EP0146302A1 - Light-sensitive silver halide photographic material for direct-post and method for processing the same - Google Patents
Light-sensitive silver halide photographic material for direct-post and method for processing the same Download PDFInfo
- Publication number
- EP0146302A1 EP0146302A1 EP84308402A EP84308402A EP0146302A1 EP 0146302 A1 EP0146302 A1 EP 0146302A1 EP 84308402 A EP84308402 A EP 84308402A EP 84308402 A EP84308402 A EP 84308402A EP 0146302 A1 EP0146302 A1 EP 0146302A1
- Authority
- EP
- European Patent Office
- Prior art keywords
- group
- silver halide
- direct
- light
- posi
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
- -1 silver halide Chemical class 0.000 title claims abstract description 123
- 229910052709 silver Inorganic materials 0.000 title claims abstract description 76
- 239000004332 silver Substances 0.000 title claims abstract description 76
- 239000000463 material Substances 0.000 title claims abstract description 41
- 238000000034 method Methods 0.000 title claims abstract description 27
- 238000012545 processing Methods 0.000 title claims abstract description 25
- 239000000839 emulsion Substances 0.000 claims abstract description 33
- 229910021607 Silver chloride Inorganic materials 0.000 claims abstract description 15
- HKZLPVFGJNLROG-UHFFFAOYSA-M silver monochloride Chemical compound [Cl-].[Ag+] HKZLPVFGJNLROG-UHFFFAOYSA-M 0.000 claims abstract description 15
- 239000000084 colloidal system Substances 0.000 claims abstract description 14
- 239000000203 mixture Substances 0.000 claims abstract description 8
- 150000001875 compounds Chemical class 0.000 claims description 37
- 125000004433 nitrogen atom Chemical group N* 0.000 claims description 12
- 229910052757 nitrogen Inorganic materials 0.000 claims description 11
- 150000001450 anions Chemical class 0.000 claims description 9
- 125000000217 alkyl group Chemical group 0.000 claims description 6
- 125000003118 aryl group Chemical group 0.000 claims description 6
- 229910052799 carbon Inorganic materials 0.000 claims description 6
- 125000004432 carbon atom Chemical group C* 0.000 claims description 6
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 6
- 125000001841 imino group Chemical group [H]N=* 0.000 claims description 6
- 125000001434 methanylylidene group Chemical group [H]C#[*] 0.000 claims description 6
- 125000003396 thiol group Chemical group [H]S* 0.000 claims description 6
- 125000000449 nitro group Chemical group [O-][N+](*)=O 0.000 claims description 4
- 150000003839 salts Chemical class 0.000 claims description 4
- 125000003342 alkenyl group Chemical group 0.000 claims description 3
- 125000003545 alkoxy group Chemical group 0.000 claims description 3
- 125000004453 alkoxycarbonyl group Chemical group 0.000 claims description 3
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 claims description 3
- 239000013522 chelant Substances 0.000 claims description 3
- 125000004093 cyano group Chemical group *C#N 0.000 claims description 3
- 125000005843 halogen group Chemical group 0.000 claims description 3
- 125000000623 heterocyclic group Chemical group 0.000 claims description 3
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims description 3
- 229910052751 metal Inorganic materials 0.000 claims description 3
- 239000002184 metal Substances 0.000 claims description 3
- 125000004430 oxygen atom Chemical group O* 0.000 claims description 3
- 229910052717 sulfur Inorganic materials 0.000 claims description 3
- 125000004434 sulfur atom Chemical group 0.000 claims description 3
- 239000000243 solution Substances 0.000 description 40
- 238000000576 coating method Methods 0.000 description 27
- 239000010410 layer Substances 0.000 description 26
- 239000011248 coating agent Substances 0.000 description 24
- 108010010803 Gelatin Proteins 0.000 description 17
- 239000008273 gelatin Substances 0.000 description 17
- 229920000159 gelatin Polymers 0.000 description 17
- 235000019322 gelatine Nutrition 0.000 description 17
- 235000011852 gelatine desserts Nutrition 0.000 description 17
- 238000002360 preparation method Methods 0.000 description 14
- 239000003795 chemical substances by application Substances 0.000 description 12
- WSFSSNUMVMOOMR-UHFFFAOYSA-N Formaldehyde Chemical compound O=C WSFSSNUMVMOOMR-UHFFFAOYSA-N 0.000 description 10
- QIGBRXMKCJKVMJ-UHFFFAOYSA-N Hydroquinone Chemical compound OC1=CC=C(O)C=C1 QIGBRXMKCJKVMJ-UHFFFAOYSA-N 0.000 description 10
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 8
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 7
- 238000011161 development Methods 0.000 description 7
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 6
- 150000001412 amines Chemical class 0.000 description 6
- 239000000975 dye Substances 0.000 description 6
- 230000001681 protective effect Effects 0.000 description 6
- PLIKAWJENQZMHA-UHFFFAOYSA-N 4-aminophenol Chemical compound NC1=CC=C(O)C=C1 PLIKAWJENQZMHA-UHFFFAOYSA-N 0.000 description 5
- 239000002253 acid Substances 0.000 description 5
- 239000000654 additive Substances 0.000 description 5
- 230000000694 effects Effects 0.000 description 5
- 239000003112 inhibitor Substances 0.000 description 5
- 239000004848 polyfunctional curative Substances 0.000 description 5
- YCIMNLLNPGFGHC-UHFFFAOYSA-N catechol Chemical compound OC1=CC=CC=C1O YCIMNLLNPGFGHC-UHFFFAOYSA-N 0.000 description 4
- 238000011156 evaluation Methods 0.000 description 4
- 150000002334 glycols Chemical class 0.000 description 4
- LEQAOMBKQFMDFZ-UHFFFAOYSA-N glyoxal Chemical compound O=CC=O LEQAOMBKQFMDFZ-UHFFFAOYSA-N 0.000 description 4
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 4
- 229910052753 mercury Inorganic materials 0.000 description 4
- 238000002156 mixing Methods 0.000 description 4
- CMCWWLVWPDLCRM-UHFFFAOYSA-N phenidone Chemical compound N1C(=O)CCN1C1=CC=CC=C1 CMCWWLVWPDLCRM-UHFFFAOYSA-N 0.000 description 4
- 239000011241 protective layer Substances 0.000 description 4
- 238000012360 testing method Methods 0.000 description 4
- 125000003831 tetrazolyl group Chemical group 0.000 description 4
- 239000002562 thickening agent Substances 0.000 description 4
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 4
- SJSJAWHHGDPBOC-UHFFFAOYSA-N 4,4-dimethyl-1-phenylpyrazolidin-3-one Chemical compound N1C(=O)C(C)(C)CN1C1=CC=CC=C1 SJSJAWHHGDPBOC-UHFFFAOYSA-N 0.000 description 3
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 3
- 229940090898 Desensitizer Drugs 0.000 description 3
- DNIAPMSPPWPWGF-UHFFFAOYSA-N Propylene glycol Chemical compound CC(O)CO DNIAPMSPPWPWGF-UHFFFAOYSA-N 0.000 description 3
- SJOOOZPMQAWAOP-UHFFFAOYSA-N [Ag].BrCl Chemical compound [Ag].BrCl SJOOOZPMQAWAOP-UHFFFAOYSA-N 0.000 description 3
- 239000003638 chemical reducing agent Substances 0.000 description 3
- 229920001577 copolymer Polymers 0.000 description 3
- MTHSVFCYNBDYFN-UHFFFAOYSA-N diethylene glycol Chemical compound OCCOCCO MTHSVFCYNBDYFN-UHFFFAOYSA-N 0.000 description 3
- 239000006224 matting agent Substances 0.000 description 3
- 239000002245 particle Substances 0.000 description 3
- 150000003254 radicals Chemical class 0.000 description 3
- SONJTKJMTWTJCT-UHFFFAOYSA-K rhodium(iii) chloride Chemical compound [Cl-].[Cl-].[Cl-].[Rh+3] SONJTKJMTWTJCT-UHFFFAOYSA-K 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- 239000004094 surface-active agent Substances 0.000 description 3
- CNHDIAIOKMXOLK-UHFFFAOYSA-N toluquinol Chemical compound CC1=CC(O)=CC=C1O CNHDIAIOKMXOLK-UHFFFAOYSA-N 0.000 description 3
- LUMLZKVIXLWTCI-NSCUHMNNSA-N (e)-2,3-dichloro-4-oxobut-2-enoic acid Chemical compound OC(=O)C(\Cl)=C(/Cl)C=O LUMLZKVIXLWTCI-NSCUHMNNSA-N 0.000 description 2
- LPYUENQFPVNPHY-UHFFFAOYSA-N 3-methoxycatechol Chemical compound COC1=CC=CC(O)=C1O LPYUENQFPVNPHY-UHFFFAOYSA-N 0.000 description 2
- RYYXDZDBXNUPOG-UHFFFAOYSA-N 4,5,6,7-tetrahydro-1,3-benzothiazole-2,6-diamine;dihydrochloride Chemical compound Cl.Cl.C1C(N)CCC2=C1SC(N)=N2 RYYXDZDBXNUPOG-UHFFFAOYSA-N 0.000 description 2
- FTBKUHRQPRFSQL-UHFFFAOYSA-N 4,5-dimethyl-1-phenyl-1,5-dihydrotetrazol-1-ium;chloride Chemical compound [Cl-].N1=N[NH+](C)C(C)N1C1=CC=CC=C1 FTBKUHRQPRFSQL-UHFFFAOYSA-N 0.000 description 2
- ZFIQGRISGKSVAG-UHFFFAOYSA-N 4-methylaminophenol Chemical compound CNC1=CC=C(O)C=C1 ZFIQGRISGKSVAG-UHFFFAOYSA-N 0.000 description 2
- WSGURAYTCUVDQL-UHFFFAOYSA-N 5-nitro-1h-indazole Chemical compound [O-][N+](=O)C1=CC=C2NN=CC2=C1 WSGURAYTCUVDQL-UHFFFAOYSA-N 0.000 description 2
