DK386484A - Straalingsfoelsomme forbindelser til brug ved fremstilling af litografiske trykplader - Google Patents
Straalingsfoelsomme forbindelser til brug ved fremstilling af litografiske trykplader Download PDFInfo
- Publication number
- DK386484A DK386484A DK386484A DK386484A DK386484A DK 386484 A DK386484 A DK 386484A DK 386484 A DK386484 A DK 386484A DK 386484 A DK386484 A DK 386484A DK 386484 A DK386484 A DK 386484A
- Authority
- DK
- Denmark
- Prior art keywords
- radiation sensitive
- different
- same
- manufacture
- printing plates
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D409/00—Heterocyclic compounds containing two or more hetero rings, at least one ring having sulfur atoms as the only ring hetero atoms
- C07D409/02—Heterocyclic compounds containing two or more hetero rings, at least one ring having sulfur atoms as the only ring hetero atoms containing two hetero rings
- C07D409/06—Heterocyclic compounds containing two or more hetero rings, at least one ring having sulfur atoms as the only ring hetero atoms containing two hetero rings linked by a carbon chain containing only aliphatic carbon atoms
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D209/00—Heterocyclic compounds containing five-membered rings, condensed with other rings, with one nitrogen atom as the only ring hetero atom
- C07D209/02—Heterocyclic compounds containing five-membered rings, condensed with other rings, with one nitrogen atom as the only ring hetero atom condensed with one carbocyclic ring
- C07D209/04—Indoles; Hydrogenated indoles
- C07D209/10—Indoles; Hydrogenated indoles with substituted hydrocarbon radicals attached to carbon atoms of the hetero ring
- C07D209/12—Radicals substituted by oxygen atoms
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D215/00—Heterocyclic compounds containing quinoline or hydrogenated quinoline ring systems
- C07D215/02—Heterocyclic compounds containing quinoline or hydrogenated quinoline ring systems having no bond between the ring nitrogen atom and a non-ring member or having only hydrogen atoms or carbon atoms directly attached to the ring nitrogen atom
- C07D215/12—Heterocyclic compounds containing quinoline or hydrogenated quinoline ring systems having no bond between the ring nitrogen atom and a non-ring member or having only hydrogen atoms or carbon atoms directly attached to the ring nitrogen atom with substituted hydrocarbon radicals attached to ring carbon atoms
- C07D215/14—Radicals substituted by oxygen atoms
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D277/00—Heterocyclic compounds containing 1,3-thiazole or hydrogenated 1,3-thiazole rings
- C07D277/60—Heterocyclic compounds containing 1,3-thiazole or hydrogenated 1,3-thiazole rings condensed with carbocyclic rings or ring systems
- C07D277/62—Benzothiazoles
- C07D277/64—Benzothiazoles with only hydrocarbon or substituted hydrocarbon radicals attached in position 2
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D277/00—Heterocyclic compounds containing 1,3-thiazole or hydrogenated 1,3-thiazole rings
- C07D277/60—Heterocyclic compounds containing 1,3-thiazole or hydrogenated 1,3-thiazole rings condensed with carbocyclic rings or ring systems
- C07D277/84—Naphthothiazoles
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D293/00—Heterocyclic compounds containing rings having nitrogen and selenium or nitrogen and tellurium, with or without oxygen or sulfur atoms, as the ring hetero atoms
- C07D293/10—Heterocyclic compounds containing rings having nitrogen and selenium or nitrogen and tellurium, with or without oxygen or sulfur atoms, as the ring hetero atoms condensed with carbocyclic rings or ring systems
- C07D293/12—Selenazoles; Hydrogenated selenazoles
