EP0390338A1 - Méthode pour fabriquer un substrat pour une tête d'enregistrement à jet liquide - Google Patents
Méthode pour fabriquer un substrat pour une tête d'enregistrement à jet liquide Download PDFInfo
- Publication number
- EP0390338A1 EP0390338A1 EP90302165A EP90302165A EP0390338A1 EP 0390338 A1 EP0390338 A1 EP 0390338A1 EP 90302165 A EP90302165 A EP 90302165A EP 90302165 A EP90302165 A EP 90302165A EP 0390338 A1 EP0390338 A1 EP 0390338A1
- Authority
- EP
- European Patent Office
- Prior art keywords
- recording head
- substrate
- jet recording
- ink
- electro
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000000758 substrate Substances 0.000 title claims abstract description 34
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 19
- 239000007788 liquid Substances 0.000 title claims description 53
- 239000011241 protective layer Substances 0.000 claims abstract description 44
- 238000000034 method Methods 0.000 claims abstract description 33
- 239000011148 porous material Substances 0.000 claims abstract description 20
- 239000000463 material Substances 0.000 claims abstract description 12
- 230000001681 protective effect Effects 0.000 claims abstract description 10
- 230000008093 supporting effect Effects 0.000 claims abstract description 7
- 239000010410 layer Substances 0.000 claims description 30
- 239000000945 filler Substances 0.000 claims description 19
- 239000011810 insulating material Substances 0.000 claims description 11
- 238000005520 cutting process Methods 0.000 claims description 9
- 238000005530 etching Methods 0.000 claims description 7
- 239000000126 substance Substances 0.000 claims description 4
- 239000000976 ink Substances 0.000 description 55
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 34
- 238000007599 discharging Methods 0.000 description 19
- 239000010408 film Substances 0.000 description 19
- 229910052681 coesite Inorganic materials 0.000 description 17
- 229910052906 cristobalite Inorganic materials 0.000 description 17
- 239000000377 silicon dioxide Substances 0.000 description 17
- 235000012239 silicon dioxide Nutrition 0.000 description 17
- 229910052682 stishovite Inorganic materials 0.000 description 17
- 229910052905 tridymite Inorganic materials 0.000 description 17
- 239000000428 dust Substances 0.000 description 14
- 230000000875 corresponding effect Effects 0.000 description 12
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 8
- 230000007547 defect Effects 0.000 description 7
- 230000000694 effects Effects 0.000 description 6
- MGWGWNFMUOTEHG-UHFFFAOYSA-N 4-(3,5-dimethylphenyl)-1,3-thiazol-2-amine Chemical compound CC1=CC(C)=CC(C=2N=C(N)SC=2)=C1 MGWGWNFMUOTEHG-UHFFFAOYSA-N 0.000 description 5
- 230000008859 change Effects 0.000 description 5
- JCXJVPUVTGWSNB-UHFFFAOYSA-N nitrogen dioxide Inorganic materials O=[N]=O JCXJVPUVTGWSNB-UHFFFAOYSA-N 0.000 description 5
- 229910052782 aluminium Inorganic materials 0.000 description 4
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 4
- 230000008569 process Effects 0.000 description 4
- 229910000077 silane Inorganic materials 0.000 description 4
- 238000004544 sputter deposition Methods 0.000 description 4
- 230000009471 action Effects 0.000 description 3
- 238000009835 boiling Methods 0.000 description 3
- 238000010276 construction Methods 0.000 description 3
- 230000007797 corrosion Effects 0.000 description 3
- 238000005260 corrosion Methods 0.000 description 3
- 239000007787 solid Substances 0.000 description 3
- LTPBRCUWZOMYOC-UHFFFAOYSA-N Beryllium oxide Chemical compound O=[Be] LTPBRCUWZOMYOC-UHFFFAOYSA-N 0.000 description 2
- 229910003862 HfB2 Inorganic materials 0.000 description 2
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 2
- 238000009825 accumulation Methods 0.000 description 2
- 238000004140 cleaning Methods 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- 239000004020 conductor Substances 0.000 description 2
- 238000001704 evaporation Methods 0.000 description 2
- 230000008020 evaporation Effects 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 238000009413 insulation Methods 0.000 description 2
- 230000007774 longterm Effects 0.000 description 2
- 238000000206 photolithography Methods 0.000 description 2
- 238000011084 recovery Methods 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- 229910017083 AlN Inorganic materials 0.000 description 1
- 229910011255 B2O3 Inorganic materials 0.000 description 1
- 239000004642 Polyimide Substances 0.000 description 1