- ZXQHSPWBYMLHLB-BXTVWIJMSA-M 6-ethoxy-1-methyl-2-[(e)-2-(3-nitrophenyl)ethenyl]quinolin-1-ium;methyl sulfate Chemical compound COS([O-])(=O)=O.C1=CC2=CC(OCC)=CC=C2[N+](C)=C1\C=C\C1=CC=CC([N+]([O-])=O)=C1 ZXQHSPWBYMLHLB-BXTVWIJMSA-M 0.000 description 2
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 2
- CIWBSHSKHKDKBQ-JLAZNSOCSA-N Ascorbic acid Chemical compound OC[C@H](O)[C@H]1OC(=O)C(O)=C1O CIWBSHSKHKDKBQ-JLAZNSOCSA-N 0.000 description 2
- NOWKCMXCCJGMRR-UHFFFAOYSA-N Aziridine Chemical compound C1CN1 NOWKCMXCCJGMRR-UHFFFAOYSA-N 0.000 description 2
- OAKJQQAXSVQMHS-UHFFFAOYSA-N Hydrazine Chemical compound NN OAKJQQAXSVQMHS-UHFFFAOYSA-N 0.000 description 2
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 2
- 239000004952 Polyamide Substances 0.000 description 2
- 239000004698 Polyethylene Substances 0.000 description 2
- 239000004743 Polypropylene Substances 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 2
- FAPWRFPIFSIZLT-UHFFFAOYSA-M Sodium chloride Chemical compound [Na+].[Cl-] FAPWRFPIFSIZLT-UHFFFAOYSA-M 0.000 description 2
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical group C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- LSNNMFCWUKXFEE-UHFFFAOYSA-N Sulfurous acid Chemical compound OS(O)=O LSNNMFCWUKXFEE-UHFFFAOYSA-N 0.000 description 2
- GSEJCLTVZPLZKY-UHFFFAOYSA-N Triethanolamine Chemical compound OCCN(CCO)CCO GSEJCLTVZPLZKY-UHFFFAOYSA-N 0.000 description 2
- 239000006096 absorbing agent Substances 0.000 description 2
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 2
- 239000003513 alkali Substances 0.000 description 2
- 125000000129 anionic group Chemical group 0.000 description 2
- 239000002216 antistatic agent Substances 0.000 description 2
- 239000007864 aqueous solution Substances 0.000 description 2
- 125000004429 atom Chemical group 0.000 description 2
- 239000004305 biphenyl Substances 0.000 description 2
- 150000001639 boron compounds Chemical class 0.000 description 2
- WERYXYBDKMZEQL-UHFFFAOYSA-N butane-1,4-diol Chemical compound OCCCCO WERYXYBDKMZEQL-UHFFFAOYSA-N 0.000 description 2
- 229920002301 cellulose acetate Polymers 0.000 description 2
- 229940015043 glyoxal Drugs 0.000 description 2
- 150000002344 gold compounds Chemical class 0.000 description 2
- 229910052736 halogen Inorganic materials 0.000 description 2
- 150000002500 ions Chemical class 0.000 description 2
- 229910001507 metal halide Inorganic materials 0.000 description 2
- 150000005309 metal halides Chemical class 0.000 description 2
- ZAKLKBFCSHJIRI-UHFFFAOYSA-N mucochloric acid Natural products OC1OC(=O)C(Cl)=C1Cl ZAKLKBFCSHJIRI-UHFFFAOYSA-N 0.000 description 2
- 239000003960 organic solvent Substances 0.000 description 2
- VLTRZXGMWDSKGL-UHFFFAOYSA-N perchloric acid Chemical compound OCl(=O)(=O)=O VLTRZXGMWDSKGL-UHFFFAOYSA-N 0.000 description 2
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 2
- 239000004014 plasticizer Substances 0.000 description 2
- 229920002647 polyamide Polymers 0.000 description 2
- 229920000573 polyethylene Polymers 0.000 description 2
- 229920001155 polypropylene Polymers 0.000 description 2
- IOLCXVTUBQKXJR-UHFFFAOYSA-M potassium bromide Chemical compound [K+].[Br-] IOLCXVTUBQKXJR-UHFFFAOYSA-M 0.000 description 2
- 239000003755 preservative agent Substances 0.000 description 2
- 230000002335 preservative effect Effects 0.000 description 2
- 238000003672 processing method Methods 0.000 description 2
- 239000001397 quillaja saponaria molina bark Substances 0.000 description 2
- 230000005070 ripening Effects 0.000 description 2
- 229930182490 saponin Natural products 0.000 description 2
- 150000007949 saponins Chemical class 0.000 description 2
- 230000035945 sensitivity Effects 0.000 description 2
- 239000000741 silica gel Substances 0.000 description 2
- 229910002027 silica gel Inorganic materials 0.000 description 2
- ADZWSOLPGZMUMY-UHFFFAOYSA-M silver bromide Chemical compound [Ag]Br ADZWSOLPGZMUMY-UHFFFAOYSA-M 0.000 description 2
- GEHJYWRUCIMESM-UHFFFAOYSA-L sodium sulfite Chemical compound [Na+].[Na+].[O-]S([O-])=O GEHJYWRUCIMESM-UHFFFAOYSA-L 0.000 description 2
- 229960004418 trolamine Drugs 0.000 description 2
- TXUICONDJPYNPY-UHFFFAOYSA-N (1,10,13-trimethyl-3-oxo-4,5,6,7,8,9,11,12,14,15,16,17-dodecahydrocyclopenta[a]phenanthren-17-yl) heptanoate Chemical compound C1CC2CC(=O)C=C(C)C2(C)C2C1C1CCC(OC(=O)CCCCCC)C1(C)CC2 TXUICONDJPYNPY-UHFFFAOYSA-N 0.000 description 1
- NNVNAJGCZFCILW-UHFFFAOYSA-N 1'-methylspiro[3,4-dihydrochromene-2,4'-piperidine]-4-amine;hydrochloride Chemical compound Cl.C1CN(C)CCC21OC1=CC=CC=C1C(N)C2 NNVNAJGCZFCILW-UHFFFAOYSA-N 0.000 description 1
- QDNPCYCBQFHNJC-UHFFFAOYSA-N 1,1'-biphenyl-3,4-diol Chemical compound C1=C(O)C(O)=CC=C1C1=CC=CC=C1 QDNPCYCBQFHNJC-UHFFFAOYSA-N 0.000 description 1
- ZXUVKMHRHUXXOQ-UHFFFAOYSA-N 1,3-bis(4-nitrophenyl)tetrazolidin-1-ium-5-one;chloride Chemical compound [Cl-].C1=CC([N+](=O)[O-])=CC=C1N1[NH2+]C(=O)N(C=2C=CC(=CC=2)[N+]([O-])=O)N1 ZXUVKMHRHUXXOQ-UHFFFAOYSA-N 0.000 description 1
- RNAILRMPLLUNEB-UHFFFAOYSA-N 1,3-diphenyl-2h-tetrazol-2-ium-5-carbonitrile;bromide Chemical compound [Br-].N#CC1=NN(C=2C=CC=CC=2)N[NH+]1C1=CC=CC=C1 RNAILRMPLLUNEB-UHFFFAOYSA-N 0.000 description 1
- ZOSAJXAQTMGLQB-UHFFFAOYSA-N 1,3-diphenyltetrazolidin-2-ium-5-one;hydroxide Chemical compound [OH-].O=C1NN(C=2C=CC=CC=2)N[NH+]1C1=CC=CC=C1 ZOSAJXAQTMGLQB-UHFFFAOYSA-N 0.000 description 1
- YNDVTESIVCIAIV-UHFFFAOYSA-N 1,4,5-triphenyl-2,5-dihydrotetrazol-4-ium;chloride Chemical compound [Cl-].C1=CC=CC=C1C1[NH+](C=2C=CC=CC=2)N=NN1C1=CC=CC=C1 YNDVTESIVCIAIV-UHFFFAOYSA-N 0.000 description 1
- CBCKQZAAMUWICA-UHFFFAOYSA-N 1,4-phenylenediamine Chemical compound NC1=CC=C(N)C=C1 CBCKQZAAMUWICA-UHFFFAOYSA-N 0.000 description 1
- GQROBPOTHGSILS-UHFFFAOYSA-N 1,5-dimethyl-4-(4-methylphenyl)-2,5-dihydrotetrazol-4-ium;chloride Chemical compound [Cl-].CC1N(C)N=N[NH+]1C1=CC=C(C)C=C1 GQROBPOTHGSILS-UHFFFAOYSA-N 0.000 description 1
- 229940043375 1,5-pentanediol Drugs 0.000 description 1
- JZLLHLCEVVEDGF-UHFFFAOYSA-N 1-(2,3-diphenyl-1,3-dihydrotetrazol-3-ium-5-yl)ethanone;chloride Chemical compound [Cl-].[NH2+]1C(C(=O)C)=NN(C=2C=CC=CC=2)N1C1=CC=CC=C1 JZLLHLCEVVEDGF-UHFFFAOYSA-N 0.000 description 1
- HKWAHSUWCRMOEZ-UHFFFAOYSA-N 1-[1,3-bis(4-ethoxyphenyl)-2h-tetrazol-2-ium-5-yl]ethanone;bromide Chemical compound [Br-].C1=CC(OCC)=CC=C1N1N=C(C(C)=O)[NH+](C=2C=CC(OCC)=CC=2)N1 HKWAHSUWCRMOEZ-UHFFFAOYSA-N 0.000 description 1
- KVVCFVUUHKDIST-UHFFFAOYSA-N 1-[2,3-bis(4-ethoxyphenyl)-1,3-dihydrotetrazol-3-ium-5-yl]ethanone;chloride Chemical compound [Cl-].C1=CC(OCC)=CC=C1N1[NH+](C=2C=CC(OCC)=CC=2)N=C(C(C)=O)N1 KVVCFVUUHKDIST-UHFFFAOYSA-N 0.000 description 1
- NJUZHLIMBZRXCS-UHFFFAOYSA-N 1-ethyl-3,4-dihydro-2h-quinolin-6-amine Chemical compound NC1=CC=C2N(CC)CCCC2=C1 NJUZHLIMBZRXCS-UHFFFAOYSA-N 0.000 description 1
- NXVHEHXRZVQDCR-UHFFFAOYSA-N 1-n,1-n-diethyl-2-methylbenzene-1,4-diamine Chemical compound CCN(CC)C1=CC=C(N)C=C1C NXVHEHXRZVQDCR-UHFFFAOYSA-N 0.000 description 1
- AHABMLPWPUZVOI-UHFFFAOYSA-N 1-n,1-n-diethylbenzene-1,2,4-triamine Chemical compound CCN(CC)C1=CC=C(N)C=C1N AHABMLPWPUZVOI-UHFFFAOYSA-N 0.000 description 1
- HYZJCKYKOHLVJF-UHFFFAOYSA-N 1H-benzimidazole Chemical compound C1=CC=C2NC=NC2=C1 HYZJCKYKOHLVJF-UHFFFAOYSA-N 0.000 description 1
- WLDWSGZHNBANIO-UHFFFAOYSA-N 2',5'-Dihydroxyacetophenone Chemical compound CC(=O)C1=CC(O)=CC=C1O WLDWSGZHNBANIO-UHFFFAOYSA-N 0.000 description 1
- VILCJCGEZXAXTO-UHFFFAOYSA-N 2,2,2-tetramine Chemical compound NCCNCCNCCN VILCJCGEZXAXTO-UHFFFAOYSA-N 0.000 description 1
- XIWRQEFBSZWJTH-UHFFFAOYSA-N 2,3-dibromobenzene-1,4-diol Chemical compound OC1=CC=C(O)C(Br)=C1Br XIWRQEFBSZWJTH-UHFFFAOYSA-N 0.000 description 1
- DBCKMJVEAUXWJJ-UHFFFAOYSA-N 2,3-dichlorobenzene-1,4-diol Chemical compound OC1=CC=C(O)C(Cl)=C1Cl DBCKMJVEAUXWJJ-UHFFFAOYSA-N 0.000 description 1
- SGXDYAUBTDSVJD-UHFFFAOYSA-N 2,3-diphenyl-1,3-dihydrotetrazol-3-ium-5-carbonitrile;2,3-di(propan-2-yl)naphthalene-1-sulfonate Chemical compound N1C(C#N)=N[NH+](C=2C=CC=CC=2)N1C1=CC=CC=C1.C1=CC=C2C(S([O-])(=O)=O)=C(C(C)C)C(C(C)C)=CC2=C1 SGXDYAUBTDSVJD-UHFFFAOYSA-N 0.000 description 1
- VSXBOKHHCCGVKJ-UHFFFAOYSA-N 2,3-diphenyl-1h-tetrazol-1-ium;chloride Chemical compound [Cl-].[NH2+]1C=NN(C=2C=CC=CC=2)N1C1=CC=CC=C1 VSXBOKHHCCGVKJ-UHFFFAOYSA-N 0.000 description 1
- CDNHHFDCGUXITF-UHFFFAOYSA-N 2,3-diphenyl-5-[4-(2,4,4-trimethylpentan-2-yloxy)phenyl]-1h-tetrazol-1-ium;chloride Chemical compound [Cl-].C1=CC(OC(C)(C)CC(C)(C)C)=CC=C1C1=NN(C=2C=CC=CC=2)N(C=2C=CC=CC=2)[NH2+]1 CDNHHFDCGUXITF-UHFFFAOYSA-N 0.000 description 1
