EP0017076B1 - Agencement de contact pour interrupteur à vide et méthode pour sa fabrication - Google Patents

Agencement de contact pour interrupteur à vide et méthode pour sa fabrication Download PDF

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Publication number
EP0017076B1
EP0017076B1 EP80101421A EP80101421A EP0017076B1 EP 0017076 B1 EP0017076 B1 EP 0017076B1 EP 80101421 A EP80101421 A EP 80101421A EP 80101421 A EP80101421 A EP 80101421A EP 0017076 B1 EP0017076 B1 EP 0017076B1
Authority
EP
European Patent Office
Prior art keywords
contact
arrangement according
insert
ring
contact arrangement
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
EP80101421A
Other languages
German (de)
English (en)
Other versions
EP0017076A1 (fr
Inventor
Rudolf Dipl.-Ing. Gebel
Gerhard Dr. Peche
Heinrich Dr. Schindler
Jürgen-Dietrich Dr. Welly
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Siemens AG
Original Assignee
Siemens AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from DE19792912823 external-priority patent/DE2912823A1/de
Priority claimed from DE19792947562 external-priority patent/DE2947562A1/de
Application filed by Siemens AG filed Critical Siemens AG
Priority to AT80101421T priority Critical patent/ATE3346T1/de
Publication of EP0017076A1 publication Critical patent/EP0017076A1/fr
Application granted granted Critical
Publication of EP0017076B1 publication Critical patent/EP0017076B1/fr
Expired legal-status Critical Current

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Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01H—ELECTRIC SWITCHES; RELAYS; SELECTORS; EMERGENCY PROTECTIVE DEVICES
    • H01H33/00—High-tension or heavy-current switches with arc-extinguishing or arc-preventing means
    • H01H33/60—Switches wherein the means for extinguishing or preventing the arc do not include separate means for obtaining or increasing flow of arc-extinguishing fluid
    • H01H33/66—Vacuum switches
    • H01H33/664—Contacts; Arc-extinguishing means, e.g. arcing rings
    • H01H33/6642—Contacts; Arc-extinguishing means, e.g. arcing rings having cup-shaped contacts, the cylindrical wall of which being provided with inclined slits to form a coil

