BR112018009864A8 - dispositivo de plasma conduzido por múltipla fase alternada ou corrente elétrica pulsada e método de produzir um plasma - Google Patents
dispositivo de plasma conduzido por múltipla fase alternada ou corrente elétrica pulsada e método de produzir um plasmaInfo
- Publication number
- BR112018009864A8 BR112018009864A8 BR112018009864A BR112018009864A BR112018009864A8 BR 112018009864 A8 BR112018009864 A8 BR 112018009864A8 BR 112018009864 A BR112018009864 A BR 112018009864A BR 112018009864 A BR112018009864 A BR 112018009864A BR 112018009864 A8 BR112018009864 A8 BR 112018009864A8
- Authority
- BR
- Brazil
- Prior art keywords
- plasma
- output wave
- hollow cathode
- electric current
- hollow
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/24—Generating plasma
- H05H1/26—Plasma torches
- H05H1/32—Plasma torches using an arc
- H05H1/44—Plasma torches using an arc using more than one torch
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J19/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
- B01J19/08—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/001—General methods for coating; Devices therefor
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/32532—Electrodes
- H01J37/32568—Relative arrangement or disposition of electrodes; moving means
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/32532—Electrodes
- H01J37/32577—Electrical connecting means
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/32532—Electrodes
- H01J37/32596—Hollow cathodes
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2218/00—Methods for coating glass
- C03C2218/10—Deposition methods
- C03C2218/15—Deposition methods from the vapour phase
- C03C2218/152—Deposition methods from the vapour phase by cvd
- C03C2218/153—Deposition methods from the vapour phase by cvd by plasma-enhanced cvd
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H2245/00—Applications of plasma devices
- H05H2245/40—Surface treatments
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Physics & Mathematics (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Materials Engineering (AREA)
- Analytical Chemistry (AREA)
- Metallurgy (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Mechanical Engineering (AREA)
- Life Sciences & Earth Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Health & Medical Sciences (AREA)
- General Health & Medical Sciences (AREA)
- Toxicology (AREA)
- Chemical Vapour Deposition (AREA)
- Plasma Technology (AREA)
Abstract
uma fonte de plasma e método de produção de plasma são fornecidos. a fonte de plasma inclui pelo menos três catodos ocos, incluindo um primeiro catodo oco, um segundo catodo oco e um terceiro catodo oco, tendo cada catodo oco uma região de saída de plasma. a fonte de plasma inclui uma fonte de energia capaz de produzir ondas de saída múltiplas, incluindo uma primeira onda de saída, uma segunda onda de saída e uma terceira onda de saída, em que a primeira onda de saída e a segunda onda de saída estão fora de fase, em que e a terceira onda de saída estão fora de fase e a primeira onda de saída e a terceira onda de saída estão fora de fase. cada catodo oco é eletricamente conectado à fonte de energia de tal forma que o primeiro catodo oco é eletricamente conectado à primeira onda de saída, o segundo catodo oco é eletricamente conectado à segunda onda de saída, e o terceiro catodo oco é eletricamente conectado ao terceiro onda de saída. a corrente elétrica flui entre os pelo menos três catodos ocos que estão fora da fase elétrica. a fonte de plasma é capaz de gerar um plasma entre os catodos ocos.
