EP0369347A2 - Thermischer Druckkopf - Google Patents

Thermischer Druckkopf Download PDF

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Publication number
EP0369347A2
EP0369347A2 EP89120874A EP89120874A EP0369347A2 EP 0369347 A2 EP0369347 A2 EP 0369347A2 EP 89120874 A EP89120874 A EP 89120874A EP 89120874 A EP89120874 A EP 89120874A EP 0369347 A2 EP0369347 A2 EP 0369347A2
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EP
European Patent Office
Prior art keywords
print head
heating
thermal print
circuit element
driver circuit
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
EP89120874A
Other languages
English (en)
French (fr)
Other versions
EP0369347A3 (en
EP0369347B1 (de
Inventor
Takeshi C/O Pat. Dep. Development Div Wakabayashi
Tsuneo C/O Pat. Dep. Development Division Ochi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Casio Computer Co Ltd
Original Assignee
Casio Computer Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP63290287A external-priority patent/JP2775779B2/ja
Priority claimed from JP7623789A external-priority patent/JPH02253966A/ja
Application filed by Casio Computer Co Ltd filed Critical Casio Computer Co Ltd
Publication of EP0369347A2 publication Critical patent/EP0369347A2/de
Publication of EP0369347A3 publication Critical patent/EP0369347A3/de
Application granted granted Critical
Publication of EP0369347B1 publication Critical patent/EP0369347B1/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
    • B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
    • B41J2/315—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by selective application of heat to a heat sensitive printing or impression-transfer material
    • B41J2/32—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by selective application of heat to a heat sensitive printing or impression-transfer material using thermal heads
    • B41J2/335—Structure of thermal heads
    • B41J2/33555—Structure of thermal heads characterised by type
    • B41J2/3357—Surface type resistors
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
    • B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
    • B41J2/315—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by selective application of heat to a heat sensitive printing or impression-transfer material
    • B41J2/32—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by selective application of heat to a heat sensitive printing or impression-transfer material using thermal heads
    • B41J2/335—Structure of thermal heads
    • B41J2/3359—Manufacturing processes

