DK2319955T3 - Fjernforbrændingsaflejring-brænder og/eller relaterede fremgangsmåder - Google Patents

Fjernforbrændingsaflejring-brænder og/eller relaterede fremgangsmåder Download PDF

Info

Publication number
DK2319955T3
DK2319955T3 DK10190212.0T DK10190212T DK2319955T3 DK 2319955 T3 DK2319955 T3 DK 2319955T3 DK 10190212 T DK10190212 T DK 10190212T DK 2319955 T3 DK2319955 T3 DK 2319955T3
Authority
DK
Denmark
Prior art keywords
burner
substrate
distribution device
coating
precursor
Prior art date
Application number
DK10190212.0T
Other languages
English (en)
Inventor
David D Mclean
Original Assignee
Guardian Glass Llc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Guardian Glass Llc filed Critical Guardian Glass Llc
Application granted granted Critical
Publication of DK2319955T3 publication Critical patent/DK2319955T3/da

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/453—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating passing the reaction gases through burners or torches, e.g. atmospheric pressure CVD
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/001—General methods for coating; Devices therefor
    • C03C17/002—General methods for coating; Devices therefor for flat glass, e.g. float glass
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/22—Surface treatment of glass, not in the form of fibres or filaments, by coating with other inorganic material
    • C03C17/23—Oxides
    • C03C17/245—Oxides by deposition from the vapour phase
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/40—Oxides
    • C23C16/401—Oxides containing silicon
    • C23C16/402—Silicon dioxide
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C23C16/45502—Flow conditions in reaction chamber
    • C23C16/45504—Laminar flow
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F23—COMBUSTION APPARATUS; COMBUSTION PROCESSES
    • F23D—BURNERS
    • F23D14/00—Burners for combustion of a gas, e.g. of a gas stored under pressure as a liquid
    • F23D14/12—Radiant burners
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F23—COMBUSTION APPARATUS; COMBUSTION PROCESSES
    • F23D—BURNERS
    • F23D14/00—Burners for combustion of a gas, e.g. of a gas stored under pressure as a liquid
    • F23D14/12—Radiant burners
    • F23D14/125—Radiant burners heating a wall surface to incandescence
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F23—COMBUSTION APPARATUS; COMBUSTION PROCESSES
    • F23D—BURNERS
    • F23D14/00—Burners for combustion of a gas, e.g. of a gas stored under pressure as a liquid
    • F23D14/12—Radiant burners
    • F23D14/14—Radiant burners using screens or perforated plates
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F23—COMBUSTION APPARATUS; COMBUSTION PROCESSES
    • F23D—BURNERS
    • F23D14/00—Burners for combustion of a gas, e.g. of a gas stored under pressure as a liquid
    • F23D14/46—Details, e.g. noise reduction means
    • F23D14/48—Nozzles
    • F23D14/56—Nozzles for spreading the flame over an area, e.g. for desurfacing of solid material, for surface hardening, or for heating workpieces
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F23—COMBUSTION APPARATUS; COMBUSTION PROCESSES
    • F23D—BURNERS
    • F23D91/00—Burners specially adapted for specific applications, not otherwise provided for
    • F23D91/02—Burners specially adapted for specific applications, not otherwise provided for for use in particular heating operations
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00—Coatings on glass
    • C03C2217/70—Properties of coatings
    • C03C2217/73—Anti-reflective coatings with specific characteristics
    • C03C2217/732—Anti-reflective coatings with specific characteristics made of a single layer
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2218/00—Methods for coating glass
    • C03C2218/10—Deposition methods
    • C03C2218/15—Deposition methods from the vapour phase

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Organic Chemistry (AREA)
  • Combustion & Propulsion (AREA)
  • General Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Physics & Mathematics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Plasma & Fusion (AREA)
  • Inorganic Chemistry (AREA)
  • Fluid Mechanics (AREA)
  • Surface Treatment Of Glass (AREA)

Claims (15)

