EA201891175A1 - PLASMA DEVICE, MADE INTO ACTION BY MULTIPHASE VARIABLE OR PULSED ELECTRIC CURRENT, AND A METHOD FOR GETTING A PLASMA - Google Patents

PLASMA DEVICE, MADE INTO ACTION BY MULTIPHASE VARIABLE OR PULSED ELECTRIC CURRENT, AND A METHOD FOR GETTING A PLASMA

Info

Publication number
EA201891175A1
EA201891175A1 EA201891175A EA201891175A EA201891175A1 EA 201891175 A1 EA201891175 A1 EA 201891175A1 EA 201891175 A EA201891175 A EA 201891175A EA 201891175 A EA201891175 A EA 201891175A EA 201891175 A1 EA201891175 A1 EA 201891175A1
Authority
EA
Eurasian Patent Office
Prior art keywords
plasma
output oscillation
hollow cathode
getting
action
Prior art date
Application number
EA201891175A
Other languages
Russian (ru)
Inventor
Джон Чамберс
Питер Машвитц
Original Assignee
Эй-Джи-Си Флет Гласс Норт Эмерике, Инк.
Асахи Гласс Ко., Лтд.
Эй-Джи-Си Гласс Юруоп
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US14/942,737 external-priority patent/US9721765B2/en
Priority claimed from US14/942,673 external-priority patent/US9721764B2/en
Application filed by Эй-Джи-Си Флет Гласс Норт Эмерике, Инк., Асахи Гласс Ко., Лтд., Эй-Джи-Си Гласс Юруоп filed Critical Эй-Джи-Си Флет Гласс Норт Эмерике, Инк.
Publication of EA201891175A1 publication Critical patent/EA201891175A1/en

Links

Classifications

    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/26—Plasma torches
    • H05H1/32—Plasma torches using an arc
    • H05H1/44—Plasma torches using an arc using more than one torch
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J19/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J19/08—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/001—General methods for coating; Devices therefor
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32532—Electrodes
    • H01J37/32568—Relative arrangement or disposition of electrodes; moving means
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32532—Electrodes
    • H01J37/32577—Electrical connecting means
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32532—Electrodes
    • H01J37/32596—Hollow cathodes
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2218/00—Methods for coating glass
    • C03C2218/10—Deposition methods
    • C03C2218/15—Deposition methods from the vapour phase
    • C03C2218/152—Deposition methods from the vapour phase by cvd
    • C03C2218/153—Deposition methods from the vapour phase by cvd by plasma-enhanced cvd
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H2245/00—Applications of plasma devices
    • H05H2245/40—Surface treatments

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Physics & Mathematics (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Materials Engineering (AREA)
  • Analytical Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • General Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Plasma Technology (AREA)
  • Chemical Vapour Deposition (AREA)

Abstract

В заявке описаны источник плазмы и способ получения плазмы. Источник плазмы включает по меньшей мере три полых катода, включая первый полый катод, второй полый катод и третий полый катод, каждый из которых имеет область выхода плазмы. Источник плазмы включает источник энергии, способный вырабатывать несколько выходных колебаний, включая первое выходное колебание, второе выходное колебание и третье выходное колебание, из которых первое выходное колебание сдвинуто по фазе со вторым выходным колебанием, второе выходное колебание сдвинуто по фазе с третьим выходным колебанием и первое выходное колебание сдвинуто по фазе с третьим выходным колебанием. Каждый полый катод электрически соединен с источником энергии так, что первый полый катод электрически подключен к первому выходному колебанию, второй полый катод электрически подключен ко второму выходному колебанию и третий полый катод электрически подключен к третьему выходному колебанию.The application describes a plasma source and a method for producing plasma. The plasma source includes at least three hollow cathodes, including the first hollow cathode, the second hollow cathode, and the third hollow cathode, each of which has a plasma exit region. The plasma source includes an energy source capable of generating several output oscillations, including the first output oscillation, the second output oscillation, and the third output oscillation, of which the first output oscillation is phase-shifted with the second output oscillation, the second output oscillation is phase-shifted with the third output oscillation and the first the output oscillation is phase shifted with the third output oscillation. Each hollow cathode is electrically connected to an energy source so that the first hollow cathode is electrically connected to the first output oscillation, the second hollow cathode is electrically connected to the second output oscillation and the third hollow cathode is electrically connected to the third output oscillation.

