EE04694B1 - Laetud osakesi emiteeriv s?lm, keevitusseade ja laetud osakeste kiire s?lm - Google Patents

Laetud osakesi emiteeriv s?lm, keevitusseade ja laetud osakeste kiire s?lm

Info

Publication number
EE04694B1
EE04694B1 EEP200000153A EEP200000153A EE04694B1 EE 04694 B1 EE04694 B1 EE 04694B1 EE P200000153 A EEP200000153 A EE P200000153A EE P200000153 A EEP200000153 A EE P200000153A EE 04694 B1 EE04694 B1 EE 04694B1
Authority
EE
Estonia
Prior art keywords
charged particle
fastener
particle beam
chamber
welding device
Prior art date
Application number
EEP200000153A
Other languages
English (en)
Estonian (et)
Inventor
Sanderson Allan
Original Assignee
The Welding Institute
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by The Welding Institute filed Critical The Welding Institute
Publication of EE200000153A publication Critical patent/EE200000153A/xx
Publication of EE04694B1 publication Critical patent/EE04694B1/xx

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/06—Electron sources; Electron guns
    • H01J37/075—Electron guns using thermionic emission from cathodes heated by particle bombardment or by irradiation, e.g. by laser
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/06—Electron sources; Electron guns
    • H01J37/063—Geometrical arrangement of electrodes for beam-forming
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/06—Electron sources; Electron guns
    • H01J37/065—Construction of guns or parts thereof
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/301—Arrangements enabling beams to pass between regions of different pressure
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/30—Electron or ion beam tubes for processing objects
    • H01J2237/31—Processing objects on a macro-scale
    • H01J2237/3104—Welding

Landscapes

  • Analytical Chemistry (AREA)
  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Electron Sources, Ion Sources (AREA)
  • Radiation-Therapy Devices (AREA)
  • Particle Accelerators (AREA)
  • Electrostatic Spraying Apparatus (AREA)
  • Secondary Cells (AREA)
  • Cold Cathode And The Manufacture (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
  • Lining Or Joining Of Plastics Or The Like (AREA)
  • Electrophonic Musical Instruments (AREA)
  • Cookers (AREA)
  • Electroluminescent Light Sources (AREA)
  • Luminescent Compositions (AREA)
  • Generation Of Surge Voltage And Current (AREA)
  • Polyurethanes Or Polyureas (AREA)
  • Polymerisation Methods In General (AREA)
EEP200000153A 1997-09-24 1998-09-24 Laetud osakesi emiteeriv s?lm, keevitusseade ja laetud osakeste kiire s?lm EE04694B1 (et)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
GBGB9720350.9A GB9720350D0 (en) 1997-09-24 1997-09-24 Improvements relating to charged particle beams
PCT/GB1998/002882 WO1999016101A2 (fr) 1997-09-24 1998-09-24 Ameliorations apportees a des faisceaux de particules chargees

Publications (2)

Publication Number Publication Date
EE200000153A EE200000153A (et) 2001-02-15
EE04694B1 true EE04694B1 (et) 2006-08-15

Family

ID=10819590

Family Applications (1)

Application Number Title Priority Date Filing Date
EEP200000153A EE04694B1 (et) 1997-09-24 1998-09-24 Laetud osakesi emiteeriv s?lm, keevitusseade ja laetud osakeste kiire s?lm

Country Status (21)

Country Link
US (1) US6404115B1 (fr)
EP (3) EP1018137B1 (fr)
JP (1) JP4200656B2 (fr)
KR (1) KR100586050B1 (fr)
CN (1) CN1205646C (fr)
AT (3) ATE430375T1 (fr)
AU (1) AU730293B2 (fr)
BR (1) BR9812505B1 (fr)
CA (1) CA2303148C (fr)
CZ (1) CZ294249B6 (fr)
DE (3) DE69839952D1 (fr)
EE (1) EE04694B1 (fr)
ES (1) ES2244081T3 (fr)
GB (1) GB9720350D0 (fr)
NO (1) NO326142B1 (fr)
NZ (1) NZ503060A (fr)
PT (1) PT1018137E (fr)
RU (1) RU2201006C2 (fr)
TR (1) TR200000750T2 (fr)
UA (1) UA69394C2 (fr)
WO (1) WO1999016101A2 (fr)

Families Citing this family (29)