Definitions

  • the present invention relates to a thermal print head for thermal recording and a method for manufacturing the same.
  • thermal print heads which perform thermal recording through selective heating of heating elements
  • only the heating elements are formed on an insulating substrate of ceramics or quartz, that is, they are formed separately from a print driver circuit section.
  • the individual resistance elements are connected to the driver circuit section by wire-bonding or the like.
  • a drive signal is supplied from the driver circuit section to each resistance element through a wire, whereby the resistance elements are selectively heated so that a thermal ink sheet is heated to effect thermal printing on a recording sheet.
  • the thermal print heads of this type If the print dot pitch is fine, according to the thermal print heads of this type, the spaces between wiring conductors, which are connected to the heating elements, are so narrow that the heating elements and the print driver circuit section cannot be easily connected. Accordingly, the wiring conductors of the print head are fanned out from the heating-element side so that their extended portions are connected to the driver circuit section by wire-bonding.
  • the wire-bonding is not a highly efficient method of connection, and the thermal print heads must be large-sized.
  • bonding regions are protuberant. Since there is hardly any allowance for deformation after the bonding regions are sealed by means of resin, the configuration of the resulting assembly must be maintained before the bonding. Thus, the assembly work is a hard task, and the reliability of the products is lowered after prolonged use.
  • the object of the present invention is to provide a thermal print head of high productivity, in which heating elements are arranged with high density, and a method for manufacturing the same.
  • a thermal print head comprises: a single-crystal semiconductor substrate; a print driver circuit element formed by implanting an impurity into a predetermined region of the semiconductor substrate; a polycrystalline silicon layer formed on the semiconductor substrate and including a low-resistance region for heating; a thin-film conductor for wiring, the conductor connecting the print driver circuit element and the polycrystalline silicon layer; an external connecting terminal connected to the thin-film conductor; and an insulating protective film covering the print driver circuit element and the polycrystalline silicon layer.
  • a method for manufacturing a thermal print head comprises: a process for forming an insulating layer on a semiconductor substrate; a process for forming a gate insulating layer after removing an active region of the insulating layer; a process for depositing polycrystalline silicon on the insulating layer and the gate insulating layer and forming a heating resistance element and a gate electrode by etching; a process for implanting an impurity at least into the heating resistance element, thereby increasing and reducing the impurity concentration and resistance value, respectively, of the heating resistance element; a process for implanting the impurity into an active region of the semiconductor substrate; a process for depositing a low-resistance metal to form a wiring conductor; and a process for depositing an insulating protective film on the whole surface of the resulting structure.
  • Fig. 1 is an enlarged sectional view showing a thermal print head 1.
  • the head 1 has a single crystal N-type silicon substrate 10.
  • the head substrate 10 corresponds to one block of a single crystal silicon substrate with a diameter of 4 to 8 inches, generally called a wafer.
  • the thermal print head 1 comprises an external terminal section 2, a print data holding circuit section 3, a print current supply section 4, a heating section 5, and an earthing diode section 6, formed on the silicon substrate 10.
  • Each of thermal print heads 1, as shown in Fig. 1 is obtained by dividing the silicon wafer (i.e., the silicon substrate 10) into a number of blocks, forming sections 2 to 6 on the substrate the 10 for each block in parallel relation, and finally cutting off the block along the two-dot chain lines shown in Fig. 1.
  • Fig. 3 is a block diagram of a circuit which is included in each individual thermal print head 1 shown in Fig. 1, that is, formed on the silicon substrate 10 for each block.
  • the external terminal section 2 includes print a control terminal 2a, a data latch terminal 2b, a data input terminal 2c, and a shift clock terminal 2d.
  • the print data holding circuit section 3 includes a shift register 3a, latch circuits 3b, and gate elements 3c, such as AND gates.
  • the shift register 3a shifts image data inputted through the data input terminal 2c in synchronism with a clock signal inputted through the shift clock terminal 2d.
  • Latch circuits 3b simultaneously latche all bits of the print data for one line, in response to a latch signal inputted through a data latch terminal 2b, when the print data is delivered to the register 3a.
  • Gate elements 3c are connected to a print timing signal inputted through the print control terminal 2a.
  • the print current supply section 4 is composed of high-current transistors.
  • each transistor 4 is formed of an N-MOS-FET (N-type-channel Metal Oxide Semiconductor Field-Effect Transistor), as mentioned later.
  • the print data holding circuit section 3 may be formed of a C-MOS-FET (Complementary Metal Oxide Semiconductor Fieldeffect Transistor).
