EP0367789A1 - Procede d'isomerisation de triazoles symetriques en triazoles asymetriques - Google Patents
Procede d'isomerisation de triazoles symetriques en triazoles asymetriquesInfo
- Publication number
- EP0367789A1 EP0367789A1 EP88906344A EP88906344A EP0367789A1 EP 0367789 A1 EP0367789 A1 EP 0367789A1 EP 88906344 A EP88906344 A EP 88906344A EP 88906344 A EP88906344 A EP 88906344A EP 0367789 A1 EP0367789 A1 EP 0367789A1
- Authority
- EP
- European Patent Office
- Prior art keywords
- triazole
- alkyl
- formula
- isomerization
- mole
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000000034 method Methods 0.000 title claims abstract description 62
- 238000006317 isomerization reaction Methods 0.000 title claims abstract description 35
- 150000003852 triazoles Chemical class 0.000 title claims description 71
- NSPMIYGKQJPBQR-UHFFFAOYSA-N 4H-1,2,4-triazole Chemical class C=1N=CNN=1 NSPMIYGKQJPBQR-UHFFFAOYSA-N 0.000 claims abstract description 32
- 239000003795 chemical substances by application Substances 0.000 claims abstract description 24
- 150000001875 compounds Chemical class 0.000 claims description 29
- 229910052799 carbon Inorganic materials 0.000 claims description 27
- 150000001721 carbon Chemical group 0.000 claims description 22
- 229910052757 nitrogen Inorganic materials 0.000 claims description 22
- 239000011541 reaction mixture Substances 0.000 claims description 22
- 239000008096 xylene Substances 0.000 claims description 20
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 claims description 18
- 125000004178 (C1-C4) alkyl group Chemical group 0.000 claims description 16
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 claims description 15
- 125000004433 nitrogen atom Chemical group N* 0.000 claims description 15
- 125000001424 substituent group Chemical group 0.000 claims description 11
- 238000011065 in-situ storage Methods 0.000 claims description 10
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 claims description 9
- 229910052794 bromium Inorganic materials 0.000 claims description 9
- 125000004432 carbon atom Chemical group C* 0.000 claims description 9
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 9
- 229910052740 iodine Inorganic materials 0.000 claims description 9
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 claims description 8
- 239000012429 reaction media Substances 0.000 claims description 8
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims description 7
- 229910052710 silicon Inorganic materials 0.000 claims description 7
- 239000010703 silicon Substances 0.000 claims description 7
- 125000006273 (C1-C3) alkyl group Chemical group 0.000 claims description 6
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 claims description 6
- 125000001188 haloalkyl group Chemical group 0.000 claims description 6
- 229910052736 halogen Inorganic materials 0.000 claims description 6
- 229910052739 hydrogen Inorganic materials 0.000 claims description 6
- 229910052760 oxygen Inorganic materials 0.000 claims description 6
- 239000001301 oxygen Substances 0.000 claims description 6
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims description 6
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 5
- 125000004448 alkyl carbonyl group Chemical group 0.000 claims description 5
- 229910052801 chlorine Inorganic materials 0.000 claims description 5
- 125000004169 (C1-C6) alkyl group Chemical group 0.000 claims description 4
- RFFLAFLAYFXFSW-UHFFFAOYSA-N 1,2-dichlorobenzene Chemical compound ClC1=CC=CC=C1Cl RFFLAFLAYFXFSW-UHFFFAOYSA-N 0.000 claims description 4
- 150000002367 halogens Chemical class 0.000 claims description 4
- 125000006677 (C1-C3) haloalkoxy group Chemical group 0.000 claims description 3
- 125000006274 (C1-C3)alkoxy group Chemical group 0.000 claims description 3
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical group [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 3
- 125000001316 cycloalkyl alkyl group Chemical group 0.000 claims description 3
- 229910052731 fluorine Inorganic materials 0.000 claims description 3
- 229920006395 saturated elastomer Polymers 0.000 claims description 3
- 125000006656 (C2-C4) alkenyl group Chemical group 0.000 claims description 2
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 2
- 125000002915 carbonyl group Chemical group [*:2]C([*:1])=O 0.000 claims description 2
- 125000005843 halogen group Chemical group 0.000 claims description 2
- 125000005913 (C3-C6) cycloalkyl group Chemical group 0.000 claims 1
- 150000004820 halides Chemical class 0.000 abstract description 17
- 238000002360 preparation method Methods 0.000 abstract description 7
- 230000000843 anti-fungal effect Effects 0.000 abstract description 5
- 230000001857 anti-mycotic effect Effects 0.000 abstract description 5
- 229940121375 antifungal agent Drugs 0.000 abstract description 5
- 239000002543 antimycotic Substances 0.000 abstract description 5
- 239000006227 byproduct Substances 0.000 abstract description 5
- 230000003641 microbiacidal effect Effects 0.000 abstract description 5
- 150000002118 epoxides Chemical class 0.000 abstract 1
- 238000011084 recovery Methods 0.000 abstract 1