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US6630774B2 (en) * 2001-03-21 2003-10-07 Advanced Electron Beams, Inc. Electron beam emitter
US7147900B2 (en) * 2003-08-14 2006-12-12 Asm Japan K.K. Method for forming silicon-containing insulation film having low dielectric constant treated with electron beam radiation
US8159118B2 (en) 2005-11-02 2012-04-17 United Technologies Corporation Electron gun
US8114528B2 (en) 2006-10-02 2012-02-14 Nippon Steel Corporation Electron beam welded joint excellent in brittle fracture resistance
EP2148354B1 (fr) * 2007-05-16 2014-09-24 Denki Kagaku Kogyo Kabushiki Kaisha Source d'électrons
JP4636082B2 (ja) * 2007-12-27 2011-02-23 日新イオン機器株式会社 カソード保持構造およびそれを備えるイオン源
KR101177254B1 (ko) 2009-12-04 2012-08-24 신닛뽄세이테쯔 카부시키카이샤 용접 구조체의 맞댐 용접 조인트 및 그 제조 방법
MY182963A (en) 2009-12-04 2021-02-05 Nippon Steel Corp Butt-weld joint and method for manufacturing same
JP5471380B2 (ja) * 2009-12-04 2014-04-16 新日鐵住金株式会社 洋上風力発電塔用大型溶接鋼管の高能率製造方法
KR101218961B1 (ko) 2009-12-04 2013-01-04 신닛테츠스미킨 카부시키카이샤 고에너지 밀도 빔을 사용한 맞댐 용접 조인트
JP2011246805A (ja) 2010-04-30 2011-12-08 Nippon Steel Corp 電子ビーム溶接継手及び電子ビーム溶接用鋼材とその製造方法
WO2012070353A1 (fr) 2010-11-22 2012-05-31 新日本製鐵株式会社 Joint soudé par faisceau d'électrons, acier pour soudage par faisceau d'électrons, et leur procédé de fabrication
JP2011246804A (ja) 2010-04-30 2011-12-08 Nippon Steel Corp 電子ビーム溶接継手及び電子ビーム溶接用鋼材とその製造方法
US20110294071A1 (en) * 2010-05-28 2011-12-01 Canon Kabushiki Kaisha Electron gun, lithography apparatus, method of manufacturing article, and electron beam apparatus
JP5015360B2 (ja) 2010-11-22 2012-08-29 新日本製鐵株式会社 電子ビーム溶接継手及び電子ビーム溶接用鋼材とその製造方法
EP2644730B1 (fr) 2010-11-22 2016-11-30 Nippon Steel & Sumitomo Metal Corporation Joint soudé par faisceau d'électrons, matériau en acier pour le soudage par faisceau d'électrons et leur procédé de fabrication
EP2644732B1 (fr) 2010-11-22 2019-02-20 Nippon Steel & Sumitomo Metal Corporation Joint soudé par faisceau d'électrons, acier pour soudage par faisceau d'électrons, et leur procédé de fabrication
KR20150127304A (ko) 2010-11-22 2015-11-16 신닛테츠스미킨 카부시키카이샤 전자 빔 용접 조인트 및 전자 빔 용접용 강재와 그의 제조 방법
RU2478974C2 (ru) * 2011-05-31 2013-04-10 Федеральное государственное унитарное предприятие "Всероссийский научно-исследовательский институт метрологии им. Д.И. Менделеева" (ФГУП "ВНИИМ им. Д.И. Менделеева") Способ воспроизведения единицы силы постоянного электрического тока и устройство для его осуществления
WO2013122633A1 (fr) * 2011-10-18 2013-08-22 Baldwin David A Dispositifs à arc et couples d'arc mobiles
EA019817B1 (ru) * 2011-12-29 2014-06-30 Федеральное Государственное Бюджетное Образовательное Учреждение Высшего Профессионального Образования "Национальный Исследовательский Томский Политехнический Университет" (Фгбоу Впо Ни Тпу) Ионный диод с магнитной самоизоляцией
RU2680150C1 (ru) * 2017-12-27 2019-02-18 федеральное государственное бюджетное образовательное учреждение высшего образования "Национальный исследовательский университет "МЭИ" (ФГБОУ ВО "НИУ "МЭИ") Катодный блок сварочной электронной пушки
EP3794626A1 (fr) 2018-03-23 2021-03-24 Freemelt Ab Ensemble cathode pour canon à électrons
RU183913U1 (ru) * 2018-05-07 2018-10-09 Федеральное государственное бюджетное образовательное учреждение высшего образования "Саратовский государственный технический университет имени Гагарина Ю.А." (СГТУ имени Гагарина Ю.А.) Триодная электронная пушка с автокатодом
GB2583359A (en) * 2019-04-25 2020-10-28 Aquasium Tech Limited Electron beam emitting assembly
CA3145964A1 (fr) * 2019-09-23 2021-04-01 Freemelt Ab Technologie de cathode de canon a electrons
EP4264656A1 (fr) 2021-02-17 2023-10-25 Accion Systems, Inc. Appareil d'émission par électronébulisation
GB202102555D0 (en) 2021-02-23 2021-04-07 Twi Ltd An electron gun cathode mount
US20240096583A1 (en) * 2022-09-15 2024-03-21 Elve Inc. Cathode heater assembly and method of manufacture

