EP0377445A3 - Procédé et dispositif pour la génération de faisceaux d'ions à grande section transversale - Google Patents

Procédé et dispositif pour la génération de faisceaux d'ions à grande section transversale Download PDF

Info

Publication number
EP0377445A3
EP0377445A3 EP19900100045 EP90100045A EP0377445A3 EP 0377445 A3 EP0377445 A3 EP 0377445A3 EP 19900100045 EP19900100045 EP 19900100045 EP 90100045 A EP90100045 A EP 90100045A EP 0377445 A3 EP0377445 A3 EP 0377445A3
Authority
EP
European Patent Office
Prior art keywords
ions
grid
ion beam
help
ion beams
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
EP19900100045
Other languages
German (de)
English (en)
Other versions
EP0377445B1 (fr
EP0377445A2 (fr
Inventor
Joachim Dr. Janes
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fraunhofer Gesellschaft zur Forderung der Angewandten Forschung eV
Original Assignee
Fraunhofer Gesellschaft zur Forderung der Angewandten Forschung eV
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fraunhofer Gesellschaft zur Forderung der Angewandten Forschung eV filed Critical Fraunhofer Gesellschaft zur Forderung der Angewandten Forschung eV
Publication of EP0377445A2 publication Critical patent/EP0377445A2/fr
Publication of EP0377445A3 publication Critical patent/EP0377445A3/fr
Application granted granted Critical
Publication of EP0377445B1 publication Critical patent/EP0377445B1/fr
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J27/00—Ion beam tubes
    • H01J27/02—Ion sources; Ion guns
    • H01J27/08—Ion sources; Ion guns using arc discharge
    • H01J27/10—Duoplasmatrons ; Duopigatrons

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Combustion & Propulsion (AREA)
  • Electron Sources, Ion Sources (AREA)
  • Drying Of Semiconductors (AREA)
  • ing And Chemical Polishing (AREA)
EP90100045A 1989-01-05 1990-01-02 Procédé et dispositif pour la génération de faisceaux d'ions à grande section transversale Expired - Lifetime EP0377445B1 (fr)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE3900252A DE3900252C1 (fr) 1989-01-05 1989-01-05
DE3900252 1989-01-05

Publications (3)

Publication Number Publication Date
EP0377445A2 EP0377445A2 (fr) 1990-07-11
EP0377445A3 true EP0377445A3 (fr) 1991-07-03
EP0377445B1 EP0377445B1 (fr) 1994-05-11

Family

ID=6371639

Family Applications (1)

Application Number Title Priority Date Filing Date
EP90100045A Expired - Lifetime EP0377445B1 (fr) 1989-01-05 1990-01-02 Procédé et dispositif pour la génération de faisceaux d'ions à grande section transversale

Country Status (2)

Country Link
EP (1) EP0377445B1 (fr)
DE (2) DE3900252C1 (fr)

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2764707A (en) * 1955-07-22 1956-09-25 Richard B Crawford Ion source
DE2942386A1 (de) * 1979-10-19 1981-04-30 Ulrich Dr. 8000 München Boesl Ionenquelle
US4737688A (en) * 1986-07-22 1988-04-12 Applied Electron Corporation Wide area source of multiply ionized atomic or molecular species
WO1988007259A1 (fr) * 1987-03-18 1988-09-22 Hans Oechsner Source d'ions de haute frequence

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3005931A (en) * 1960-03-29 1961-10-24 Raphael A Dandl Ion gun

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2764707A (en) * 1955-07-22 1956-09-25 Richard B Crawford Ion source
DE2942386A1 (de) * 1979-10-19 1981-04-30 Ulrich Dr. 8000 München Boesl Ionenquelle
US4737688A (en) * 1986-07-22 1988-04-12 Applied Electron Corporation Wide area source of multiply ionized atomic or molecular species
WO1988007259A1 (fr) * 1987-03-18 1988-09-22 Hans Oechsner Source d'ions de haute frequence

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
IBM TECHNICAL DISCLOSURE BULLETIN. vol. 17, no. 5, Oktober 1974, NEW YORK US Seite 1379 W.C. KO, R.WINNARD: "HOLLOW CATHODE DISCHARGE ION SOURCE" *

Also Published As

Publication number Publication date
DE3900252C1 (fr) 1990-05-23
DE59005653D1 (de) 1994-06-16
EP0377445B1 (fr) 1994-05-11
EP0377445A2 (fr) 1990-07-11