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US14/942,737 US9721765B2 (en) | 2015-11-16 | 2015-11-16 | Plasma device driven by multiple-phase alternating or pulsed electrical current |
| US14/942,673 US9721764B2 (en) | 2015-11-16 | 2015-11-16 | Method of producing plasma by multiple-phase alternating or pulsed electrical current |
| PCT/US2016/061134 WO2017087233A1 (en) | 2015-11-16 | 2016-11-09 | Plasma device driven by multiple-phase alternating or pulsed electrical current and method of producing a plasma |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| BR112018009864A2 BR112018009864A2 (pt) | 2018-11-13 |
| BR112018009864A8 true BR112018009864A8 (pt) | 2019-02-26 |
Family
ID=58717680
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| BR112018009864A BR112018009864A8 (pt) | 2015-11-16 | 2016-11-09 | dispositivo de plasma conduzido por múltipla fase alternada ou corrente elétrica pulsada e método de produzir um plasma |
Country Status (10)
| Country | Link |
|---|---|
| EP (1) | EP3377673A4 (pt) |
| JP (1) | JP2018535532A (pt) |
| KR (1) | KR20180095530A (pt) |
| CN (1) | CN108463575A (pt) |
| BR (1) | BR112018009864A8 (pt) |
| EA (1) | EA201891175A1 (pt) |
| MX (1) | MX2018006095A (pt) |
| PH (1) | PH12018501049A1 (pt) |
| SG (1) | SG11201804129YA (pt) |
| WO (1) | WO2017087233A1 (pt) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| RU2680318C1 (ru) * | 2018-08-31 | 2019-02-19 | Общество С Ограниченной Ответственностью "Трипл-Сп" | Система охлаждения высоковольтного электродугового плазмотрона переменного тока и высоковольтный электродуговой плазмотрон переменного тока с системой охлаждения (варианты) |
| CN115355504A (zh) * | 2022-08-15 | 2022-11-18 | 浙江大学台州研究院 | 一种多相交流等离子体炬和固体废物处理装置 |
Family Cites Families (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH07226395A (ja) * | 1994-02-15 | 1995-08-22 | Matsushita Electric Ind Co Ltd | 真空プラズマ処理装置 |
| US7232975B2 (en) * | 2003-12-02 | 2007-06-19 | Battelle Energy Alliance, Llc | Plasma generators, reactor systems and related methods |
| US7411353B1 (en) * | 2007-05-11 | 2008-08-12 | Rutberg Alexander P | Alternating current multi-phase plasma gas generator with annular electrodes |
| EA030379B1 (ru) * | 2008-08-04 | 2018-07-31 | Эй-Джи-Си Флет Гласс Норт Эмерике, Инк. | Способ нанесения тонкопленочных покрытий с использованием плазменно-химического осаждения из газовой фазы (варианты) |
| US20120164353A1 (en) * | 2009-09-05 | 2012-06-28 | John Madocks | Plasma enhanced chemical vapor deposition apparatus |
| ES2781775T3 (es) * | 2012-11-02 | 2020-09-07 | Agc Inc | Fuente de plasma para un aparato de CVD de plasma y un procedimiento de fabricación de un artículo por el uso de la fuente de plasma |
| WO2015022621A1 (en) * | 2013-08-11 | 2015-02-19 | Ariel - University Research And Development Company, Ltd. | Ferroelectric emitter for electron beam emission and radiation generation |
-
2016
- 2016-11-09 EA EA201891175A patent/EA201891175A1/ru unknown
- 2016-11-09 KR KR1020187017067A patent/KR20180095530A/ko unknown
- 2016-11-09 MX MX2018006095A patent/MX2018006095A/es unknown
- 2016-11-09 EP EP16866871.3A patent/EP3377673A4/en not_active Withdrawn
- 2016-11-09 SG SG11201804129YA patent/SG11201804129YA/en unknown
- 2016-11-09 BR BR112018009864A patent/BR112018009864A8/pt not_active Application Discontinuation
- 2016-11-09 JP JP2018544766A patent/JP2018535532A/ja active Pending
- 2016-11-09 CN CN201680078860.4A patent/CN108463575A/zh active Pending
- 2016-11-09 WO PCT/US2016/061134 patent/WO2017087233A1/en active Application Filing
-
2018
- 2018-05-16 PH PH12018501049A patent/PH12018501049A1/en unknown
Also Published As
| Publication number | Publication date |
|---|---|
| KR20180095530A (ko) | 2018-08-27 |
| WO2017087233A1 (en) | 2017-05-26 |
| CN108463575A (zh) | 2018-08-28 |
| BR112018009864A2 (pt) | 2018-11-13 |
| EA201891175A1 (ru) | 2018-12-28 |
| MX2018006095A (es) | 2018-11-12 |
| EP3377673A4 (en) | 2019-07-31 |
| SG11201804129YA (en) | 2018-06-28 |
| EP3377673A1 (en) | 2018-09-26 |
| JP2018535532A (ja) | 2018-11-29 |
| PH12018501049A1 (en) | 2019-01-28 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| B25D | Requested change of name of applicant approved |
Owner name: AGC FLAT GLASS NORTH AMERICA, INC. (US) ; AGC GLAS |
|
| B06U | Preliminary requirement: requests with searches performed by other patent offices: procedure suspended [chapter 6.21 patent gazette] | ||
| B11B | Dismissal acc. art. 36, par 1 of ipl - no reply within 90 days to fullfil the necessary requirements |