- 238000006243 chemical reaction Methods 0.000 description 38
- 150000002924 oxiranes Chemical class 0.000 description 19
- 239000000203 mixture Substances 0.000 description 16
- 239000002904 solvent Substances 0.000 description 15
- IJGRMHOSHXDMSA-UHFFFAOYSA-N nitrogen Substances N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 13
- -1 oxygen radical Chemical class 0.000 description 13
- 239000000047 product Substances 0.000 description 13
- BTANRVKWQNVYAZ-UHFFFAOYSA-N butan-2-ol Chemical compound CCC(C)O BTANRVKWQNVYAZ-UHFFFAOYSA-N 0.000 description 12
- 150000003254 radicals Chemical class 0.000 description 12
- 239000007789 gas Substances 0.000 description 9
- 239000000376 reactant Substances 0.000 description 9
- IAYPIBMASNFSPL-UHFFFAOYSA-N Ethylene oxide Chemical compound C1CO1 IAYPIBMASNFSPL-UHFFFAOYSA-N 0.000 description 8
- UYOZQDVQTCMNRJ-UHFFFAOYSA-N FC1=CC=C(C=C1)C(C1=CC=C(C=C1)F)[SiH2]CN1N=CNC1 Chemical compound FC1=CC=C(C=C1)C(C1=CC=C(C=C1)F)[SiH2]CN1N=CNC1 UYOZQDVQTCMNRJ-UHFFFAOYSA-N 0.000 description 8
- FQKUGOMFVDPBIZ-UHFFFAOYSA-N flusilazole Chemical compound C=1C=C(F)C=CC=1[Si](C=1C=CC(F)=CC=1)(C)CN1C=NC=N1 FQKUGOMFVDPBIZ-UHFFFAOYSA-N 0.000 description 8
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 6
- 230000015572 biosynthetic process Effects 0.000 description 6
- PAJDCLAJAWXEAO-UHFFFAOYSA-N bis(4-fluorophenyl)-(iodomethyl)-methylsilane Chemical compound C=1C=C(F)C=CC=1[Si](CI)(C)C1=CC=C(F)C=C1 PAJDCLAJAWXEAO-UHFFFAOYSA-N 0.000 description 6
- 238000004587 chromatography analysis Methods 0.000 description 6
- 238000004821 distillation Methods 0.000 description 6
- 230000000694 effects Effects 0.000 description 6
- OKKJLVBELUTLKV-UHFFFAOYSA-N methanol Natural products OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 6
- 238000000926 separation method Methods 0.000 description 6
- 239000000758 substrate Substances 0.000 description 6
- CSRZQMIRAZTJOY-UHFFFAOYSA-N trimethylsilyl iodide Chemical compound C[Si](C)(C)I CSRZQMIRAZTJOY-UHFFFAOYSA-N 0.000 description 6
- AGEZXYOZHKGVCM-UHFFFAOYSA-N benzyl bromide Chemical compound BrCC1=CC=CC=C1 AGEZXYOZHKGVCM-UHFFFAOYSA-N 0.000 description 5
- 239000000543 intermediate Substances 0.000 description 5
- 238000005804 alkylation reaction Methods 0.000 description 4
- 229940045720 antineoplastic alkylating drug epoxides Drugs 0.000 description 4
- 238000001914 filtration Methods 0.000 description 4
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 4
- 230000009257 reactivity Effects 0.000 description 4
- 150000003839 salts Chemical class 0.000 description 4
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 3
- 150000001336 alkenes Chemical class 0.000 description 3
- 230000029936 alkylation Effects 0.000 description 3
- 150000004945 aromatic hydrocarbons Chemical class 0.000 description 3
- 150000003944 halohydrins Chemical class 0.000 description 3
- 239000001257 hydrogen Substances 0.000 description 3
- 150000002576 ketones Chemical class 0.000 description 3
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 3
- 238000001556 precipitation Methods 0.000 description 3
- 230000009467 reduction Effects 0.000 description 3
- FVAUCKIRQBBSSJ-UHFFFAOYSA-M sodium iodide Chemical compound [Na+].[I-] FVAUCKIRQBBSSJ-UHFFFAOYSA-M 0.000 description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 3
- 125000006552 (C3-C8) cycloalkyl group Chemical group 0.000 description 2
- FYGHSUNMUKGBRK-UHFFFAOYSA-N 1,2,3-trimethylbenzene Chemical compound CC1=CC=CC(C)=C1C FYGHSUNMUKGBRK-UHFFFAOYSA-N 0.000 description 2
- 150000000178 1,2,4-triazoles Chemical class 0.000 description 2
- NSPMIYGKQJPBQR-CVMUNTFWSA-N 1h-1,2,4-triazole Chemical class [13CH]=1[15N]=[13CH][15NH][15N]=1 NSPMIYGKQJPBQR-CVMUNTFWSA-N 0.000 description 2
- 125000001255 4-fluorophenyl group Chemical group [H]C1=C([H])C(*)=C([H])C([H])=C1F 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical group [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 2
- NTIZESTWPVYFNL-UHFFFAOYSA-N Methyl isobutyl ketone Chemical compound CC(C)CC(C)=O NTIZESTWPVYFNL-UHFFFAOYSA-N 0.000 description 2
- UIHCLUNTQKBZGK-UHFFFAOYSA-N Methyl isobutyl ketone Natural products CCC(C)C(C)=O UIHCLUNTQKBZGK-UHFFFAOYSA-N 0.000 description 2
- IMNFDUFMRHMDMM-UHFFFAOYSA-N N-Heptane Chemical compound CCCCCCC IMNFDUFMRHMDMM-UHFFFAOYSA-N 0.000 description 2
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 description 2
- OFBQJSOFQDEBGM-UHFFFAOYSA-N Pentane Chemical compound CCCCC OFBQJSOFQDEBGM-UHFFFAOYSA-N 0.000 description 2
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 2
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 2
- 150000001338 aliphatic hydrocarbons Chemical class 0.000 description 2
- 125000000217 alkyl group Chemical group 0.000 description 2
- 229940100198 alkylating agent Drugs 0.000 description 2
- 239000002168 alkylating agent Substances 0.000 description 2
- 125000003277 amino group Chemical group 0.000 description 2
- 238000004458 analytical method Methods 0.000 description 2
- 238000010533 azeotropic distillation Methods 0.000 description 2
- 150000001649 bromium compounds Chemical class 0.000 description 2