- AQPVLFWWOYVUOV-UHFFFAOYSA-N 2,3-diphenyl-5-thiophen-2-yl-1,3-dihydrotetrazol-3-ium;chloride Chemical compound [Cl-].[NH2+]1N(C=2C=CC=CC=2)N(C=2C=CC=CC=2)N=C1C1=CC=CS1 AQPVLFWWOYVUOV-UHFFFAOYSA-N 0.000 description 1
- SUYLOMATYCPVFT-UHFFFAOYSA-N 2,4,6-triaminophenol Chemical compound NC1=CC(N)=C(O)C(N)=C1 SUYLOMATYCPVFT-UHFFFAOYSA-N 0.000 description 1
- DPKOCFTZJRJTQL-UHFFFAOYSA-N 2,4-diamino-5-methylphenol Chemical compound CC1=CC(O)=C(N)C=C1N DPKOCFTZJRJTQL-UHFFFAOYSA-N 0.000 description 1
- RWAOPZVGICHCOI-UHFFFAOYSA-N 2,4-diaminobenzene-1,3-diol Chemical compound NC1=CC=C(O)C(N)=C1O RWAOPZVGICHCOI-UHFFFAOYSA-N 0.000 description 1
- YZDIUKPBJDYTOM-UHFFFAOYSA-N 2,5-diethylbenzene-1,4-diol Chemical compound CCC1=CC(O)=C(CC)C=C1O YZDIUKPBJDYTOM-UHFFFAOYSA-N 0.000 description 1
- GPASWZHHWPVSRG-UHFFFAOYSA-N 2,5-dimethylbenzene-1,4-diol Chemical compound CC1=CC(O)=C(C)C=C1O GPASWZHHWPVSRG-UHFFFAOYSA-N 0.000 description 1
- IPZIKIFFPGSDIV-UHFFFAOYSA-N 2-(2,3-diphenyl-1,3-dihydrotetrazol-3-ium-5-yl)-1,3-benzoxazole;chloride Chemical compound [Cl-].N1=C(C=2OC3=CC=CC=C3N=2)NN(C=2C=CC=CC=2)[NH+]1C1=CC=CC=C1 IPZIKIFFPGSDIV-UHFFFAOYSA-N 0.000 description 1
- OPRFPVHIAQGVQF-UHFFFAOYSA-N 2-(2,3-diphenyl-1,3-dihydrotetrazol-3-ium-5-yl)quinoline;chloride Chemical compound [Cl-].N1=C(C=2N=C3C=CC=CC3=CC=2)NN(C=2C=CC=CC=2)[NH+]1C1=CC=CC=C1 OPRFPVHIAQGVQF-UHFFFAOYSA-N 0.000 description 1
- QTLHLXYADXCVCF-UHFFFAOYSA-N 2-(4-amino-n-ethyl-3-methylanilino)ethanol Chemical compound OCCN(CC)C1=CC=C(N)C(C)=C1 QTLHLXYADXCVCF-UHFFFAOYSA-N 0.000 description 1
- WFTSBMRVTWFBIF-UHFFFAOYSA-N 2-(4-aminophenyl)-3,4-dihydropyrazol-5-amine Chemical compound C1CC(N)=NN1C1=CC=C(N)C=C1 WFTSBMRVTWFBIF-UHFFFAOYSA-N 0.000 description 1
- MIPQDTFFRSHLQU-UHFFFAOYSA-N 2-(4-iodophenyl)-3,5-diphenyl-1,3-dihydrotetrazol-3-ium;chloride Chemical compound [Cl-].C1=CC(I)=CC=C1N1[NH+](C=2C=CC=CC=2)N=C(C=2C=CC=CC=2)N1 MIPQDTFFRSHLQU-UHFFFAOYSA-N 0.000 description 1
- QDVIEADSFRNGLY-UHFFFAOYSA-N 2-(5-dodecyl-3-phenyl-1h-tetrazol-1-ium-2-yl)-1,3-benzothiazole;bromide Chemical compound [Br-].N1C(CCCCCCCCCCCC)=N[NH+](C=2SC3=CC=CC=C3N=2)N1C1=CC=CC=C1 QDVIEADSFRNGLY-UHFFFAOYSA-N 0.000 description 1
- LHPPDQUVECZQSW-UHFFFAOYSA-N 2-(benzotriazol-2-yl)-4,6-ditert-butylphenol Chemical compound CC(C)(C)C1=CC(C(C)(C)C)=CC(N2N=C3C=CC=CC3=N2)=C1O LHPPDQUVECZQSW-UHFFFAOYSA-N 0.000 description 1
- WXHVQMGINBSVAY-UHFFFAOYSA-N 2-(benzotriazol-2-yl)-4-tert-butylphenol Chemical compound CC(C)(C)C1=CC=C(O)C(N2N=C3C=CC=CC3=N2)=C1 WXHVQMGINBSVAY-UHFFFAOYSA-N 0.000 description 1
- HZAXFHJVJLSVMW-UHFFFAOYSA-N 2-Aminoethan-1-ol Chemical compound NCCO HZAXFHJVJLSVMW-UHFFFAOYSA-N 0.000 description 1
- HIGSPBFIOSHWQG-UHFFFAOYSA-N 2-Isopropyl-1,4-benzenediol Chemical compound CC(C)C1=CC(O)=CC=C1O HIGSPBFIOSHWQG-UHFFFAOYSA-N 0.000 description 1
- XUZXPOJPVISNRN-UHFFFAOYSA-N 2-[5-(2-chlorophenyl)-2-phenyl-1,3-dihydrotetrazol-3-ium-3-yl]-1,3-benzothiazole;chloride Chemical compound [Cl-].ClC1=CC=CC=C1C1=N[NH+](C=2SC3=CC=CC=C3N=2)N(C=2C=CC=CC=2)N1 XUZXPOJPVISNRN-UHFFFAOYSA-N 0.000 description 1
- BLWMNAXCPBTEKO-UHFFFAOYSA-N 2-[5-(4-chlorophenyl)-2-(4-nitrophenyl)-1,3-dihydrotetrazol-3-ium-3-yl]-1,3-benzothiazole;chloride Chemical compound [Cl-].C1=CC([N+](=O)[O-])=CC=C1N1[NH+](C=2SC3=CC=CC=C3N=2)N=C(C=2C=CC(Cl)=CC=2)N1 BLWMNAXCPBTEKO-UHFFFAOYSA-N 0.000 description 1
- XQHGAEQBYRZJIX-UHFFFAOYSA-N 2-amino-4-chloro-6-phenylphenol Chemical compound NC1=CC(Cl)=CC(C=2C=CC=CC=2)=C1O XQHGAEQBYRZJIX-UHFFFAOYSA-N 0.000 description 1
- LGXONQNQFVDTOL-UHFFFAOYSA-N 2-amino-5-(dimethylamino)phenol Chemical compound CN(C)C1=CC=C(N)C(O)=C1 LGXONQNQFVDTOL-UHFFFAOYSA-N 0.000 description 1
- UDVRKKAWBVVSAM-UHFFFAOYSA-N 2-amino-6-phenylphenol Chemical compound NC1=CC=CC(C=2C=CC=CC=2)=C1O UDVRKKAWBVVSAM-UHFFFAOYSA-N 0.000 description 1
- QPKNFEVLZVJGBM-UHFFFAOYSA-N 2-aminonaphthalen-1-ol Chemical compound C1=CC=CC2=C(O)C(N)=CC=C21 QPKNFEVLZVJGBM-UHFFFAOYSA-N 0.000 description 1
- CDAWCLOXVUBKRW-UHFFFAOYSA-N 2-aminophenol Chemical compound NC1=CC=CC=C1O CDAWCLOXVUBKRW-UHFFFAOYSA-N 0.000 description 1
- REFDOIWRJDGBHY-UHFFFAOYSA-N 2-bromobenzene-1,4-diol Chemical compound OC1=CC=C(O)C(Br)=C1 REFDOIWRJDGBHY-UHFFFAOYSA-N 0.000 description 1
- ZGJUJDQANIYVAL-UHFFFAOYSA-N 2-methyl-4-morpholin-4-ylaniline Chemical compound C1=C(N)C(C)=CC(N2CCOCC2)=C1 ZGJUJDQANIYVAL-UHFFFAOYSA-N 0.000 description 1
- 125000003903 2-propenyl group Chemical group [H]C([*])([H])C([H])=C([H])[H] 0.000 description 1
- OVOZYARDXPHRDL-UHFFFAOYSA-N 3,4-diaminophenol Chemical compound NC1=CC=C(O)C=C1N OVOZYARDXPHRDL-UHFFFAOYSA-N 0.000 description 1
- VBOXYQFUZKAVFF-UHFFFAOYSA-N 3-(4-methylphenyl)-1,5-diphenyl-2h-tetrazol-2-ium;chloride Chemical compound [Cl-].C1=CC(C)=CC=C1N1N=C(C=2C=CC=CC=2)[NH+](C=2C=CC=CC=2)N1 VBOXYQFUZKAVFF-UHFFFAOYSA-N 0.000 description 1
- QVGQHBFRHAXWOL-UHFFFAOYSA-N 3-(4-methylphenyl)-2,5-diphenyl-1h-tetrazol-1-ium;2-sulfanyl-3h-1,3-benzoxazole-2-sulfonate Chemical compound C1=CC=C2OC(S(=O)(=O)[O-])(S)NC2=C1.C1=CC(C)=CC=C1N1N(C=2C=CC=CC=2)[NH2+]C(C=2C=CC=CC=2)=N1 QVGQHBFRHAXWOL-UHFFFAOYSA-N 0.000 description 1
- MZARMVPHVYXYCW-UHFFFAOYSA-N 3-[4-[1,3-bis[4-(2-carboxyethyl)phenyl]-2h-tetrazol-2-ium-5-yl]phenyl]propanoic acid;chloride Chemical compound [Cl-].C1=CC(CCC(=O)O)=CC=C1N1N=C(C=2C=CC(CCC(O)=O)=CC=2)N(C=2C=CC(CCC(O)=O)=CC=2)[NH2+]1 MZARMVPHVYXYCW-UHFFFAOYSA-N 0.000 description 1
- IXEATAOYAWHCPE-UHFFFAOYSA-N 3-[4-[2,3-bis[4-(2-carboxyethyl)phenyl]-1,3-dihydrotetrazol-3-ium-5-yl]phenyl]propanoic acid;2-(2,2-diethylhexyl)butanedioate Chemical compound CCCCC(CC)(CC)CC(C([O-])=O)CC([O-])=O.C1=CC(CCC(=O)O)=CC=C1N1[NH+](C=2C=CC(CCC(O)=O)=CC=2)N=C(C=2C=CC(CCC(O)=O)=CC=2)N1.C1=CC(CCC(=O)O)=CC=C1N1[NH+](C=2C=CC(CCC(O)=O)=CC=2)N=C(C=2C=CC(CCC(O)=O)=CC=2)N1 IXEATAOYAWHCPE-UHFFFAOYSA-N 0.000 description 1
- UAYRQYDAMDWXHD-UHFFFAOYSA-N 4-(2,3-diphenyl-1,3-dihydrotetrazol-3-ium-5-yl)benzonitrile;chloride Chemical compound [Cl-].C1=CC(C#N)=CC=C1C1=N[NH+](C=2C=CC=CC=2)N(C=2C=CC=CC=2)N1 UAYRQYDAMDWXHD-UHFFFAOYSA-N 0.000 description 1
- NMFYRDNROSEUJG-UHFFFAOYSA-N 4-(2-chlorophenyl)-1,5-dimethyl-2,5-dihydrotetrazol-4-ium;chloride Chemical compound [Cl-].CC1N(C)N=N[NH+]1C1=CC=CC=C1Cl NMFYRDNROSEUJG-UHFFFAOYSA-N 0.000 description 1
- SSLXNXXJGACSJP-UHFFFAOYSA-N 4-(2h-pyridin-1-yl)aniline Chemical compound C1=CC(N)=CC=C1N1C=CC=CC1 SSLXNXXJGACSJP-UHFFFAOYSA-N 0.000 description 1
- PXTAJWSNGRKUST-UHFFFAOYSA-N 4-(3-chlorophenyl)-1,5-dimethyl-2,5-dihydrotetrazol-4-ium;chloride Chemical compound [Cl-].CC1N(C)N=N[NH+]1C1=CC=CC(Cl)=C1 PXTAJWSNGRKUST-UHFFFAOYSA-N 0.000 description 1
- ODWZWRYCMIZFNP-UHFFFAOYSA-N 4-(4-amino-n-butylanilino)butane-2-sulfonic acid Chemical compound OS(=O)(=O)C(C)CCN(CCCC)C1=CC=C(N)C=C1 ODWZWRYCMIZFNP-UHFFFAOYSA-N 0.000 description 1
- ZZTUFJMOIKVESF-UHFFFAOYSA-N 4-(5-methyl-1-phenyl-1,2-dihydrotetrazol-1-ium-3-yl)phenol;bromide Chemical compound [Br-].CC1=NN(C=2C=CC(O)=CC=2)N[NH+]1C1=CC=CC=C1 ZZTUFJMOIKVESF-UHFFFAOYSA-N 0.000 description 1
- XHFJGLIQDYVTSE-UHFFFAOYSA-N 4-(5-methyl-2-phenyl-1h-tetrazol-1-ium-3-yl)phenol;chloride Chemical compound [Cl-].N1C(C)=N[NH+](C=2C=CC=CC=2)N1C1=CC=C(O)C=C1 XHFJGLIQDYVTSE-UHFFFAOYSA-N 0.000 description 1
- RSJGEEMAGDWQJQ-UHFFFAOYSA-N 4-[2-(1-ethyl-4-phenyl-2,5-dihydrotetrazol-4-ium-5-yl)ethenyl]-n,n-dimethylaniline;chloride Chemical compound [Cl-].CCN1NN=[N+](C=2C=CC=CC=2)C1C=CC1=CC=C(N(C)C)C=C1 RSJGEEMAGDWQJQ-UHFFFAOYSA-N 0.000 description 1
- XCTSQILHZOXJKI-UHFFFAOYSA-N 4-[5-(4-nitrophenyl)-3-phenyl-1,3-dihydrotetrazol-3-ium-2-yl]phenol;chloride Chemical compound [Cl-].C1=CC(O)=CC=C1N1[NH+](C=2C=CC=CC=2)N=C(C=2C=CC(=CC=2)[N+]([O-])=O)N1 XCTSQILHZOXJKI-UHFFFAOYSA-N 0.000 description 1
- OUIITAOCYATDMY-UHFFFAOYSA-N 4-amino-2-phenylphenol Chemical compound NC1=CC=C(O)C(C=2C=CC=CC=2)=C1 OUIITAOCYATDMY-UHFFFAOYSA-N 0.000 description 1
- XSFKCGABINPZRK-UHFFFAOYSA-N 4-aminopyrazol-3-one Chemical compound NC1=CN=NC1=O XSFKCGABINPZRK-UHFFFAOYSA-N 0.000 description 1
- QROGOPRRETUDKB-UHFFFAOYSA-N 4-butyl-2-tert-butyl-6-(5-chlorobenzotriazol-2-yl)phenol Chemical compound CC(C)(C)C1=CC(CCCC)=CC(N2N=C3C=C(Cl)C=CC3=N2)=C1O QROGOPRRETUDKB-UHFFFAOYSA-N 0.000 description 1
- WWOBYPKUYODHDG-UHFFFAOYSA-N 4-chlorocatechol Chemical compound OC1=CC=C(Cl)C=C1O WWOBYPKUYODHDG-UHFFFAOYSA-N 0.000 description 1
- GQNRHFATGSPZDZ-UHFFFAOYSA-N 4-cyclohexyl-1,5-dimethyl-2,5-dihydrotetrazol-4-ium;chloride Chemical compound [Cl-].CC1N(C)N=N[NH+]1C1CCCCC1 GQNRHFATGSPZDZ-UHFFFAOYSA-N 0.000 description 1
- KWXICGTUELOLSQ-UHFFFAOYSA-N 4-dodecylbenzenesulfonic acid Chemical compound CCCCCCCCCCCCC1=CC=C(S(O)(=O)=O)C=C1 KWXICGTUELOLSQ-UHFFFAOYSA-N 0.000 description 1
