EA201492247A1 - Устройство и способ предотвращения повреждения подложки в плазменной установке, в которой применяют dbd - Google Patents

Устройство и способ предотвращения повреждения подложки в плазменной установке, в которой применяют dbd

Info

Publication number
EA201492247A1
EA201492247A1 EA201492247A EA201492247A EA201492247A1 EA 201492247 A1 EA201492247 A1 EA 201492247A1 EA 201492247 A EA201492247 A EA 201492247A EA 201492247 A EA201492247 A EA 201492247A EA 201492247 A1 EA201492247 A1 EA 201492247A1
Authority
EA
Eurasian Patent Office
Prior art keywords
electrodes
terminals
dbd
voltage
preventing damage
Prior art date
Application number
EA201492247A
Other languages
English (en)
Other versions
EA028986B1 (ru
Inventor
Эрик Тиксон
Жозеф Леклерк
Эрик Мишель
Original Assignee
Асахи Гласс Компани, Лимитед
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Асахи Гласс Компани, Лимитед filed Critical Асахи Гласс Компани, Лимитед
Publication of EA201492247A1 publication Critical patent/EA201492247A1/ru
Publication of EA028986B1 publication Critical patent/EA028986B1/ru

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32348—Dielectric barrier discharge
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/001—General methods for coating; Devices therefor
    • C03C17/002—General methods for coating; Devices therefor for flat glass, e.g. float glass
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C23/00—Other surface treatment of glass not in the form of fibres or filaments
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32458—Vessel
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32715—Workpiece holder
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32733—Means for moving the material to be treated
    • H01J37/32743—Means for moving the material to be treated for introducing the material into processing chamber
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32917—Plasma diagnostics
    • H01J37/32935—Monitoring and controlling tubes by information coming from the object and/or discharge
    • H01J37/32944—Arc detection
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/32—Processing objects by plasma generation

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Analytical Chemistry (AREA)
  • Plasma & Fusion (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Geochemistry & Mineralogy (AREA)
  • General Chemical & Material Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Plasma Technology (AREA)
  • Drying Of Semiconductors (AREA)
  • Chemical Vapour Deposition (AREA)

Abstract

Настоящее изобретение относится к способу предотвращения повреждения подложки в установке для обработки поверхности диэлектрическим барьерным разрядом (DBD) и к установке для обработки поверхности, в которой применяют DBD, для осуществления такого способа. Он включает измерение амплитуды напряжения на зажимах электродов и амплитуды тока, циркулирующего между указанными электродами; определение максимального числа периодических изменений напряжения на зажимах электродов в присутствии горячей электрической дуги (n max) для недопущения превышения 50 джоулей в виде рассеянной энергии в указанной подложке; модификацию с отрицательной обратной связью напряжения на зажимах указанных электродов перед достижением определенного максимального числа периодических изменений напряжения на зажимах электродов при варьировании амплитуды указанных двух параметров в результате инициирования горячей электрической дуги между указанными электродами.
EA201492247A 2012-07-11 2013-07-09 Устройство и способ предотвращения повреждения подложки в плазменной установке, в которой применяют dbd EA028986B1 (ru)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
EP12175855 2012-07-11
EP12199072 2012-12-21
PCT/IB2013/055636 WO2014009883A2 (en) 2012-07-11 2013-07-09 Device and process for preventing substrate damages in a dbd plasma installation

Publications (2)

Publication Number Publication Date
EA201492247A1 true EA201492247A1 (ru) 2015-08-31
EA028986B1 EA028986B1 (ru) 2018-01-31

Family

ID=49223815

Family Applications (1)

Application Number Title Priority Date Filing Date
EA201492247A EA028986B1 (ru) 2012-07-11 2013-07-09 Устройство и способ предотвращения повреждения подложки в плазменной установке, в которой применяют dbd

Country Status (5)

Country Link
US (1) US9378932B2 (ru)
EP (1) EP2873089B1 (ru)
JP (1) JP6075703B2 (ru)
EA (1) EA028986B1 (ru)
WO (1) WO2014009883A2 (ru)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20180040461A1 (en) * 2016-08-02 2018-02-08 Advanced Energy Industries, Inc. Application of diode box to reduce crazing in glass coatings
US10510512B2 (en) * 2018-01-25 2019-12-17 Tokyo Electron Limited Methods and systems for controlling plasma performance

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1073091A3 (en) 1999-07-27 2004-10-06 Matsushita Electric Works, Ltd. Electrode for plasma generation, plasma treatment apparatus using the electrode, and plasma treatment with the apparatus
AU1451901A (en) 1999-11-01 2001-05-14 James D. Getty Modular chemical abatement system and method for semiconductor manufacturing
US6774569B2 (en) * 2002-07-11 2004-08-10 Fuji Photo Film B.V. Apparatus for producing and sustaining a glow discharge plasma under atmospheric conditions
JP4510882B2 (ja) * 2005-03-28 2010-07-28 三菱電機株式会社 無声放電式プラズマ装置
US7615931B2 (en) * 2005-05-02 2009-11-10 International Technology Center Pulsed dielectric barrier discharge
WO2007130613A2 (en) * 2006-05-04 2007-11-15 Sri International Multiarc discharge moving bed reactor system
KR100776616B1 (ko) * 2006-05-04 2007-11-15 한국기계연구원 평판형 저온 플라즈마 반응기
US7733095B2 (en) * 2007-08-15 2010-06-08 Applied Materials, Inc. Apparatus for wafer level arc detection at an RF bias impedance match to the pedestal electrode
EP2145701A1 (fr) * 2008-07-16 2010-01-20 AGC Flat Glass Europe SA Procédé et installation pour la préparation de surface par décharge à barrière diélectrique
DE102009011960B4 (de) * 2009-03-10 2013-06-13 Schott Ag Verfahren zur Überwachung von Plasma-Entladungen
US20120156091A1 (en) * 2009-03-16 2012-06-21 Drexel University Methods and devices for treating surfaces with surface plasma`
WO2011063407A2 (en) * 2009-11-23 2011-05-26 The University Of Notre Dame Du Lac Methods and apparatus for plasma based adaptive optics
DE102010024135A1 (de) * 2010-06-17 2011-12-22 WPNLB UG (haftungsbeschränkt) & Co. KG Vorrichtung zur kontinuierlichen Plasmabehandlung und/oder Plasmabeschichtung eines Materialstücks
JP2012102377A (ja) * 2010-11-11 2012-05-31 Fujifilm Corp 成膜装置
US9263241B2 (en) 2011-05-10 2016-02-16 Advanced Energy Industries, Inc. Current threshold response mode for arc management

Also Published As

Publication number Publication date
JP6075703B2 (ja) 2017-02-08
JP2015531431A (ja) 2015-11-02
EP2873089B1 (en) 2017-09-06
EA028986B1 (ru) 2018-01-31
US20150206718A1 (en) 2015-07-23
WO2014009883A2 (en) 2014-01-16
EP2873089A2 (en) 2015-05-20
US9378932B2 (en) 2016-06-28
WO2014009883A3 (en) 2014-03-06

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Legal Events

Date Code Title Description
PD4A Registration of transfer of a eurasian patent in accordance with the succession in title
MM4A Lapse of a eurasian patent due to non-payment of renewal fees within the time limit in the following designated state(s)

Designated state(s): AM AZ BY KZ KG TJ TM