- 150000001805 chlorine compounds Chemical class 0.000 description 2
- DCFKHNIGBAHNSS-UHFFFAOYSA-N chloro(triethyl)silane Chemical compound CC[Si](Cl)(CC)CC DCFKHNIGBAHNSS-UHFFFAOYSA-N 0.000 description 2
- MVPPADPHJFYWMZ-UHFFFAOYSA-N chlorobenzene Chemical compound ClC1=CC=CC=C1 MVPPADPHJFYWMZ-UHFFFAOYSA-N 0.000 description 2
- 238000001816 cooling Methods 0.000 description 2
- 150000003950 cyclic amides Chemical class 0.000 description 2
- DIOQZVSQGTUSAI-UHFFFAOYSA-N decane Chemical compound CCCCCCCCCC DIOQZVSQGTUSAI-UHFFFAOYSA-N 0.000 description 2
- 238000000354 decomposition reaction Methods 0.000 description 2
- 230000007423 decrease Effects 0.000 description 2
- 125000005594 diketone group Chemical group 0.000 description 2
- SQNZJJAZBFDUTD-UHFFFAOYSA-N durene Chemical compound CC1=CC(C)=C(C)C=C1C SQNZJJAZBFDUTD-UHFFFAOYSA-N 0.000 description 2
- 150000002170 ethers Chemical class 0.000 description 2
- 229940093499 ethyl acetate Drugs 0.000 description 2
- 235000019439 ethyl acetate Nutrition 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 150000002391 heterocyclic compounds Chemical class 0.000 description 2
- 230000000977 initiatory effect Effects 0.000 description 2
- 150000004694 iodide salts Chemical class 0.000 description 2
- 238000002955 isolation Methods 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 229940043265 methyl isobutyl ketone Drugs 0.000 description 2
- UAEPNZWRGJTJPN-UHFFFAOYSA-N methylcyclohexane Chemical compound CC1CCCCC1 UAEPNZWRGJTJPN-UHFFFAOYSA-N 0.000 description 2
- XYDYWTJEGDZLTH-UHFFFAOYSA-N methylenetriphenylphosphorane Chemical compound C=1C=CC=CC=1P(C=1C=CC=CC=1)(=C)C1=CC=CC=C1 XYDYWTJEGDZLTH-UHFFFAOYSA-N 0.000 description 2
- 238000002156 mixing Methods 0.000 description 2
- JRZJOMJEPLMPRA-UHFFFAOYSA-N olefin Natural products CCCCCCCC=C JRZJOMJEPLMPRA-UHFFFAOYSA-N 0.000 description 2
- 239000003208 petroleum Substances 0.000 description 2
- 239000003880 polar aprotic solvent Substances 0.000 description 2
- 125000006239 protecting group Chemical group 0.000 description 2
- 241000894007 species Species 0.000 description 2
- 150000003738 xylenes Chemical class 0.000 description 2
- 125000004209 (C1-C8) alkyl group Chemical group 0.000 description 1
- RBACIKXCRWGCBB-UHFFFAOYSA-N 1,2-Epoxybutane Chemical compound CCC1CO1 RBACIKXCRWGCBB-UHFFFAOYSA-N 0.000 description 1
- YYSNTDMZDVSZFV-UHFFFAOYSA-N 1,3-dihydro-1,2,4-triazol-2-ylmethyl-bis(4-fluorophenyl)-methylsilane Chemical compound C=1C=C(F)C=CC=1[Si](C=1C=CC(F)=CC=1)(C)CN1CN=CN1 YYSNTDMZDVSZFV-UHFFFAOYSA-N 0.000 description 1
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 1
- OCJBOOLMMGQPQU-UHFFFAOYSA-N 1,4-dichlorobenzene Chemical compound ClC1=CC=C(Cl)C=C1 OCJBOOLMMGQPQU-UHFFFAOYSA-N 0.000 description 1
- JWUCHKBSVLQQCO-UHFFFAOYSA-N 1-(2-fluorophenyl)-1-(4-fluorophenyl)-2-(1H-1,2,4-triazol-1-yl)ethanol Chemical compound C=1C=C(F)C=CC=1C(C=1C(=CC=CC=1)F)(O)CN1C=NC=N1 JWUCHKBSVLQQCO-UHFFFAOYSA-N 0.000 description 1
- BNWQEHYYXTVKOF-UHFFFAOYSA-N 1-benzyl-1,2,4-triazole Chemical compound C1=NC=NN1CC1=CC=CC=C1 BNWQEHYYXTVKOF-UHFFFAOYSA-N 0.000 description 1
- JRLPEMVDPFPYPJ-UHFFFAOYSA-N 1-ethyl-4-methylbenzene Chemical compound CCC1=CC=C(C)C=C1 JRLPEMVDPFPYPJ-UHFFFAOYSA-N 0.000 description 1
- SNTWKPAKVQFCCF-UHFFFAOYSA-N 2,3-dihydro-1h-triazole Chemical compound N1NC=CN1 SNTWKPAKVQFCCF-UHFFFAOYSA-N 0.000 description 1
- PQXKWPLDPFFDJP-UHFFFAOYSA-N 2,3-dimethyloxirane Chemical compound CC1OC1C PQXKWPLDPFFDJP-UHFFFAOYSA-N 0.000 description 1
- JECYNCQXXKQDJN-UHFFFAOYSA-N 2-(2-methylhexan-2-yloxymethyl)oxirane Chemical compound CCCCC(C)(C)OCC1CO1 JECYNCQXXKQDJN-UHFFFAOYSA-N 0.000 description 1
- XARVANDLQOZMMJ-CHHVJCJISA-N 2-[(z)-[1-(2-amino-1,3-thiazol-4-yl)-2-oxo-2-(2-oxoethylamino)ethylidene]amino]oxy-2-methylpropanoic acid Chemical compound OC(=O)C(C)(C)O\N=C(/C(=O)NCC=O)C1=CSC(N)=N1 XARVANDLQOZMMJ-CHHVJCJISA-N 0.000 description 1
- MPGABYXKKCLIRW-UHFFFAOYSA-N 2-decyloxirane Chemical compound CCCCCCCCCCC1CO1 MPGABYXKKCLIRW-UHFFFAOYSA-N 0.000 description 1
- NJWSNNWLBMSXQR-UHFFFAOYSA-N 2-hexyloxirane Chemical compound CCCCCCC1CO1 NJWSNNWLBMSXQR-UHFFFAOYSA-N 0.000 description 1
- AAMHBRRZYSORSH-UHFFFAOYSA-N 2-octyloxirane Chemical compound CCCCCCCCC1CO1 AAMHBRRZYSORSH-UHFFFAOYSA-N 0.000 description 1
- DUXCSEISVMREAX-UHFFFAOYSA-N 3,3-dimethylbutan-1-ol Chemical compound CC(C)(C)CCO DUXCSEISVMREAX-UHFFFAOYSA-N 0.000 description 1
- QCQCHGYLTSGIGX-GHXANHINSA-N 4-[[(3ar,5ar,5br,7ar,9s,11ar,11br,13as)-5a,5b,8,8,11a-pentamethyl-3a-[(5-methylpyridine-3-carbonyl)amino]-2-oxo-1-propan-2-yl-4,5,6,7,7a,9,10,11,11b,12,13,13a-dodecahydro-3h-cyclopenta[a]chrysen-9-yl]oxy]-2,2-dimethyl-4-oxobutanoic acid Chemical compound N([C@@]12CC[C@@]3(C)[C@]4(C)CC[C@H]5C(C)(C)[C@@H](OC(=O)CC(C)(C)C(O)=O)CC[C@]5(C)[C@H]4CC[C@@H]3C1=C(C(C2)=O)C(C)C)C(=O)C1=CN=CC(C)=C1 QCQCHGYLTSGIGX-GHXANHINSA-N 0.000 description 1
- XDTMQSROBMDMFD-UHFFFAOYSA-N Cyclohexane Chemical compound C1CCCCC1 XDTMQSROBMDMFD-UHFFFAOYSA-N 0.000 description 1
- ZAFNJMIOTHYJRJ-UHFFFAOYSA-N Diisopropyl ether Chemical compound CC(C)OC(C)C ZAFNJMIOTHYJRJ-UHFFFAOYSA-N 0.000 description 1
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 1
