EP0032384A2 - Verfahren und Werkzeug zur Trennung zusammengeklebter Werkstücke - Google Patents

Verfahren und Werkzeug zur Trennung zusammengeklebter Werkstücke Download PDF

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Publication number
EP0032384A2
EP0032384A2 EP81100086A EP81100086A EP0032384A2 EP 0032384 A2 EP0032384 A2 EP 0032384A2 EP 81100086 A EP81100086 A EP 81100086A EP 81100086 A EP81100086 A EP 81100086A EP 0032384 A2 EP0032384 A2 EP 0032384A2
Authority
EP
European Patent Office
Prior art keywords
adhesive
workpieces
mask
workpiece
pellicle
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
EP81100086A
Other languages
English (en)
French (fr)
Other versions
EP0032384A3 (en
EP0032384B1 (de
Inventor
Jay Willard Contant
Donald Willis Fisher
David Dixon Fox
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
International Business Machines Corp
Original Assignee
International Business Machines Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by International Business Machines Corp filed Critical International Business Machines Corp
Publication of EP0032384A2 publication Critical patent/EP0032384A2/de
Publication of EP0032384A3 publication Critical patent/EP0032384A3/en
Application granted granted Critical
Publication of EP0032384B1 publication Critical patent/EP0032384B1/de
Expired legal-status Critical Current

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/62—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof
    • G03F1/64—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof characterised by the frames, e.g. structure or material, including bonding means therefor
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C65/00—Joining or sealing of preformed parts, e.g. welding of plastics materials; Apparatus therefor
    • B29C65/76—Making non-permanent or releasable joints
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/62—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C66/00—General aspects of processes or apparatus for joining preformed parts
    • B29C66/70—General aspects of processes or apparatus for joining preformed parts characterised by the composition, physical properties or the structure of the material of the parts to be joined; Joining with non-plastics material
    • B29C66/72—General aspects of processes or apparatus for joining preformed parts characterised by the composition, physical properties or the structure of the material of the parts to be joined; Joining with non-plastics material characterised by the structure of the material of the parts to be joined
    • B29C66/727—General aspects of processes or apparatus for joining preformed parts characterised by the composition, physical properties or the structure of the material of the parts to be joined; Joining with non-plastics material characterised by the structure of the material of the parts to be joined being porous, e.g. foam
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S428/00—Stock material or miscellaneous articles
    • Y10S428/913—Material designed to be responsive to temperature, light, moisture
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T156/00—Adhesive bonding and miscellaneous chemical manufacture
    • Y10T156/10—Methods of surface bonding and/or assembly therefor
    • Y10T156/1052—Methods of surface bonding and/or assembly therefor with cutting, punching, tearing or severing
    • Y10T156/1059—Splitting sheet lamina in plane intermediate of faces
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T156/00—Adhesive bonding and miscellaneous chemical manufacture
    • Y10T156/19—Delaminating means
    • Y10T156/1928—Differential fluid pressure delaminating means
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T156/00—Adhesive bonding and miscellaneous chemical manufacture
    • Y10T156/19—Delaminating means
    • Y10T156/1928—Differential fluid pressure delaminating means
    • Y10T156/1933—Spraying delaminating means [e.g., atomizer, etc.
    • Y10T156/1939—Air blasting delaminating means]
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T225/00—Severing by tearing or breaking
    • Y10T225/10—Methods
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T225/00—Severing by tearing or breaking
    • Y10T225/30—Breaking or tearing apparatus
    • Y10T225/304—Including means to apply thermal shock to work