  • the heating section 5 includes heating elements respectively formed corresponding to each high-current transistor 4.
  • the earthing diode section 6 serves to prevent the print current from flowing back into each heating element. The operation of each circuit element for printing is conventionally known, so that its description is omitted herein.
  • the heating section 5 is formed near a boundary line to an adjacent block of the silicon substrate 10.
  • a protuberance 12 is formed along one side edge (perpendicular to the drawing plane of Fig. 1) near the adjacent block.
  • the protuberance 12 is covered by an insulating film 13 of SiO 2 , and heating resistance elements 14, made of polycrystalline silicon doped with an impurity, are formed on the surface of the film 13. Having a trapezoidal cross section, the protuberance 12 extends over the full width of the silicon substrate 10 (in the vertical direction of Fig. 1), as shown in Figs. 2A and 2B.
  • Resistance elements 14 are arranged at regular pitches of 16 to 32 dots/mm along the longitudinal direction of the protuberance 12. In this case, each resistance element 14 is formed continuously extending from one base surface of the protuberance 12 to the other by way of the top surface of the protuberance 12.
  • Element 14 is doped with a predetermined amount of phosphorus (P) ions as an impurity, thereby enjoying a predetermined sheet resistivity (tens of ohms/ ⁇ ).
  • P phosphorus
  • the total resistance of resistance element 14 depends on the implantation concentration of the P ions and its area. Accordingly, the total resistance is finally adjusted to tens to hundreds of ohms, depending on the amount of P-ion implantation and the unetched area. In this case, only a part portion of element 14 which faces the top surface of protuberance 12 is adjusted to the predetermined sheet resistance (tens of ohms/ ⁇ ), and the remaining portion is adjusted to a lower resistance. This will be described in detail later.
  • a protective film 15 is formed on the surface of heating resistance elements 14. It may be formed as a double-layer structure of SiO 2 and SiN or a single-layer structure of SiON, employed resistance against oxidation and wear.
  • a P-type region 16 is formed inside the top surface of silicon substrate 10 by implantation of boron (B) ions Formed inside A region 16 is a N-type region 17 doped with P ions.
  • P- and N-type regions 16 and 17 constitute an earthing diode section 6.
  • the whole surface of the N-type region 17 except its central portion is covered by insulating film 13 of SiO 2 .
  • An one end 18 of heating resistance element 14 is connected to the top surface of the region 17.
  • a high insulation protective film 19, made of phosphorus-silica glass (PSG) is formed on the one end 18 of the element 14 by the CVD (Chemical Vapor Deposition) method, and the protective film 15 is formed on a film 19.
  • the silicon substrate 10 itself serves as the earth line 7.
  • a bottom surface 10a of the silicon substrate 10 is preferably connected to a ground line of the an apparatus which incorporates the head.
  • the transistor 4 for current supply is an N-MOS-FET.
  • numeral 20 denotes a P-type region doped with B ions, and two N-type regions 21 doped with P ions are formed within P-type region 20. Regions 21 constitute source and drain electrodes, individually.
  • Gate insulating films 22 and gate electrode 23 are formed in layers between the two N-type regions. Films 22 and electrode 23 are made of SiO 2 and polycrystalline silicon, respectively. The surfaces of members 22 and 23 are coated with insulating protective films 19. Wiring conductors 24 for the source and the drain are formed corresponding to two N-type regions 21.
  • the gate electrode 23, like the heating resistance element 14, is doped with P ions, so that its resistance is low.
  • One of conductors 24 is connected to the one end of resistance element 14.
  • the protective film 15 also covers wiring conductors 24 and gate electrode 23. As seen from Fig. 1, each heating resistance element 14 is formed on the top surface of the protuberance 12, and its top surface projects above those of wiring conductors 24. If conductors 24 project above each resistance element 14, an identical portion of the protective film 15 which faces element 14 is depressed below the rest portion of the film 15 which face conductors 24.
  • the shift register 3a, latch circuits 3b, and gate element 3c are respectively formed of C MOS-FETs.
  • the C MOS FET comprising of the combination of an N MOS N-channel MOS) FET and a PMOS FET (P-channel MOS), as is generally known, is located adjacent to the transistor 4 for current supply. Although only one C MOS FET is shown in Fig. 1, a plurality of C MOS FETs are actually arranged even within the drawing plane of Fig. 1. The actual size (length as in Fig. 1) of the C MOS FET is not greater than one-tenth that of the transistor 4.
  • the N MOS FET is constructed in the same manner as the transistor 4.
  • the P-type region 25 doped with B ions is formed inside the top surface of the silicon substrate 10, and two N-type regions 26 doped with P ions are formed within P-type region 25.
  • the gate insulating film 27 of SiO 2 and gate electrode 23 of the polycrystalline silicon are formed in layers between the two N-type regions.
  • Wiring conductors 28 for a source and a drain are formed corresponding to two N-type regions 26.
  • gate electrode 23 are doped with P ions, so that their resistances are low, and their Surfaces are covered with the insulating protective film 19.