- BZLVMXJERCGZMT-UHFFFAOYSA-N Methyl tert-butyl ether Chemical compound COC(C)(C)C BZLVMXJERCGZMT-UHFFFAOYSA-N 0.000 description 1
- FXHOOIRPVKKKFG-UHFFFAOYSA-N N,N-Dimethylacetamide Chemical compound CN(C)C(C)=O FXHOOIRPVKKKFG-UHFFFAOYSA-N 0.000 description 1
- 238000007126 N-alkylation reaction Methods 0.000 description 1
- MNGHIDSOIIPDEZ-UHFFFAOYSA-N N1N=C(N=C1)[SiH2]C Chemical class N1N=C(N=C1)[SiH2]C MNGHIDSOIIPDEZ-UHFFFAOYSA-N 0.000 description 1
- GOOHAUXETOMSMM-UHFFFAOYSA-N Propylene oxide Chemical compound CC1CO1 GOOHAUXETOMSMM-UHFFFAOYSA-N 0.000 description 1
- AWMVMTVKBNGEAK-UHFFFAOYSA-N Styrene oxide Chemical compound C1OC1C1=CC=CC=C1 AWMVMTVKBNGEAK-UHFFFAOYSA-N 0.000 description 1
- 230000001133 acceleration Effects 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 150000001298 alcohols Chemical class 0.000 description 1
- 150000001299 aldehydes Chemical class 0.000 description 1
- 150000004703 alkoxides Chemical class 0.000 description 1
- 125000004453 alkoxycarbonyl group Chemical group 0.000 description 1
- 230000002152 alkylating effect Effects 0.000 description 1
- 150000001408 amides Chemical class 0.000 description 1
- 150000001412 amines Chemical class 0.000 description 1
- 238000013459 approach Methods 0.000 description 1
- 239000000010 aprotic solvent Substances 0.000 description 1
- 125000003118 aryl group Chemical group 0.000 description 1
- 239000012298 atmosphere Substances 0.000 description 1
- 125000004429 atom Chemical group 0.000 description 1
- KCXMKQUNVWSEMD-UHFFFAOYSA-N benzyl chloride Chemical compound ClCC1=CC=CC=C1 KCXMKQUNVWSEMD-UHFFFAOYSA-N 0.000 description 1
- 229940073608 benzyl chloride Drugs 0.000 description 1
- IYYIVELXUANFED-UHFFFAOYSA-N bromo(trimethyl)silane Chemical compound C[Si](C)(C)Br IYYIVELXUANFED-UHFFFAOYSA-N 0.000 description 1
- VSCMNSZBNLOXNR-UHFFFAOYSA-N bromo(triphenyl)silane Chemical compound C=1C=CC=CC=1[Si](C=1C=CC=CC=1)(Br)C1=CC=CC=C1 VSCMNSZBNLOXNR-UHFFFAOYSA-N 0.000 description 1
- 244000309464 bull Species 0.000 description 1
- 230000015556 catabolic process Effects 0.000 description 1
- MNKYQPOFRKPUAE-UHFFFAOYSA-N chloro(triphenyl)silane Chemical compound C=1C=CC=CC=1[Si](C=1C=CC=CC=1)(Cl)C1=CC=CC=C1 MNKYQPOFRKPUAE-UHFFFAOYSA-N 0.000 description 1
- SPFTYBCGSWVBBX-UHFFFAOYSA-N chloromethyl-bis(4-fluorophenyl)-methylsilane Chemical compound C=1C=C(F)C=CC=1[Si](CCl)(C)C1=CC=C(F)C=C1 SPFTYBCGSWVBBX-UHFFFAOYSA-N 0.000 description 1
- IJOOHPMOJXWVHK-UHFFFAOYSA-N chlorotrimethylsilane Chemical compound C[Si](C)(C)Cl IJOOHPMOJXWVHK-UHFFFAOYSA-N 0.000 description 1
- 239000006184 cosolvent Substances 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 230000018109 developmental process Effects 0.000 description 1
- 229940117389 dichlorobenzene Drugs 0.000 description 1
- 238000007865 diluting Methods 0.000 description 1
- QILSFLSDHQAZET-UHFFFAOYSA-N diphenylmethanol Chemical compound C=1C=CC=CC=1C(O)C1=CC=CC=C1 QILSFLSDHQAZET-UHFFFAOYSA-N 0.000 description 1
- 229940079593 drug Drugs 0.000 description 1
- 239000003814 drug Substances 0.000 description 1
- 238000006735 epoxidation reaction Methods 0.000 description 1
- 150000002148 esters Chemical class 0.000 description 1
- 229940035423 ethyl ether Drugs 0.000 description 1
- 239000012634 fragment Substances 0.000 description 1
- 238000013467 fragmentation Methods 0.000 description 1
- 238000006062 fragmentation reaction Methods 0.000 description 1
- 125000000524 functional group Chemical group 0.000 description 1
- 238000004817 gas chromatography Methods 0.000 description 1
- 150000002390 heteroarenes Chemical class 0.000 description 1
- 125000000623 heterocyclic group Chemical group 0.000 description 1
- 239000004615 ingredient Substances 0.000 description 1
- HVTICUPFWKNHNG-UHFFFAOYSA-N iodoethane Chemical compound CCI HVTICUPFWKNHNG-UHFFFAOYSA-N 0.000 description 1
- INQOMBQAUSQDDS-UHFFFAOYSA-N iodomethane Chemical compound IC INQOMBQAUSQDDS-UHFFFAOYSA-N 0.000 description 1
- VZNYXGQMDSRJAL-UHFFFAOYSA-N iodomethyl(trimethyl)silane Chemical compound C[Si](C)(C)CI VZNYXGQMDSRJAL-UHFFFAOYSA-N 0.000 description 1
- XJTQJERLRPWUGL-UHFFFAOYSA-N iodomethylbenzene Chemical compound ICC1=CC=CC=C1 XJTQJERLRPWUGL-UHFFFAOYSA-N 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 229910052987 metal hydride Inorganic materials 0.000 description 1
- 150000004681 metal hydrides Chemical class 0.000 description 1
- 229910021645 metal ion Inorganic materials 0.000 description 1
- PHMNHMRVFPSCHO-UHFFFAOYSA-N methanol;1h-1,2,4-triazole Chemical class OC.C=1N=CNN=1 PHMNHMRVFPSCHO-UHFFFAOYSA-N 0.000 description 1
- GYNNXHKOJHMOHS-UHFFFAOYSA-N methyl-cycloheptane Natural products CC1CCCCCC1 GYNNXHKOJHMOHS-UHFFFAOYSA-N 0.000 description 1
- SYSQUGFVNFXIIT-UHFFFAOYSA-N n-[4-(1,3-benzoxazol-2-yl)phenyl]-4-nitrobenzenesulfonamide Chemical class C1=CC([N+](=O)[O-])=CC=C1S(=O)(=O)NC1=CC=C(C=2OC3=CC=CC=C3N=2)C=C1 SYSQUGFVNFXIIT-UHFFFAOYSA-N 0.000 description 1
- QJGQUHMNIGDVPM-UHFFFAOYSA-N nitrogen group Chemical group [N] QJGQUHMNIGDVPM-UHFFFAOYSA-N 0.000 description 1
- ZCYXXKJEDCHMGH-UHFFFAOYSA-N nonane Chemical compound CCCC[CH]CCCC ZCYXXKJEDCHMGH-UHFFFAOYSA-N 0.000 description 1