Definitions

  • the invention relates to a contact arrangement for vacuum switches with coaxially arranged pot contacts, the slotted contact carrier is provided with a closed contact ring, the end face of which forms the contact contact surface.
  • the pot contacts arranged coaxially opposite one another each form a rotating hollow body, the bottom of which is connected to a power supply and the edge of which forms the annular contact contact surface.
  • the contact carriers of the two contacts are provided with opposing oblique slots that divide the contact carrier into individual segments. These segments form a current loop with the arc that arises after the contacts open, the Lorentz force of which causes the arc to rotate between the contacts.
  • the inclination of the slots with respect to the axis of the pot contact is chosen so large that the slots overlap in the azimuthal direction in the contact carrier.
  • the bottom of the pot contact can also be provided with slots (DE-B-1 196751).
  • a known embodiment of a contact arrangement for vacuum switches contains pot contacts which are provided with a disk-shaped contact pad.
  • the two contacts are arranged concentrically to one another such that an inner contact is surrounded by the contact walls of the outer contact and their edges point axially in the same direction.
  • the contact pad is arranged inside the pot, while in the case of the internal contact, the power supply is arranged in the pot and the bottom of the contact is provided with the contact pad.
  • the contact pads are thus opposite each other in a central part of the two contacts. An arc that arises after the contacts have been lifted is to be driven away from the contact support surfaces to the walls of the pot contacts, which serve as areas of erosion of the contacts.
  • a flat intermediate layer made of a material with increased electrical resistance is embedded between the contact pad and the power supply, which is arranged as close as possible to the power supply in the bottom of the pot contacts (DE-A1-25 46 376).
  • the invention is based on the object, in a contact arrangement with pot contacts, the edges of which each form the contact support surfaces, to force such a current distribution in each of the contacts between the power supply and the annular contact support surface such that the base points of an arc which arises between the contacts and rotates between the contact surfaces are stabilized.
  • both a radially inward and outward force component on the arc should be avoided.
  • the free surface of the contact ring is provided radially inwards and outwards with a bevel and that the contact ring and / or the part of the contact carrier adjacent to the contact ring has a central zone with respect to the material of the contact carrier reduced electrical conductivity included.
  • This zone with low electrical conductivity causes the current supply to branch from the contact carrier to the contact contact surface of the contact ring, the current components of which run essentially radially within the contact ring.
  • the magnetic fields of these radial current components each exert a Lorentz force on the arc, which is directed radially to the center of the strip-shaped contact support surface, and the arc discharge on the contact ring is stabilized.
  • the arc can therefore neither migrate into the recess of the pot contact nor to the outer edge.
  • the beveling of the contact ring prevents the arc from being ignited at a point on the contact contact surface where the stabilizing effect cannot yet occur.
  • an increased contact pressure is obtained due to the reduced contact contact surface compared to the width of the contact carrier.
  • the electrical resistance of the zone can preferably be at least twice, in particular at least three times, greater than the electrical resistance of the contact carrier.
  • a particularly simple and effective embodiment of the contact arrangement is obtained in that the zone is designed as a recess which is evacuated with the surroundings of the contact arrangement, for example within the arcing chamber of a vacuum switch.
  • the zone with increased electrical resistance is also obtained by introducing, for example diffusing in or alloying in, additional material which increases the resistance. Tin, bismuth or phosphorus and arsenic are suitable for this.
  • the surface of the contact ring facing the contact carrier can be provided, for example, with a support made of the resistance material, which is then melted or sintered into the contact ring. Subsequently the support can be removed from the surface of the contact ring.
  • the correspondingly designed resistance material can also be inserted into the recess.
  • This insert can consist of a ferromagnetic material, for example iron, which reinforces the stabilizing forces acting on the arc.
  • the insert can also consist of an insulator, for example a ceramic body.
  • metals with low electrical conductivity for example chromium or also chromium-copper and cobalt, can be used as an insert.
  • Graphite is also suitable as an insert.