- CMGDVUCDZOBDNL-UHFFFAOYSA-N 4-methyl-2h-benzotriazole Chemical compound CC1=CC=CC2=NNN=C12 CMGDVUCDZOBDNL-UHFFFAOYSA-N 0.000 description 1
- LTRYTFOYRKRJLU-UHFFFAOYSA-N 5-(3,4-dimethoxyphenyl)-2-(2-ethoxyphenyl)-3-(4-methoxyphenyl)-1,3-dihydrotetrazol-3-ium;chloride Chemical compound [Cl-].CCOC1=CC=CC=C1N1[NH+](C=2C=CC(OC)=CC=2)N=C(C=2C=C(OC)C(OC)=CC=2)N1 LTRYTFOYRKRJLU-UHFFFAOYSA-N 0.000 description 1
- YUUSISNBOVSHOI-UHFFFAOYSA-N 5-(4-bromophenyl)-3-phenyl-2-(2,4,6-trichlorophenyl)-1,3-dihydrotetrazol-3-ium;chloride Chemical compound [Cl-].ClC1=CC(Cl)=CC(Cl)=C1N1[NH+](C=2C=CC=CC=2)N=C(C=2C=CC(Br)=CC=2)N1 YUUSISNBOVSHOI-UHFFFAOYSA-N 0.000 description 1
- UWXJPFCATNGVAS-UHFFFAOYSA-N 5-(furan-2-yl)-2,3-diphenyl-1h-tetrazol-1-ium;chloride Chemical compound [Cl-].N1N(C=2C=CC=CC=2)[NH+](C=2C=CC=CC=2)N=C1C1=CC=CO1 UWXJPFCATNGVAS-UHFFFAOYSA-N 0.000 description 1
- BISHACNKZIBDFM-UHFFFAOYSA-N 5-amino-1h-pyrimidine-2,4-dione Chemical compound NC1=CNC(=O)NC1=O BISHACNKZIBDFM-UHFFFAOYSA-N 0.000 description 1
- BQCIJWPKDPZNHD-UHFFFAOYSA-N 5-bromo-2h-benzotriazole Chemical compound C1=C(Br)C=CC2=NNN=C21 BQCIJWPKDPZNHD-UHFFFAOYSA-N 0.000 description 1
- XCCGPQQFNTUPTJ-UHFFFAOYSA-N 5-ethyl-1,3-diphenyl-2h-tetrazol-2-ium;bromide Chemical compound [Br-].CCC1=NN(C=2C=CC=CC=2)N[NH+]1C1=CC=CC=C1 XCCGPQQFNTUPTJ-UHFFFAOYSA-N 0.000 description 1
- ZWTWLIOPZJFEOO-UHFFFAOYSA-N 5-ethyl-2h-benzotriazole Chemical compound C1=C(CC)C=CC2=NNN=C21 ZWTWLIOPZJFEOO-UHFFFAOYSA-N 0.000 description 1
- UOSGISDWERJLNR-UHFFFAOYSA-N 5-hexyl-2,3-diphenyl-1h-tetrazol-1-ium;chloride Chemical compound [Cl-].N1C(CCCCCC)=N[NH+](C=2C=CC=CC=2)N1C1=CC=CC=C1 UOSGISDWERJLNR-UHFFFAOYSA-N 0.000 description 1
- LRUDIIUSNGCQKF-UHFFFAOYSA-N 5-methyl-1H-benzotriazole Chemical compound C1=C(C)C=CC2=NNN=C21 LRUDIIUSNGCQKF-UHFFFAOYSA-N 0.000 description 1
- FVEIWCGHPBBVHX-UHFFFAOYSA-N 5-methyl-1h-benzo[g]indazole Chemical compound C12=CC=CC=C2C(C)=CC2=C1NN=C2 FVEIWCGHPBBVHX-UHFFFAOYSA-N 0.000 description 1
- RFZVUKSHEUPSMN-UHFFFAOYSA-N 5-methyl-2,3-diphenyl-1,3-dihydrotetrazol-3-ium;chloride Chemical compound [Cl-].[NH2+]1C(C)=NN(C=2C=CC=CC=2)N1C1=CC=CC=C1 RFZVUKSHEUPSMN-UHFFFAOYSA-N 0.000 description 1
- AOCDQWRMYHJTMY-UHFFFAOYSA-N 5-nitro-2h-benzotriazole Chemical compound C1=C([N+](=O)[O-])C=CC2=NNN=C21 AOCDQWRMYHJTMY-UHFFFAOYSA-N 0.000 description 1
- NKLOLMQJDLMZRE-UHFFFAOYSA-N 6-chloro-1h-benzimidazole Chemical compound ClC1=CC=C2N=CNC2=C1 NKLOLMQJDLMZRE-UHFFFAOYSA-N 0.000 description 1
- XPAZGLFMMUODDK-UHFFFAOYSA-N 6-nitro-1h-benzimidazole Chemical compound [O-][N+](=O)C1=CC=C2N=CNC2=C1 XPAZGLFMMUODDK-UHFFFAOYSA-N 0.000 description 1
- ORZRMRUXSPNQQL-UHFFFAOYSA-N 6-nitro-1h-indazole Chemical compound [O-][N+](=O)C1=CC=C2C=NNC2=C1 ORZRMRUXSPNQQL-UHFFFAOYSA-N 0.000 description 1
- HRPVXLWXLXDGHG-UHFFFAOYSA-N Acrylamide Chemical compound NC(=O)C=C HRPVXLWXLXDGHG-UHFFFAOYSA-N 0.000 description 1
- 229920001817 Agar Polymers 0.000 description 1
- 102000009027 Albumins Human genes 0.000 description 1
- 108010088751 Albumins Proteins 0.000 description 1
- LSNNMFCWUKXFEE-UHFFFAOYSA-M Bisulfite Chemical compound OS([O-])=O LSNNMFCWUKXFEE-UHFFFAOYSA-M 0.000 description 1
- CPELXLSAUQHCOX-UHFFFAOYSA-M Bromide Chemical compound [Br-] CPELXLSAUQHCOX-UHFFFAOYSA-M 0.000 description 1
- PBNVPWBSPCVHAW-UHFFFAOYSA-N C(CC)OS(=O)(=O)C=1C(=CC=C2C=CC=CC12)S(=O)(=O)OCCC.[Na] Chemical compound C(CC)OS(=O)(=O)C=1C(=CC=C2C=CC=CC12)S(=O)(=O)OCCC.[Na] PBNVPWBSPCVHAW-UHFFFAOYSA-N 0.000 description 1
- BVKZGUZCCUSVTD-UHFFFAOYSA-L Carbonate Chemical compound [O-]C([O-])=O BVKZGUZCCUSVTD-UHFFFAOYSA-L 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- PQUCIEFHOVEZAU-UHFFFAOYSA-N Diammonium sulfite Chemical compound [NH4+].[NH4+].[O-]S([O-])=O PQUCIEFHOVEZAU-UHFFFAOYSA-N 0.000 description 1
- KCXVZYZYPLLWCC-UHFFFAOYSA-N EDTA Chemical compound OC(=O)CN(CC(O)=O)CCN(CC(O)=O)CC(O)=O KCXVZYZYPLLWCC-UHFFFAOYSA-N 0.000 description 1
- 239000004593 Epoxy Substances 0.000 description 1
- SXRSQZLOMIGNAQ-UHFFFAOYSA-N Glutaraldehyde Chemical compound O=CCCCC=O SXRSQZLOMIGNAQ-UHFFFAOYSA-N 0.000 description 1
- 229920000084 Gum arabic Polymers 0.000 description 1
- AVXURJPOCDRRFD-UHFFFAOYSA-N Hydroxylamine Chemical compound ON AVXURJPOCDRRFD-UHFFFAOYSA-N 0.000 description 1
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical group CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 1
- KWYHDKDOAIKMQN-UHFFFAOYSA-N N,N,N',N'-tetramethylethylenediamine Chemical compound CN(C)CCN(C)C KWYHDKDOAIKMQN-UHFFFAOYSA-N 0.000 description 1
- WRUZLCLJULHLEY-UHFFFAOYSA-N N-(p-hydroxyphenyl)glycine Chemical compound OC(=O)CNC1=CC=C(O)C=C1 WRUZLCLJULHLEY-UHFFFAOYSA-N 0.000 description 1
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 1
- 239000000020 Nitrocellulose Substances 0.000 description 1
- ALQSHHUCVQOPAS-UHFFFAOYSA-N Pentane-1,5-diol Chemical compound OCCCCCO ALQSHHUCVQOPAS-UHFFFAOYSA-N 0.000 description 1
- 239000004721 Polyphenylene oxide Substances 0.000 description 1
- 239000004793 Polystyrene Substances 0.000 description 1
- 239000004372 Polyvinyl alcohol Substances 0.000 description 1
- ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 description 1
- 229910021604 Rhodium(III) chloride Inorganic materials 0.000 description 1
- KJTLSVCANCCWHF-UHFFFAOYSA-N Ruthenium Chemical compound [Ru] KJTLSVCANCCWHF-UHFFFAOYSA-N 0.000 description 1
- 241000978776 Senegalia senegal Species 0.000 description 1
- PMZURENOXWZQFD-UHFFFAOYSA-L Sodium Sulfate Chemical compound [Na+].[Na+].[O-]S([O-])(=O)=O PMZURENOXWZQFD-UHFFFAOYSA-L 0.000 description 1
- 229920002125 Sokalan® Polymers 0.000 description 1
- QAOWNCQODCNURD-UHFFFAOYSA-L Sulfate Chemical compound [O-]S([O-])(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-L 0.000 description 1
- 229910021626 Tin(II) chloride Inorganic materials 0.000 description 1
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 1
- FJWGYAHXMCUOOM-QHOUIDNNSA-N [(2s,3r,4s,5r,6r)-2-[(2r,3r,4s,5r,6s)-4,5-dinitrooxy-2-(nitrooxymethyl)-6-[(2r,3r,4s,5r,6s)-4,5,6-trinitrooxy-2-(nitrooxymethyl)oxan-3-yl]oxyoxan-3-yl]oxy-3,5-dinitrooxy-6-(nitrooxymethyl)oxan-4-yl] nitrate Chemical compound O([C@@H]1O[C@@H]([C@H]([C@H](O[N+]([O-])=O)[C@H]1O[N+]([O-])=O)O[C@H]1[C@@H]([C@@H](O[N+]([O-])=O)[C@H](O[N+]([O-])=O)[C@@H](CO[N+]([O-])=O)O1)O[N+]([O-])=O)CO[N+](=O)[O-])[C@@H]1[C@@H](CO[N+]([O-])=O)O[C@@H](O[N+]([O-])=O)[C@H](O[N+]([O-])=O)[C@H]1O[N+]([O-])=O FJWGYAHXMCUOOM-QHOUIDNNSA-N 0.000 description 1
- XCFIVNQHHFZRNR-UHFFFAOYSA-N [Ag].Cl[IH]Br Chemical compound [Ag].Cl[IH]Br XCFIVNQHHFZRNR-UHFFFAOYSA-N 0.000 description 1
- HOLVRJRSWZOAJU-UHFFFAOYSA-N [Ag].ICl Chemical compound [Ag].ICl HOLVRJRSWZOAJU-UHFFFAOYSA-N 0.000 description 1
- XEIPQVVAVOUIOP-UHFFFAOYSA-N [Au]=S Chemical compound [Au]=S XEIPQVVAVOUIOP-UHFFFAOYSA-N 0.000 description 1
- KWEGYAQDWBZXMX-UHFFFAOYSA-N [Au]=[Se] Chemical compound [Au]=[Se] KWEGYAQDWBZXMX-UHFFFAOYSA-N 0.000 description 1
- 239000000205 acacia gum Substances 0.000 description 1
- 235000010489 acacia gum Nutrition 0.000 description 1
- 230000002378 acidificating effect Effects 0.000 description 1
- 150000001252 acrylic acid derivatives Chemical group 0.000 description 1
- 239000013543 active substance Substances 0.000 description 1
- 230000000996 additive effect Effects 0.000 description 1
- 239000008272 agar Substances 0.000 description 1
- 235000010419 agar Nutrition 0.000 description 1
- 238000007754 air knife coating Methods 0.000 description 1
- 150000001298 alcohols Chemical class 0.000 description 1
- 239000000783 alginic acid Substances 0.000 description 1
- 235000010443 alginic acid Nutrition 0.000 description 1
- 229920000615 alginic acid Polymers 0.000 description 1
- 229960001126 alginic acid Drugs 0.000 description 1
- 150000004781 alginic acids Chemical class 0.000 description 1
- 125000005036 alkoxyphenyl group Chemical group 0.000 description 1
- 125000005907 alkyl ester group Chemical group 0.000 description 1
- 150000008051 alkyl sulfates Chemical class 0.000 description 1
- 125000002947 alkylene group Chemical group 0.000 description 1
- 229910021529 ammonia Inorganic materials 0.000 description 1
- 239000002518 antifoaming agent Substances 0.000 description 1
- 239000003963 antioxidant agent Substances 0.000 description 1
- 235000006708 antioxidants Nutrition 0.000 description 1
- 125000000732 arylene group Chemical group 0.000 description 1
- 235000010323 ascorbic acid Nutrition 0.000 description 1
- 239000011668 ascorbic acid Substances 0.000 description 1
- 229960005070 ascorbic acid Drugs 0.000 description 1