- BKIMMITUMNQMOS-UHFFFAOYSA-N normal nonane Natural products CCCCCCCCC BKIMMITUMNQMOS-UHFFFAOYSA-N 0.000 description 1
- TVMXDCGIABBOFY-UHFFFAOYSA-N octane Chemical compound CCCCCCCC TVMXDCGIABBOFY-UHFFFAOYSA-N 0.000 description 1
- 150000003961 organosilicon compounds Chemical class 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 150000003003 phosphines Chemical group 0.000 description 1
- 239000002798 polar solvent Substances 0.000 description 1
- 238000000746 purification Methods 0.000 description 1
- 150000003222 pyridines Chemical class 0.000 description 1
- 238000000197 pyrolysis Methods 0.000 description 1
- 150000003242 quaternary ammonium salts Chemical class 0.000 description 1
- 230000008929 regeneration Effects 0.000 description 1
- 238000011069 regeneration method Methods 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 238000012552 review Methods 0.000 description 1
- 238000000526 short-path distillation Methods 0.000 description 1
- 229910000029 sodium carbonate Inorganic materials 0.000 description 1
- 235000009518 sodium iodide Nutrition 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 238000010561 standard procedure Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 238000003786 synthesis reaction Methods 0.000 description 1
- 150000003512 tertiary amines Chemical group 0.000 description 1
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 1
- 150000003573 thiols Chemical class 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
- C07F7/02—Silicon compounds
- C07F7/08—Compounds having one or more C—Si linkages
- C07F7/0803—Compounds with Si-C or Si-Si linkages
- C07F7/0825—Preparations of compounds not comprising Si-Si or Si-cyano linkages
- C07F7/083—Syntheses without formation of a Si-C bond
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
- C07F7/02—Silicon compounds
- C07F7/08—Compounds having one or more C—Si linkages
- C07F7/0803—Compounds with Si-C or Si-Si linkages
- C07F7/081—Compounds with Si-C or Si-Si linkages comprising at least one atom selected from the elements N, O, halogen, S, Se or Te
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
- C07F7/02—Silicon compounds
- C07F7/08—Compounds having one or more C—Si linkages
- C07F7/0803—Compounds with Si-C or Si-Si linkages
- C07F7/081—Compounds with Si-C or Si-Si linkages comprising at least one atom selected from the elements N, O, halogen, S, Se or Te
- C07F7/0812—Compounds with Si-C or Si-Si linkages comprising at least one atom selected from the elements N, O, halogen, S, Se or Te comprising a heterocyclic ring
Definitions
- U.S. Patents 4,530,922 and 4,510,136 disclose the preparation of mixtures of isomeric 1,2,4-triazolyl methylsilanes in which the unsymmetrical isomer pre- dominates.
- U.S. 4,639,527 discloses the production of ⁇ -hydroxyalkyl-1,2,4-triazoles from ⁇ -hydroxyalkyl- 1,3,4-triazoles by heating the symmetrical isomers with base in polar-aprotic solvents.
- EP-A-143,379 (Bayer) discloses the production of a class of ⁇ -hydroxyalkyl-1,2,4-triazoles from appropriate oxiranes without concurrent symmetrical triazole formation in the presence of base and cyclic amides.
- Q is an optionally substituted radical of up to about 35 carbon atoms bonded to the triazole or to X through a carbon atom; and X is Cl, Br or I; provided that
- heteroatom substituents on the carbon atom of Q bonded to the nitrogen atom of the triazole or to X are limited to one oxygen radical so as to form an ether linkage or one silicon radical;
- Q are the radicals of antifungal, antimycotic or microbicidal 1H-1,2,4- triazoles including the following:
- R 1 is C 1 -C 4 alkyl, OR 11 or CN;
- R 2 is H, C 1 -C 4 alkyl, C 3 -C 8 cycloalkyl, C 4 -C 6
- R 3 is halogen or phenyl
- R 4 is H or halogen
- R 5 is C 1 -C 4 alkyl
- R 6 is C 5 -C 7 alkylcarbonyl or
- R 7 is H or CH 3 ;
- R 8 and R 9 are independently C 1 -C 4 alkyl
- R 10 is H or C 1 -C 4 alkyl
- R 11 is H, C 1 -C 4 alkyl or C 2 -C 4 alkenyl
- R 12 and R 13 are independently H or C 1 -C 4 alkyl; n is 0, 1 or 2; and
- Z is O or CH 2 .
- Q is generally a radical of up to about 25 carbon atoms, usually up to about 20 carbon atoms, preferably between about 10 and about 20 carbon atoms.
- Preferred O radicals include
- Q is not substituted by a hydroxyl group.
- the isomerizing agent should be present in a concentration of at least about 1 mole %, usually about 1-20 mole %, preferably about 2-10 mole %, especially, about 6 mole %.
- reaction media include N,N-dimethyl- formamide, toluene, xylene, ortho-diehlorobenzene or methylethyl ketone, especially, xylene.
- the iso- merizing agent of Formula III is formed in situ by initially introducing into the reaction media a compound of the Formulae IV, V or VI different from the compound of Formula III
- R 14 and R 15 are independently H, C 1 -C 6 alkyl, C 2 -C 6 alkylcarbonyl, C 2 -C 6 alkoxycarbonyl,.
- R 16 , R 17 and R 18 are independently C 1 -C 8 alkyl, -
- Y and Z are independently H, F, Cl, Br, I, C 1 -C 3 alkyl, C 1 -C 3 haloalkyl, C 1 -C 3 alkoxy, C 1 -C 3 haloalkoxy, C 1 -C 3 alkyl S(O) m , C 1 -C 3 haloalkyl S(O) m , NO 2 , CN or phenyl; and m is 0, 1 or 2.