  • the insert can preferably be designed in such a way that a gap is formed in the current path at least approximately transversely to the current direction between the insert and the contact carrier or also between the insert and the contact ring.
  • the size of this gap is preferably chosen to be at least as large as the axial component of the width of the slots of the contact carrier.
  • the gap width will generally not be significantly less than 0.2 mm.
  • a special embodiment of the contact arrangement consists in that the surface of the contact carrier adjoining the contact ring is provided with a recess and that the insert consists of the material of the contact ring.
  • the contact ring can be produced as a profile body with an annular extension which extends into the recess of the contact carrier. The height of this extension can be dimensioned somewhat less than the depth of the recess. The mentioned gap is then formed between the end face of the extension and the bottom of the recess.
  • the contact ring consists of a material with high temperature resistance and high erosion resistance as well as high mechanical strength. Such properties have, for example, sintered materials that contain chromium and copper as essential components.
  • a material for the contact carrier is preferably selected which consists at least essentially of the impregnating metal of the contact ring, for example copper.
  • the contact ring with at least the adjacent part of the contact carrier can then be produced by so-called back casting, in which the contact ring and then the carrier body are cast in a common operation.
  • the insert can be inserted as a molded body and can be enclosed by the casting material during casting or can also be removed again if the design is appropriate.
  • both the contact ring and the adjacent part of the contact carrier can be provided with a common recess. This common component is then attached to the contact base, for example soldered.
  • the electrical conductivity of the contact ring is significantly lower, preferably by at least a factor of 3, than the conductivity of the contact carrier.
  • This increase in resistance of the contact ring compared to the contact carrier is obtained by using the chrome-copper matrix.
  • Such an increase in resistance also results from an increased content of suitable additives in the contact ring, for example iron up to about 15% or cobalt up to about 20%, or even only in an addition of iron and cobalt.
  • pot contacts are arranged coaxially opposite one another.
  • FIGS. 1 to 6 different designs are schematically illustrated as a section on both sides of the common axis of rotation. A hatching of the cut surface is partially not shown in FIG. 1 in order not to disturb the clarity.
  • the contact carrier 4 contains oblique slots 10, the angle of inclination a of which is preferably chosen relative to the axis of rotation 18 such that the end faces of the segments which are formed between two slots do not overlap in the azimuthal direction. This is ensured if, starting from the end of one of the slots on the contact ring 12, one encounters an adjacent slot vertically upward.
  • the end faces of the contact carrier 4 are provided with a contact ring 12 made of so-called contact material, which is known to have a high erosion resistance and high temperature resistance as well as a high mechanical strength and, for example, a chromium and copper ent holding sintered material can be.
  • the height h of the contact ring 12 can be 4 mm, for example.
  • the surface of the contact ring 12 facing the contact carrier 4 is provided with an annular recess 14, which represents an increased electrical resistance for the current I, so that it is already divided into two partial currents 1 1 and 1 2 in the contact carrier 4, which are in the contact ring 12 in the vicinity of its end face, which forms the contact bearing surface 13, are directed essentially radially to the axis of rotation.
  • the contact ring 12 is provided in the radial direction on both sides of the contact bearing surface 13 with a bevel, not specified in each case.
  • the beveling of the outer edge is designed so that the radial distance a of the outer edge of the contact support surface 13 from the outer wall of the contact carrier 4 is more than half the distance b of the outer edge of the recess 14 from the outer wall of the contact carrier 4.
  • the bevel on the inside of the contact ring 12 is designed in a corresponding manner.
  • the bevel is preferably chosen so that the radial width c of the contact bearing surface 13 is at most as large and in particular smaller than the radial width d of the recess 14. This results in an increased stabilizing effect the arc through larger radial current components.
  • the edge of the contact surface also has a stabilizing effect.
  • the recess 14 is provided with an annular insert 16 made of a material with increased electrical resistance compared to the material of the contact carrier 4.
  • it can consist of electrically insulating material, preferably ceramic.