EA201891175A 2015-11-16 2016-11-09 PLASMA DEVICE, MADE INTO ACTION BY MULTIPHASE VARIABLE OR PULSED ELECTRIC CURRENT, AND A METHOD FOR GETTING A PLASMA EA201891175A1 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US14/942,737 US9721765B2 (en) 2015-11-16 2015-11-16 Plasma device driven by multiple-phase alternating or pulsed electrical current
US14/942,673 US9721764B2 (en) 2015-11-16 2015-11-16 Method of producing plasma by multiple-phase alternating or pulsed electrical current
PCT/US2016/061134 WO2017087233A1 (en) 2015-11-16 2016-11-09 Plasma device driven by multiple-phase alternating or pulsed electrical current and method of producing a plasma

Publications (1)

Publication Number Publication Date
EA201891175A1 true EA201891175A1 (en) 2018-12-28

Family

ID=58717680

Family Applications (1)

Application Number Title Priority Date Filing Date
EA201891175A EA201891175A1 (en) 2015-11-16 2016-11-09 PLASMA DEVICE, MADE INTO ACTION BY MULTIPHASE VARIABLE OR PULSED ELECTRIC CURRENT, AND A METHOD FOR GETTING A PLASMA

Country Status (10)

Country Link
EP (1) EP3377673A4 (en)
JP (1) JP2018535532A (en)
KR (1) KR20180095530A (en)
CN (1) CN108463575A (en)
BR (1) BR112018009864A8 (en)
EA (1) EA201891175A1 (en)
MX (1) MX2018006095A (en)
PH (1) PH12018501049A1 (en)
SG (1) SG11201804129YA (en)
WO (1) WO2017087233A1 (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
RU2680318C1 (en) * 2018-08-31 2019-02-19 Общество С Ограниченной Ответственностью "Трипл-Сп" Ac high-voltage electric arc plasma torch cooling system and the ac high-voltage electric arc plasma torch with cooling system (embodiments)
CN115355504A (en) * 2022-08-15 2022-11-18 浙江大学台州研究院 Multiphase alternating current plasma torch and solid waste treatment device

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH07226395A (en) * 1994-02-15 1995-08-22 Matsushita Electric Ind Co Ltd Vacuum plasma treatment apparatus
US7232975B2 (en) * 2003-12-02 2007-06-19 Battelle Energy Alliance, Llc Plasma generators, reactor systems and related methods
US7411353B1 (en) 2007-05-11 2008-08-12 Rutberg Alexander P Alternating current multi-phase plasma gas generator with annular electrodes
EP2316252B1 (en) * 2008-08-04 2018-10-31 AGC Flat Glass North America, Inc. Plasma source and method for depositing thin film coatings using plasma enhanced chemical vapor deposition and method thereof
JP2013503974A (en) * 2009-09-05 2013-02-04 ジェネラル・プラズマ・インコーポレーテッド Plasma chemical vapor deposition equipment
WO2014069309A1 (en) * 2012-11-02 2014-05-08 旭硝子株式会社 Plasma source for plasma cvd device and method for manufacturing article using plasma source
WO2015022621A1 (en) * 2013-08-11 2015-02-19 Ariel - University Research And Development Company, Ltd. Ferroelectric emitter for electron beam emission and radiation generation

Also Published As

Publication number Publication date
KR20180095530A (en) 2018-08-27
SG11201804129YA (en) 2018-06-28
WO2017087233A1 (en) 2017-05-26
MX2018006095A (en) 2018-11-12
CN108463575A (en) 2018-08-28
BR112018009864A2 (en) 2018-11-13
EP3377673A4 (en) 2019-07-31
BR112018009864A8 (en) 2019-02-26
EP3377673A1 (en) 2018-09-26
PH12018501049A1 (en) 2019-01-28
JP2018535532A (en) 2018-11-29

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