EA201891175A1 - Плазменный прибор, приводимый в действие многофазным переменным или импульсным электрическим током, и способ получения плазмы - Google Patents
Плазменный прибор, приводимый в действие многофазным переменным или импульсным электрическим током, и способ получения плазмыInfo
- Publication number
- EA201891175A1 EA201891175A1 EA201891175A EA201891175A EA201891175A1 EA 201891175 A1 EA201891175 A1 EA 201891175A1 EA 201891175 A EA201891175 A EA 201891175A EA 201891175 A EA201891175 A EA 201891175A EA 201891175 A1 EA201891175 A1 EA 201891175A1
- Authority
- EA
- Eurasian Patent Office
- Prior art keywords
- plasma
- output oscillation
- hollow cathode
- getting
- action
- Prior art date
Links
Classifications
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/24—Generating plasma
- H05H1/26—Plasma torches
- H05H1/32—Plasma torches using an arc
- H05H1/44—Plasma torches using an arc using more than one torch
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J19/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
- B01J19/08—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/001—General methods for coating; Devices therefor
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/32532—Electrodes
- H01J37/32568—Relative arrangement or disposition of electrodes; moving means
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/32532—Electrodes
- H01J37/32577—Electrical connecting means
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/32532—Electrodes
- H01J37/32596—Hollow cathodes
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2218/00—Methods for coating glass
- C03C2218/10—Deposition methods
- C03C2218/15—Deposition methods from the vapour phase
- C03C2218/152—Deposition methods from the vapour phase by cvd
- C03C2218/153—Deposition methods from the vapour phase by cvd by plasma-enhanced cvd
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H2245/00—Applications of plasma devices
- H05H2245/40—Surface treatments
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Physics & Mathematics (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Materials Engineering (AREA)
- Analytical Chemistry (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Geochemistry & Mineralogy (AREA)
- Life Sciences & Earth Sciences (AREA)
- Health & Medical Sciences (AREA)
- General Health & Medical Sciences (AREA)
- Toxicology (AREA)
- Plasma Technology (AREA)
- Chemical Vapour Deposition (AREA)
Abstract
В заявке описаны источник плазмы и способ получения плазмы. Источник плазмы включает по меньшей мере три полых катода, включая первый полый катод, второй полый катод и третий полый катод, каждый из которых имеет область выхода плазмы. Источник плазмы включает источник энергии, способный вырабатывать несколько выходных колебаний, включая первое выходное колебание, второе выходное колебание и третье выходное колебание, из которых первое выходное колебание сдвинуто по фазе со вторым выходным колебанием, второе выходное колебание сдвинуто по фазе с третьим выходным колебанием и первое выходное колебание сдвинуто по фазе с третьим выходным колебанием. Каждый полый катод электрически соединен с источником энергии так, что первый полый катод электрически подключен к первому выходному колебанию, второй полый катод электрически подключен ко второму выходному колебанию и третий полый катод электрически подключен к третьему выходному колебанию.