- This invention also comprises a process (Equation 2) for the conversion of a symmetric 4H-1,2,4-triazole of Formula VII to an unsymmetric 1H-1,2,4-triazole of Formula VIII in the presence of an oxirane, L.
- J is an optionally substituted radical of up to about 35 carbon atoms bonded to the triazole through a carbon atom; provided that
- substituents on the carbinol radical are selected from the group consisting of hydrogen or a radical bonded through a carbon atom;
- the remaining substituent on the carbon atom of J bonded to the nitrogen atom of the triazole is selected from either a second hydrogen atom or an optionally substituted radical bonded through a carbon atom; (d) when the remaining substituent on the carbon atom of J bonded to the nitrogen atom of the triazole is other than a second hydrogen atom, then at least one of the substituents of the carbinol carbon is a hydrogen atom; and
- L is the corresponding oxirane derivative of the radical J where the epoxide ether linkage is formed between the carbinol hydroxyl group of
- Nonlimiting examples of J are the radicals of antifungal, antimycotic or microbicidal 1H-1,2,4- triazole carbinols including the following: > ;f R
- R 19 is H, C 1 -C 4 alkyl, C 3 -C 8 cycloalkyl C 4 -C 6
- R 20 is halogen or phenyl;
- R 21 is H or halogen;
- R 22 is C 1 -C 4 alkyl;
- R 23 is or C 5 -C 7 alkylcarbonyl; and 21 p is 0, 1 or 2.
- J is generally a radical of up to about 25 carbon atoms, usually up to about 20 carbon atoms, preferably between about 10 and about 20 carbon atoms.
- Preferred J radicals and the corresponding oxiranes L include
- the oxirane L is formed in situ by initially introducing into the reaction media a compound of Formula IX different from the oxirane L,
- R 24 is H, C 1 -C 2 alkyl, C 2 -C 6 alkylcarbonyl; R 25 and R 26 are independently H, C 1 -C 6 alkyl, - R 27 and R 28 are independently H, F, Cl, Br, I,
- R 25 or R 26 is hydrogen.
- Equation A V. Kendal, J. Org. Chem. 35. 2246, 1970 and C. Temple and J. A. Montgomery, Triazoles. Vol. 37 of The Chemistry of Heterocyclic Compounds. A. Weissberger and E. C. Taylor, Eds., John Wiley and Sons, New York, 1981, page 5). While such alkylation reactions (Equations A and B) can be conveniently carried out by the treatment of a metal salt (M) of the 1,2,4-triazole (1) with an alkylating agent (RZ or an oxirane), mixtures of the unsymmetrical 1H-1,2,4-alkyltriazole (2ab) and symmetrical 4H-1,2,4-alkyltriazole (3ab result (see J. Org. Chem. 35. 2246, 1970). Equation A
- the unsymmetrical 1H-1,2,4-triazole is the major product with the amounts of the symmetrical 4H-1,2,4-triazole by-product varying with the reaction conditions (solvent, temperature), nature of the metal ion, and nature of the alkylating agent.
- Q or J represent the radicals of antifungal, antimycotic or microbicidal 1H-1,2,4-triazoles (compounds of Formula II or Formula VIII) are well known in the art.
- German Patent Application 3,326,456 (published January 31, 1985). 12. European Patent Application 158,448 (published October 16, 1985).
- German Patent Application 3,018,865 (published November 26, 1981).
- the intermediate 4 can be prepared according to the teachings of the previously cited application.
- the triazole of Formula II where Q is Q 7 and the triazole of Formula VIII where J is J 2 are disclosed in U.S. 4,217,129.
- the halides of Formula III where Q is Q 7 and the oxirane L 2 can be prepared from the ⁇ , ⁇ -unsaturated ketone (5 ) by
- Intermediate 5 can be prepared from diketone 6 and aldehyde 2 according to the methods described in K. Uchara, F. Kitamura, M. Tanaka, Bull. Chem. Soc. Jap. 49, 493 (1976). v
- Diketone 6 can be prepared according to the teachings in R. Levine, J. A. Conroy, J. Adams, C. R. Hauser, J. Am. Chem. Soc. 67, 1510 (1945).
- Aldehyde 7 is available through the oxidation of commercially available 3,3-dimethyl-1-butanol by known methods.
- the triazoles of Formula II where Q is Q 8 and of Formula VIII where J is J 3 are disclosed in U.S. 4,243,405 and U.S. 4,205,075.
- the halides of Formula III where Q is Q 8 can be prepared by metal hydride reductions of the ⁇ -haloketones 8 disclosed in the previously cited patents by methods described in H. O. House, Modern Synthetic Reactions, second edition, W. A. Benjamin, 1972, pages 474 to 476.
- the epoxide L 3 can be prepared from the corresponding halohydrins of Formula III utilizing methodology also described in Modern Synthetic Reactions, pages 435 and 436.
- halides of Formula III where Q is Q 10 can be prepared from the ketone 9 disclosed in the previously cited reference by reaction with methylene triphenylphosphorane followed by conversion of the resulting olefin 10 to a halohydrin (Formula III,
- the triazoles of Formula II where Q is Q 11 , the triazole of Formula VIII where J is J 6 , and the oxirane L 6 are disclosed in EP-A-40,345.
- the halides of Formula III where Q is Q 11 can be prepared from ketone 11 disclosed in the previously cited reference by reaction with methylenetriphenylphosphorane followed by conversion of the resulting olefin 12 to a halohydrin (Formula III, Q 11 ) as described in Modern Synthetic Reactions, pages 432 to 442.
- Equation C treatment of the 4H-1,2,4-triazole I with the isomerizating agent QX results in the formation of the quaternary ammonium salt X which then undergoes fragmentation to the 1H-1,2,4-triazole II with the regeneration of QX.
- This sequence is exemplified in Equation E by the isomerization of 1-[[bis(4-fluorophenyl)methylsilyl]- methyl]-4H-1,2,4-triazole (Q is Q 1 ) to 1-[[bis(4- fluorophenyl)methylsilyl]methyl]-1H-1,2,4-triazole.
- Equation D The process of Equation D is exemplified by the isomerization of (RS)-2,4'-difluoro- ⁇ -(4H-1,2,4- triazol-1-ylmethyl)benzhydryl alcohol (J is J 1 ) to (RS)-2,4'-difluoro- ⁇ -(1H-1,2,4-triazol-1-ylmethyl)- benzhydryl alcohol (Equation F).