- 229910052581 Si3N4 Inorganic materials 0.000 description 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 230000008901 benefit Effects 0.000 description 1
- 230000008033 biological extinction Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 239000003086 colorant Substances 0.000 description 1
- 229910052593 corundum Inorganic materials 0.000 description 1
- JKWMSGQKBLHBQQ-UHFFFAOYSA-N diboron trioxide Chemical compound O=BOB=O JKWMSGQKBLHBQQ-UHFFFAOYSA-N 0.000 description 1
- 238000005755 formation reaction Methods 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 238000001182 laser chemical vapour deposition Methods 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 229910003465 moissanite Inorganic materials 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 238000000059 patterning Methods 0.000 description 1
- 239000012466 permeate Substances 0.000 description 1
- 239000012071 phase Substances 0.000 description 1
- 238000001020 plasma etching Methods 0.000 description 1
- 229920001721 polyimide Polymers 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 230000004044 response Effects 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 229910010271 silicon carbide Inorganic materials 0.000 description 1
- PBCFLUZVCVVTBY-UHFFFAOYSA-N tantalum pentoxide Inorganic materials O=[Ta](=O)O[Ta](=O)=O PBCFLUZVCVVTBY-UHFFFAOYSA-N 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 229910052718 tin Inorganic materials 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
- ZNOKGRXACCSDPY-UHFFFAOYSA-N tungsten(VI) oxide Inorganic materials O=[W](=O)=O ZNOKGRXACCSDPY-UHFFFAOYSA-N 0.000 description 1
- 239000012808 vapor phase Substances 0.000 description 1
- 229910001845 yogo sapphire Inorganic materials 0.000 description 1
Images
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/14—Structure thereof only for on-demand ink jet heads
- B41J2/14016—Structure of bubble jet print heads
- B41J2/14088—Structure of heating means
- B41J2/14112—Resistive element
- B41J2/14129—Layer structure
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/16—Production of nozzles
- B41J2/1601—Production of bubble jet print heads
- B41J2/1603—Production of bubble jet print heads of the front shooter type
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/16—Production of nozzles
- B41J2/1601—Production of bubble jet print heads
- B41J2/1604—Production of bubble jet print heads of the edge shooter type
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/16—Production of nozzles
- B41J2/1621—Manufacturing processes
- B41J2/1626—Manufacturing processes etching
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/16—Production of nozzles
- B41J2/1621—Manufacturing processes
- B41J2/1626—Manufacturing processes etching
- B41J2/1628—Manufacturing processes etching dry etching
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/16—Production of nozzles
- B41J2/1621—Manufacturing processes
- B41J2/1632—Manufacturing processes machining
- B41J2/1634—Manufacturing processes machining laser machining
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/16—Production of nozzles
- B41J2/1621—Manufacturing processes
- B41J2/164—Manufacturing processes thin film formation
- B41J2/1642—Manufacturing processes thin film formation thin film formation by CVD [chemical vapor deposition]
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/16—Production of nozzles
- B41J2/1621—Manufacturing processes
- B41J2/164—Manufacturing processes thin film formation
- B41J2/1643—Manufacturing processes thin film formation thin film formation by plating
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/16—Production of nozzles
- B41J2/1621—Manufacturing processes
- B41J2/164—Manufacturing processes thin film formation
- B41J2/1645—Manufacturing processes thin film formation thin film formation by spincoating
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/16—Production of nozzles
- B41J2/1621—Manufacturing processes
- B41J2/164—Manufacturing processes thin film formation
- B41J2/1646—Manufacturing processes thin film formation thin film formation by sputtering
Definitions
- the liquid jet recording method disclosed in the above Gazzette can not only be very effectively applied to the so-called drop-on demand recording method, but also can be easily realized by providing the recording head unit with highly dense multiple orifices over the full line width thereof corresponding to the recording region of the recorded member and therefore, has an advantage that images of high resolution and high quality can be obtained at a high speed.