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D417/00—Heterocyclic compounds containing two or more hetero rings, at least one ring having nitrogen and sulfur atoms as the only ring hetero atoms, not provided for by group C07D415/00
- C07D417/02—Heterocyclic compounds containing two or more hetero rings, at least one ring having nitrogen and sulfur atoms as the only ring hetero atoms, not provided for by group C07D415/00 containing two hetero rings
- C07D417/06—Heterocyclic compounds containing two or more hetero rings, at least one ring having nitrogen and sulfur atoms as the only ring hetero atoms, not provided for by group C07D415/00 containing two hetero rings linked by a carbon chain containing only aliphatic carbon atoms
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
- G03C1/00—Photosensitive materials
- G03C1/675—Compositions containing polyhalogenated compounds as photosensitive substances
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
- G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
- G03F7/0295—Photolytic halogen compounds
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/114—Initiator containing
- Y10S430/117—Free radical
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/114—Initiator containing
- Y10S430/12—Nitrogen compound containing
- Y10S430/121—Nitrogen in heterocyclic ring
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/114—Initiator containing
- Y10S430/124—Carbonyl compound containing
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/114—Initiator containing
- Y10S430/124—Carbonyl compound containing
- Y10S430/125—Carbonyl in heterocyclic compound
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/114—Initiator containing
- Y10S430/126—Halogen compound containing
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/127—Spectral sensitizer containing
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Inorganic Chemistry (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Plural Heterocyclic Compounds (AREA)
- Pyridine Compounds (AREA)
- Nitrogen Condensed Heterocyclic Rings (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
- Vessels, Lead-In Wires, Accessory Apparatuses For Cathode-Ray Tubes (AREA)
- Electroluminescent Light Sources (AREA)
- Luminescent Compositions (AREA)
- Materials For Photolithography (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
- Indole Compounds (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Light Receiving Elements (AREA)
- Heterocyclic Carbon Compounds Containing A Hetero Ring Having Nitrogen And Oxygen As The Only Ring Hetero Atoms (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
GB838321813A GB8321813D0 (en) | 1983-08-12 | 1983-08-12 | Radiation sensitive compounds |
Publications (2)
Publication Number | Publication Date |
---|---|
DK386484D0 DK386484D0 (da) | 1984-08-10 |
DK386484A true DK386484A (da) | 1985-02-13 |
Family
ID=10547248
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DK386484A DK386484A (da) | 1983-08-12 | 1984-08-10 | Straalingsfoelsomme forbindelser til brug ved fremstilling af litografiske trykplader |
Country Status (14)
Country | Link |
---|---|
US (2) | US5141841A (da) |
EP (1) | EP0135348B1 (da) |
AT (1) | ATE40848T1 (da) |
AU (1) | AU584308B2 (da) |
CA (1) | CA1335595C (da) |
DE (1) | DE3476780D1 (da) |
DK (1) | DK386484A (da) |
ES (1) | ES8607834A1 (da) |
FI (1) | FI72823C (da) |
GB (1) | GB8321813D0 (da) |
IE (1) | IE57703B1 (da) |
NO (1) | NO169897C (da) |
NZ (1) | NZ209183A (da) |
ZA (1) | ZA846152B (da) |
Families Citing this family (20)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB8321813D0 (en) * | 1983-08-12 | 1983-09-14 | Vickers Plc | Radiation sensitive compounds |
DE3333450A1 (de) * | 1983-09-16 | 1985-04-11 | Hoechst Ag, 6230 Frankfurt | Trihalogenmethylgruppen enthaltende carbonylmethylenheterocyclen, verfahren zu ihrer herstellung und lichtempfindliches gemisch, das diese verbindungen enthaelt |