- Q and J would not contain functional groups which themselves would be reactive with the isomerizing agents QX or L, for example, thiols or amines including amino groups, substituted amino groups or nitrogen containing heterocycles, or that such functionality would first have to be render- ed non reactive prior to carrying out the isomerization process, utilizing a molar excess of the isomerizing agent or "protecting groups" well known in the art. See for example, T. W. Greene, Protective Groups in Orqanic Synthesis, John Wiley and Sons, New York, 1981.
- Suitable solvents include aliphatic and aromatic hydrocarbons, halogenated aromatic hydrocarbons, ethers, esters, and amides.
- Specific solvents include petroleum fractions, petroleum ethers, C 5 -C 8 aliphatic hydrocarbons, for example, pentane, hexane, heptane, octane, nonane, decane, cyclohexane or methylcyclohexane, benzene, toluene, xylenes, chlorobenzene, dichlorobenzene, trimethylbenzene, durene, p-ethyltoluene, ethylether, methyl-t-butyl ether, i-propylether, tetrahydrofuran, dioxane, ethyl acetate, dimethylacetamide, dimethylformamide and N-methylpyrrolidinone.
- Preferred solvents include aromatic and halogenated aromatic
- the rate and/or efficiency of the isomerization process is affected by moisture, the reaction temperature, the degree of. mixing of ingredients, and the concentrations, ratios and chemical structure of the reactants.
- the present invention is conducted at elevated temperatures usually between about 100oC and about
- 300°C preferably between about 100oC and about 250oC more preferably between about 140oC and about 200oC.
- the main I'imitation is the solubility of the materials in the solvent at the reaction temperature if a solvent is to be used.
- reactions can be carried out in the presence of less than stoichiometric (i.e., less than about 90%) amounts of these reactants (QX or L).
- QX or L reactants
- quantities of QX or epoxide L of about 0.1 mole % relative to the amount of the symmetrical triazoles I or VII can effect isomerization to the unsymmetrical isomer
- the preferred range of these reactants is about 1 to 20 mole %, more preferred is about 2 to 10 mole % most preferred is about 4 to 8 mole %, especially preferred is about 6 mole %.
- Factors to consider in the selection of the ratio of QX or L with respect to the triazoles I or VII is the desired rate of isomerization, reaction temperature, relative reactivity of QX or L and the ease of separ- ation of these reactants from the product unsymmetrical triazole in the reaction mixture.
- the use of very high temperatures for the conversion can effect the decomposition of QX or L resulting in a decrease in the conversion rate and/or reduced yields of the product triazole, however.
- the relative reaction rate is also affected by the reactivity of the isomerizing agents QX and L.
- iodides are more reactive than the corresponding bromides which are more reactive than the chlorides.
- Primary halides QX are more reactive than secondary halides.
- Primary epox- ides L are more reactive than secondary epoxides.
- the addition of pyri- dines, tertiary phosphines or tertiary amines may enhance the reactivity of these halides.
- the isomerizing agents QX or L can also be conveniently generated in situ in the reaction mixture as described in Equations G and H.
- RX represents a halide, silyl- halide or silylmethylhalide of Formula IV , V or VI. respectively different from QX.
- Triazole substrates of Formula I bearing free hydroxyl groups may react with compounds of
- halides of Formula IV are commercially available or can be prepared from commercially available alcohols by methods well known to one skilled in the art.
- Silylhalides and silyl- methylhalides are also available from commercial sources or can be prepared, as described in V. Bazant, V. Chvalovsky, J. Rathousky, Qrganosilicon Compounds. Academic Press, New York, 1965 and C. Eaborn, Organosilicon Compounds. Butterworths Scientific Publications, London, 1960.
- iodides are more reactive than the corresponding bromides which are more reactive than the chlorides.
- Primary alkyl or arylalkyl halides are more reactive than secondary derivatives.
- Suitable compounds of Formulae IV, V and VI include methyl iodide, ethyl iodide, benzyl iodide, benzyl bromide, benzyl chloride, trimethyl- silyl iodide, trimethylsilyl bromide, trimethylsilyl chloride, triethylsilyl chloride, triphenylsilyl bromide, triphenylsilyl chloride and trimethylsilyl- methyl iodide.
- the epoxide L can be generated by initial reaction of an epoxide of Formula IX different from L with the triazole of Formula VII.
- L then effects the isomerization of the symmetrical triazole VII to the unsymmetrical triazole VIII and is subsequently regenerated.
- the reaction conditions for this sequence are as previously discussed where the isomerization is effected directly by L.
- the process is again most useful the higher the ratio of the substrate triazole VII to the initiating epoxide IX. The higher this ratio, the lower the reduction in yield of the product triazole VIII resulting f rom the formation of the triazole XIII and the easier the separation of the product from the other species of the reaction mixture.
- Many epoxides of Formula IX are commercially available or can be prepared from commercial olefins by epoxidation methods well known to one skilled in the art.
- Suitable epoxides of Formula IX include 1,2-epoxybutane, 2,3-epoxybutane, 1,2-epoxydecane, 1,2-epoxydodecane, styrene oxide, 1,2-e ⁇ oxyhexane, 1,2-epoxyoctane or 1,2-epoxypropane.
- Equation I by the isomerization of the symmetrical triazole of Q 6 , conversion of a triazole of Formula I, where the carbon atom of Q bonded to the nitrogen atom of the triazole is also bonded to a carbinol group, to the corresponding triazole of Formula II, by reaction with a halide of Formula III can afford an epoxide XIV in addition to or instead of the reformation of halide III.
- the epoxide XIV so formed can then effect the conversion of the triazole I as previously described in Equations D and F.
- the epoxide XIV can also be formed utilizing a halide of Formulae IV, V or VI as described in Equation G.
- xylene refers to a mixture of the ortho, meta and para isomers. All gas chromatographic analyses were performed on a Hewlett-Packard 5840A Gas Chromatograph equipped with an FID detector utilizing a HP17 flexible capillary column (50% phenyl sili- cone). The initial column temperature was 135oC and was programmed to rise 8oC/min. from 135-250oC.
- the bis (4-fluorophenyl) (iodomethyl)methysilane utilized as the isomerizing agent in Examples 1 and 5 was prepared as follows:
- the reaction mixture was heated and dried azeotropically by removal of solvent through the distilling head. The distillation was continued until the temperature of the reaction mixture reached 175oC at which point all of the sec-butanol had been removed. The distil- lation head was then removed and replaced with a stopper, a con denser was inserted between the flask and the gas inlet tube and the mixture refluxed at
- reaction mixture indicated 97% conversion of the starting 4H-1,2,4-triazole to 1-[[bis(4-fluorophenyl)- methylsilyl]methyl]-1H-1,2,4-triazole by comparison to an authentic sample prepared according to U.S. 4,510,136.