  • the protective film 15 is formed covering wiring conductors 28 and portions of the film 19 on gate electrodes 23.
  • the P MOS FET is constructed in the same manner as the N MOS except that two P-type regions 29 are formed inside the top surface of the silicon substrate 10. More specifically, the gate insulating film 27, gate electrodes 23, and wiring conductors 28 are similar to those of the N MOS FET. Therefore, a description of those elements is omitted herein.
  • Terminals 2a to 2d of the external terminal section 2 are formed as bump electrodes 11.
  • a wiring conductor 30 is formed on the insulating film 13 and the insulating protective film 19, which are formed in layers on the silicon substrate 10.
  • the conductor 30 serves to connect terminals 2a to 2d with the shift register 3a, latch circuits 3b, or gate element 3c.
  • the whole surface of the wiring conductor 30 except a specific portion is covered by the protective film 15.
  • the barrier metal 31 is formed on the specific portion of the conductor 30 which is exposed from the film 15.
  • a bump electrode 11 is formed on the barrier metal 31.
  • a Ti-W alloy a single or laminate structure of Ti, Cu, Ti-N, W, or W-Si may be used for the barrier metal.
  • a gold- or solder-based alloy may be used for the bump electrode 11.
  • Each thermal print head 1 is obtained by dividing one wafer into a number of blocks, simultaneously forming the required elements for each block, and finally cutting off the block. In the description to follow, only one block of the wafer will be mentioned.
  • the single-crystal N-type silicon substrate (wafer) 10 is first prepared, and one side of the substrate 10 is etched so that the portion indicated by broken line is removed to form the protuberance 12.
  • the etching thickness ranges from several micrometers to tens of micrometers.
  • the etching may be prosecuted by plasma etching method, or be effected by the use of a chemical fluid consisting mainly of hydrofluoric acid.
  • the silicon substrate 10 is heated to about 1,000° C for a thermal oxidation treatment, so that a SiO 2 film 33 is formed in and on the surface of the substrate 10.
  • a photoresist film is patterned on the film 33 by photolithography. More specifically, the photoresist film is applied to the SiO 2 film 33, and is exposed to the light through a mask. The exposed photoresist film is developed to remove unnecessary portions. Thus, the photoresist film is patterned.
  • the SiO 2 film 33 is etched so that unnecessary portions thereof, i.e., those portions corresponding to the respective P-type regions 16, 20 and 25 of the diode section 6, transistors 4, and the C MOS FETs are removed, as shown in Fig. 4B.
  • B ions are implanted and diffused into those portions of the silicon substrate 10 cleared of the SiO 2 film 33, so that a multitude of the P-type regions 16, 20 and 25 are formed for each block, in the silicon substrate 10.
  • the SiO 2 film 33 is removed. Then, a SiO 2 film 34 is formed over the whole surface of the resulting structure, and a photoresist film (not shown) is patterned on the surface of the film 34 by photolithography. Using this photoresist film as a mask, the region for the formation of the diode section 6, that is, the portion corresponding to the P-type region 16, is removed by etching, and the gate insulating film 35 is formed on the exposed portion, as shown in Fig. 4C. The P ions are implanted into the P-type region 16 of the diode section 6 through the insulating film 35, thus forming the N-type region 17. In this case, the gate insulating film 35 serves to prevent the surface of the N-type region 17 from being damaged by the implantation of the P ions.
  • the SiO 2 film 34 and the gate insulating film 35 are removed by etching, and the silicon substrate 10 is subjected again to thermal oxidation treatment, whereby an SiO 2 film is formed on the surface of the substrate 10.
  • a photoresist film is patterned on the surface Of the SiO 2 film by photolithography, and the SiO 2 film is etched with use of the photoresist film as a mask. Thereupon, those portions of the SiO 2 film which correspond to the respective P-type regions 20 and 25 of the transistor 4 and the C MOS FET and the region for the formation of the P MOS FET are removed, as shown in Fig. 4D.
  • a polycrystalline silicon layer 36 is formed on the whole surface of the resulting structure by the CVD method using a monosilane (SiH 4 ) gas.
  • the P ions are implanted throughout the layer 36, as shown in Fig. 4D, so that the P-ion concentration the layer 36 is increased, thereby reducing its resistance to a predetermined value.
  • the P-ion concentration is previously adjusted in consideration of an increment corresponding to the amount of P ions implanted during the formation of the N-type regions 21 and 26 in a subsequent process (shown in Fig. 4F).
  • the sheet resistance of the polycrystalline silicon layer 36 which ranges from several kilohms/ ⁇ to several megohms/ ⁇ before the P-ion implantation, is finally adjusted to tens of ohms/ ⁇ .
  • the amount of P-ions implanted in those portions of the polycrystalline silicon layer 36 which correspond to the respective gate electrodes 23 of the transistor 4, the C MOS FET, etc. is equal to the amount in the portion corresponding to the heating resistance element 14.
  • the amount of the P-ion implantation in the layer 36 can be increased by reimplanting the P ions only into the layer 36 with use of a resist mask, or by forming separate resist masks for separate processes.