Definitions

  • the invention relates to a method of separating two workpieces adhesively bonded together and a tool for executing the method.
  • the object of the invention is to separate two workpieces easily and quickly, e. g. a pattern mask and a ring supporting a pellicle, adhesively bonded together, where the adhesive remains substantially on the one workpiece, and where the workpieces are not damaged and can even be rebonded using the same adhesive, and without additional adhesive.
  • the method and tools are preferably used e. g. to remove from pattern masks the pellicle supporting rings known from prior art. This is done without damaging either the pellicles, the pellicle supporting ring or the mask and without leaving significant amounts of adhesive residue on the mask, thus eliminating the lengthy uneconomical cleaning steps known to the prior art. The removal does not interfere with the rebonding of the pellicle ring to the mask once the mask has been corrected or cleaned.
  • the invention discloses a method of separating a glass mask from a pellicle ring adhesively mounted thereon. This is accomplished by maintaining a coolant in contact with the mask for a period of time sufficient to cool the adhesive bond between the mask and pellicle ring to below its embrittlement temperature so that when a shearing force is applied to the ring with respect to the glass mask will cause shearing of the adhesive bond at the adhesive glass mask interface.
  • pressure is applied to the ring across the adhesive, separation at the surface of the mask occurs and the ring is released from the mask without damage to the mask or the ring and without leaving significant amounts of adhesive on the surface of the mask. Pellicles removed in this manner can be rebonded at a later time to a glass mask using the same adhesive and without using additional adhesive.
  • Fig. 1 shows a mask 10 constructed from a glass substrate and having a pattern of opaque areas on its surface 12. On the same surface 12 over these opaque areas there is provided a pellicle 13 which is spaced from the surface 12 by a pellicle support ring 14 which is bonded to the surface 12.
  • This pellicle 13 consists of a thin transparent film stretched over and bonded to the pellicle support ring 14.
  • the pellicle 13 generally is as transparent as the glass substrate 10 and should have a thickness of approximately 6 microns so that it does not substantially effect the optical path of light being passed through the mask by an optical projection system (not shown).
  • Pellicle materials are usually polymer films such as polyethylene terephthalate, sold under the tradename MYLAR, nitrocellulouse or parylene. If desired anti-reflective coatings can be placed on the film to reduce any effects in the projection system.
  • the thickness of the pellicle support ring which separates or spaces the pellicle from the mask is varied in accordance with the size of the dirt particles that are expected in the environment in which the mask is to be used. Thus, for instance, when the expected size of the dirt particles is approximately 30 millimicrons the thickness of the pellicle support ring should be approximately 4 millimeters.
  • the pellicle support ring 14 is generally metallic, i.e., aluminum but could also be plastic. This pellicle support ring 14 is bonded to the glass mask 10 with an adhesive.
  • This adhesive can be any pressure sensitive or heat or solvent activated adhesive such as rigid acrylic, epoxy, cyanoacrylate or polyester material.
  • a foam ring 15 having such pressure sensitive adhesive layers 16 and 17 on each side is used to bond the support ring 14. to the glass mask 10.
  • the foam 15 is sandwiched in the adhesive between the glass surface 12 and the aluminum ring 14 and can be formed, for example, of neoprene, pvc, polyurethane or a polyester.
  • any foam capable of becoming rigid when cooled to the adhesive embrittlement temperature is suitable.
  • any adhesive that is capable of embrittlement by cooling is suitable for the present_invention.
  • Figs. 2 and 3 illustrate the apparatus used to accomplish the present invention and thus removed the pellicle support ring from the glass mask without leavipg either significant amounts of adhesive on the glass which would interfere with correction or cleaning of the glass and which prevents damage to the glass. Further the present invention accomplishes such a removal without adversely affecting the adhesive and permits the salvaged pellicle and pellicle support ring to be rebonded to the same cleaned mask or any other mask without providing additional adhesive material.
  • the apparatus of the invention includes a base plate 20 on which there is mounted three equally spaced wire holders 21, 22 and 23 having stainless steel wires 24, 25 and 26 stretched there between to form a generally triangular enclosed space.
  • the mask 10 whose supporting ring 14 is to be removed is located over the base with the pellicle support ring 14 positioned between these wires 24, 25 and 26. Tension is applied to the wires 24 and 25 by the adjustable holder 23.
  • the wire 26 is permanently fixed between the holders 22 and 21. To assure that the support ring 14 is tightly held between the wires it is provided with a V-shaped groove 18 on its outer side and the wires 24, 25 and 26 are located in this groove. Thus the ring is tightly held by the wires.
  • a multiplicity of mechanical fingers which extend from a number of fixed ring locators could be used. Such fingers would be spring loaded to apply a force across, i.e. normal to the bonded surfaces, to apply a separation force to the mask and ring once the bond is embrittled and sheared.
  • a number of springs '27, 28, 29 and 30 are positioned around the ring 14 so that a positive bias is applied across, i.e. normal to, the bond between the ring 14 and the glass mask 10.
  • An apertured gas head 31 completes the basic apparatus and is placed over the mask 10 opposite to the pellicle support ring 14 which is to be removed. If necessary an O ring 34 can be used to provide a seal between the glass mask 10 and the head 31.
  • the head 31 is further provided with a central input 35 which connects with a series of radial spokes 36 radiating outwith from the central input 35 and connecting to a channel 37 which is in the form of the ring and which is positioned over and the same size as the pellicle ring which is to be removed.
  • a coolant fluid such as, for example, liquid nitrogen or nitrogen gas cooled by liquid nitrogen, which will chill the glass plate 10 to at least the embrittlement temperature of the adhesive which for most acrylic adhesives is between - 70°C and -120°C is introduced through the input port 35 into the radiating spokes 36 and thus the ring cavity 37.
  • This coolant fluid as it enters the channel 37 contacts the glass mask immediately opposite to the bonded pellicle supporting ring and chills the glass mask and the adhesive bond between the mask and the pellicle ring to below the embrittlement temperature of the adhesive and causes contractions between the pellicle supporting ring 14 and the glass mask 10.
  • This shearing of the bond takes approximately two minutes when nitrogen gas cooled by liquid nitrogen is used and the pellicle ring is approximately 88.9 mm in diameter.

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
EP81100086A 1980-01-14 1981-01-08 Verfahren und Werkzeug zur Trennung zusammengeklebter Werkstücke Expired EP0032384B1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US06/111,749 US4255216A (en) 1980-01-14 1980-01-14 Pellicle ring removal method and tool
US111749 1987-10-21

Publications (3)

Publication Number Publication Date
EP0032384A2 true EP0032384A2 (de) 1981-07-22
EP0032384A3 EP0032384A3 (en) 1982-06-02
EP0032384B1 EP0032384B1 (de) 1985-11-13

Family

ID=22340249

Family Applications (1)

Application Number Title Priority Date Filing Date
EP81100086A Expired EP0032384B1 (de) 1980-01-14 1981-01-08 Verfahren und Werkzeug zur Trennung zusammengeklebter Werkstücke

Country Status (3)

Country Link
US (1) US4255216A (de)
EP (1) EP0032384B1 (de)
DE (1) DE3172859D1 (de)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP2560048A4 (de) * 2010-04-13 2017-08-23 Asahi Kasei E-materials Corporation Selbsthaltender film, selbsthaltende struktur, verfahren zur herstellung des selbsthaltenden films und membran

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Publication number Priority date Publication date Assignee Title
EP2560048A4 (de) * 2010-04-13 2017-08-23 Asahi Kasei E-materials Corporation Selbsthaltender film, selbsthaltende struktur, verfahren zur herstellung des selbsthaltenden films und membran

Also Published As

Publication number Publication date
EP0032384A3 (en) 1982-06-02
EP0032384B1 (de) 1985-11-13
US4255216A (en) 1981-03-10
DE3172859D1 (en) 1985-12-19

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