DK318384A - Vedvarende pnictidkilde og leveringssystem til filmaflejring, isaer ved kemisk dampaflejring - Google Patents
Vedvarende pnictidkilde og leveringssystem til filmaflejring, isaer ved kemisk dampaflejring Download PDFInfo
- Publication number
- DK318384A DK318384A DK318384A DK318384A DK318384A DK 318384 A DK318384 A DK 318384A DK 318384 A DK318384 A DK 318384A DK 318384 A DK318384 A DK 318384A DK 318384 A DK318384 A DK 318384A
- Authority
- DK
- Denmark
- Prior art keywords
- disposal
- pnic
- issues
- updated
- delivery system
- Prior art date
Links
- 238000004326 stimulated echo acquisition mode for imaging Methods 0.000 title 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/0021—Reactive sputtering or evaporation
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/448—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
- C23C16/4481—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials by evaporation using carrier gas in contact with the source material
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Organic Chemistry (AREA)
- Metallurgy (AREA)
- Materials Engineering (AREA)
- Power Engineering (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Chemical & Material Sciences (AREA)
- General Physics & Mathematics (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Manufacturing & Machinery (AREA)
- Chemical Vapour Deposition (AREA)
- Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
- Formation Of Insulating Films (AREA)
- Physical Vapour Deposition (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US58110284A | 1984-02-17 | 1984-02-17 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| DK318384D0 DK318384D0 (da) | 1984-06-28 |
| DK318384A true DK318384A (da) | 1985-08-18 |
Family
ID=24323890
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DK318384A DK318384A (da) | 1984-02-17 | 1984-06-28 | Vedvarende pnictidkilde og leveringssystem til filmaflejring, isaer ved kemisk dampaflejring |
Country Status (5)
| Country | Link |
|---|---|
| EP (1) | EP0152669A3 (fr) |
| JP (1) | JPS60177616A (fr) |
| KR (1) | KR850006256A (fr) |
| AU (1) | AU2993684A (fr) |
| DK (1) | DK318384A (fr) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| FR2727322B1 (fr) * | 1994-11-30 | 1996-12-27 | Kodak Pathe | Procede pour la sublimation d'un materiau solide et dispositif pour la mise en oeuvre du procede |
Family Cites Families (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US2503571A (en) * | 1947-05-02 | 1950-04-11 | Bell Telephone Labor Inc | Apparatus for coating surfaces by thermal vaporization at atmospheric pressure |
| DE1204494B (de) * | 1956-06-09 | 1965-11-04 | Siemens Ag | Verfahren und Vorrichtung zum Aufdampfen von Schichten aus einer bei Aufdampftemperatur nicht bestaendigen, als Halbleiter-Grundstoff verwendbaren Stoechiometrisch genaubestimmten Mehrstoffverbindung |
| FR1535167A (fr) * | 1967-08-24 | 1968-08-02 | Schloemann Ag | Procédé et dispositif de dégazage en continu de matériaux métalliques de revêtement |
| US3674549A (en) * | 1968-02-28 | 1972-07-04 | Pioneer Electronic Corp | Manufacturing process for an insb thin film semiconductor element |
| FR2403646A1 (fr) * | 1977-09-16 | 1979-04-13 | Anvar | Procede de realisation d'un depot de compose semi-conducteur d'elements iii et v |
| JPS5799723A (en) * | 1980-12-12 | 1982-06-21 | Nippon Telegr & Teleph Corp <Ntt> | Forming method for compound semiconductor thin film |
| AU553091B2 (en) * | 1981-12-30 | 1986-07-03 | Stauffer Chemical Company | High phosphorus pholyphosphides |
| JPS58126973A (ja) * | 1982-01-22 | 1983-07-28 | Hitachi Ltd | 薄膜形成用ソ−ス供給装置 |
-
1984
- 1984-06-27 AU AU29936/84A patent/AU2993684A/en not_active Abandoned
- 1984-06-28 EP EP84304413A patent/EP0152669A3/fr not_active Withdrawn
- 1984-06-28 DK DK318384A patent/DK318384A/da not_active Application Discontinuation
- 1984-06-29 KR KR1019840003744A patent/KR850006256A/ko not_active IP Right Cessation
- 1984-06-29 JP JP59133482A patent/JPS60177616A/ja active Pending
Also Published As
| Publication number | Publication date |
|---|---|
| KR850006256A (ko) | 1985-10-02 |
| DK318384D0 (da) | 1984-06-28 |
| EP0152669A3 (fr) | 1986-06-11 |
| EP0152669A2 (fr) | 1985-08-28 |
| JPS60177616A (ja) | 1985-09-11 |
| AU2993684A (en) | 1985-08-22 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| AHB | Application shelved due to non-payment |