- the heat generating resistance layer 107 and electrodes 103 and 104 are patterned into a predetermined shape by etching. That is, in the other portions than the portion being constituted the heat generating region 102, they are patterned almost into one and the same shape, and in the portion, being constituted the heat generating region 102, the electrodes are not laminated on the heat generating resistance layer 107, but the heat generating resistance layer 107 constitutes a heat generating portion 111.
- the first upper protective layer 108 and the third upper protective layer 110 are laminated over the whole surface of the base plate 101, while the second upper protective layer 109 is patterned so as not to be laminated on the heat generating region 102.
- the third protective layer 110 is in contact with ink, and with regard to the defects of the film forming these layers, care must be particularly taken of insulativeness or the like.
- Pin-holes and dust in the film may be mentioned as the defects of the film, and with regard to pin-holes, for example, as shown in JP Laid-Open Patent Application No. 60-157872 (corresponding USP 4777494), could be dissolved by anode-oxidizing the ground of the film portion, but the entry of dust into the film could not be sufficiently dissolved.
- Another object of the present invention is to eliminate the problems as noted above and to provide a method of manufacturing a substrate for a liquid jet recording head which is free of the possibility of recording liquid permeating from a recess created by the short-circuited wiring portion of electrodes being cut to thereby corrode the wiring and which is high in reliability, a substrate manufactured by the method, a liquid jet recording head using the substrate, and a liquid jet recording apparatus having the head.
- the present invention brings about excellent effects particularly in a recording head, recording device of the bubble jet system among the ink jet recording system.
- any ink which is solid or softened at room temperature may also be used in the present invention.
- the ink jet recording apparatus it is a common practice to control the temperature of ink itself within a range of 30 to 70 °C, thus adjusting the viscosity of the ink to be within the stable ejection range. Accordingly any ink which is liquid upon applying a recording signal may be used. Furthermore, any ink which is liquefied upon application of thermal energy may also be used in the present invention.
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Particle Formation And Scattering Control In Inkjet Printers (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
EP93201057A EP0559295B1 (fr) | 1989-03-01 | 1990-02-28 | Méthode pour fabriquer un substrat pour une tête d'enregistrement à jet liquide |
Applications Claiming Priority (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP48839/89 | 1989-03-01 | ||
JP4883989A JPH02227255A (ja) | 1989-03-01 | 1989-03-01 | 液体噴射記録ヘッド用基体の製造方法およびその方法により製造された基体、並びにその基体を用いた液体噴射記録ヘッド |
JP48838/89 | 1989-03-01 | ||
JP4883889A JP2659238B2 (ja) | 1989-03-01 | 1989-03-01 | インクジェット記録ヘッド、該ヘッド用基体および該基体の製造方法 |
Related Child Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
EP93201057.2 Division-Into | 1990-02-28 |
Publications (2)
Publication Number | Publication Date |
---|---|
EP0390338A1 true EP0390338A1 (fr) | 1990-10-03 |
EP0390338B1 EP0390338B1 (fr) | 1994-12-07 |
Family
ID=26389165
Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
EP90302165A Expired - Lifetime EP0390338B1 (fr) | 1989-03-01 | 1990-02-28 | Méthode pour fabriquer un substrat pour une tête d'enregistrement à jet liquide |
EP93201057A Expired - Lifetime EP0559295B1 (fr) | 1989-03-01 | 1990-02-28 | Méthode pour fabriquer un substrat pour une tête d'enregistrement à jet liquide |
Family Applications After (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
