Anschließend evakuiert man mit der Vakuumpumpe 8 die Reaktionskammer 2 und pumpt das Gas aus dem Speicherbehälter 1 mit der Vakuumpumpe 8 über Leitungen 10, 11 in die Reaktionskammer 2, so daß in ihr die Fluorvorbehandlung beginnen kann.Simultaneously to this work or also before or after, the objects to be treated are, for example, placed in the
Während der Fluorvorbehandlung kann man schon die Reaktionskammer 3 mit zu behandelnden Gegenständen füllen und mittels einer Vakuumpumpe 12 evakuieren.During the fluorine pretreatment, the
Ist die Fluorvorbehandlung in der Reaktionskammer 2 abgeschlossen, dann pumpt man mit der Vakuumpumpe 8 das Gas zurück in den Speicherbehälter 1. Danach erfolgt ein Spülvorgang mit Inertgas von der Quelle 6. Das Spülgas mit Fluorresten wird von der Vakuumpumpe 8 einer Entsorgungsanlage 13 zugeführt, die einen Katalysator 14 und einen Gaswäscher 15 aufweist. Hinter der Entsorgungsanlage 13 ist eine weitere Vakuumpumpe 16 geschaltet, die dafür sorgt, daß auch bei der Entsorgung im gesamten System Unterdruck herrscht. Die gespülte und deshalb fluorfreie Reaktionskammer 2 kann nach dem Abtrennen von der Quelle 6 und der Vakuumpumpe 8 belüftet und geöffnet werden.When the fluorine pretreatment in the
Durch erneute Zufuhr von Fluor in den Speicherbehälter 1 kann man die durch Reaktionen mit den zu behandelnden Gegenständen und Luftresten in den Reaktionskammern 2, 3 herabgesetzte Fluorkonzentration wieder auf den erforderlichen Wert anheben und das Gas dann nach dem Verschließen und Evakuieren der Reaktionskammer 3 mittels der Vakuumpumpe 12 in die Reaktionskammer 3 pumpen.By re-supplying fluorine into the storage container 1, the fluorine concentration reduced by reactions with the objects to be treated and residual air in the
Durch die erforderliche Fluorzufuhr in den Speicherbehälter 1 vermindert sich notwendigerweise der Unterdruck im Speicherbehälter 1. Drucksensoren 17, 18, 19 an den Reaktionskammern 2, 3 und dem Speicherbehälter 1 sprechen an, sobald der Unterdruck sich bis zu einem Wert von beispielsweise 0,9 bar vermindert hat. Dann wird das gesamte, Fluor enthaltende Gas aus der Anlage über die Entsorgungsanlage 13 entsorgt und erneut in dem Speicherbehälter 1 fluorhaltiges Gas mit der richtigen Fluorkonzentration und einem Unterdruck von 0,2 bar gemischt.The required supply of fluorine in the storage container 1 necessarily reduces the negative pressure in the storage container 1.
- 11
- SpeicherbehälterStorage tank
- 22nd
- ReaktionskammerReaction chamber
- 33rd
- ReaktionskammerReaction chamber
- 44th
- Leitungmanagement
- 55
- FluorvorratsbehälterFluorine storage container
- 66
- Quellesource
- 77
- Leitungmanagement
- 88th
- VakuumpumpeVacuum pump
- 99
- FluorsensorFluorine sensor
- 1010th
- Leitungmanagement
- 1111
- Leitungmanagement
- 1212th
- VakuumpumpeVacuum pump
- 1313
- EntsorgungsanlageDisposal facility
- 1414
- Katalysatorcatalyst
- 1515
- GaswäscherGas scrubber
- 1616
- VakuumpumpeVacuum pump
- 1717th
- DrucksensorPressure sensor
- 1818th
- DrucksensorPressure sensor
- 1919th
- DrucksensorPressure sensor
Claims (1)
- Device for treating articles in a gas-tight reaction chamber (2) designed to operate under vacuum with a fluorine-containing gas, in which a storage container (1) which is to be kept under vacuum is provided in order to adjust the necessary fluorine concentration in the gas, characterised in that a second reaction chamber (3) is provided in addition to the reaction chamber (2), in that the reaction chambers (2, 3) are connected to one another on the inlet side and outlet side by a respective pipe (7, 4) having blocking members, in that the storage container (1) is arranged between the reaction chambers (2, 3) on the lines (7, 4) and the outlet-side line (7) is connected to a discharge arrangement (13) and in that a respective pressure sensor (17, 18, 19) is arranged on the reaction chambers (2, 3) and the storage container (1) to activate the discharge arrangement (13).
