PH12018501049A1 - Plasma device driven by multiple-phase alternating or pulsed electrical current and method of producing a plasma - Google Patents

Plasma device driven by multiple-phase alternating or pulsed electrical current and method of producing a plasma

Info

Publication number
PH12018501049A1
PH12018501049A1 PH12018501049A PH12018501049A PH12018501049A1 PH 12018501049 A1 PH12018501049 A1 PH 12018501049A1 PH 12018501049 A PH12018501049 A PH 12018501049A PH 12018501049 A PH12018501049 A PH 12018501049A PH 12018501049 A1 PH12018501049 A1 PH 12018501049A1
Authority
PH
Philippines
Prior art keywords
plasma
output wave
producing
hollow cathode
electrical current
Prior art date
Application number
PH12018501049A
Inventor
John Chambers
Peter Maschwitz
Original Assignee
Agc Glass Europe
Agc Flat Glass Na Inc
Agc Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US14/942,737 external-priority patent/US9721765B2/en
Priority claimed from US14/942,673 external-priority patent/US9721764B2/en
Application filed by Agc Glass Europe, Agc Flat Glass Na Inc, Agc Inc filed Critical Agc Glass Europe
Publication of PH12018501049A1 publication Critical patent/PH12018501049A1/en

Links

Classifications

    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/26—Plasma torches
    • H05H1/32—Plasma torches using an arc
    • H05H1/44—Plasma torches using an arc using more than one torch
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J19/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J19/08—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/001—General methods for coating; Devices therefor
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32532—Electrodes
    • H01J37/32568—Relative arrangement or disposition of electrodes; moving means
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32532—Electrodes
    • H01J37/32577—Electrical connecting means
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32532—Electrodes
    • H01J37/32596—Hollow cathodes
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2218/00—Methods for coating glass
    • C03C2218/10—Deposition methods
    • C03C2218/15—Deposition methods from the vapour phase
    • C03C2218/152—Deposition methods from the vapour phase by cvd
    • C03C2218/153—Deposition methods from the vapour phase by cvd by plasma-enhanced cvd
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H2245/00—Applications of plasma devices
    • H05H2245/40—Surface treatments

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Physics & Mathematics (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Materials Engineering (AREA)
  • Analytical Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • General Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Chemical Vapour Deposition (AREA)
  • Plasma Technology (AREA)

Abstract

A plasma source and method of producing a plasma are provided. The plasma source includes at least three hollow cathodes, including a first hollow cathode, a second hollow cathode, and a third hollow cathode, each hollow cathode having a plasma exit region. The plasma source includes a source of power capable of producing multiple output waves, including a first output wave, a second output wave, and a third output wave, wherein the first output wave and the second output wave are out of phase, the second output wave and the third output wave are out of phase, and the first output wave and the third output wave are out of phase. Each hollow cathode is electrically connected to the source of power such that the first hollow cathode is electrically connected to the first output wave, the second hollow cathode is electrically connected to the second output wave, and the third is electrically connected to the third output wave.
PH12018501049A 2015-11-16 2018-05-16 Plasma device driven by multiple-phase alternating or pulsed electrical current and method of producing a plasma PH12018501049A1 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US14/942,737 US9721765B2 (en) 2015-11-16 2015-11-16 Plasma device driven by multiple-phase alternating or pulsed electrical current
US14/942,673 US9721764B2 (en) 2015-11-16 2015-11-16 Method of producing plasma by multiple-phase alternating or pulsed electrical current
PCT/US2016/061134 WO2017087233A1 (en) 2015-11-16 2016-11-09 Plasma device driven by multiple-phase alternating or pulsed electrical current and method of producing a plasma

Publications (1)

Publication Number Publication Date
PH12018501049A1 true PH12018501049A1 (en) 2019-01-28

Family

ID=58717680

Family Applications (1)

Application Number Title Priority Date Filing Date
PH12018501049A PH12018501049A1 (en) 2015-11-16 2018-05-16 Plasma device driven by multiple-phase alternating or pulsed electrical current and method of producing a plasma

Country Status (10)

Country Link
EP (1) EP3377673A4 (en)
JP (1) JP2018535532A (en)
KR (1) KR20180095530A (en)
CN (1) CN108463575A (en)
BR (1) BR112018009864A8 (en)
EA (1) EA201891175A1 (en)
MX (1) MX2018006095A (en)
PH (1) PH12018501049A1 (en)
SG (1) SG11201804129YA (en)
WO (1) WO2017087233A1 (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
RU2680318C1 (en) * 2018-08-31 2019-02-19 Общество С Ограниченной Ответственностью "Трипл-Сп" Ac high-voltage electric arc plasma torch cooling system and the ac high-voltage electric arc plasma torch with cooling system (embodiments)
CN115355504A (en) * 2022-08-15 2022-11-18 浙江大学台州研究院 Multiphase alternating current plasma torch and solid waste treatment device

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH07226395A (en) * 1994-02-15 1995-08-22 Matsushita Electric Ind Co Ltd Vacuum plasma treatment apparatus
US7232975B2 (en) * 2003-12-02 2007-06-19 Battelle Energy Alliance, Llc Plasma generators, reactor systems and related methods
US7411353B1 (en) * 2007-05-11 2008-08-12 Rutberg Alexander P Alternating current multi-phase plasma gas generator with annular electrodes
EA020763B9 (en) * 2008-08-04 2015-05-29 Эй-Джи-Си Флет Гласс Норт Эмерике, Инк. Plasma source and methods for depositing thin film coatings using plasma enhanced chemical vapor deposition
KR20120085254A (en) * 2009-09-05 2012-07-31 제너럴 플라즈마, 인크. Plasma enhanced chemical vapor deposition apparatus
EP2915902B1 (en) * 2012-11-02 2020-02-19 AGC Inc. Plasma source for a plasma cvd apparatus and a manufacturing method of an article using the plasma source
US9646797B2 (en) * 2013-08-11 2017-05-09 Ariel-University Research And Development Company Ltd. Ferroelectric emitter for electron beam emission and radiation generation

Also Published As

Publication number Publication date
MX2018006095A (en) 2018-11-12
KR20180095530A (en) 2018-08-27
SG11201804129YA (en) 2018-06-28
EP3377673A4 (en) 2019-07-31
BR112018009864A8 (en) 2019-02-26
BR112018009864A2 (en) 2018-11-13
WO2017087233A1 (en) 2017-05-26
EA201891175A1 (en) 2018-12-28
EP3377673A1 (en) 2018-09-26
CN108463575A (en) 2018-08-28
JP2018535532A (en) 2018-11-29

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