  1. FJERNFORBRÆNDINGSAFLEJRING-BRÆNDER OG/ELLER RELATEREDE FREMGANGSMÅDER PATENTKRAV
    1. Fjemforbrændingsaflejringssystem (600, 700) til anvendelse i forbrændingsaflejring, hvor der aflejres en coating (220) på et substrat (22), hvilket system omfatter: en infrarød (IR) brænder, der er konfigureret til at generere udstrålende energi (18') i et område mellem brænderen og substratet (22); og en fordelingsanordning (602), hvor fordelingsanordningen er anbragt uden for brænderen, konfigureret til at tilvejebringe en strøm (604), der omfatter en fordampet prækursor og en bæregas fra en position, der er væk fra den udstrålende energi, der er genereret af IR-brænderen, hvilken fordelingsanordning (602) endvidere er konfigureret til at foranledige strømmen (604) til at strømme parallelt med substratet (22) mellem substratet (22) og IR-brænderen, hvor, i drift, strømmen (604) er laminær, når den forlader fordelingsanordningen (602), og hvor, i drift, den udstrålende energi (18') er tilstrækkelig til at foranledige prækursoren i strømmen (604) til at blive forbrændt og opvarme substratet (22) for at gøre det muligt for en del af den forbrændte prækursor at danne coatingen (220), direkte eller indirekte, på substratet (22).
  2. 2. System ifølge krav 1, hvor fordelingsanordningen (602) er en luftkniv.
  3. 3. System ifølge krav 1, hvor en strøm af strømmen (604) er ensartet ved reaktionszonen.
  4. 4. System ifølge krav 1, hvor bæregassen er en inert gas, eller hvor bæregassen omfatter oxygen.
  5. 5. System ifølge krav 1, der endvidere omfatter bafler (702a; 702b), der mindst delvist omgiver reaktionszonen.
  6. 6. System ifølge krav 1, hvor fordelingsanordningen (602) er konfigureret til at oscillere for at reducere uensartetheder og/eller striber i coatingen.
  7. 7. System ifølge krav 1, hvor fordelingsanordningen (602) omfatter et samlerør med en spalteudgang, hvorigennem strømmen (604) skal passere.
  8. 8. System ifølge krav 1, der endvidere omfatter en flerhed af infrarøde (IR) brændere, hvilken flerhed af IR-brændere danner en enkelt udstrålende energifront.
  9. 9. Brænder ifølge krav 1, hvor fordelingsanordningen (602) er tilvejebragt på opstrømssiden af IR-brænderen, eller hvor fordelingsanordningen (602) er tilvejebragt på nedstrømssiden af IR-brænderen, eller hvor fordelingsanordningen (602) er tilvejebragt mellem tilstødende IR-brændere.
  10. 10. Fremgangsmåde til dannelse af en coating på et glassubstrat (22) ved anvendelse af forbrændingsaflejring, hvilken fremgangsmåde omfatter: tilvejebringelse af et glassubstrat (22) med mindst én overflade, der skal coates; tilvejebringelse af mindst én infrarød (IR) brænder; tilvejebringelse af en laminær strøm af en gasholdig strøm (604) via en fordelingsanordning (602), hvor fordelingsanordningen (602) er anbragt uden for brænderen, omfattende en prækursor og en bæregas, hvor strømmen (604) mindst initialt tilvejebringes væk fra IR-brænderen; foranledning af strømmen (604) til at passere mellem substratet (22) og den mindst ene IR-brænder parallelt med substratet (22); forbrænding, ved anvendelse af den mindst ene IR-brænder, af mindst en del af prækursoren i strømmen (604) for et danne et forbrændt materiale, hvor det forbrændte materiale omfatter ikke-fordampet materiale; og tilvejebringelse af glassubstratet (22) i et område, således at glassubstratet (22) opvarmes tilstrækkeligt til at gøre det muligt for det forbrændte materiale at danne coatingen, direkte eller indirekte, på glassubstratet (22).
  11. 11. Fremgangsmåde ifølge krav 10, hvor strømmen af den gasholdige strøm (604) er ensartet under forbrændingen.
  12. 12. Fremgangsmåde ifølge krav 10, hvor strømmen (604) tilvejebringes via en fordelingsanordning (602), der omfatter et samlerør med en spalteudgang, hvorigennem strømmen (604) skal passere.
  13. 13. Fremgangsmåde ifølge krav 10, hvor strømmen tilvejebringes via en luftkniv.
  14. 14. Fremgangsmåde ifølge krav 12, der endvidere omfatter at foranledige fordelingsanordningen til at oscillere for at reducere uensartetheder og/eller striber i coatingen.
  15. 15. Fremgangsmåde ifølge krav 10, der endvidere omfatter tilvejebringelse af brændstof ved en luftstrømningshastighed på ca. 75-125 standardliter pr. minut.
DK10190212.0T 2009-11-10 2010-11-05 Fjernforbrændingsaflejring-brænder og/eller relaterede fremgangsmåder DK2319955T3 (da)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US12/591,168 US8563097B2 (en) 2007-12-17 2009-11-10 Remote combustion deposition burner and/or related methods