  • a photoresist film is patterned on the surface of the polycrystalline silicon layer 36 by photolithography, and the layer 36 is etched by using the photoresist film as a mask, so that unnecessary portions of the layer 36 are removed.
  • the diode section 6, heating resistance elements 14, transistors 4, P-type regions 20 and 25, and gate electrodes 23 are formed in the manner shown in Fig. 4E.
  • An essential requirement for each resistance element 14 is that it be able to heat only required heating portions to improve the resolution. In the present embodiment, therefore, the resistance inside a region A of each resistance element 14, shown in Figs. 2A and 2B, which corresponds to the top surface of the protuberance 12 is higher than the resistance outside.
  • Fig. 2A shows a method in which slits S are formed in region A of each resistance element 14, so that the width of the electric conduction path in the region A is narrower than that of any other part outside the region A. In either case, the total resistance value of each resistance element 14 is adjusted to, e.g., tens to hundred of ohms.
  • the gate insulating film 27 of the P MOS FET is masked by means of a photoresist film 37, and the P ions are implanted into the respective P-type regions 20 and 25 of the transistor 4 and the C MOS FET through the gate insulating film 22, thereby forming two sets of N-type regions 21 and 26, as shown in Fig. 4F. Regions 21 and 26 serve as sources and drains, respectively.
  • a photoresist film 38 is patterned again on the whole surface of the resulting structure by photolithography, as shown in Fig. 4G. Then, using the film 38 as a mask, B ions are implanted into the silicon substrate 10 through the gate insulating film 27 of the P MOS FET, thereby forming two P-type regions 29. Regions 29 serve individually as a source and a drain.
  • the photoresist film 38 is removed by etching.
  • a photoresist film is patterned again on the structure by photolithography, and those portions of gate insulating films 22 and 27 which correspond to N-type regions 21 and 26 and P-type region 29 of the transistor 4 and the C MOS FET are removed by etching with use of the patterned photoresist film as a mask.
  • an insulating protective film of the PSG is formed on the whole surface of the resulting structure by the normal-pressure CVD method.
  • a photoresist film is patterned on the surface of the insulating protective film by photolithography, and the protective film is etched by using this photoresist film as a mask.
  • one end 18 of the heating resistance element 14, the respective gate electrodes 23 of the transistor 4 and the C MOS FET, and the insulating film 13 are covered by the insulating protective film 19 of the PSG, as shown in Fig. 4H.
  • an electrically conductive metal film such as Al, Al-Si, Mo, or W, is formed on the whole surface of the resulting structure by sputtering or vacuum evaporation.
  • a photoresist film is patterned on the surface of the metal film by photolithography. Using this photoresist film as a mask, the metal film is etched to remove unnecessary portions.
  • wiring conductors 24, 28 and 30 are formed on the portions corresponding to the respective N-type regions 21 and 26 of the transistor 4 and the C MOS FET, the portion corresponding to P-type region 29 of the P-MOS FET, and the portion corresponding to the bump electrode 11, as shown in Fig. 4I.
  • Conductors 24 and 28 are connected electrically to N-type regions 21 and 26 and P-type region 29. In this case, one of wiring conductors 24 of the transistor 4 is also connected electrically to the resistance element 14.
  • the protective film 15 is formed on the whole surface of the resulting structure by sputtering or vacuum evaporation, as shown in Fig. 4J.
  • the film 15 is a double-layer structure of the SiO 2 and SiN or a single-layer structure of SiON, having resistance against oxidation and wear, and may be formed by the CVD method or the like. Further, that portion of the protective film 15 which corresponds to the protuberance 12 is raised above other portions.
  • a photoresist film is patterned on the surface of the protective film 15 by photolithography. Using this photoresist film as a mask, the film 15 is etched so that an unnecessary portion, i.e., the portion corresponding to the bump electrode 11, is removed, as shown in Fig. 4K. Thereafter, the photoresist film is removed, and a Ti-W alloy, as a barrier metal, and Au, as a metal for intimate contact, are deposited Successively on the whole surface of the etched protective film by vacuum evaporation or sputtering, thereby forming the metal layer 32. Further, a resist 39 is deposited on the surface of the layer 32 by spin coating, and the bump forming region is removed by etching. The etched portion is plated with Au, thus forming the bump electrode 11. The height of the bump electrode 11 is adjusted to about 10 to 30 ⁇ m, in order to maximize the strength of bonding between the electrode 11 and an external electrode.
  • the resist 39 and the whole region of the metal layer 32 except the portion corresponding to the bump electrode 11 are removed successively by etching. Thereupon, each block of the wafer is brought to the state shown in Fig. 1. Finally, the silicon substrate 10 is diced into individual blocks along the two-dot chain lines of Fig. 1. Thus, the thermal print head 1 of the present invention is obtained.
  • the thermal print head 1 is in the form of a substantially rectangular plate.
  • a heating element region 40 which has a number of the heating resistance elements 14 and earthing diodes 6 thereon, is formed on one side edge of the silicon substrate 10.