- QVQLCTNNEUAWMS-UHFFFAOYSA-N barium oxide Chemical compound [Ba]=O QVQLCTNNEUAWMS-UHFFFAOYSA-N 0.000 description 1
- 229910001864 baryta Inorganic materials 0.000 description 1
- 125000001164 benzothiazolyl group Chemical group S1C(=NC2=C1C=CC=C2)* 0.000 description 1
- QRUDEWIWKLJBPS-UHFFFAOYSA-N benzotriazole Chemical compound C1=CC=C2N[N][N]C2=C1 QRUDEWIWKLJBPS-UHFFFAOYSA-N 0.000 description 1
- 239000012964 benzotriazole Substances 0.000 description 1
- YKOQAAJBYBTSBS-UHFFFAOYSA-N biphenyl-2,3-diol Chemical compound OC1=CC=CC(C=2C=CC=CC=2)=C1O YKOQAAJBYBTSBS-UHFFFAOYSA-N 0.000 description 1
- 229910052797 bismuth Inorganic materials 0.000 description 1
- JCXGWMGPZLAOME-UHFFFAOYSA-N bismuth atom Chemical compound [Bi] JCXGWMGPZLAOME-UHFFFAOYSA-N 0.000 description 1
- 239000007844 bleaching agent Substances 0.000 description 1
- UORVGPXVDQYIDP-BJUDXGSMSA-N borane Chemical compound [10BH3] UORVGPXVDQYIDP-BJUDXGSMSA-N 0.000 description 1
- 229910000085 borane Inorganic materials 0.000 description 1
- KGBXLFKZBHKPEV-UHFFFAOYSA-N boric acid Chemical compound OB(O)O KGBXLFKZBHKPEV-UHFFFAOYSA-N 0.000 description 1
- 239000004327 boric acid Substances 0.000 description 1
- 229910052796 boron Inorganic materials 0.000 description 1
- 229940006460 bromide ion Drugs 0.000 description 1
- 230000003139 buffering effect Effects 0.000 description 1
- 150000001718 carbodiimides Chemical class 0.000 description 1
- 150000001732 carboxylic acid derivatives Chemical class 0.000 description 1
- 125000002091 cationic group Chemical group 0.000 description 1
- 239000003518 caustics Substances 0.000 description 1
- AJPXTSMULZANCB-UHFFFAOYSA-N chlorohydroquinone Chemical compound OC1=CC=C(O)C(Cl)=C1 AJPXTSMULZANCB-UHFFFAOYSA-N 0.000 description 1
- 125000004218 chloromethyl group Chemical group [H]C([H])(Cl)* 0.000 description 1
- 229910017052 cobalt Inorganic materials 0.000 description 1
- 239000010941 cobalt Substances 0.000 description 1
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- 238000002508 contact lithography Methods 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 238000007766 curtain coating Methods 0.000 description 1
- 230000002542 deteriorative effect Effects 0.000 description 1
- 229960000633 dextran sulfate Drugs 0.000 description 1
- 235000014113 dietary fatty acids Nutrition 0.000 description 1
- ZBCBWPMODOFKDW-UHFFFAOYSA-N diethanolamine Chemical compound OCCNCCO ZBCBWPMODOFKDW-UHFFFAOYSA-N 0.000 description 1
- 229940043237 diethanolamine Drugs 0.000 description 1
- MSKNRVFALYVLJL-UHFFFAOYSA-N diphenylphosphanium;4-nitrophenol;chloride Chemical compound [Cl-].OC1=CC=C([N+]([O-])=O)C=C1.C=1C=CC=CC=1[PH2+]C1=CC=CC=C1 MSKNRVFALYVLJL-UHFFFAOYSA-N 0.000 description 1
- 238000007598 dipping method Methods 0.000 description 1
- UXELAVSYWBWGQM-UHFFFAOYSA-L disodium;2,2-diethyl-3-sulfobutanedioate Chemical compound [Na+].[Na+].CCC(CC)(C([O-])=O)C(C([O-])=O)S(O)(=O)=O UXELAVSYWBWGQM-UHFFFAOYSA-L 0.000 description 1
- AFOSIXZFDONLBT-UHFFFAOYSA-N divinyl sulfone Chemical compound C=CS(=O)(=O)C=C AFOSIXZFDONLBT-UHFFFAOYSA-N 0.000 description 1
- MOTZDAYCYVMXPC-UHFFFAOYSA-N dodecyl hydrogen sulfate Chemical compound CCCCCCCCCCCCOS(O)(=O)=O MOTZDAYCYVMXPC-UHFFFAOYSA-N 0.000 description 1
- 229940043264 dodecyl sulfate Drugs 0.000 description 1
- 229960001484 edetic acid Drugs 0.000 description 1
- 239000003995 emulsifying agent Substances 0.000 description 1
- 239000003623 enhancer Substances 0.000 description 1
- 150000002148 esters Chemical class 0.000 description 1
- 150000002170 ethers Chemical class 0.000 description 1
- SYCDSJVGWYZMTK-UHFFFAOYSA-N ethyl 2,3-bis(3-nitrophenyl)-1,3-dihydrotetrazol-3-ium-5-carboxylate;1-methylbenzotriazole-4-sulfonate Chemical compound C1=CC=C2N(C)N=NC2=C1S([O-])(=O)=O.N1C(C(=O)OCC)=N[NH+](C=2C=C(C=CC=2)[N+]([O-])=O)N1C1=CC=CC([N+]([O-])=O)=C1 SYCDSJVGWYZMTK-UHFFFAOYSA-N 0.000 description 1
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 1
- 238000007765 extrusion coating Methods 0.000 description 1
- 239000000194 fatty acid Substances 0.000 description 1
- 229930195729 fatty acid Natural products 0.000 description 1
- 230000002349 favourable effect Effects 0.000 description 1
- 239000007888 film coating Substances 0.000 description 1
- 238000009501 film coating Methods 0.000 description 1
- 125000003983 fluorenyl group Chemical class C1(=CC=CC=2C3=CC=CC=C3CC12)* 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 229920000578 graft copolymer Polymers 0.000 description 1
- 150000002367 halogens Chemical class 0.000 description 1
- NWVVVBRKAWDGAB-UHFFFAOYSA-N hydroquinone methyl ether Natural products COC1=CC=C(O)C=C1 NWVVVBRKAWDGAB-UHFFFAOYSA-N 0.000 description 1
- WGCNASOHLSPBMP-UHFFFAOYSA-N hydroxyacetaldehyde Natural products OCC=O WGCNASOHLSPBMP-UHFFFAOYSA-N 0.000 description 1
- 125000004464 hydroxyphenyl group Chemical group 0.000 description 1
- 230000002401 inhibitory effect Effects 0.000 description 1
- 230000005764 inhibitory process Effects 0.000 description 1
- XMBWDFGMSWQBCA-UHFFFAOYSA-M iodide Chemical compound [I-] XMBWDFGMSWQBCA-UHFFFAOYSA-M 0.000 description 1
- 229940006461 iodide ion Drugs 0.000 description 1
- 229910052741 iridium Inorganic materials 0.000 description 1
- GKOZUEZYRPOHIO-UHFFFAOYSA-N iridium atom Chemical compound [Ir] GKOZUEZYRPOHIO-UHFFFAOYSA-N 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 239000012948 isocyanate Substances 0.000 description 1
- 150000002513 isocyanates Chemical class 0.000 description 1
- 239000011133 lead Substances 0.000 description 1
- 150000002734 metacrylic acid derivatives Chemical group 0.000 description 1
- 229910021645 metal ion Inorganic materials 0.000 description 1
- WSFSSNUMVMOOMR-NJFSPNSNSA-N methanone Chemical compound O=[14CH2] WSFSSNUMVMOOMR-NJFSPNSNSA-N 0.000 description 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 1
- 150000007522 mineralic acids Chemical class 0.000 description 1
- 239000000178 monomer Substances 0.000 description 1
- NPKFETRYYSUTEC-UHFFFAOYSA-N n-[2-(4-amino-n-ethyl-3-methylanilino)ethyl]methanesulfonamide Chemical compound CS(=O)(=O)NCCN(CC)C1=CC=C(N)C(C)=C1 NPKFETRYYSUTEC-UHFFFAOYSA-N 0.000 description 1
- SNNYMRAOKHXQSO-UHFFFAOYSA-N n-[4-(1,5-diphenyl-2h-tetrazol-2-ium-3-yl)phenyl]acetamide;bromide Chemical compound [Br-].C1=CC(NC(=O)C)=CC=C1N1N=C(C=2C=CC=CC=2)[NH+](C=2C=CC=CC=2)N1 SNNYMRAOKHXQSO-UHFFFAOYSA-N 0.000 description 1
- QHEPZDDANRVQLQ-UHFFFAOYSA-N n-[4-(3,5-diphenyl-1,3-dihydrotetrazol-3-ium-2-yl)phenyl]acetamide;chloride Chemical compound [Cl-].C1=CC(NC(=O)C)=CC=C1N1[NH+](C=2C=CC=CC=2)N=C(C=2C=CC=CC=2)N1 QHEPZDDANRVQLQ-UHFFFAOYSA-N 0.000 description 1
- 125000001624 naphthyl group Chemical group 0.000 description 1
- 230000007935 neutral effect Effects 0.000 description 1
- 238000006386 neutralization reaction Methods 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 229910017604 nitric acid Inorganic materials 0.000 description 1
- 229920001220 nitrocellulos Polymers 0.000 description 1
- 125000006501 nitrophenyl group Chemical group 0.000 description 1
- QIQXTHQIDYTFRH-UHFFFAOYSA-N octadecanoic acid Chemical compound CCCCCCCCCCCCCCCCCC(O)=O QIQXTHQIDYTFRH-UHFFFAOYSA-N 0.000 description 1
- 150000007524 organic acids Chemical class 0.000 description 1
- 229910052762 osmium Inorganic materials 0.000 description 1
- SYQBFIAQOQZEGI-UHFFFAOYSA-N osmium atom Chemical compound [Os] SYQBFIAQOQZEGI-UHFFFAOYSA-N 0.000 description 1
- 125000002971 oxazolyl group Chemical group 0.000 description 1
- 229910052763 palladium Inorganic materials 0.000 description 1
- 125000000913 palmityl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- AZQWKYJCGOJGHM-UHFFFAOYSA-N para-benzoquinone Natural products O=C1C=CC(=O)C=C1 AZQWKYJCGOJGHM-UHFFFAOYSA-N 0.000 description 1
- WVDDGKGOMKODPV-ZQBYOMGUSA-N phenyl(114C)methanol Chemical compound O[14CH2]C1=CC=CC=C1 WVDDGKGOMKODPV-ZQBYOMGUSA-N 0.000 description 1
- 125000000843 phenylene group Chemical group C1(=C(C=CC=C1)*)* 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 229920000233 poly(alkylene oxides) Polymers 0.000 description 1
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 1
- 239000004584 polyacrylic acid Substances 0.000 description 1
- 229920000768 polyamine Polymers 0.000 description 1
- 229920006289 polycarbonate film Polymers 0.000 description 1
- 229920006267 polyester film Polymers 0.000 description 1
- 229920000570 polyether Polymers 0.000 description 1
- 229920000139 polyethylene terephthalate Polymers 0.000 description 1