DE3613632A1 (de) * | 1986-04-23 | 1987-10-29 | Hoechst Ag | Photopolymerisierbares gemisch und dieses enthaltendes photopolymerisierbares aufzeichnungsmaterial |
DE3807381A1 (de) * | 1988-03-07 | 1989-09-21 | Hoechst Ag | 4,6-bis-trichlormethyl-s-triazin-2-ylgruppen enthaltende heterocyclische verbindungen, verfahren zu ihrer herstellung und lichtempfindliches gemisch, das diese verbindung enthaelt |
US5216158A (en) * | 1988-03-07 | 1993-06-01 | Hoechst Aktiengesellschaft | Oxadiazole compounds containing 4,6-bis-trichloromethyl-S-triazin-2-yl groups, process for their preparation |
DE3912652A1 (de) * | 1989-04-18 | 1990-10-25 | Hoechst Ag | Lichtempfindliche bis-trichlormethyl-s-triazine, verfahren zu ihrer herstellung und diese verbindungen enthaltendes lichtempfindliches gemisch |
DE3930086A1 (de) * | 1989-09-09 | 1991-03-21 | Hoechst Ag | Positiv arbeitendes strahlungsempfindliches gemisch und daraus hergestelltes strahlungsempfindliches aufzeichnungsmaterial |
DE3930087A1 (de) * | 1989-09-09 | 1991-03-14 | Hoechst Ag | Positiv arbeitendes strahlungsempfindliches gemisch und daraus hergestelltes strahlungsempfindliches aufzeichnungsmaterial |
SI21560B (sl) * | 1990-06-07 | 2005-04-30 | Astrazeneca Ab | 3,5-disubstituirani indolni derivati kot "5-HT1-podobni" receptorski agonisti |
US5552256A (en) * | 1994-09-29 | 1996-09-03 | International Business Machines Corporation | Positive resist composition containing naphthoquinonediazide compound having non-metallic atom directly bonded to the naphthalene ring |
US6542907B1 (en) | 2000-03-31 | 2003-04-01 | International Business Machines Corporation | Method and apparatus for decentralized, invertible generation of bounded-length globally unique replica identifiers |
KR100748294B1 (ko) | 2000-07-05 | 2007-08-09 | 아스텔라스세이야쿠 가부시키가이샤 | 프로판-1,3-디온 유도체 |
MXPA06014131A (es) * | 2004-06-04 | 2007-03-07 | Astellas Pharma Inc | Derivado de propano-1,3-diona o su sal. |
PT1864976E (pt) * | 2005-03-31 | 2013-01-04 | Astellas Pharma Inc | Derivado de propano-1,3-diona ou um seu sal |
US8133658B2 (en) * | 2005-07-29 | 2012-03-13 | Anocoil Corporation | Non-chemical development of printing plates |
US8137897B2 (en) * | 2005-07-29 | 2012-03-20 | Anocoil Corporation | Processless development of printing plate |
US8377630B2 (en) * | 2005-07-29 | 2013-02-19 | Anocoil Corporation | On-press plate development without contamination of fountain fluid |
US7816065B2 (en) * | 2005-07-29 | 2010-10-19 | Anocoil Corporation | Imageable printing plate for on-press development |
US8343707B2 (en) | 2005-07-29 | 2013-01-01 | Anocoil Corporation | Lithographic printing plate for in-solidus development on press |
WO2007125892A1 (ja) * | 2006-04-28 | 2007-11-08 | Adeka Corporation | 光学記録材料、カルコン型化合物及び金属錯体 |
Family Cites Families (25)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB466269A (en) * | 1935-08-15 | 1937-05-18 | Eastman Kodak Co | Improvements in the manufacture of intermediates for dyes |
GB498012A (en) * | 1937-06-30 | 1938-12-30 | Ig Farbenindustrie Ag | Process for the manufacture of polymethine dyestuffs |
DE1298414B (de) * | 1967-11-09 | 1969-06-26 | Kalle Ag | Lichtempfindliches Gemisch |
JPS5011286B1 (da) * | 1971-07-15 | 1975-04-30 | ||
US3987037A (en) * | 1971-09-03 | 1976-10-19 | Minnesota Mining And Manufacturing Company | Chromophore-substituted vinyl-halomethyl-s-triazines |
JPS5148516B2 (da) * | 1973-02-07 | 1976-12-21 | ||
US4053316A (en) * | 1973-03-16 | 1977-10-11 | Ici United States Inc. | Photopolymerization of ethylenically-unsaturated organic compounds |
JPS5319205B2 (da) * | 1973-03-27 | 1978-06-20 | ||
JPS5139025A (da) * | 1974-09-27 | 1976-04-01 | Fuji Photo Film Co Ltd | |
US4113592A (en) * | 1975-04-14 | 1978-09-12 | Celanese Corporation | Trihalogenated hydrocarbons as co-photoinitiators |