  • a print driver circuit element region 41 which is provided with transistors 4 for current supply and elements for print data transfer, is formed in the central portion of the substrate 10, and bump electrodes 11 are formed along the other side edge of the substrate 10. Bump electrodes 11 are connected to one end of a flexible connector 42, the other end of which is connected to a circuit substrate 43 (Fig. 7) of the apparatus.
  • Wires 45 which are composed of copper leaf plated with solder, are formed on one side of the connector 42.
  • the respective one ends of wires 45 are disposed on bump electrodes 11, and are bonded thereto at a time by means of a heat-pressure bonding device 46.
  • the junction is covered by an insulating adhesive agent 47, such as silicone rubber (Fig. 7).
  • the respective other ends of wires 45 are temporarily bonded to the circuit substrate 43 by means of the bonding device 46. Also in this case, the junction is covered by the insulating adhesive agent 47.
  • the circuit substrate 43 supplies the thermal print head 1 with an image signal, a clock signal, a strobe signal, and an enable signal, thereby driving the head.
  • the thermal print head 1 thus connected to the flexible connector 42, is bent at the portion corresponding to the connector 42, and is kept tilted with the heating element region 40 downward, as shown in Fig. 7.
  • heating resistance elements 14 are selectively heated. Thereupon, ink on a thermal ink sheet 48 is transferred to a recording sheet 49 by the resulting heat, thereby effecting thermal recording.
  • that portion of protective film 15 which corresponds to the protuberance 12 projects above the other portions. Therefore, the surface of only that portion of the film 15 which faces each resistance element 14 can be satisfactorily brought into intimate contact with the ink sheet 48. Thus, a distinct thermal recording can be effected. Since resistance elements 14 are connected to earthing diodes 6, in particular, electric current can be securely prevented from flowing backward by diodes 6. Thus, the thermal recording can be effected with high resolution.
  • the present invention is not limited to the embodiment described above, and that various changes and modifications may be effected therein by one skilled in the art without departing from the scope or spirit of the invention.
  • the thermal print head 1 may be brought directly into contact with a thermal paper sheet for thermal recording.
  • the one end of each heating resistance element 14 need not always be connected to its corresponding diode 6, and may alternatively be connected to a wiring conductor as an earth line.
  • N-type regions 17, 21 and 26 and P-type region 29, in the embodiment described above, are formed by ion implantation, they may alternatively be formed by thermal diffusion.
  • P ions are diffused into P-type regions 20 and 25 after removing gate insulating films 22 and 27 by etching. In this case, P ions are implanted into resistance element 14 in a separate process.
  • P-type region 29 is formed after N-type regions 21 and 26 are formed.
  • N-type regions 21 and 26 may be formed after P-type region 29 is formed.
  • the polycrystalline silicon layer 36 may be formed after N-type regions 21 and 26 and P-type region 29 are formed.
  • the heating element region 40 is located close to the side edge portion of the silicon substrate 10, as seen from Fig. 7, in order that the region 40 can be brought into intimate contact with the recording sheet 49.
  • conventional earthing conductors require a width of several millimeters to several centimeters.
  • earthing diodes 6 are arranged in place of the earthing conductors, so that heating resistance elements 14 can be located much closer to the side edge portion of the silicon substrate 10 than in the conventional arrangement.
  • the resistance elements 14 may, however, be located close to the side edge portion of the silicon substrate 10 by using any other suitable means. The following is a description of an example of such means.
  • Figs. 8 to 10 show a thermal print head 1' according to a second embodiment of the present invention.
  • Fig. 8 is an enlarged sectional view of the thermal print head 1' .
  • the head 1' comprises the external terminal section 2, print data holding circuit section 3, print current supply section 4, and heating section 8.
  • the heating section 8 corresponds to the heating section 4 of the thermal print head 1 of the first embodiment.
  • the greatest difference between heads 1 and 1' lies in that the head 1' does not comprise the earthing diode section 6. Instead, the thermal print head 1' comprises a common conductor for connecting all heating resistance elements in common. In contrast with the case of the conventional thermal print head, however, the common conductor is formed on an insulating layer which overlies individual selective conductors.
  • numeral 51 denotes a glazed layer of, e.g., SiO 2 or SiN.
  • the glazed layer 51 is formed on the silicon Substrate 10, for example, in a manner such that no other elements are on the substrate. It serves to store the heat produced in the heating resistance elements mentioned later, and delay the dissipation of the heat from substrate 10.
  • the glazed layer 51 is covered by an insulating film 13' of SiO 2 and an insulating protective film 19'. Films 13' and 19' correspond to insulating film 13 and the insulating protective film 19, respectively, of the first embodiment.