  • the zone with increased electrical resistance can also be produced without a recess by incorporating, for example alloying, a material with increased electrical resistance into the material of the contact ring 12 in this zone or is diffused.
  • the material of the contact ring 12 in the zone with increased electrical resistance or the material of the insert in this zone is preferably selected so that the electrical resistance in this zone is at least 2 times higher than the resistance of the contact carrier 4th
  • the end face of the contact carrier 4 facing the contact ring 12 is provided with the recess 14, which contains an annular insert 16.
  • the insert 16 is fastened to the contact ring 12 and can advantageously form an integrated component with the latter and thus also consist of the same material.
  • the height of the extension of the insert 16 can preferably be selected somewhat less than the depth of the recess 14, so that a gap 8 is formed between the end face of the extension of the insert 16 and the bottom of the recess 14, which allows a slight compression of the contact carrier 4.
  • the contact arrangement shown in the exemplary embodiment is suitable, for example, for a voltage of 12 kV and an operating current of approximately 1,000 A and a nominal short-circuit breaking current of approximately 40,000 A.
  • This elastic deformation initially reduces the gap 8 between the insert 16 and the base 6 according to FIG. 3 and fills it with increasing deformation of the contact carrier 4, so that it then significantly reduces the further deformation of the contact by the contact pressure force F.
  • the gap 8 is limited to an amount which is chosen so that the slots 10 are not completely closed with increasing deformation of the contact carrier 4.
  • the recess 14 can also be provided with an insert which is fastened to the bottom of the recess 14, so that a corresponding gap then arises between this insert and the contact ring 12.
  • a recess 14 can be provided which extends both into the contact carrier 4 and into the contact ring 12 and which can either be evacuated with the contact arrangement or can also contain an insert which is not shown in the figure. This insert can also be dimensioned such that a gap is formed either in the contact ring or in the part of the recess in the contact carrier 4, as is shown in FIG. 3.
  • a particularly simple method for making the contact consists in that the contact carrier 4 is formed simultaneously with the soaking of the matrix metal of the contact ring 12 by so-called back casting.
  • the recess 14 is filled, for example in accordance with FIG. 4, with a shaped body which can be shaped in such a way that it can be removed again after casting the carrier body 4.
  • the metal matrix of the contact ring 12, for example chrome-copper, and the impregnation metal of the contact carrier, for example copper, optionally with predetermined additives, are then firmly fused together.
  • the contact carrier 4 is attached to the bottom 6 of the contact with its end face consisting of two concentric ring surfaces, at for example soldered with a hard solder.
  • the base 6 can be provided with a corresponding annular extension, not shown in the figure, whose radial width is equal to the radial width of the recess 14.
  • the slots 10 can also extend through at least part of the bottom 6.
  • the surface of the contact carrier 4 facing the contact ring 12 is provided with a recess 14 which divides the current to be switched into current paths, the components of which in the contact ring 12 run essentially radially.
  • the recess 14 is provided with an insert 16.
  • This insert 16 is formed by an annular, flange-like extension of the contact ring 12. It protrudes into the recess 14 in such a way that its free end face is still a short distance from the bottom 6 of the pot contact 2.
  • the recess 14 has approximately the same depth as the contact carrier 4. The depth of the recess 14 and thus the height of the insert 16 can, however, also be chosen to be substantially less than the height of the contact carrier 4.
  • the intermediate layer 20 can consist, for example, of an electrically insulating surface layer, preferably of a metal oxide. In connection with a contact ring 12, which contains chromium and copper as essential components, this surface layer can consist of chromium oxide, for example.
  • the side surfaces of the insert 16 may also be expedient to also provide the side surfaces of the insert 16 with an electrically insulating surface layer, so that a current transfer to the insert 16 can also be prevented there.
  • the insert 16 consists of an inserted ring made of electrically poorly conductive material, for example iron.
  • the entire surface of the annular insert 16 can be provided with the electrically insulating support 22. Under certain circumstances, it may be sufficient to provide only the surface of the insert 16 which is in contact with the contact ring 12 with an electrically insulating pad or a special intermediate layer which prevents current transfer from the insert 16 to the contact ring 12.