US4040922A (en) * | 1975-10-06 | 1977-08-09 | Eastman Kodak Company | Photopolymerizable polymeric compositions containing halogen containing heterocyclic compound |
US4062686A (en) * | 1976-04-21 | 1977-12-13 | Eastman Kodak Company | Sensitizers for photocrosslinkable polymers |
JPS5928323B2 (ja) * | 1976-08-12 | 1984-07-12 | 富士写真フイルム株式会社 | 光重合性組成物 |
US4043887A (en) * | 1977-01-17 | 1977-08-23 | Eastman Kodak Company | Benzophenone initiators for the photopolymerization of unsaturated compounds |
US4189323A (en) * | 1977-04-25 | 1980-02-19 | Hoechst Aktiengesellschaft | Radiation-sensitive copying composition |
JPS5928328B2 (ja) * | 1977-11-29 | 1984-07-12 | 富士写真フイルム株式会社 | 光重合性組成物 |
JPS6053300B2 (ja) * | 1978-08-29 | 1985-11-25 | 富士写真フイルム株式会社 | 感光性樹脂組成物 |
CA1153369A (en) * | 1979-12-28 | 1983-09-06 | Mobil Oil Corporation | Halo-alkyl substituted halogenated polynuclear ketone photoinitiators |
JPS5815503A (ja) * | 1981-07-20 | 1983-01-28 | Fuji Photo Film Co Ltd | 光重合性組成物 |
US4454218A (en) * | 1982-09-13 | 1984-06-12 | E. I. Du Pont De Nemours And Company | N-Alkylindolylidene and N-alkylbenzo-thiazolylidene alkanones as sensitizers for photopolymer compositions |
GB8312721D0 (en) * | 1983-05-09 | 1983-06-15 | Vickers Plc | Photoinitiators |
GB8321813D0 (en) * | 1983-08-12 | 1983-09-14 | Vickers Plc | Radiation sensitive compounds |
DE3333450A1 (de) * | 1983-09-16 | 1985-04-11 | Hoechst Ag, 6230 Frankfurt | Trihalogenmethylgruppen enthaltende carbonylmethylenheterocyclen, verfahren zu ihrer herstellung und lichtempfindliches gemisch, das diese verbindungen enthaelt |
DE3337024A1 (de) * | 1983-10-12 | 1985-04-25 | Hoechst Ag, 6230 Frankfurt | Lichtempfindliche, trichlormethylgruppen aufweisende verbindungen, verfahren zu ihrer herstellung und diese verbindungen enthaltendes lichtempfindliches gemisch |
GB8528545D0 (en) * | 1985-11-20 | 1985-12-24 | Minnesota Mining & Mfg | Photothermographic materials |
-
1983
- 1983-08-12 GB GB838321813A patent/GB8321813D0/en active Pending
-
1984
- 1984-08-07 FI FI843106A patent/FI72823C/fi not_active IP Right Cessation
- 1984-08-08 AU AU31706/84A patent/AU584308B2/en not_active Ceased
- 1984-08-08 ZA ZA846152A patent/ZA846152B/xx unknown
- 1984-08-09 DE DE8484305425T patent/DE3476780D1/de not_active Expired
- 1984-08-09 EP EP84305425A patent/EP0135348B1/en not_active Expired
- 1984-08-09 AT AT84305425T patent/ATE40848T1/de not_active IP Right Cessation
- 1984-08-10 NZ NZ209183A patent/NZ209183A/xx unknown
- 1984-08-10 IE IE2070/84A patent/IE57703B1/en not_active IP Right Cessation
- 1984-08-10 CA CA000460817A patent/CA1335595C/en not_active Expired - Fee Related
- 1984-08-10 DK DK386484A patent/DK386484A/da not_active Application Discontinuation
- 1984-08-10 ES ES535053A patent/ES8607834A1/es not_active Expired
- 1984-08-10 NO NO843221A patent/NO169897C/no unknown
-
1989
- 1989-08-17 US US07/395,218 patent/US5141841A/en not_active Expired - Fee Related
-
1992
- 1992-05-22 US US07/886,858 patent/US5519136A/en not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
NZ209183A (en) | 1989-07-27 |
ES535053A0 (es) | 1986-06-01 |
FI72823C (fi) | 1987-07-10 |
DK386484D0 (da) | 1984-08-10 |
US5519136A (en) | 1996-05-21 |
EP0135348A2 (en) | 1985-03-27 |
ATE40848T1 (de) | 1989-03-15 |
NO169897B (no) | 1992-05-11 |
EP0135348A3 (en) | 1986-06-11 |
AU3170684A (en) | 1985-02-14 |
NO843221L (no) | 1985-02-13 |
US5141841A (en) | 1992-08-25 |
IE57703B1 (en) | 1993-03-10 |
AU584308B2 (en) | 1989-05-25 |
DE3476780D1 (en) | 1989-03-23 |
EP0135348B1 (en) | 1989-02-15 |
CA1335595C (en) | 1995-05-16 |
FI843106A0 (fi) | 1984-08-07 |
ZA846152B (en) | 1985-03-27 |
FI843106A (fi) | 1985-02-13 |
FI72823B (fi) | 1987-03-31 |
GB8321813D0 (en) | 1983-09-14 |
NO169897C (no) | 1992-08-19 |
IE842070L (en) | 1985-02-12 |
ES8607834A1 (es) | 1986-06-01 |
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