FR2403646A1 - Procede de realisation d'un depot de compose semi-conducteur d'elements iii et v - Google Patents
Procede de realisation d'un depot de compose semi-conducteur d'elements iii et vInfo
- Publication number
- FR2403646A1 FR2403646A1 FR7728237A FR7728237A FR2403646A1 FR 2403646 A1 FR2403646 A1 FR 2403646A1 FR 7728237 A FR7728237 A FR 7728237A FR 7728237 A FR7728237 A FR 7728237A FR 2403646 A1 FR2403646 A1 FR 2403646A1
- Authority
- FR
- France
- Prior art keywords
- iii
- semiconductor compound
- deposit
- making
- elements
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 150000001875 compounds Chemical class 0.000 title abstract 3
- 239000004065 semiconductor Substances 0.000 title abstract 3
- 238000000034 method Methods 0.000 title abstract 2
- 239000000758 substrate Substances 0.000 abstract 2
- 238000005229 chemical vapour deposition Methods 0.000 abstract 1
- 229910052739 hydrogen Inorganic materials 0.000 abstract 1
- 239000001257 hydrogen Substances 0.000 abstract 1
- 125000004435 hydrogen atom Chemical class [H]* 0.000 abstract 1
- 238000004519 manufacturing process Methods 0.000 abstract 1
- 230000000087 stabilizing effect Effects 0.000 abstract 1
- 239000000126 substance Substances 0.000 abstract 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B25/00—Single-crystal growth by chemical reaction of reactive gases, e.g. chemical vapour-deposition growth
- C30B25/02—Epitaxial-layer growth
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
- C23C16/301—AIII BV compounds, where A is Al, Ga, In or Tl and B is N, P, As, Sb or Bi
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B29/00—Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
- C30B29/10—Inorganic compounds or compositions
- C30B29/40—AIIIBV compounds wherein A is B, Al, Ga, In or Tl and B is N, P, As, Sb or Bi
Abstract
L'invention concerne un procédé de réalisation par dépôt chimique en phase vapeur, d'une couche d'un composé semi-conducteur d'éléments M(III) et M'(V) des groupes III et V sur un substrat. Le procédé consiste à décomposer en présence du substrat, un composé de coordination : renfermant, d'une part, les éléments M(III) et M'(V) liés par une liaison donneur/accepteur, d'autre part, des radicaux chimiques R1 , R2 , R3 , R4 , R5 , R 6 , autres qu'un hydrogène, au moins un des radicaux R1 , R2 et/ou R3 fixé à l'élément M(III) étant un donneur d'électrons stabilisant la liaison donneur/accepteur. L'invention est tout particulièrement applicable pour réaliser des dispositifs électroniques semi-conducteurs.
Priority Applications (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FR7728237A FR2403646A1 (fr) | 1977-09-16 | 1977-09-16 | Procede de realisation d'un depot de compose semi-conducteur d'elements iii et v |
GB7835375A GB2007632B (en) | 1977-09-16 | 1978-09-05 | Process for depositing a semi-conductor layer on a substrate and a semi-conductor layered substrate produced by the process |
US05/941,728 US4250205A (en) | 1977-09-16 | 1978-09-12 | Process for depositing a III-V semi-conductor layer on a substrate |
JP11322778A JPS5453963A (en) | 1977-09-16 | 1978-09-14 | Method of forming third and fifth group element semiconductor compound evaporating layer |
DE19782840331 DE2840331A1 (de) | 1977-09-16 | 1978-09-15 | Verfahren zum aufbringen einer halbleitenden verbindung von elementen der gruppen iii und v des periodensystems |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FR7728237A FR2403646A1 (fr) | 1977-09-16 | 1977-09-16 | Procede de realisation d'un depot de compose semi-conducteur d'elements iii et v |
Publications (2)
Publication Number | Publication Date |
---|---|
FR2403646A1 true FR2403646A1 (fr) | 1979-04-13 |
FR2403646B1 FR2403646B1 (fr) | 1980-08-01 |
Family
ID=9195544