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  • Contacts (AREA)

Claims (23)

1. Agencement de contact pour interrupteur sous vide à contacts en pots (2) disposés coaxia- lement entre eux, dont le support de contact fendu (4) est pourvu d'un anneau de contact fermé (12) dont la surface frontale forme la portée de contact (13), caractérisé par le fait que la surface libre de l'anneau de contact (12) est pourvue radialement vers l'intérieur et vers l'extérieur respectivement d'un biseau et que l'anneau de contact (12) et/ou la partie du support de contact (4), qui jouxte l'anneau de contact, comportent une zone médiane (14) ayant, par rapport au matériau du support de contact (4), une conductibilité électrique notablement diminuée.
2. Agencement de contact selon la revendication 1, caractérisé par le fait que la largeur (d) de la zone (14) est, en direction radiale, plus grande que la largeur (c) de la portée de contact (13).
3. Agencement de contact selon la revendication 1 ou 2, caractérisé par le fait que la zone est constituée par un évidement (14).
4. Agencement de contact selon l'une des revendications 1 à 3, caractérisé par le fait que l'évidement (14) est pourvu d'un insert (16).
5. Agencement de contact selon la revendication 4, caractérisé par le fait que l'insert (16) est constitué avec un matériau ferromagnétique.
6. Agencement de contact selon la revendication 4, caractérisé par le fait que l'insert (16) est constitué par un isolant.
7. Agencement de contact selon la revendication 4, caractérisé par le fait que l'insert (16) est constitué par un métal ayant une résistance électrique élevée.
8. Agencement de contact selon la revendication 7, caractérisé par le fait que l'insert (16) est constitué par du chrome ou par du chrome-cuivre.
9. Agencement de contact selon l'a revendication 1, caractérisé par le fait que la zone est constituée avec le matériau de l'anneau de contact (12) avec au moins un matériau d'addition qui augmente la résistance électrique.
10. Agencement de contact selon la revendication 9, caractérisé par le fait que le matériau d'addition est l'étain ou le bismuth ou le phosphore ou l'arsenic ou plusieurs de ces matériaux.
11. Agencement de contact selon l'une des revendications 3 à 8, caractérisé par le fait que le support de contact (4) est pourvu de l'évidement (14), et que l'insert (16) est fixé à l'anneau de contact (12).
12. Agencement de contact selon la revendication 11, caractérisé par le fait que l'insert (16) est constitué avec le matériau de l'anneau de contact (12).
13. Agencement de contact selon la revendication 12, caractérisé par le fait que l'insert (16) forme avec l'anneau de contact (12) une pièce partielle commune.
14. Agencement de contact selon la revendication 12 ou 13, caractérisé par le fait que l'insert (16) forme avec le support de contact (4) ou avec son fond (6) une fente (8).
15. Agencement de contact selon la revendication 14, caractérisé par le fait que la largeur de la fente (8) est plus petite que la composante axiale de la largeur des fentes (10) du support de contact (4).
16. Agencement de contact selon la revendication 14 ou 15, caractérisé par le fait que la largeur de la fente (8) est au moins égale à 0,2 mm.
17. Agencement de contact selon l'une des revendications 1 à 12, caractérisé par le fait que la bague de contact (12) est constituée par une matrice chrome-cuivre et le support de contact (4) par du cuivre.
18. Agencement de contact selon l'une des revendications 1 à 17, caractérisé par le fait que la conductibilité électrique de l'anneau de contact (12) est notablement inférieure à la conductibilité du support de contact (4).
19. Agencement de contact selon la revendication 18, caractérisé par le fait que l'anneau de contact (12) contient jusqu'à 15 % de fer ou jusqu'à 20 % de cobalt ou du fer et du cobalt.
20. Agencement de contact selon la revendication 1 ou selon l'une des revendications 7 à 16, caractérisé par le fait qu'entre le fond (6) ou le support de contact (4) du contact (2) en forme de pot et de l'insert (16) et/ou l'anneau de contact (12) et l'insert (16), est prévu une couche intermédiaire électriquement isolante (20).
21. Agencement de contact selon la revendication 1, caractérisé par le fait que la couche intermédiaire (20) est une couche superficielle de t'insert (16).
22. Agencement de contact selon la revendication 1, caractérisé par le fait que l'insert (16) est un anneau métallique avec une surface au moins partiellement oxydée.
23. Procédé pour réaliser un agencement de contact selon l'une des revendications 17 à 19, caractérisé par le fait que l'anneau de contact (12) et le support de contact (4) avec l'évidement (14) sont formés par doublage, et qu'ensuite le support de contact (4) est pourvu avec les fentes (10) et est ensuite fixé au fond (6).
EP80101421A 1979-03-30 1980-03-18 Agencement de contact pour interrupteur à vide et méthode pour sa fabrication Expired EP0017076B1 (fr)