  • the heating resistance element 50 is formed on that portion of the insulating protective film 19' which corresponds to the glazed layer 51. One end 50a of the resistance element 50, which extends to that portion of the film 19' around the layer 51, is connected to a selective conductor 52.
  • heating resistance elements 50 are arranged along one side edge 10b of the silicon substrate 10. Each resistance element 50 has a zigzag shape.
  • Each heating resistance element 50 has an other end 50b which extends in the same direction as one end 50a.
  • the element 50 is covered by a protective film 15'.
  • a hole 53 is bored through that portion of the resistance element 50 which faces the other end 50b.
  • Formed on the protective film 15' is a common conductor 54 which extends at right angles to each selective conductor 52.
  • the other end 50b of each resistance element 50 is connected to the common conductor 54 via through hole 53.
  • a heat conductor film 55 is formed on that portion of the protective film 15' which faces the heating resistance element 50.
  • the film 15' is formed of a rigid layer of metal, such as Mo or W. It serves to store the heat temporarily, thereby easing the heat dissipation, and to make the temperature inside the area for the heat conductor film 55 uniform.
  • the respective upper surfaces of the heat conductor film 55 and the common conductor 54 are covered by a protective film 56.
  • the common conductor 54 which extends along the other side edge portion of the silicon substrate 10, is connected to the earthing terminal 2e, as shown in Fig. 10.
  • Fig. 10 shows a layout of element forming portions of the thermal print head 1'.
  • the silicon substrate 10 is cut along the two-dot chain lines of Fig. 8, whereby each individual thermal print head 1 shown in Fig. 10 is obtained.
  • the common conductor 54 is disposed on the selective conductors 52, so that the heating section can be brought very close to one side edge 10b of the silicon substrate 10.
  • Fig. 11 shows a modification of the heating section 8.
  • each heating resistance element 50' has an other end 50b in common with its adjacent resistance element 50''.
  • the resistance elements 50' and 50'' are alternately arranged along the one side edge 10b of the substrate 10.
  • Each two adjacent resistance elements 50' and 50'' are formed integrally with each other by means of a common line 50c.
  • the line 50c is connected, at other end 50b, to the common conductor 54 via the hole 53.
  • the heating resistance elements 50' and 50'' are linearly symmetrical with respect to common line 50c. Ends 50a of resistance elements 50' and 50'' are connected to their corresponding selective conductors 52. In this wire arrangement. elements 50' amd 50'' are driven in a time-sharing mode.
  • each selective conductor 52 connected to one end 50a of each corresponding resistance element 50'' is cut off by means of a switching element (not shown).
  • each selective conductor 52 connected to one end 50a of each corresponding resistance element 50' is dead.
  • the thermal print head 1' of the second embodiment can be connected to circuit substrate 43 by means of the flexible connector 42, as shown in Fig. 7, when it is used.
  • thermal print heads 1 or 1' may be arranged on an insulating substrate so that a thermal printing apparatus can be constructed having a longer heating section.
  • the following is a description of the thermal printing apparatus.
  • Fig. 12 shows a thermal printing apparatus 60 with a long heating section used in a line printer or facsimile.
  • the thermal print head 1' of the second embodiment will be described. It is to be understood, however, that the thermal printing apparatus 60 of the same construction can be obtained with use of the thermal print head 1 of the first embodiment.
  • the thermal printing apparatus 60 includes a supporting substrate 61.
  • the substrate 61 which is formed of ceramics, metal, quartz, etc., is wide enough to carry the thermal print, heads 1' in two lines. Thus, a number of heads 1' are arranged in two lines on the substrate 61.
  • the heads 1' are oriented so that their side edges 10b, along which heating resistance elements 50 are arranged, are directed to the center of the supporting substrate 61.
  • the thermal print heads 1' are arranged substantially alternately along the two lines so that each print head 1' overlaps its adjacent print heads 1' only at the opposite end portions of its side edge 10b, with respect to the longitudinal direction. In this case, heads 1' are relatively situated so as to maintain pitch P of heating resistance elements 50.
  • the distance between the last (or first) resistance element 50 of each head 1' and the first (or last) resistance element 50 of each adjacent head 1' is equal to pitch P of elements 50.
  • the thermal print heads 1' are positioned and bonded on the supporting substrate 61, with side edges 10b of their respective silicon substrates 10 in intimate contact so that their heating resistance elements 50 are situated close to one another.
  • the flexible connector 42 is connected to terminals 2a to 2e of each head 1', as shown in Fig. 6.
  • the connectors 42 is also connected to, e.g., a circuit substrate (not shown) of the apparatus.
  • the thermal printing apparatus 60 of this type can be applied to a line printer or facsimile, despite the use of a single-crystal semiconductor wafer for the substrate.
  • heating resistance elements 50 are located close to one side edge 10b of the silicon substrate 10, so that all the resistance elements can be pressed against the recording sheet under substantially uniform conditions.
  • the apparatus can enjoy improved print quality.