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
FR7728237A Granted FR2403646A1 (fr) | 1977-09-16 | 1977-09-16 | Procede de realisation d'un depot de compose semi-conducteur d'elements iii et v |
Country Status (5)
Country | Link |
---|---|
US (1) | US4250205A (fr) |
JP (1) | JPS5453963A (fr) |
DE (1) | DE2840331A1 (fr) |
FR (1) | FR2403646A1 (fr) |
GB (1) | GB2007632B (fr) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0052979A1 (fr) * | 1980-11-18 | 1982-06-02 | BRITISH TELECOMMUNICATIONS public limited company | Production de composés du groupe IIIB-VB |
WO1986003228A1 (fr) * | 1984-11-20 | 1986-06-05 | Hughes Aircraft Company | Procede de depot d'arseniure de gallium a partir de complexes de gallium-arsenic en phase vapeur |
Families Citing this family (23)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE3379059D1 (en) * | 1982-10-19 | 1989-03-02 | Secr Defence Brit | Organometallic chemical vapour deposition of films |
EP0117051B2 (fr) * | 1983-01-19 | 1995-02-08 | BRITISH TELECOMMUNICATIONS public limited company | Croissance de semi-conducteurs |
DK318184A (da) * | 1984-02-17 | 1985-08-18 | Stauffer Chemical Co | Hoejvakuumaflejringsprocesser under anvendelse af et kontinuerligt pnictidleveringssystem |
AU2993684A (en) * | 1984-02-17 | 1985-08-22 | Stauffer Chemical Company | Vapour deposition of pnictides |
US4588451A (en) * | 1984-04-27 | 1986-05-13 | Advanced Energy Fund Limited Partnership | Metal organic chemical vapor deposition of 111-v compounds on silicon |
US4524090A (en) * | 1984-04-30 | 1985-06-18 | The United States Of America As Represented By The Secretary Of The Navy | Deposition of compounds from multi-component organo-metals |
JPS61275191A (ja) * | 1985-05-29 | 1986-12-05 | Furukawa Electric Co Ltd:The | GaAs薄膜の気相成長法 |
JPS6291494A (ja) * | 1985-10-16 | 1987-04-25 | Res Dev Corp Of Japan | 化合物半導体単結晶成長方法及び装置 |
JPH0645886B2 (ja) * | 1985-12-16 | 1994-06-15 | キヤノン株式会社 | 堆積膜形成法 |
JP2566914B2 (ja) * | 1985-12-28 | 1996-12-25 | キヤノン株式会社 | 薄膜半導体素子及びその形成法 |
US4717597A (en) * | 1986-03-21 | 1988-01-05 | Motorola Inc. | Method for providing impurities into a carrier gas line |
US5250135A (en) * | 1986-05-21 | 1993-10-05 | British Telecommunications Public Limited Company | Reagent source |
US4946543A (en) * | 1986-06-02 | 1990-08-07 | Kalisher Murray H | Method and apparatus for growing films on a substrate |
US4740606A (en) * | 1986-07-01 | 1988-04-26 | Morton Thiokol, Inc. | Gallium hydride/trialkylamine adducts, and their use in deposition of III-V compound films |
DE3631469A1 (de) * | 1986-09-16 | 1988-03-17 | Merck Patent Gmbh | Metallorganische verbindungen |
US4814203A (en) * | 1986-09-29 | 1989-03-21 | Ethyl Corporation | Vapor deposition of arsenic |
US4833103A (en) * | 1987-06-16 | 1989-05-23 | Eastman Kodak Company | Process for depositing a III-V compound layer on a substrate |
US4798701A (en) * | 1987-07-13 | 1989-01-17 | International Business Machines Corporation | Method of synthesizing amorphous group IIIA-group VA compounds |
US4792467A (en) * | 1987-08-17 | 1988-12-20 | Morton Thiokol, Inc. | Method for vapor phase deposition of gallium nitride film |
US4975299A (en) * | 1989-11-02 | 1990-12-04 | Eastman Kodak Company | Vapor deposition process for depositing an organo-metallic compound layer on a substrate |
US5505928A (en) * | 1991-11-22 | 1996-04-09 | The Regents Of University Of California | Preparation of III-V semiconductor nanocrystals |
US6607829B1 (en) * | 1997-11-13 | 2003-08-19 | Massachusetts Institute Of Technology | Tellurium-containing nanocrystalline materials |
US6207392B1 (en) | 1997-11-25 | 2001-03-27 | The Regents Of The University Of California | Semiconductor nanocrystal probes for biological applications and process for making and using such probes |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3922475A (en) * | 1970-06-22 | 1975-11-25 | Rockwell International Corp | Process for producing nitride films |