EP93201057A Expired - Lifetime EP0559295B1 (fr) | 1989-03-01 | 1990-02-28 | Méthode pour fabriquer un substrat pour une tête d'enregistrement à jet liquide |
Country Status (3)
Country | Link |
---|---|
EP (2) | EP0390338B1 (fr) |
AT (2) | ATE139940T1 (fr) |
DE (2) | DE69014690T2 (fr) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0698494A3 (fr) * | 1994-08-26 | 1997-02-19 | Canon Kk | Procédé de production d'une couche de base pour tête d'enregistrement à jet d'encre, tête d'enregistrement à jet d'encre et appareil d'enregistrement à jet d'encre |
EP0768182A2 (fr) * | 1995-10-13 | 1997-04-16 | Canon Kabushiki Kaisha | Méthode de fabrication d'une tête d'enregistrement par jet d'encre, tête d'enregistrement par jet d'encre fabriquée par cette méthode et appareil d'enregistrement par jet d'encre équipé avec une telle tête |
CN1094425C (zh) * | 1998-11-03 | 2002-11-20 | 三星电子株式会社 | 微型喷射装置的喷嘴板组件和制造喷嘴板组件的方法 |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0032087A2 (fr) * | 1980-01-04 | 1981-07-15 | Thomson-Csf | Plaquette de résistances en ligne à très faible pas |
US4536250A (en) * | 1983-04-20 | 1985-08-20 | Canon Kabushiki Kaisha | Method of making liquid jet recording head |
Family Cites Families (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4707708A (en) * | 1985-09-27 | 1987-11-17 | Hitachi, Ltd. | Thermal print head |
-
1990
- 1990-02-28 DE DE69014690T patent/DE69014690T2/de not_active Expired - Fee Related
- 1990-02-28 DE DE69027685T patent/DE69027685T2/de not_active Expired - Fee Related
- 1990-02-28 AT AT93201057T patent/ATE139940T1/de not_active IP Right Cessation
- 1990-02-28 EP EP90302165A patent/EP0390338B1/fr not_active Expired - Lifetime
- 1990-02-28 EP EP93201057A patent/EP0559295B1/fr not_active Expired - Lifetime
- 1990-02-28 AT AT90302165T patent/ATE115051T1/de not_active IP Right Cessation
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0032087A2 (fr) * | 1980-01-04 | 1981-07-15 | Thomson-Csf | Plaquette de résistances en ligne à très faible pas |
US4536250A (en) * | 1983-04-20 | 1985-08-20 | Canon Kabushiki Kaisha | Method of making liquid jet recording head |
Non-Patent Citations (2)
Title |
---|
IEEE CIRCUITS AND DEVICES MAGAZINE * |
PATENT ABSTRACTS OF JAPAN * |
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0698494A3 (fr) * | 1994-08-26 | 1997-02-19 | Canon Kk | Procédé de production d'une couche de base pour tête d'enregistrement à jet d'encre, tête d'enregistrement à jet d'encre et appareil d'enregistrement à jet d'encre |
US5660739A (en) * | 1994-08-26 | 1997-08-26 | Canon Kabushiki Kaisha | Method of producing substrate for ink jet recording head, ink jet recording head and ink jet recording apparatus |
EP0768182A2 (fr) * | 1995-10-13 | 1997-04-16 | Canon Kabushiki Kaisha | Méthode de fabrication d'une tête d'enregistrement par jet d'encre, tête d'enregistrement par jet d'encre fabriquée par cette méthode et appareil d'enregistrement par jet d'encre équipé avec une telle tête |
EP0768182A3 (fr) * | 1995-10-13 | 1998-12-02 | Canon Kabushiki Kaisha | Méthode de fabrication d'une tête d'enregistrement par jet d'encre, tête d'enregistrement par jet d'encre fabriquée par cette méthode et appareil d'enregistrement par jet d'encre équipé avec une telle tête |
US6315853B1 (en) | 1995-10-13 | 2001-11-13 | Canon Kabushiki Kaisha | Method for manufacturing an ink jet recording head |
CN1094425C (zh) * | 1998-11-03 | 2002-11-20 | 三星电子株式会社 | 微型喷射装置的喷嘴板组件和制造喷嘴板组件的方法 |
Also Published As
Publication number | Publication date |
---|---|
EP0559295B1 (fr) | 1996-07-03 |
EP0559295A1 (fr) | 1993-09-08 |
DE69027685D1 (de) | 1996-08-08 |
EP0390338B1 (fr) | 1994-12-07 |
DE69027685T2 (de) | 1996-11-28 |
DE69014690T2 (de) | 1995-05-04 |
ATE115051T1 (de) | 1994-12-15 |
ATE139940T1 (de) | 1996-07-15 |
DE69014690D1 (de) | 1995-01-19 |
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