Similar Documents

Publication Publication Date Title
DE60138526D1 (de) Verfahren und vorrichtung zur erzeugung von 18f-fluorid
EP0002726B1 (fr) Procédé et appareil à décapage ionique réactif
DE68905286T2 (de) Verfahren und vorrichtung zur herstellung oder modifikation von schneidkanten.
DE69018018D1 (de) Verfahren und Gerät zur Erzeugung eines elliptisch verteilten Ionenstrahls.
TW428204B (en) Acceleration and analysis architecture for ion implanter
ATE358878T1 (de) Vorrichtung zur erzeugung und zum auswählen von ionen die in einer schwerionen-krebstherapie- anlage verwendt werden
ATE227884T1 (de) Ionenstrahlabtastverfahren und vorrichtung
DE102005047081A1 (de) Verfahren zum beschleunigten Ätzen von Silizium
DE69030987D1 (de) Verfahren und Vorrichtung zur Steuerung von Ionenbewegung durch eine Membran
DE69216367T2 (de) Verfahren und Vorrichtung zur Entfernung von SO2 und NO aus Verbrennungsabgasen
DE69017896T2 (de) Verfahren und vorrichtung zur abgasbehandlung durch mehrstufige elektronenbestrahlung.
DE2335821A1 (de) Teilchenbeschleuniger
ATE45897T1 (de) Verfahren und vorrichtung zur herstellung von metallpulver.
EP0377445A3 (fr) Procédé et dispositif pour la génération de faisceaux d'ions à grande section transversale
DE3424449A1 (de) Quelle fuer negative ionen
EP0390004A3 (fr) Procédé et dispositif pour la gravure par plasma micro-onde
DE102018128326A1 (de) Verfahren zum Bearbeiten von Stimmzungen
DE2244891A1 (de) Vorrichtung zur erzeugung elektrischer energie
KR950004655A (ko) 고속원자빔을 이용한 처리방법
CH625622A5 (fr)
DE3416198A1 (de) Verfahren und vorrichtung zum erzeugen eines elektronenvorhangs mit regulierbarer intensitaetsverteilung
DE69200643T2 (de) Verfahren und Vorrichtung zur Regelung des transversalen Magnetfelds in einem Undulator zur Erzeugung von Lichtenergie aus einem Elektronenstrahl.
DE19605226A1 (de) Verfahren zur Herstellung eines Plasmas sowie Verwendung eines derart hergestellten Plasmas
DE69627936D1 (de) Verfahren und vorrichtung zur erzeugung eines laserstrahles
JPS5457862A (en) Ion-beam irradiation device

Legal Events

Date Code Title Description
PUAI Public reference made under article 153(3) epc to a published international application that has entered the european phase

Free format text: ORIGINAL CODE: 0009012

AK Designated contracting states

Kind code of ref document: A2

Designated state(s): DE FR GB IT NL

PUAL Search report despatched

Free format text: ORIGINAL CODE: 0009013

AK Designated contracting states

Kind code of ref document: A3

Designated state(s): DE FR GB IT NL

17P Request for examination filed

Effective date: 19910806

17Q First examination report despatched

Effective date: 19930823

GRAA (expected) grant

Free format text: ORIGINAL CODE: 0009210

AK Designated contracting states

Kind code of ref document: B1

Designated state(s): DE FR GB IT NL

REF Corresponds to:

Ref document number: 59005653

Country of ref document: DE

Date of ref document: 19940616

GBT Gb: translation of ep patent filed (gb section 77(6)(a)/1977)

Effective date: 19940525

ITF It: translation for a ep patent filed

Owner name: UFFICIO BREVETTI RICCARDI & C.

ET Fr: translation filed
PLBE No opposition filed within time limit

Free format text: ORIGINAL CODE: 0009261

STAA Information on the status of an ep patent application or granted ep patent

Free format text: STATUS: NO OPPOSITION FILED WITHIN TIME LIMIT

26N No opposition filed
PGFP Annual fee paid to national office [announced via postgrant information from national office to epo]

Ref country code: GB

Payment date: 19961218

Year of fee payment: 8

PGFP Annual fee paid to national office [announced via postgrant information from national office to epo]

Ref country code: FR

Payment date: 19970121

Year of fee payment: 8

Ref country code: DE

Payment date: 19970121

Year of fee payment: 8

PGFP Annual fee paid to national office [announced via postgrant information from national office to epo]

Ref country code: NL

Payment date: 19970124

Year of fee payment: 8

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: GB

Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES

Effective date: 19980102

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: FR

Free format text: THE PATENT HAS BEEN ANNULLED BY A DECISION OF A NATIONAL AUTHORITY

Effective date: 19980131

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: NL

Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES

Effective date: 19980801

GBPC Gb: european patent ceased through non-payment of renewal fee

Effective date: 19980102

NLV4 Nl: lapsed or anulled due to non-payment of the annual fee

Effective date: 19980801

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: DE

Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES

Effective date: 19981001

REG Reference to a national code

Ref country code: FR

Ref legal event code: ST

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: IT

Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES;WARNING: LAPSES OF ITALIAN PATENTS WITH EFFECTIVE DATE BEFORE 2007 MAY HAVE OCCURRED AT ANY TIME BEFORE 2007. THE CORRECT EFFECTIVE DATE MAY BE DIFFERENT FROM THE ONE RECORDED.

Effective date: 20050102