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  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Electronic Switches (AREA)
EP89120874A 1988-11-18 1989-11-10 Thermischer Druckkopf Expired - Lifetime EP0369347B1 (de)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP290287/88 1988-11-18
JP63290287A JP2775779B2 (ja) 1988-11-18 1988-11-18 サーマルヘッドおよびその製造方法
JP76237/89 1989-03-28
JP7623789A JPH02253966A (ja) 1989-03-28 1989-03-28 サーマルヘッドおよびサーマルヘッド装置

Publications (3)

Publication Number Publication Date
EP0369347A2 true EP0369347A2 (de) 1990-05-23
EP0369347A3 EP0369347A3 (en) 1990-10-24
EP0369347B1 EP0369347B1 (de) 1995-05-24

Family

ID=26417398

Family Applications (1)

Application Number Title Priority Date Filing Date
EP89120874A Expired - Lifetime EP0369347B1 (de) 1988-11-18 1989-11-10 Thermischer Druckkopf

Country Status (2)

Country Link
EP (1) EP0369347B1 (de)
DE (1) DE68922823T2 (de)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0440459A1 (de) * 1990-01-31 1991-08-07 Canon Kabushiki Kaisha Tintenstrahlaufzeichnungssystem
EP0441635A1 (de) * 1990-02-09 1991-08-14 Canon Kabushiki Kaisha Tintenstrahlaufzeichnungssystem

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4429321A (en) * 1980-10-23 1984-01-31 Canon Kabushiki Kaisha Liquid jet recording device
EP0129914A1 (de) * 1983-06-27 1985-01-02 Teletype Corporation Verfahren zum Herstellen einer integrierten Schaltungsanordnung
EP0171010A2 (de) * 1984-07-30 1986-02-12 Hitachi, Ltd. Thermischer Druckkopf
EP0198646A2 (de) * 1985-04-13 1986-10-22 Konica Corporation Integrierte Halbleiteranordnung
EP0229953A2 (de) * 1985-12-20 1987-07-29 Hitachi, Ltd. Thermischer Druckkopf
EP0241282A2 (de) * 1986-04-08 1987-10-14 Oki Electric Industry Company, Limited Thermischer Kopf

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4429321A (en) * 1980-10-23 1984-01-31 Canon Kabushiki Kaisha Liquid jet recording device
EP0129914A1 (de) * 1983-06-27 1985-01-02 Teletype Corporation Verfahren zum Herstellen einer integrierten Schaltungsanordnung
EP0171010A2 (de) * 1984-07-30 1986-02-12 Hitachi, Ltd. Thermischer Druckkopf
EP0198646A2 (de) * 1985-04-13 1986-10-22 Konica Corporation Integrierte Halbleiteranordnung
EP0229953A2 (de) * 1985-12-20 1987-07-29 Hitachi, Ltd. Thermischer Druckkopf
EP0241282A2 (de) * 1986-04-08 1987-10-14 Oki Electric Industry Company, Limited Thermischer Kopf

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0440459A1 (de) * 1990-01-31 1991-08-07 Canon Kabushiki Kaisha Tintenstrahlaufzeichnungssystem
US5666142A (en) * 1990-01-31 1997-09-09 Canon Kabushiki Kaisha Ink jet recording system having improved functional devices for driving energy generating members
EP0441635A1 (de) * 1990-02-09 1991-08-14 Canon Kabushiki Kaisha Tintenstrahlaufzeichnungssystem
US5264874A (en) * 1990-02-09 1993-11-23 Canon Kabushiki Kaisha Ink jet recording system
US5567630A (en) * 1990-02-09 1996-10-22 Canon Kabushiki Kaisha Method of forming an ink jet recording device, and head using same

Also Published As

Publication number Publication date
EP0369347A3 (en) 1990-10-24
DE68922823T2 (de) 1996-02-08
EP0369347B1 (de) 1995-05-24
DE68922823D1 (de) 1995-06-29

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