- the reaction mixture was diluted to a 25% concentration of the 1H-1,2,4-triazole product by addition of xylene/ethylacetate (9:1).
- Aqueous 37% hydrochloric acid (12 g) was added at a rate such that the temperature of the mixture remained below 30oC.
- the resulting hydrochloride salt of the product which precipitated was collected by filtration and washed with xylene (60 ml).
- Example 3 isomerization of 1-[[bis(4-fluoro ⁇ henyl)methylsilyl]- methyl]-4H-1,2,4-triazole to 1-[[bis(4-fluorophenyl)- methylsilyl]methyl]-1H-1,2,4-triazole utilizing trimethylsilyl iodide - identification of bis (4-fluorophenyl)(iodomethyl)methylsilane in the reaction mixture 1-[[Bis(4-fluorophenyl)methylsilyl]methyl]-4H-
- 1,2,4-triazole was dried in xylene/sec-butanol (1:1) by azeotropic removal of the sec-butanol from the mixture through distillation. Cooling of the resulting xylene solution resulted in precipitation of the dried 4H-1,2,4-triazole which was collected by filtration.
- the compound (25 g, 79 mmole), trimethylsilyl iodide (1.4 g, 7 mmole) and xylene (25 ml) were combined, solvent was removed by distillation until the temperature of the reaction mixture reached 175oC and then heating was continued at 175°C under nitrogen for 20 hrs.
- Example 5 Isomerization of 1-[[bis(4-fluorophenyl)methylsilyl]- methyl]-4H-1,2,4-triazole to 1-[[bis(4-fluorophenyl)-methylsilyllmethyll-1H-1.2.4-triazole 1-[[Bis(4-fluorophenyl)methylsilyl]methyl]-4H- 1,2,4-triazole was azeotropically dried as described in Examples 2 and 3.
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- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Pharmaceuticals Containing Other Organic And Inorganic Compounds (AREA)
- Plural Heterocyclic Compounds (AREA)
- Low-Molecular Organic Synthesis Reactions Using Catalysts (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
- Catalysts (AREA)
Abstract
Des 4H-1,2,4-triazoles symétriques sont isomérisés en 1H-1,2,4-triazoles correspondants en présence d'un agent d'isomérisation consistant en un époxyde ou un halogénure organique. Ce procédé est utile pour la récupération de 1H-1,2,4-triazole antifongicide, antimycotique ou microbicide par isomérisation du sous-produit 4H-1,2,4-triazole indésiré formé pendant leur préparation.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US6261987A | 1987-06-16 | 1987-06-16 | |
US62619 | 1987-06-16 |
Publications (1)
Publication Number | Publication Date |
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EP0367789A1 true EP0367789A1 (fr) | 1990-05-16 |
Family
ID=22043686
Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
EP88906344A Pending EP0367789A1 (fr) | 1987-06-16 | 1988-06-13 | Procede d'isomerisation de triazoles symetriques en triazoles asymetriques |
EP88305372A Expired - Lifetime EP0296745B1 (fr) | 1987-06-16 | 1988-06-13 | Procédé pour l'isomérisation de triazoles symmétriques à triazoles assymétriques |
Family Applications After (1)
Application Number | Title | Priority Date | Filing Date |
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EP88305372A Expired - Lifetime EP0296745B1 (fr) | 1987-06-16 | 1988-06-13 | Procédé pour l'isomérisation de triazoles symmétriques à triazoles assymétriques |
Country Status (6)
Country | Link |
---|---|
EP (2) | EP0367789A1 (fr) |
AT (1) | ATE115140T1 (fr) |
BR (1) | BR8807554A (fr) |
DE (1) | DE3852344T2 (fr) |
ES (1) | ES2064351T3 (fr) |
WO (1) | WO1988010255A1 (fr) |
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NZ270418A (en) * | 1994-02-07 | 1997-09-22 | Eisai Co Ltd | Polycyclic triazole & imidazole derivatives, antifungal compositions |
CN102321035B (zh) * | 2011-06-14 | 2013-07-03 | 江苏七洲绿色化工股份有限公司 | 一种从1,2,4-三氮唑取代物中除去1,3,4-三氮唑取代物的方法 |
CN113582979B (zh) * | 2021-08-20 | 2023-02-24 | 浙江禾本科技股份有限公司 | 一种由异构体合成丙环唑的方法 |
Family Cites Families (4)
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CA1176258A (fr) * | 1981-06-24 | 1984-10-16 | William K. Moberg | Derives de triazole-1,2,4 et d'imidazole fongicides |
DE3202613A1 (de) * | 1982-01-27 | 1983-08-04 | Bayer Ag, 5090 Leverkusen | Antimykotische mittel |
DE3342692A1 (de) * | 1983-11-25 | 1985-06-05 | Bayer Ag, 5090 Leverkusen | Verfahren zur herstellung von ss-hydroxyethyl-(1,2,4-triazol)-derivaten |
DE3342693A1 (de) * | 1983-11-25 | 1985-06-05 | Bayer Ag, 5090 Leverkusen | Verfahren zur herstellung von ss-hydroxy-ethyl-(1,2,4-triazol)- derivaten |
-
1988
- 1988-06-13 AT AT88305372T patent/ATE115140T1/de not_active IP Right Cessation
- 1988-06-13 EP EP88906344A patent/EP0367789A1/fr active Pending
- 1988-06-13 BR BR888807554A patent/BR8807554A/pt unknown
- 1988-06-13 ES ES88305372T patent/ES2064351T3/es not_active Expired - Lifetime
- 1988-06-13 DE DE3852344T patent/DE3852344T2/de not_active Expired - Fee Related
- 1988-06-13 WO PCT/US1988/001950 patent/WO1988010255A1/fr not_active Application Discontinuation
- 1988-06-13 EP EP88305372A patent/EP0296745B1/fr not_active Expired - Lifetime
Non-Patent Citations (1)
Title |
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See references of WO8810255A1 * |
Also Published As
Publication number | Publication date |
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BR8807554A (pt) | 1990-05-22 |
WO1988010255A1 (fr) | 1988-12-29 |
EP0296745A1 (fr) | 1988-12-28 |
DE3852344T2 (de) | 1995-05-18 |
DE3852344D1 (de) | 1995-01-19 |
ES2064351T3 (es) | 1995-02-01 |
ATE115140T1 (de) | 1994-12-15 |
EP0296745B1 (fr) | 1994-12-07 |
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