SU570239A1 (ru) * | 1976-02-12 | 1979-02-10 | Институт химии АН СССР | "Способ получени кристаллических соединений а1у ву14 |
US4147571A (en) * | 1977-07-11 | 1979-04-03 | Hewlett-Packard Company | Method for vapor epitaxial deposition of III/V materials utilizing organometallic compounds and a halogen or halide in a hot wall system |
-
1977
- 1977-09-16 FR FR7728237A patent/FR2403646A1/fr active Granted
-
1978
- 1978-09-05 GB GB7835375A patent/GB2007632B/en not_active Expired
- 1978-09-12 US US05/941,728 patent/US4250205A/en not_active Expired - Lifetime
- 1978-09-14 JP JP11322778A patent/JPS5453963A/ja active Pending
- 1978-09-15 DE DE19782840331 patent/DE2840331A1/de not_active Withdrawn
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0052979A1 (fr) * | 1980-11-18 | 1982-06-02 | BRITISH TELECOMMUNICATIONS public limited company | Production de composés du groupe IIIB-VB |
WO1986003228A1 (fr) * | 1984-11-20 | 1986-06-05 | Hughes Aircraft Company | Procede de depot d'arseniure de gallium a partir de complexes de gallium-arsenic en phase vapeur |
Also Published As
Publication number | Publication date |
---|---|
GB2007632A (en) | 1979-05-23 |
US4250205A (en) | 1981-02-10 |
GB2007632B (en) | 1982-05-26 |
JPS5453963A (en) | 1979-04-27 |
FR2403646B1 (fr) | 1980-08-01 |
DE2840331A1 (de) | 1979-04-05 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
FR2403646A1 (fr) | Procede de realisation d'un depot de compose semi-conducteur d'elements iii et v | |
FR2371524A1 (fr) | Procede de depot d'une couche mince par decomposition d'un gaz dans un plasma | |
ATE75167T1 (de) | Verfahren und vorrichtung fuer gasstrahlniederschlag von leitfaehigen und dielektrischen duennen festfilmen und so hergestellte erzeugnisse. | |
ATE119215T1 (de) | Chemische abscheidemethoden unter verwendung überkritischer lösungen. | |
ES8702870A1 (es) | Un metodo y un aparato para revestir un substrato de vidrio. | |
KR930006038A (ko) | 구리 필름을 화학 증착시키는 유기 금속 구리 착물 | |
KR970706418A (ko) | 화학적 증착법에 유용한 탄탈륨 및 니오븀 시약, 및 상기 시약을 이용하여 피막을 침착하는 방법(tantalum and niobium reagents useful in chemigal vapor deposition poocesses, and process for depositing coatings using the same) | |
KR830006816A (ko) | P-형 반도체 합금 제조방법 | |
FR2571543B1 (fr) | Suscepteur a utiliser pour le depot d'une couche sur une plaquette de silicium par un procede de depot en phase vapeur | |
KR860002589A (ko) | 전이 금속 질화물 박막 기착법 | |
KR920701514A (ko) | 가스상으로부터 박층 필름을 증착시키기 위한 유기금속 화합물의 용도 | |
AT400041B (de) | Hartmetall-substrat mit diamantschicht hoher haftfestigkeit | |
FR2348982A1 (fr) | Procede de depot chimique d'un metal a la surface d'un substrat dielectrique | |
Maury | Trends in precursor selection for MOCVD | |
ES8401680A1 (es) | "un metodo de fabricacion de una pila solar". | |
KR900702075A (ko) | 고순도 금 박막의 광화학적 증착 방법 | |
KR890003983A (ko) | 종래의 cvd 반응로를 사용한 스트레인층 초격자의 연속 화학 증착 성장 방법 | |
GB1440357A (en) | Method for making amorphous semiconductor films | |
PT95436A (pt) | Processo de producao de uma pelicula depositada e de producao de um dispositivo semicondutor | |
ATE67530T1 (de) | Metallorganisches gasphasen-epitaxiewachstum von ii-vi-halbleitermaterialien. | |
ES466902A1 (es) | Un metodo para formar una pelicula de fosforo-nitrogeno-oxi-geno. | |
NO874718D0 (no) | Forbedret binding av et halogenkarbon til et substrat. | |
EP0183047A3 (fr) | Procédé de dépôt photochimique de vapeurs de polymères à liaisons hétéro | |
KR850006257A (ko) | 연속 프닉타이드 송출장치, 특히 증착을 사용하는 진공침적방법 | |
SU576352A1 (ru) | Парогазова среда дл нанесени окисных покрытий |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
ST | Notification of lapse |