Family Cites Families (11)

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FR1599106A (fr) * 1968-11-29 1970-07-15
US4041316A (en) 1974-09-20 1977-08-09 Hitachi, Ltd. Field emission electron gun with an evaporation source
GB1549127A (en) * 1977-05-11 1979-08-01 Inst Elektroswarki Patona Electron beam welding guns
US4333214A (en) 1980-03-31 1982-06-08 Western Electric Company, Inc. Wire weldment deflashing tool
DE3031839C2 (de) 1980-08-23 1983-10-20 Dynamit Nobel Ag, 5210 Troisdorf Verfahren zum kontinuierlichen Herstellen einer gemusterten Bahn aus thermoplastischem Kunststoff
DE3227974A1 (de) * 1982-07-27 1984-02-09 Messer Griesheim Gmbh, 6000 Frankfurt Elektronenstrahlerzeuger, insbesondere zweielektroden-elektronenstrahlerzeuger
JPS6139976A (ja) 1984-07-31 1986-02-26 Nippon Gakki Seizo Kk 記録信号の再生装置におけるジツタ吸収回路
US4792688A (en) 1987-06-15 1988-12-20 The Perkin-Elmer Corporation Differentially pumped seal apparatus
JP2732961B2 (ja) 1991-07-18 1998-03-30 株式会社日立製作所 荷電粒子線装置
GB9224602D0 (en) * 1992-11-24 1993-01-13 Welding Inst Charged particle generation
US5623183A (en) * 1995-03-22 1997-04-22 Litton Systems, Inc. Diverging beam electron gun for a toxic remediation device with a dome-shaped focusing electrode

Also Published As

Publication number Publication date
EP1018137B1 (fr) 2005-06-22
TR200000750T2 (tr) 2000-06-21
AU730293B2 (en) 2001-03-01
NZ503060A (en) 2001-11-30
PT1018137E (pt) 2005-10-31
BR9812505A (pt) 2000-07-25
CZ294249B6 (cs) 2004-11-10
ATE298462T1 (de) 2005-07-15
US6404115B1 (en) 2002-06-11
EP1587130B1 (fr) 2008-08-27
UA69394C2 (uk) 2004-09-15
KR20010015610A (ko) 2001-02-26
RU2201006C2 (ru) 2003-03-20
KR100586050B1 (ko) 2006-06-07
WO1999016101A3 (fr) 1999-06-17
ATE406666T1 (de) 2008-09-15
JP2001517857A (ja) 2001-10-09
DE69830664T2 (de) 2005-12-01
JP4200656B2 (ja) 2008-12-24
BR9812505B1 (pt) 2009-12-01
CA2303148C (fr) 2008-06-03
ATE430375T1 (de) 2009-05-15
NO20001513D0 (no) 2000-03-23
NO20001513L (no) 2000-03-23
WO1999016101A2 (fr) 1999-04-01
EP1587130A1 (fr) 2005-10-19
DE69840801D1 (de) 2009-06-10
CN1271460A (zh) 2000-10-25
AU9176598A (en) 1999-04-12
CA2303148A1 (fr) 1999-04-01
DE69839952D1 (de) 2008-10-09
GB9720350D0 (en) 1997-11-26
CZ2000749A3 (cs) 2004-07-14
ES2244081T3 (es) 2005-12-01
NO326142B1 (no) 2008-10-06
EE200000153A (et) 2001-02-15
EP1018137A2 (fr) 2000-07-12
EP1587129A1 (fr) 2005-10-19
EP1587129B1 (fr) 2009-04-29
CN1205646C (zh) 2005-06-08
DE69830664D1 (de) 2005-07-28

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Legal Events

Date Code Title Description
KB4A Valid patent at the end of a year

Effective date: 20061231

KB4A Valid patent at the end of a year

Effective date: 20071231

KB4A Valid patent at the end of a year

Effective date: 20081231

KB4A Valid patent at the end of a year

Effective date: 20101231