EP3377673A4 - Plasma device driven by multiple-phase alternating or pulsed electrical current and method of producing a plasma - Google Patents

Plasma device driven by multiple-phase alternating or pulsed electrical current and method of producing a plasma Download PDF

Info

Publication number
EP3377673A4
EP3377673A4 EP16866871.3A EP16866871A EP3377673A4 EP 3377673 A4 EP3377673 A4 EP 3377673A4 EP 16866871 A EP16866871 A EP 16866871A EP 3377673 A4 EP3377673 A4 EP 3377673A4
Authority
EP
European Patent Office
Prior art keywords
plasma
producing
electrical current
phase alternating
device driven
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
EP16866871.3A
Other languages
German (de)
French (fr)
Other versions
EP3377673A1 (en
Inventor
John Chambers
Peter Maschwitz
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
AGC Glass Europe SA
AGC Inc
AGC Flat Glass North America Inc
Original Assignee
AGC Glass Europe SA
Asahi Glass Co Ltd
AGC Flat Glass North America Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US14/942,737 external-priority patent/US9721765B2/en
Priority claimed from US14/942,673 external-priority patent/US9721764B2/en
Application filed by AGC Glass Europe SA, Asahi Glass Co Ltd, AGC Flat Glass North America Inc filed Critical AGC Glass Europe SA
Publication of EP3377673A1 publication Critical patent/EP3377673A1/en
Publication of EP3377673A4 publication Critical patent/EP3377673A4/en
Withdrawn legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/26—Plasma torches
    • H05H1/32—Plasma torches using an arc
    • H05H1/44—Plasma torches using an arc using more than one torch
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J19/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J19/08—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32532—Electrodes
    • H01J37/32568—Relative arrangement or disposition of electrodes; moving means
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32532—Electrodes
    • H01J37/32577—Electrical connecting means
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32532—Electrodes
    • H01J37/32596—Hollow cathodes
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/001—General methods for coating; Devices therefor
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2218/00—Methods for coating glass
    • C03C2218/10—Deposition methods
    • C03C2218/15—Deposition methods from the vapour phase
    • C03C2218/152—Deposition methods from the vapour phase by cvd
    • C03C2218/153—Deposition methods from the vapour phase by cvd by plasma-enhanced cvd
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H2245/00—Applications of plasma devices
    • H05H2245/40—Surface treatments
EP16866871.3A 2015-11-16 2016-11-09 Plasma device driven by multiple-phase alternating or pulsed electrical current and method of producing a plasma Withdrawn EP3377673A4 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US14/942,737 US9721765B2 (en) 2015-11-16 2015-11-16 Plasma device driven by multiple-phase alternating or pulsed electrical current
US14/942,673 US9721764B2 (en) 2015-11-16 2015-11-16 Method of producing plasma by multiple-phase alternating or pulsed electrical current
PCT/US2016/061134 WO2017087233A1 (en) 2015-11-16 2016-11-09 Plasma device driven by multiple-phase alternating or pulsed electrical current and method of producing a plasma

Publications (2)

Publication Number Publication Date
EP3377673A1 EP3377673A1 (en) 2018-09-26
EP3377673A4 true EP3377673A4 (en) 2019-07-31

Family

ID=58717680

Family Applications (1)

Application Number Title Priority Date Filing Date
EP16866871.3A Withdrawn EP3377673A4 (en) 2015-11-16 2016-11-09 Plasma device driven by multiple-phase alternating or pulsed electrical current and method of producing a plasma

Country Status (10)

Country Link
EP (1) EP3377673A4 (en)
JP (1) JP2018535532A (en)
KR (1) KR20180095530A (en)
CN (1) CN108463575A (en)
BR (1) BR112018009864A8 (en)
EA (1) EA201891175A1 (en)
MX (1) MX2018006095A (en)
PH (1) PH12018501049A1 (en)
SG (1) SG11201804129YA (en)
WO (1) WO2017087233A1 (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
RU2680318C1 (en) * 2018-08-31 2019-02-19 Общество С Ограниченной Ответственностью "Трипл-Сп" Ac high-voltage electric arc plasma torch cooling system and the ac high-voltage electric arc plasma torch with cooling system (embodiments)
CN115355504A (en) * 2022-08-15 2022-11-18 浙江大学台州研究院 Multiphase alternating current plasma torch and solid waste treatment device

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5609690A (en) * 1994-02-15 1997-03-11 Matsushita Electric Industrial Co., Ltd. Vacuum plasma processing apparatus and method
US7411353B1 (en) * 2007-05-11 2008-08-12 Rutberg Alexander P Alternating current multi-phase plasma gas generator with annular electrodes
US20100028238A1 (en) * 2008-08-04 2010-02-04 Agc Flat Glass North America, Inc. Plasma source and methods for depositing thin film coatings using plasma enhanced chemical vapor deposition
EP2915902A1 (en) * 2012-11-02 2015-09-09 Asahi Glass Company, Limited Plasma source for plasma cvd device and method for manufacturing article using plasma source

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7232975B2 (en) * 2003-12-02 2007-06-19 Battelle Energy Alliance, Llc Plasma generators, reactor systems and related methods
JP2013503974A (en) * 2009-09-05 2013-02-04 ジェネラル・プラズマ・インコーポレーテッド Plasma chemical vapor deposition equipment
EP3031066B1 (en) * 2013-08-11 2018-10-17 Ariel-University Research and Development Company Ltd. Ferroelectric emitter for electron beam emission and radiation generation

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5609690A (en) * 1994-02-15 1997-03-11 Matsushita Electric Industrial Co., Ltd. Vacuum plasma processing apparatus and method
US7411353B1 (en) * 2007-05-11 2008-08-12 Rutberg Alexander P Alternating current multi-phase plasma gas generator with annular electrodes
US20100028238A1 (en) * 2008-08-04 2010-02-04 Agc Flat Glass North America, Inc. Plasma source and methods for depositing thin film coatings using plasma enhanced chemical vapor deposition
EP2915902A1 (en) * 2012-11-02 2015-09-09 Asahi Glass Company, Limited Plasma source for plasma cvd device and method for manufacturing article using plasma source

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
See also references of WO2017087233A1 *

Also Published As

Publication number Publication date
BR112018009864A2 (en) 2018-11-13
BR112018009864A8 (en) 2019-02-26
MX2018006095A (en) 2018-11-12
CN108463575A (en) 2018-08-28
KR20180095530A (en) 2018-08-27
WO2017087233A1 (en) 2017-05-26
EP3377673A1 (en) 2018-09-26
SG11201804129YA (en) 2018-06-28
EA201891175A1 (en) 2018-12-28
JP2018535532A (en) 2018-11-29
PH12018501049A1 (en) 2019-01-28

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