Priority Applications (1)

Application Number Priority Date Filing Date Title
AT80101421T ATE3346T1 (de) 1979-03-30 1980-03-18 Kontaktanordnung fuer vakuumschalter und verfahren zu ihrer herstellung.

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
DE2912823 1979-03-20
DE19792912823 DE2912823A1 (de) 1979-03-30 1979-03-30 Kontaktanordnung fuer vakuumschalter
DE19792947562 DE2947562A1 (de) 1979-11-26 1979-11-26 Kontaktanordnung fuer vakuumschalter
DE2947562 1979-11-26

Publications (2)

Publication Number Publication Date
EP0017076A1 EP0017076A1 (fr) 1980-10-15
EP0017076B1 true EP0017076B1 (fr) 1983-05-11

Family

ID=25778502

Family Applications (1)

Application Number Title Priority Date Filing Date
EP80101421A Expired EP0017076B1 (fr) 1979-03-30 1980-03-18 Agencement de contact pour interrupteur à vide et méthode pour sa fabrication

Country Status (6)

Country Link
US (1) US4334133A (fr)
EP (1) EP0017076B1 (fr)
AU (1) AU529019B2 (fr)
CA (1) CA1130351A (fr)
DE (1) DE3063033D1 (fr)
EG (1) EG13822A (fr)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3112009A1 (de) * 1981-03-26 1982-10-07 Siemens AG, 1000 Berlin und 8000 München "kontaktanordnung fuer vakuumschalter"
US4401868A (en) * 1981-06-29 1983-08-30 Westinghouse Electric Corp. Vacuum interrupter with a spacially modulated axial magnetic field contact
DE3138086A1 (de) * 1981-09-24 1983-04-07 Siemens AG, 1000 Berlin und 8000 München "kontaktanordnung fuer vakuumschalter"
DE8318959U1 (de) * 1983-06-30 1986-02-27 Siemens AG, 1000 Berlin und 8000 München Topfförmiges Schaltkontaktstück für einen elektrischen Vakuumschalter
DE3632469A1 (de) * 1986-09-24 1988-03-31 Bosch Gmbh Robert Elektromagnetischer schalter, insbesondere fuer andrehvorrichtungen von brennkraftmaschinen
DE3703326A1 (de) * 1987-02-04 1988-08-18 Siemens Ag Vakuumschaltroehre
US5777287A (en) * 1996-12-19 1998-07-07 Eaton Corporation Axial magnetic field coil for vacuum interrupter
NL1019651C2 (nl) * 2001-12-21 2003-06-24 Holec Holland Nv Soldeerring voor vervaardigen van vacuümbuis, en werkwijze voor het vervaardigen van een dergelijke soldeerring en van een vacuümbuis.
FR2946790B1 (fr) * 2009-06-10 2011-07-01 Areva T & D Sa Contact pour ampoule a vide a moyenne tension a coupure d'arc amelioree, ampoule a vide et disjoncteur, tel qu'un disjoncteur sectionneur d'alternateur associes.
FR2946792A1 (fr) * 2009-06-10 2010-12-17 Areva T & D Sa Enroulement pour contact d'ampoule a vide a moyenne tension a endurance amelioree, ampoule a vide et disjoncteur, tel qu'un disjoncteur sectionneur d'alternateur associes.
FR2946791B1 (fr) * 2009-06-10 2011-09-23 Areva T & D Sa Contact pour ampoule a vide a moyenne tension a structure renforcee, ampoule a vide et disjoncteur, tel qu'un disjoncteur sectionneur d'alternateur associes.
JP6268031B2 (ja) * 2014-04-17 2018-01-24 株式会社東芝 真空バルブ

Family Cites Families (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US1132094A (en) * 1911-09-08 1915-03-16 Western Electric Co Contact member.
US2580910A (en) * 1949-02-08 1952-01-01 S & C Electric Co Contact construction
US3089936A (en) * 1960-02-23 1963-05-14 Gen Electric Contact structure for an electric circuit interrupter
US3182156A (en) * 1961-09-19 1965-05-04 Gen Electric Vacuum-type circuit interrupter
US3210505A (en) * 1962-04-03 1965-10-05 Gen Electric Electrode structure for an electric circuit interrupter
FR1353285A (fr) * 1962-04-03 1964-02-21 Thomson Houston Comp Francaise Structure de contact pour interrupteur de circuit électrique
US3185799A (en) * 1962-12-17 1965-05-25 Gen Electric Vacuum-type electric circuit interrupter in which a main arc is divided into series-related arcs
US3327081A (en) * 1964-11-25 1967-06-20 Allis Chalmers Mfg Co Contact with high resistance material insert
GB1163271A (en) * 1965-08-06 1969-09-04 English Electric Co Ltd Circuit Interrupters
DE1558647B2 (de) * 1967-08-05 1972-03-09 Siemens Ag Heterogenes durchdringungsverbundmetall als kontaktwerkstoff fuer vakuumschalter
US3546407A (en) * 1967-08-15 1970-12-08 Gen Electric Vacuum-type circuit interrupter
GB1316102A (en) * 1969-08-08 1973-05-09 Ass Elect Ind Vacuum switches
US3622724A (en) * 1970-02-24 1971-11-23 Gen Electric Vacuum-type circuit interrupter having contacts with improved arc-revolving means
DE2328182C2 (de) * 1973-06-02 1982-07-08 L. Schuler GmbH, 7320 Göppingen Antrieb für eine mechanische Presse
DD117140A1 (fr) * 1974-12-20 1975-12-20
SU705909A1 (ru) * 1976-08-02 1992-10-07 Предприятие П/Я Р-6517 Система электродов дл вакуумного коммутационного прибора

Also Published As

Publication number Publication date
EP0017076A1 (fr) 1980-10-15
DE3063033D1 (en) 1983-06-16
US4334133A (en) 1982-06-08
EG13822A (en) 1982-06-30
AU529019B2 (en) 1983-05-19
CA1130351A (fr) 1982-08-24
AU5696680A (en) 1980-10-02

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PUAI Public reference made under article 153(3) epc to a published international application that has entered the european phase

Free format text: ORIGINAL CODE: 0009012

AK Designated contracting states

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17P Request for examination filed

Effective date: 19801027

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