- 239000005020 polyethylene terephthalate Substances 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 229920002223 polystyrene Polymers 0.000 description 1
- 229920002689 polyvinyl acetate Polymers 0.000 description 1
- 239000011118 polyvinyl acetate Substances 0.000 description 1
- 229920002451 polyvinyl alcohol Polymers 0.000 description 1
- 229910052700 potassium Inorganic materials 0.000 description 1
- 239000011591 potassium Substances 0.000 description 1
- BHZRJJOHZFYXTO-UHFFFAOYSA-L potassium sulfite Chemical compound [K+].[K+].[O-]S([O-])=O BHZRJJOHZFYXTO-UHFFFAOYSA-L 0.000 description 1
- 235000019252 potassium sulphite Nutrition 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 238000004321 preservation Methods 0.000 description 1
- 230000002265 prevention Effects 0.000 description 1
- 230000001915 proofreading effect Effects 0.000 description 1
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 239000011253 protective coating Substances 0.000 description 1
- 125000003226 pyrazolyl group Chemical group 0.000 description 1
- 125000004076 pyridyl group Chemical group 0.000 description 1
- 239000011369 resultant mixture Substances 0.000 description 1
- 230000002441 reversible effect Effects 0.000 description 1
- 238000012552 review Methods 0.000 description 1
- 229910052703 rhodium Inorganic materials 0.000 description 1
- 239000010948 rhodium Substances 0.000 description 1
- MHOVAHRLVXNVSD-UHFFFAOYSA-N rhodium atom Chemical compound [Rh] MHOVAHRLVXNVSD-UHFFFAOYSA-N 0.000 description 1
- 238000007761 roller coating Methods 0.000 description 1
- 229910052707 ruthenium Inorganic materials 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 239000011734 sodium Substances 0.000 description 1
- 235000010378 sodium ascorbate Nutrition 0.000 description 1
- PPASLZSBLFJQEF-RKJRWTFHSA-M sodium ascorbate Substances [Na+].OC[C@@H](O)[C@H]1OC(=O)C(O)=C1[O-] PPASLZSBLFJQEF-RKJRWTFHSA-M 0.000 description 1
- 229960005055 sodium ascorbate Drugs 0.000 description 1
- 239000012279 sodium borohydride Substances 0.000 description 1
- 229910000033 sodium borohydride Inorganic materials 0.000 description 1
- 239000011780 sodium chloride Substances 0.000 description 1
- 229910052938 sodium sulfate Inorganic materials 0.000 description 1
- 235000011152 sodium sulphate Nutrition 0.000 description 1
- 235000010265 sodium sulphite Nutrition 0.000 description 1
- PPASLZSBLFJQEF-RXSVEWSESA-M sodium-L-ascorbate Chemical compound [Na+].OC[C@H](O)[C@H]1OC(=O)C(O)=C1[O-] PPASLZSBLFJQEF-RXSVEWSESA-M 0.000 description 1
- 239000003381 stabilizer Substances 0.000 description 1
- 230000000087 stabilizing effect Effects 0.000 description 1
- 235000011150 stannous chloride Nutrition 0.000 description 1
- 239000001119 stannous chloride Substances 0.000 description 1
- 239000011550 stock solution Substances 0.000 description 1
- 235000000346 sugar Nutrition 0.000 description 1
- 150000008163 sugars Chemical class 0.000 description 1
- BDHFUVZGWQCTTF-UHFFFAOYSA-M sulfonate Chemical compound [O-]S(=O)=O BDHFUVZGWQCTTF-UHFFFAOYSA-M 0.000 description 1
- 150000003459 sulfonic acid esters Chemical class 0.000 description 1
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- FAGUFWYHJQFNRV-UHFFFAOYSA-N tetraethylenepentamine Chemical compound NCCNCCNCCNCCN FAGUFWYHJQFNRV-UHFFFAOYSA-N 0.000 description 1
- AKXUUJCMWZFYMV-UHFFFAOYSA-M tetrakis(hydroxymethyl)phosphanium;chloride Chemical compound [Cl-].OC[P+](CO)(CO)CO AKXUUJCMWZFYMV-UHFFFAOYSA-M 0.000 description 1
- 125000000335 thiazolyl group Chemical group 0.000 description 1
- JOXIMZWYDAKGHI-UHFFFAOYSA-N toluene-4-sulfonic acid Chemical compound CC1=CC=C(S(O)(=O)=O)C=C1 JOXIMZWYDAKGHI-UHFFFAOYSA-N 0.000 description 1
- 125000003944 tolyl group Chemical group 0.000 description 1
- ZIBGPFATKBEMQZ-UHFFFAOYSA-N triethylene glycol Chemical compound OCCOCCOCCO ZIBGPFATKBEMQZ-UHFFFAOYSA-N 0.000 description 1
- UORVGPXVDQYIDP-UHFFFAOYSA-N trihydridoboron Substances B UORVGPXVDQYIDP-UHFFFAOYSA-N 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
- G03C1/00—Photosensitive materials
- G03C1/005—Silver halide emulsions; Preparation thereof; Physical treatment thereof; Incorporation of additives therein
- G03C1/485—Direct positive emulsions
- G03C1/48515—Direct positive emulsions prefogged
Definitions
- This invention relates to a direct-posi light-sensitive silver halide photographic material, more particularly to a direct-posi light-sensitive silver halide photographic material capable of giving a posi-image by imparting previously fog and destroying fog by exposure utilizing the solarization or Herschel effect, and to a method for processing the same.
- a light-sensitive silver halide photographic material for direct-posi which utilizes a light-source enriched in UV-rays, such as xenone, metal halide, mercury lamp or ultra-high pressure mercury lamp, for exposure, as the light-sensitive material of the type which can be handled under a fluorescent lamp for safety light from which UV-rays are cut
- the reversal sensitivity of the light-sensitive material is lowered until it becomes approximate to the re-reversal sensitivity, whereby re-reversal tends to occur increasingly in practical application.
- An object of this invention is to provide a hard tone direct-posi light-sensitive silver halide photographic material, which can inhibit re-reversal generated by exposure and is low in Dmin.
- Another object of this invention is to provide a direct-posi light-sensitive silver halide photographic material which is low in Dmin even by processing with a developer for rapid processing and can give photographic characteristics of hard contrast, and also a method for processing the same.
- a direct-posi light-sensitive silver halide photographic material which comprises (i) having at least one layer of direct-posi silver halide emulsion layer containing silver halide grains having a silver halide composition containing 50 mol % or more of silver chloride on a support and (ii) containing a tetrazolium compound in at least one layer of said emulsion layer and/or the hydrophilic colloid layer existing on said support on the same side as said emulsion layer.
- the light-sensitive material according to this invention is processed with a method, which comprises processing the above light-sensitive material with a developer containing at least one compound represented by the formula [I] shown below:
- the above tetrazolium compound to be contained in the hydrophilic colloid layer may preferably be represented by the formulae [II] through [VI] shown below:
- R 2 to R 18 each represent a group selected from the group consisting of alkyl groups (e.g. methyl, ethyl, propyl, tert-butyl, chloromethyl), alkenyl groups (e.g. allyl), aryl groups ⁇ e.g. phenyl, tolyl, hydroxyphenyl, alkoxyphenyl, carboxyphenyl, alkoxycarbonylphenyl, aminophenyl, mercaptophenyl, sulfoxyphenyl, aminosulfoxyphenyl, nitrophenyl, halogenated phenyl, etc., naphthyl (e.g.
- hyterocyclic groups e.g. thiazolyl, benzothiazolyl, oxazolyl, pyrymidine, pyridyl, pyrazolyl, etc.
- each of these groups may be a group forming a metal chelate or complex.
- R 4 , R 7 , R 10 , R 12 and R 14 may be, in addition to those as mentioned above, a hydroxy group, an alkoxy group, a carboxy group, an alkoxycarbonyl group, a mercapto group, an alkoxysulfide group or a cyano group.
- X G represents an anion, which may be any anion generally known in the art.
- D represents a divalent aromatic group such as phenylene group
- E represents a divalent group selected from, for example, an alkylene group, an arylene group and an aralkylene group.
- n 1 or 2, with the proviso that m is 1, when the compound forms an intramolecular salt.
- the anion represented by the above X" in the tetrazolium compound of this invention may be, for example, a halogen ion such as chloride ion, bromide ion, iodide ion, etc., an acid radical of an inorganic acid such as nitric acid, sulfuric acid, perchloric acid, etc., an acid radical of an organic acid such as a sulfonic acid or a carboxylic acid, etc., an anionic active agent, specifically a lower alkyl benzenesulfonic acid anion such as p-toluenesulfonic acid anion, etc., a higher alkyl benzenesulfonic acid anion such as p-dodecylbenzenesulfonic acid anion, etc., a higher alkyl sulfate anion such as lauryl sulfate anion, etc., a boric acid type anion such as tetraphenyl
- tetrazolium compounds to be used in this invention can readily be synthesized according to, for example, the methods as disclosed in Chemical Reviews, THE WILLIAM & WILKINS COMPANY, Vol. 55, p. 355 - 483.
