EP0028303B1 - Source de plasma et d'ions - Google Patents

Source de plasma et d'ions Download PDF

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Publication number
EP0028303B1
EP0028303B1 EP80105360A EP80105360A EP0028303B1 EP 0028303 B1 EP0028303 B1 EP 0028303B1 EP 80105360 A EP80105360 A EP 80105360A EP 80105360 A EP80105360 A EP 80105360A EP 0028303 B1 EP0028303 B1 EP 0028303B1
Authority
EP
European Patent Office
Prior art keywords
plasma
ion source
magnetic field
microwaves
gas
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
EP80105360A
Other languages
German (de)
English (en)
Other versions
EP0028303A2 (fr
EP0028303A3 (en
Inventor
Volker Dr. Dipl.-Phys. Bechthold
Ludwig Dr. Dipl.-Phys. Friedrich
Josef Phys.- Ing. Möllenbeck
Peter Ziegler
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Forschungszentrum Karlsruhe GmbH
Original Assignee
Kernforschungszentrum Karlsruhe GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kernforschungszentrum Karlsruhe GmbH filed Critical Kernforschungszentrum Karlsruhe GmbH
Publication of EP0028303A2 publication Critical patent/EP0028303A2/fr
Publication of EP0028303A3 publication Critical patent/EP0028303A3/de
Application granted granted Critical
Publication of EP0028303B1 publication Critical patent/EP0028303B1/fr
Expired legal-status Critical Current

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Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J27/00—Ion beam tubes
    • H01J27/02—Ion sources; Ion guns
    • H01J27/16—Ion sources; Ion guns using high-frequency excitation, e.g. microwave excitation
    • H01J27/18—Ion sources; Ion guns using high-frequency excitation, e.g. microwave excitation with an applied axial magnetic field

Definitions

  • the invention relates to a plasma and ion source in which a plasma is generated in a limited volume by means of electron cyclotron resonance by means of a magnetic field, the radiation of microwaves and the supply of the gas to be ionized.
  • Electron cyclotron resonance is particularly suitable for generating a plasma simply and reliably by generating a magnetic field in a gas-filled volume and radiating resonant electrical high-frequency power.
  • the frequency f and the magnetic field B result from the following relationship:
  • a high frequency is also required, for example 10-20 GHZ microwaves for electron densities of 10 12 / CM 3 .
  • the required magnetic fields are in the range of 4-8 KG.
  • the plasma is transported from generation to use by diffusion along the weakly falling magnetic field from the resonance zone, which is supplied directly by a coil arrangement.
  • the object on which the invention is based is now to provide a plasma and ion source in which high ion densities are achieved in a well-defined range and, in addition to limiting the discharge, the electrical power required is limited to the low consumption of the microwave generator.
  • the entire arrangement can be considerably simplified since a suitably dimensioned annular permanent magnet can be used.
  • This has an axially cylindrical bore, on the axis of which the resonance field strength is reached and whose diameter is chosen large enough so that the microwaves can penetrate to the resonance point.
  • the figure shows in section the plasma and ion source and recorded above the course of the magnetic field H over the axis (in mm) of the bore 2.
  • This bore 2 is located in the center of the ring-shaped permanent magnet 1 made of SmC0 5 material.
  • This magnet 1 with a diameter of 70 mm and a thickness of 20 mm is able to generate a magnetic field (maximum) of 5.18 kG in the central region 5 of the axial bore 2.
  • the microwaves 3 and the gas 4 (medium to be ionized) are introduced via the insert on the magnet 1 or into the resonance region 5.
  • the insert 8 has an inner bore 9 which is connected to the feed line 4 for the gas and extends into the region 5.
  • the axial bore 2 is lined with a sleeve 10 made of non-magnetic material, which is connected both to the flange 7 for the microwave 3 and a connecting flange 11 to a vacuum or acceleration system, not shown.

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Combustion & Propulsion (AREA)
  • Plasma Technology (AREA)
  • Electron Sources, Ion Sources (AREA)

Claims (3)

1. Source de plasma et d'ions, où l'on produit un plasma dans un volume limité, par résonance de cyclotron électronique, au moyen d'un champ magnétique, de l'irradiation par microondes et de l'introduction des gaz à ioniser, source caractérisée en ce que l'on utilise un aimant permanent (1) avec une perforation axiale (2), dans laquelle on peut introduire les microondes (3) aussi bien que le gaz (4).
2. Source de plasma et d'ions selon la revendication 1, caractérisée en ce que l'aimant permanent (1) produit dans une zone de la perforation axiale (2) un maximum de champ magnétique et que les microondes (3) et le gaz (4) peuvent être introduits dans cette zone.
3. Source de plasma et d'ions selon l'une des revendications 1 et 2, caractérisée en ce que l'aimant permanent (1) est constitué de SmC05.
EP80105360A 1979-11-03 1980-09-08 Source de plasma et d'ions Expired EP0028303B1 (fr)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE2944467 1979-11-03
DE19792944467 DE2944467A1 (de) 1979-11-03 1979-11-03 Plasma- und ionenquelle

Publications (3)

Publication Number Publication Date
EP0028303A2 EP0028303A2 (fr) 1981-05-13
EP0028303A3 EP0028303A3 (en) 1981-08-05
EP0028303B1 true EP0028303B1 (fr) 1983-12-07

Family

ID=6085093

Family Applications (1)

Application Number Title Priority Date Filing Date
EP80105360A Expired EP0028303B1 (fr) 1979-11-03 1980-09-08 Source de plasma et d'ions

Country Status (2)

Country Link
EP (1) EP0028303B1 (fr)
DE (2) DE2944467A1 (fr)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2583250B1 (fr) * 1985-06-07 1989-06-30 France Etat Procede et dispositif d'excitation d'un plasma par micro-ondes a la resonance cyclotronique electronique
DE3803355A1 (de) * 1988-02-05 1989-08-17 Leybold Ag Teilchenquelle fuer eine reaktive ionenstrahlaetz- oder plasmadepositionsanlage
US5208512A (en) * 1990-10-16 1993-05-04 International Business Machines Corporation Scanned electron cyclotron resonance plasma source

Also Published As

Publication number Publication date
EP0028303A2 (fr) 1981-05-13
DE3065834D1 (en) 1984-01-12
EP0028303A3 (en) 1981-08-05
DE2944467A1 (de) 1981-05-14

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