EP0028303A3 - Plasma and ion source - Google Patents

Plasma and ion source Download PDF

Info

Publication number
EP0028303A3
EP0028303A3 EP80105360A EP80105360A EP0028303A3 EP 0028303 A3 EP0028303 A3 EP 0028303A3 EP 80105360 A EP80105360 A EP 80105360A EP 80105360 A EP80105360 A EP 80105360A EP 0028303 A3 EP0028303 A3 EP 0028303A3
Authority
EP
European Patent Office
Prior art keywords
plasma
ion source
ion
source
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
EP80105360A
Other languages
German (de)
Other versions
EP0028303B1 (en
EP0028303A2 (en
Inventor
Volker Dr. Dipl.-Phys. Bechthold
Ludwig Dr. Dipl.-Phys. Friedrich
Josef Phys.- Ing. Mollenbeck
Peter Ziegler
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Forschungszentrum Karlsruhe GmbH
Original Assignee
Kernforschungszentrum Karlsruhe GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kernforschungszentrum Karlsruhe GmbH filed Critical Kernforschungszentrum Karlsruhe GmbH
Publication of EP0028303A2 publication Critical patent/EP0028303A2/en
Publication of EP0028303A3 publication Critical patent/EP0028303A3/en
Application granted granted Critical
Publication of EP0028303B1 publication Critical patent/EP0028303B1/en
Expired legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J27/00—Ion beam tubes
    • H01J27/02—Ion sources; Ion guns
    • H01J27/16—Ion sources; Ion guns using high-frequency excitation, e.g. microwave excitation
    • H01J27/18—Ion sources; Ion guns using high-frequency excitation, e.g. microwave excitation with an applied axial magnetic field

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Combustion & Propulsion (AREA)
  • Plasma Technology (AREA)
  • Electron Sources, Ion Sources (AREA)
EP80105360A 1979-11-03 1980-09-08 Plasma and ion source Expired EP0028303B1 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE19792944467 DE2944467A1 (en) 1979-11-03 1979-11-03 PLASMA AND ION SOURCE
DE2944467 1979-11-03

Publications (3)

Publication Number Publication Date
EP0028303A2 EP0028303A2 (en) 1981-05-13
EP0028303A3 true EP0028303A3 (en) 1981-08-05
EP0028303B1 EP0028303B1 (en) 1983-12-07

Family

ID=6085093

Family Applications (1)

Application Number Title Priority Date Filing Date
EP80105360A Expired EP0028303B1 (en) 1979-11-03 1980-09-08 Plasma and ion source

Country Status (2)

Country Link
EP (1) EP0028303B1 (en)
DE (2) DE2944467A1 (en)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2583250B1 (en) * 1985-06-07 1989-06-30 France Etat METHOD AND DEVICE FOR EXCITTING A MICROWAVE PLASMA WITH ELECTRONIC CYCLOTRONIC RESONANCE
DE3803355A1 (en) * 1988-02-05 1989-08-17 Leybold Ag PARTICLE SOURCE FOR A REACTIVE ION BEAM OR PLASMA POSITIONING PLANT
US5208512A (en) * 1990-10-16 1993-05-04 International Business Machines Corporation Scanned electron cyclotron resonance plasma source

Non-Patent Citations (3)

* Cited by examiner, † Cited by third party
Title
IEEE TRANSACTIONS ON NUCLEAR SCIENCE, Band NS-26, Nr. 2, April 1979, Seiten 2120-2127 New York, U.S.A. R. GELLER: "Electron cyclotron resonance (E.C.R.) multiply charged ion sources" * Figuren 5, 15 * *
IEEE TRANSACTIONS ON NUCLEAR SCIENCE, Band NS-26, Nr. 3, Juni 1979, Seiten 3680-3682 New York, U.S.A. V. BECHTOLD et al.: "An ECR-type light ion source for the Karlsruhe isochronous cyclotron" * Figuren 1,2; Seite 3681, linke Spalte, Absatz 1 * *
JAPANESE JOURNAL OF APPLIED PHYSICS, Band 11, 1972, Seiten 1226-1227 Tokyo, JP. H. TAMAGAWA et al.: "A proposal on multiply charged ion source" * Figur 1, Seite 1226, rechte Spalte, Absatz 3 * *

Also Published As

Publication number Publication date
EP0028303B1 (en) 1983-12-07
DE2944467A1 (en) 1981-05-14
DE3065834D1 (en) 1984-01-12
EP0028303A2 (en) 1981-05-13

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