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US14/942,737 US9721765B2 (en) | 2015-11-16 | 2015-11-16 | Plasma device driven by multiple-phase alternating or pulsed electrical current |
| US14/942,673 US9721764B2 (en) | 2015-11-16 | 2015-11-16 | Method of producing plasma by multiple-phase alternating or pulsed electrical current |
| PCT/US2016/061134 WO2017087233A1 (en) | 2015-11-16 | 2016-11-09 | Plasma device driven by multiple-phase alternating or pulsed electrical current and method of producing a plasma |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| EA201891175A1 true EA201891175A1 (ru) | 2018-12-28 |
Family
ID=58717680
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| EA201891175A EA201891175A1 (ru) | 2015-11-16 | 2016-11-09 | Плазменный прибор, приводимый в действие многофазным переменным или импульсным электрическим током, и способ получения плазмы |
Country Status (10)
| Country | Link |
|---|---|
| EP (1) | EP3377673A4 (ru) |
| JP (1) | JP2018535532A (ru) |
| KR (1) | KR20180095530A (ru) |
| CN (1) | CN108463575A (ru) |
| BR (1) | BR112018009864A8 (ru) |
| EA (1) | EA201891175A1 (ru) |
| MX (1) | MX2018006095A (ru) |
| PH (1) | PH12018501049A1 (ru) |
| SG (1) | SG11201804129YA (ru) |
| WO (1) | WO2017087233A1 (ru) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| RU2680318C1 (ru) * | 2018-08-31 | 2019-02-19 | Общество С Ограниченной Ответственностью "Трипл-Сп" | Система охлаждения высоковольтного электродугового плазмотрона переменного тока и высоковольтный электродуговой плазмотрон переменного тока с системой охлаждения (варианты) |
| CN115355504A (zh) * | 2022-08-15 | 2022-11-18 | 浙江大学台州研究院 | 一种多相交流等离子体炬和固体废物处理装置 |
Family Cites Families (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH07226395A (ja) * | 1994-02-15 | 1995-08-22 | Matsushita Electric Ind Co Ltd | 真空プラズマ処理装置 |
| US7232975B2 (en) * | 2003-12-02 | 2007-06-19 | Battelle Energy Alliance, Llc | Plasma generators, reactor systems and related methods |
| US7411353B1 (en) | 2007-05-11 | 2008-08-12 | Rutberg Alexander P | Alternating current multi-phase plasma gas generator with annular electrodes |
| EP2316252B1 (en) * | 2008-08-04 | 2018-10-31 | AGC Flat Glass North America, Inc. | Plasma source and method for depositing thin film coatings using plasma enhanced chemical vapor deposition and method thereof |
| JP2013503974A (ja) * | 2009-09-05 | 2013-02-04 | ジェネラル・プラズマ・インコーポレーテッド | プラズマ化学気相成長装置 |
| WO2014069309A1 (ja) * | 2012-11-02 | 2014-05-08 | 旭硝子株式会社 | プラズマｃｖｄ装置用のプラズマ源およびこのプラズマ源を用いた物品の製造方法 |
| WO2015022621A1 (en) * | 2013-08-11 | 2015-02-19 | Ariel - University Research And Development Company, Ltd. | Ferroelectric emitter for electron beam emission and radiation generation |
-
2016
- 2016-11-09 EP EP16866871.3A patent/EP3377673A4/en not_active Withdrawn
- 2016-11-09 MX MX2018006095A patent/MX2018006095A/es unknown
- 2016-11-09 CN CN201680078860.4A patent/CN108463575A/zh active Pending
- 2016-11-09 KR KR1020187017067A patent/KR20180095530A/ko unknown
- 2016-11-09 WO PCT/US2016/061134 patent/WO2017087233A1/en active Application Filing
- 2016-11-09 JP JP2018544766A patent/JP2018535532A/ja active Pending
- 2016-11-09 BR BR112018009864A patent/BR112018009864A8/pt not_active Application Discontinuation
- 2016-11-09 SG SG11201804129YA patent/SG11201804129YA/en unknown
- 2016-11-09 EA EA201891175A patent/EA201891175A1/ru unknown
-
2018
- 2018-05-16 PH PH12018501049A patent/PH12018501049A1/en unknown
Also Published As
| Publication number | Publication date |
|---|---|
| KR20180095530A (ko) | 2018-08-27 |
| SG11201804129YA (en) | 2018-06-28 |
| WO2017087233A1 (en) | 2017-05-26 |
| MX2018006095A (es) | 2018-11-12 |
| CN108463575A (zh) | 2018-08-28 |
| BR112018009864A2 (pt) | 2018-11-13 |
| EP3377673A4 (en) | 2019-07-31 |
| BR112018009864A8 (pt) | 2019-02-26 |
| EP3377673A1 (en) | 2018-09-26 |
| PH12018501049A1 (en) | 2019-01-28 |
| JP2018535532A (ja) | 2018-11-29 |
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