- the tetrazolium compound to be used in this invention may be used singly to give more preferably characteristics, but a pluralty of compounds can be combined at any ratio without deteriorating the preferable characteristics.
- the tetrazolium compound of this invention into the silver halide emulsion layer.
- it is added into the hydrophilic colloid layer adjacent directly or through an intermediate layer to the hydrophilic colloid layer containing the silver halide emulsion layer.
- a solution of a tetrazolium compound of this invention in a suitable organic solvent such as alcohols (e.g. methanol, ethanol), ethers, esters, etc., may be applied by the overcoating method, etc. directly on the portion of the outermost layer of the light-sensitive material to incorporate the compound in the light-sensitive material of this invention.
- a suitable organic solvent such as alcohols (e.g. methanol, ethanol), ethers, esters, etc.
- the tetrazolium compound to be used in this invention should preferbly be employed in an amount within the range from 1 x 10 6 mol to 5 x 10- 1 mol, particularly from 1 x 10-5 mol to 1 x 10-2 mol per mol of the silver halide contained in the light-sensitive material of this invention.
- the silver halide to be used in this invention may include silver chloride, silver chlorobromide, silver chloroiodide, silver chloroiodobromide and the like. In any case, it is required that the silver chloride should be contained at a proportion of at least 50 mol %. If the silver chloride content is less than 50 mol %, the contrast hardening effect of this invention will undesirably be lost. On the other hand, if it exceeds 95 mol %, re-reversal will be generated intensely. Accordingly, in view of various photographic performances, in one of preferred embodiments, the silver chloride content may be 50 mol % - 95 mol %.
- the above silver halide emulsion containing 50 mol % or more of silver chloride can be prepared by, for example, any of the acidic method, the neutral method or the ammonia method, according to the conventional techniques known in the art, including simultaneous mixing, reverse mixing, ordinary mixing, etc. Further, if desired, it can be prepared while controlling the flow rate at which it is to be added, pH or EAg.
- the silver halide to be incorporated in the silver halide emulsion layer of this invention is not limited, but it should desirably contain a silver halide having an average grain size of 0.05 to 1.5 micron, preferably 0.1 to 0.5 micron, and with at least 75 %, preferably 80 % or more of all the grain number comprising those having 0.5 to 1.5-fold, preferably 0.6 to 1.4-fold of the aforesaid average grain size.
- the silver halide of this invention may be silver chlorobromide having an average grain size of 0.1 to 0.3 p , and 80 % or more of all the grains have grain sizes of 0.6 to 1.4-fold of the average grain size.
- an organic desensitizer may be added, and such organic desensitizers may include, for example, 7- membered ring commpounds as disclosed in Japanese Patent Publication No. 14500/1968, fluorene compounds having a nitro group as disclosed in Japanese Unexamined Patent Publication No.84432/1974, compounds having a nitro- phenylmercapto group as disclosed in U.S.Patent 3,910,795, nitrostyryl compounds, pinacryptol yellow, 5-m-nitrobenzylidene rhodanineas as disclosed in U.S. Patent 2,669,515, etc.
- These organic desensitizers may be added in amounts of 1.0 x 10 -6 mol to 1.0 x 10 -1 mol, preferably 1.0 x 10- 5 mol to 1.0 x 10 2 mol per mol of the silver halide.
- atoms such as of iridium, rhodium, osmium, bismuth, cobalt, nickel, palladium, ruthenium, iron, copper, zinc, lead, etc.
- these atoms should preferably be contained in amounts of 10 -9 to 10 -2 mole, particularly 10 -6 to 10-3 mol per mol of the silver halide.
- Either surface latent image type or internal latent image type may be available.
- silver halides prepared according to different methods may be mixed together. The crystal form is not limited at all, but either cubic, octahedral or spherical may be available.
- the direct-posi silver halide emulsion to be used in this invention is endowed with fogging before exposure according to the technique known in the art.
- Fog can be imparted with a reducing agent alone or a combination of a reducing agent and a gold compound.
- useful reducing agents are, for example, formalin, hydrazine, polyamine (e.g. triethylenetetramine, tetraethylenepentamine, etc.), thiourea dioxide, tetra-(hydroxymethyl)phosphonium chloride, boron compounds (e.g.
- amine borane, sodium borohydride, etc. and stannous chloride, and they are used generally in amounts of 2.0 x 10 -6 to 2.0 x 10 -3 per mol of the silver halide.
- polyaminethiourea dioxide and boron compounds may preferably be employed.
- Typical examples of the above gold compounds include chloroauric acid, potassium chloroaurate, gold sulfide, gold selenide, etc., which can be used in amounts generally from 1.0 x 10 -6 to 1.0 x 10 4 mol per mol of the silver halide.
- the degree of the fog to be imparted to the direct-posi silver halide of this invention can be chosen suitably depending on the amount of the fogging agent, and the temperature and time conditions of fogging-ripening.
- hydrophilic colloid to be used particularly advantageously in this invention is gelatin, but hydrophilic colloids other than gelatin may include, for example, colloidal albumin, agar, gum arabic, alginic acid, hydrolyzed cellulose acetate, acrylamide, imidated polyamide, polyvinyl alcohol, hydrolyzed polyvinyl acetate, gelatin derivatives such as phenylcarbamyl gelatin, acylated gelatin, phthalated gelatin as disclosed in U.S.
- These hydrophilic colloids are also applicable for layer containing no silver halide such as the halation prevention layer, the protective layer, the intermediate layer, etc.
- the light-sensitive material of this ivnention comprises a hydrophilic colloid layer containing the silver halide and the tetrazolium compound according to this invention provided by coating on a suitable support for photography.
- the support to be used in this invention may include typically baryta paper, polyethylene-coated paper, polypropylene synthetic paper, glass plate, cellulose acetate, cellulose nitrate, polyester films such as polyethylene terephthalte, polyamide film, polypropylene film, polycarbonate film, polystyrene film, etc. These supports can be chosen suitable depending on the end of use of the respective light-sensitive materials.
- the light-sensitive material which comprises at least one hydrophilic colloid layer containing the silver halide and the tetrazolium compound according to the present invention provided by coating on a support, should desirably have a protective layer having an appropriate thickness, namely 0.1 to 10 p, particularly a gelatin protective layer having a 0.8 to 2 p thickness, provided by coating.
- hydrophilic colloid to be used in this invention may also employ, if desired, various additives for photography, such as gelatin plasticizers, film hardeners, surfactants, image stabilizers, UV-absorbers, anti-stain agents, pH controllers, antioxidants, antistatic agents, thickeners, graininess enhancers, dyes, mordants, whitening agents, developing speed controllers, matting agents, etc. within the ranges which will not damage the effect of this invention.
- various additives for photography such as gelatin plasticizers, film hardeners, surfactants, image stabilizers, UV-absorbers, anti-stain agents, pH controllers, antioxidants, antistatic agents, thickeners, graininess enhancers, dyes, mordants, whitening agents, developing speed controllers, matting agents, etc.
- those which can be used particularly preferably for this invention may include, as the thickeners or plasticizers, the substances disclosed in U.S. Patent 2,960,404, Japanese Patent Publication No.4939/1968, German ALS 1 904 604, Japanese Patent Publication No.63715/1973, Japanese Patent Publication No.15462/1970, Belgian Patent 762,833, U.S.Patent 3,767,410 and Belgian Patent 558,143, such as styrene-sodium maleate copolymers, dextran sulfate, etc.; as film hardeners, various kinds of film hardners of aledehyde type, epoxy type, ethyleneimine type, active halogen type, vinylsulfone type, isocyanate type, sulfonic acid ester type, carbodiimide type, mucochloric acid type, acyloyl type, etc.; as UV-absorbers, compounds as disclosed in U.S.
- Patent 3,253,921 and U.K. Patent 1,309,349 particularly 2-(2'-hydroxy-5-tert-butylphenyl)benzotriazole, 2-(2'-hydroxy-3',5'-di-tert-butylphenyl)benzotriazole, 2-(2'-hydroxy-3'-tert-butyl-5'-butylphenyl)-5-chlorobenzotriazole, 2-(2'-hydroxy-3'-5'-di-tert-butylphenyl)-5-chlorobenzotriazole and the like; as dyes, compounds as disclosed in U.S. Patent 2,072,908, German Patent 107 990, U.S. Patent 3,048,487 and U.S.
- Patent 515,998 These compounds may be incorporated in the protective layer, the emulsion layer or the intermediate layer.
- the surfactants to be used for improving penetrability for coating aids, emulsifying agents, processing liquors, etc. as defoaming agents or for controlling various physical properties of the light-sensitive material, there may be employed anionic, cationic, nonionic or amphoteric compounds as disclosed in U.K. Patents 548,532 and 1,216,389, U.S. Patents 3,026,202 and 3,514,293, Japanese Patent Publications Nos.
- Available antistatic agents may include the compounds as disclosed in Japanese Patent Publication No.24158/1971, Japanese Unexamined Patent Publication No.89979/1973, U.S. Patents 2,882,157 and 2,972,535, Japanese Unexamined Patent Publications Nos. 20785/1973, 43130/1973 and 90391/1973, Japanese Patent Publication Nos. 24159/1971, 39312/1971 and 43809/1973, and Japanese Unexamined Patent Publication No. 83627/1972.
- Matting agents are inclusive of the compounds as disclosed in U.K. Patent 1,221,980, U.S. Patents 2,992,101 and 2,956,884, French Patent 1,395,544 and Japanese Patent Publication No.43125/1973, particularly silica gel having particle sizes of 0.5 to 20 u and polymethyl methacrylate polymers having particle sizes of 0.5 to 20 ⁇ .
- the emulsion layer and other constituent layers in the light-sensitive material of this invention can be coated according to various coating methods known in the art.
- the coating method includes the dipping coating method, the air-knife coating method, the roller coating, the curtain coating and extrusion coating method.
- the method disclosed in U.S. Patent 2,681,294 is one of advantageous methods. Two or more layers can be coated simultaneously by use of the method as disclosed in U.S. Patents 2,761,791 and 3,526,528.
- the light-sensitive material of this invention is treated with a developer containing at least one compound represented by the formula [I] shown below:
- the compounds represented by the above formula [I] are generally known as development inhibitors, and these development inhibitors should preferably be employed in amounts of 10 -1 to 10- 5 mol, particularly 10- 2 to 10 4 mol per liter of the developer. It is also preferred to dissolve the above development inhibitor in an alkanol amine and/or a glycol prior to addition into the developer.
- the developing agents to be incorporated in the developer include the following.
- ortho- or para-amino phenol or amino- pyrazolone as representative ones, including 4-aminophenol, 2-amino-6-phenylphenol, 2-amino-4-chloro-6-phenylphenol, 4-amino-2-phenylphenol, 3,4-diaminophenol, 3-methyl-4,6-diaminophenol, 2,4-diaminoresorcinol, 2,4,6- triaminophenol, N-methyl-p-aminophenol, N-S-hydroxyethyl- p-aminophenol, p-hydroxyphenyl aminoacetic acid, 2-amino- naphthol and the like.
- the heterocyclic developing agent may include, for example, I-phenyl-3-pyrazolidone (phenidone), 4,4'-dimethyl-1-phenyl-pyrazolidone (dimezone), l-phenyl-4-amino-5-pyrazolone, 1-(p-aminophenyl)-3-amino-2-pyrazoline, l-phenyl-3-methyl-4-amino-5-pyrazolone, 5-aminouracil, 5-amino-2,4,6-trihydroxyphylimidene, etc.
- Preferable combinations are hydroquinone and phenidone or hydroquinone and dimezone, and it is preferable to use hydroquinone in an amount of 5 g to 50 g/liter, while phenidone or dimezone in an amount of 0.05 to 5 g/liter.
- a preservative for example, a sulfite such as sodium sulfite, potassium sulfite, ammonium sulfite, etc. without damaging the effect of this invention. This may be reckoned as one specific feature of this invention.
- the sulfite concentration may preferably be 0.06 to 1 gram ion/liter.
