DE3065834D1 - Plasma and ion source - Google Patents

Plasma and ion source

Info

Publication number
DE3065834D1
DE3065834D1 DE8080105360T DE3065834T DE3065834D1 DE 3065834 D1 DE3065834 D1 DE 3065834D1 DE 8080105360 T DE8080105360 T DE 8080105360T DE 3065834 T DE3065834 T DE 3065834T DE 3065834 D1 DE3065834 D1 DE 3065834D1
Authority
DE
Germany
Prior art keywords
plasma
ion source
ion
source
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
DE8080105360T
Other languages
German (de)
Inventor
Volker Dr Dipl Phys Bechthold
Ludwig Dr Dipl Phys Friedrich
Josef Mollenbeck
Peter Ziegler
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Forschungszentrum Karlsruhe GmbH
Original Assignee
Kernforschungszentrum Karlsruhe GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kernforschungszentrum Karlsruhe GmbH filed Critical Kernforschungszentrum Karlsruhe GmbH
Priority to DE8080105360T priority Critical patent/DE3065834D1/en
Application granted granted Critical
Publication of DE3065834D1 publication Critical patent/DE3065834D1/en
Expired legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J27/00—Ion beam tubes
    • H01J27/02—Ion sources; Ion guns
    • H01J27/16—Ion sources; Ion guns using high-frequency excitation, e.g. microwave excitation
    • H01J27/18—Ion sources; Ion guns using high-frequency excitation, e.g. microwave excitation with an applied axial magnetic field

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Combustion & Propulsion (AREA)
  • Plasma Technology (AREA)
  • Electron Sources, Ion Sources (AREA)
DE8080105360T 1979-11-03 1980-09-08 Plasma and ion source Expired DE3065834D1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
DE8080105360T DE3065834D1 (en) 1979-11-03 1980-09-08 Plasma and ion source

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE19792944467 DE2944467A1 (en) 1979-11-03 1979-11-03 PLASMA AND ION SOURCE
DE8080105360T DE3065834D1 (en) 1979-11-03 1980-09-08 Plasma and ion source

Publications (1)

Publication Number Publication Date
DE3065834D1 true DE3065834D1 (en) 1984-01-12

Family

ID=6085093

Family Applications (2)

Application Number Title Priority Date Filing Date
DE19792944467 Withdrawn DE2944467A1 (en) 1979-11-03 1979-11-03 PLASMA AND ION SOURCE
DE8080105360T Expired DE3065834D1 (en) 1979-11-03 1980-09-08 Plasma and ion source

Family Applications Before (1)

Application Number Title Priority Date Filing Date
DE19792944467 Withdrawn DE2944467A1 (en) 1979-11-03 1979-11-03 PLASMA AND ION SOURCE

Country Status (2)

Country Link
EP (1) EP0028303B1 (en)
DE (2) DE2944467A1 (en)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2583250B1 (en) * 1985-06-07 1989-06-30 France Etat METHOD AND DEVICE FOR EXCITTING A MICROWAVE PLASMA WITH ELECTRONIC CYCLOTRONIC RESONANCE
DE3803355A1 (en) * 1988-02-05 1989-08-17 Leybold Ag PARTICLE SOURCE FOR A REACTIVE ION BEAM OR PLASMA POSITIONING PLANT
US5208512A (en) * 1990-10-16 1993-05-04 International Business Machines Corporation Scanned electron cyclotron resonance plasma source

Also Published As

Publication number Publication date
EP0028303B1 (en) 1983-12-07
EP0028303A3 (en) 1981-08-05
EP0028303A2 (en) 1981-05-13
DE2944467A1 (en) 1981-05-14

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Legal Events

Date Code Title Description
8339 Ceased/non-payment of the annual fee