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE4105179 | 1991-02-20 | ||
| DE4105179A DE4105179A1 (en) | 1991-02-20 | 1991-02-20 | METHOD FOR THE TREATMENT OF OBJECTS WITH A GAS CONTAINING FLUOR, AND DEVICE FOR ITS IMPLEMENTATION |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| EP0502303A1 EP0502303A1 (en) | 1992-09-09 |
| EP0502303B1 true EP0502303B1 (en) | 1995-05-31 |
Family
ID=6425421
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| EP92101160A Expired - Lifetime EP0502303B1 (en) | 1991-02-20 | 1992-01-24 | Process for treating objects with a gas comprising fluor, and apparatus for carrying out the process |
Country Status (3)
| Country | Link |
|---|---|
| EP (1) | EP0502303B1 (en) |
| DE (2) | DE4105179A1 (en) |
| ES (1) | ES2073194T3 (en) |
Families Citing this family (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE4304792A1 (en) * | 1993-02-17 | 1994-08-18 | Moeller Bernd | Process for treating the surface of objects |
| ES2115799T3 (en) * | 1993-06-19 | 1998-07-01 | Fluor Tech Sys Gmbh | PROCEDURE FOR THE PRE-TREATMENT OF SURFACES TO BE VARNISHED OF PIECES OF SYNTHETIC MATERIAL. |
| DE4320388A1 (en) * | 1993-06-19 | 1994-12-22 | Ahlbrandt System Gmbh | Process for the pretreatment of plastic part surfaces to be painted |
| GB9319408D0 (en) * | 1993-09-20 | 1993-11-03 | Avondale Property Holdings Ltd | Extrusion of laminate pipes |
| GB2309663B (en) * | 1993-09-20 | 1998-02-18 | Avondale Property | Extrusion of laminate pipes |
| DE19527883A1 (en) * | 1995-07-29 | 1997-01-30 | Fluor Tech Sys Gmbh | Coating for electrically non-conducting plastic, e.g.polypropylene - comprises fluorination during pretreatment stage, followed by electrostatic spray lacquering |
| DE19731771A1 (en) * | 1997-07-24 | 1999-01-28 | Bultykhanova Natalia | Sealing plastic containers, especially fuel tanks |
| US6462142B1 (en) * | 1999-11-03 | 2002-10-08 | Air Products And Chemicals, Inc. | Processes for improved surface properties incorporating compressive heating of reactive gases |
Family Cites Families (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| BE789562A (en) * | 1971-09-30 | 1973-01-15 | Air Prod & Chem | IMPROVEMENT OF POLYESTER MATERIALS |
| CA1074509A (en) * | 1974-12-12 | 1980-04-01 | Air Products And Chemicals | Fluorinated polyester tire reinforcement materials |
| US3998180A (en) * | 1975-04-07 | 1976-12-21 | Union Carbide Corporation | Vapor deposition apparatus including fluid transfer means |
| US4237156A (en) * | 1978-11-17 | 1980-12-02 | Phillips Petroleum Company | Fluorinated poly(arylene sulfides) |
| US4296151A (en) * | 1978-12-12 | 1981-10-20 | Phillips Petroleum Company | Fluorinated polymeric surfaces |
| US4467075A (en) * | 1983-08-05 | 1984-08-21 | Union Carbide Corporation | Surface treatment of a solid polymeric material with a reactive gas |
| US4576837A (en) * | 1985-03-19 | 1986-03-18 | Tarancon Corporation | Method of treating surfaces |
| DE8703823U1 (en) * | 1987-03-13 | 1987-04-23 | Lohmann Gmbh & Co Kg, 5450 Neuwied | Device for continuous surface treatment of web-shaped plastic material with gaseous fluorine |
| US4994308A (en) * | 1988-05-31 | 1991-02-19 | Tarancon Corporation | Direct fluorination of polymeric materials by using dioxifluorine fluid (mixture of CO2 and F2) |
-
1991
- 1991-02-20 DE DE4105179A patent/DE4105179A1/en not_active Withdrawn
-
1992
- 1992-01-24 EP EP92101160A patent/EP0502303B1/en not_active Expired - Lifetime
- 1992-01-24 ES ES92101160T patent/ES2073194T3/en not_active Expired - Lifetime
- 1992-01-24 DE DE59202375T patent/DE59202375D1/en not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| ES2073194T3 (en) | 1995-08-01 |
| EP0502303A1 (en) | 1992-09-09 |
| DE4105179A1 (en) | 1992-08-27 |
| DE59202375D1 (en) | 1995-07-06 |
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