- hydroxyamine or a hydrazide compound may be available as the preservative. Otherwise, it may freely be practiced to impart the function of controlling pH and buffering with a caustic alkali, a carbonate alkali or an amine as employed generally in black-and-white developer, and to add an inorganic development inhibiting agent such as potassium bromide, a metal ion capturing agent such as ethylene-diaminetetraacetic acid, a development accelerator such as methanol, ethanol, benzyl alcohol, polyalkylene oxide, etc., a surfactant such as sodium alkyl aryl sulfonate, natural saponin, sugars or alkyl esters of the aforesaid compound, etc., film hardener such as glutaraldehyde, formalin, glyoxal, etc., or an ion strength controlling agent such as sodium sulfate, etc.
- an inorganic development inhibiting agent such as potassium bromide
- the pH value may be adjusted as desired at 9 to 12, but the range from pH 10 to 11 is preferred in view of preservation characteristic and photographic performance.
- the developer according to this invention may also contain an organic solvent selected from alkanol amines or glycols, if desired.
- the above alkanol amines may be, for example, monoethanol amine, diethanol amine, triethanol amine. Preferably, triethanol amine is employed. These alkanol amines may be employed preferably in an amount of 20 to 500 g, particularly preferably 60 to 300 g, per liter of the developer.
- the above glycols may include ethylene glycol, diethylene glycol, propylene glycol, triethylene glycol, 1,4-butane diol, 1,5-pentane diol and the like.
- ethylene glycol is employed.
- These glycols may be employed preferably in an amount of 20 to 500 g, particularly 60 to 300 g, per liter of the developer.
- alkanolamines and glycols may be used either singly or as a combination of two or more compounds.
- processing may be conducted according to various conditions.
- the processing temperature for example, the developing temperature may preferably 50 °C or lower, particularly preferably around 30 °c, while developing may generally be completed within 3 minutes, particularly preferably within 2 minutes to give frequently favorable results.
- the processing steps other than development for example, washing, stopping, stabilizing and fixing, and further the steps of prehardening, neutralization, etc., if desired, may be freely employed, and these steps can also be omitted depending on the occasion. Further, these processings may be either the so called manual developing processing such as tray developing or frame developing or mechanical developing such as roller developing or hanger developing.
- the light-sensitive material of this invention and its preferred processing method as described in detail above can accomplish completely the objects of this invention.
- a printing plate having dot quality with low Dmin (minimum density) and excellent sharpness in its finishing was found to be prepared.
- Each emulsion as prepared above was desalted and redispersed to prepare a mono-dispersed emulsion.
- To this mono-dispersed emulsion was added 10 mg of thiourea dioxide per mol of the silver halide, the resultant mixture was ripened at 60 °c for 60 minutes, followed by ripening at 60°C with addition of 3 mg of chloroauric acid per mol of the silver halide until the highest performance is attained to form fog.
- the emulsion endowed with fog thus obtained was divided into 5 equal portions, which were then formulated into coating solution recipes E 1 to E 5 as shown below.
- P l solution shown below was prepared as the coating solution for protective film for emulsion.
- the back coating solution B 1 was prepared as follows.
- Each of the above test samples was exposed by use of a step-wedge in a UV-ray light room printer employing a ultra-high pressure mercury lamp as the light source (HMW-215 produced by ORC manufacturing Co.), and separately subjected to contact printing by use of halftone dot photographic original with a darkened degree of about 50 %, and exposure was effected to the darkened degree of the test sample of about 50 %.
- a step-wedge in a UV-ray light room printer employing a ultra-high pressure mercury lamp as the light source (HMW-215 produced by ORC manufacturing Co.)
- the exposed test sample was processed under the conditions shown below by charging the developer of the recipe shown below and a commercial available fixing solution into a roller conveying type automatic developing machine (developer tank capacity: 40t ).
- the developer was made up to one liter by dissolving 500 ml of the stock solution of the developer shown below in 500 ml of pure water before use.
- the samples of this invention (Sample Nos. 6, 7, 9, 10, 12, 13, 14, 15, 17, 18, 20 and 21) containing 50 mol % or more of silver chloride and tetrazolium compounds according to this invention can be understood to give excellent finishing with inhibition of re-reversal, low Dmin and excellent sharpness of dot, as comapred with Control samples.
- Light-sensitive materials were prepared in the same manner as in Example 1, but developers were prepared by adding the compounds shown in Table 2 in amounts prescribed in the Table in place of 5-methylbenzotriazole, I-phenyl-5-mercaptotetrazole and 5-nitroindazole employed in Example 1.
- test sample No. 8 prepared in Example 1 was exposed similarly as in Example 1 by a UV-ray light room printer (HMW-215 produced by ORC manufacturing Co.) employing a ultra-high pressure mercury lamp as the light source. Subsequently, developing processing was performed with a developer containing the compounds in the Table shown below.
- a UV-ray light room printer HMW-215 produced by ORC manufacturing Co.
- An emulsion was prepared following the same procedure as in Example 1, but without addition of rhodium chloride, and subjected to ripening to form fog.
- This emulsion was divided into 5 equal portions, and coating solutions were prepared according to the recipes E 1 through E 5 . However, into each solution was added pinakryptol yellow in methanolic solution in an amount of 1 g per mole of the silver halide. Subsequently, following the same steps of Example 1, exposure and processing were conducted. Evaluation of the image obtained gave the result that the samples employing the emulsions containing tetrazolium compounds according to this invention are inhibited in re-reversal, and finishing with low Dmin and excellent sharpness could be obtained.
- the above objects of this invention can be accomplished, whereby Dmin of dot and sharpness of the dot can be improved. And, further, the above effects can be still promoted by processing with a developer containing a compound represented by the aforementioned formula [I].
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Silver Salt Photography Or Processing Solution Therefor (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP23579283A JPS60126645A (ja) | 1983-12-13 | 1983-12-13 | 明室用直接ポジハロゲン化銀写真感光材料による画像形成方法 |
JP235792/83 | 1983-12-13 |
Publications (1)
Publication Number | Publication Date |
---|---|
EP0146302A1 true EP0146302A1 (en) | 1985-06-26 |
Family
ID=16991321
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
EP84308402A Withdrawn EP0146302A1 (en) | 1983-12-13 | 1984-12-04 | Light-sensitive silver halide photographic material for direct-post and method for processing the same |
Country Status (2)
Country | Link |
---|---|
EP (1) | EP0146302A1 (enrdf_load_stackoverflow) |
JP (1) | JPS60126645A (enrdf_load_stackoverflow) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4849326A (en) * | 1987-07-21 | 1989-07-18 | Minnesota Mining And Manufacturing Company | White light handeable direct-positive silver halide photographic elements |
EP0647880A1 (en) * | 1993-10-06 | 1995-04-12 | Konica Corporation | Method of processing silver halide photographic light-sensitive material |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6375738A (ja) * | 1986-09-19 | 1988-04-06 | Fuji Photo Film Co Ltd | 直接ポジ型ハロゲン化銀写真感光材料 |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB1101895A (en) * | 1964-04-09 | 1968-01-31 | Eastman Kodak Co | Photographic direct positive colour processes and materials |
DE2734336A1 (de) * | 1976-07-31 | 1978-02-02 | Konishiroku Photo Ind | Lichtempfindliches photographisches silberhalogenidaufzeichnungsmaterial |
Family Cites Families (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0244048B2 (ja) * | 1982-03-19 | 1990-10-02 | Konishiroku Photo Ind | Chokusetsuhojiharogenkaginshashinkankozairyo |
JPS58186740A (ja) * | 1982-04-26 | 1983-10-31 | Konishiroku Photo Ind Co Ltd | 直接ポジハロゲン化銀写真感光材料およびその処理方法 |
-
1983
- 1983-12-13 JP JP23579283A patent/JPS60126645A/ja active Granted
-
1984
- 1984-12-04 EP EP84308402A patent/EP0146302A1/en not_active Withdrawn
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB1101895A (en) * | 1964-04-09 | 1968-01-31 | Eastman Kodak Co | Photographic direct positive colour processes and materials |
DE2734336A1 (de) * | 1976-07-31 | 1978-02-02 | Konishiroku Photo Ind | Lichtempfindliches photographisches silberhalogenidaufzeichnungsmaterial |
Non-Patent Citations (2)
Title |
---|
PATENTS ABSTRACTS OF JAPAN, vol. 7, no. 286 (P-244)[1431], 21st December 1983; & JP - A - 58 160 949 (KONISHIROKU SHASHIN KOGYO K.K.) 24-09-1983 * |
PATENTS ABSTRACTS OF JAPAN, vol. 8, no. 31 (P-253)[1468], 9th February 1984; & JP - A - 58 186 740 (KONISHIROKU SHASHIN KOGYO K.K.) 31-10-1983 * |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4849326A (en) * | 1987-07-21 | 1989-07-18 | Minnesota Mining And Manufacturing Company | White light handeable direct-positive silver halide photographic elements |
EP0647880A1 (en) * | 1993-10-06 | 1995-04-12 | Konica Corporation | Method of processing silver halide photographic light-sensitive material |
USH1608H (en) * | 1993-10-06 | 1996-11-05 | Konica Corp. | Method of processing silver halide photographic light-sensitive material |
Also Published As
Publication number | Publication date |
---|---|
JPS60126645A (ja) | 1985-07-06 |
JPH0435058B2 (enrdf_load_stackoverflow) | 1992-06-09 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US5004669A (en) | Light-sensitive silver halide photographic material | |
US3885970A (en) | Photographic silver halide emulsion with silver halide grains having one twinning plane | |
US4233400A (en) | Light-sensitive silver halide photographic material containing tetrazolium compounds | |
US4761362A (en) | Processing a photographic material comprising an emulsion layer providing a contrast gradation and another layer providing a soft tone gradation | |
GB1589593A (en) | Light-sensitive silver halide photographic material and method of processing thereof | |
US4416980A (en) | High-contrast light-sensitive silver halide photographic material | |
US4283479A (en) | Silver halide photographic materials and a process forming relief images | |
JPS5863933A (ja) | 画像形成方法 | |
EP0146302A1 (en) | Light-sensitive silver halide photographic material for direct-post and method for processing the same | |
US4221864A (en) | Light-sensitive silver halide photographic materials | |
GB1600573A (en) | Process for forming high-contrast silver images | |
GB1600571A (en) | Method of processing a light-sensitive silver halide photographic material | |
JPH0435056B2 (enrdf_load_stackoverflow) | ||
US4444875A (en) | Light-sensitive silver halide photographic material | |
JPH0244048B2 (ja) | Chokusetsuhojiharogenkaginshashinkankozairyo | |
JPS6149654B2 (enrdf_load_stackoverflow) | ||
GB1593751A (en) | Light-sensitive silver halide photographic material | |
JPS59224839A (ja) | ハロゲン化銀写真感光材料 | |
JPH0450572B2 (enrdf_load_stackoverflow) | ||
JPH0342452B2 (enrdf_load_stackoverflow) | ||
JPS6147949A (ja) | 画像形成方法 | |
JPS5979244A (ja) | 銀画像形成方法 | |
JPS58186740A (ja) | 直接ポジハロゲン化銀写真感光材料およびその処理方法 | |
JPH0310934B2 (enrdf_load_stackoverflow) | ||
JPS59231528A (ja) | ハロゲン化銀写真感光材料 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
PUAI | Public reference made under article 153(3) epc to a published international application that has entered the european phase |
Free format text: ORIGINAL CODE: 0009012 |
|
AK | Designated contracting states |
Designated state(s): BE DE FR GB |
|
RIN1 | Information on inventor provided before grant (corrected) |
Inventor name: MURAKAMI, TAKESHI Inventor name: NAGASHIMA, TOSHIHARU Inventor name: YOSHIDA, KAZUHIRO |
|
17P | Request for examination filed |
Effective date: 19851205 |
|
17Q | First examination report despatched |
Effective date: 19861006 |
|
STAA | Information on the status of an ep patent application or granted ep patent |
Free format text: STATUS: THE APPLICATION IS DEEMED TO BE WITHDRAWN |
|
18D | Application deemed to be withdrawn |
Effective date: 19870617 |
|
RIN1 | Information on inventor provided before grant (corrected) |
Inventor name: YOSHIDA, KAZUHIRO Inventor name: MURAKAMI, TAKESHI Inventor name: NAGASHIMA, TOSHIHARU |