Publications (1)

Publication Number Publication Date
DK2319955T3 true DK2319955T3 (da) 2018-07-16

Family

ID=43640461

Family Applications (1)

Application Number Title Priority Date Filing Date
DK10190212.0T DK2319955T3 (da) 2009-11-10 2010-11-05 Fjernforbrændingsaflejring-brænder og/eller relaterede fremgangsmåder

Country Status (6)

Country Link
US (1) US8563097B2 (da)
EP (1) EP2319955B1 (da)
DK (1) DK2319955T3 (da)
ES (1) ES2675056T3 (da)
PL (1) PL2319955T3 (da)
TR (1) TR201810802T4 (da)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8231730B2 (en) * 2008-06-09 2012-07-31 Guardian Industries Corp. Combustion deposition burner and/or related methods
US10745804B2 (en) * 2017-01-31 2020-08-18 Ofs Fitel, Llc Parallel slit torch for making optical fiber preform

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE78517C (de) F. GRAF, Aachen Bunsenbrenner mit Wasserkühlung
US78407A (en) 1868-05-26 Improvement in wool-boxes
US5101558A (en) * 1988-12-08 1992-04-07 The Frymaster Corporation Method for making a flashback resistant infrared gas burner apparatus
JPH06221525A (ja) 1993-01-27 1994-08-09 Noritz Corp 燃焼装置
ATE233327T1 (de) * 1993-03-24 2003-03-15 Georgia Tech Res Inst Verfahren und vorrichtung zur verbrennungs cvd von filmen und beschichtungen
US5858465A (en) * 1993-03-24 1999-01-12 Georgia Tech Research Corporation Combustion chemical vapor deposition of phosphate films and coatings
JPH0854528A (ja) 1994-08-10 1996-02-27 Furukawa Electric Co Ltd:The 光導波路の製造方法
JP3268973B2 (ja) 1996-04-19 2002-03-25 株式会社ノリタケカンパニーリミテド ガラス成形体の絵付焼成法及びそのための装置
US6193911B1 (en) * 1998-04-29 2001-02-27 Morton International Incorporated Precursor solution compositions for electronic devices using CCVD
KR100308795B1 (ko) 1999-01-27 2001-09-26 최만수 화염과 레이저를 이용한 미세입자 제조방법 및 미세입자 증착방법
AU2002220726A1 (en) * 2001-11-26 2003-06-10 Pirelli & C. S.P.A. Burner for a vapour deposition process
US20060127599A1 (en) * 2002-02-12 2006-06-15 Wojak Gregory J Process and apparatus for preparing a diamond substance
ATE448178T1 (de) 2002-12-20 2009-11-15 Prysmian Spa Brenner für die chemische gasphasenabscheidung von glas
DE102004019575A1 (de) 2004-04-20 2005-11-24 Innovent E.V. Technologieentwicklung Verfahren zur Herstellung von transmissionsverbessernden und/oder reflexionsmindernden optischen Schichten
US8440256B2 (en) * 2007-12-17 2013-05-14 Guardian Industries Corp. Combustion deposition of metal oxide coatings deposited via infrared burners

Also Published As

Publication number Publication date
EP2319955B1 (en) 2018-05-02
US8563097B2 (en) 2013-10-22
EP2319955A1 (en) 2011-05-11
US20100129561A1 (en) 2010-05-27
TR201810802T4 (tr) 2018-08-27
PL2319955T3 (pl) 2018-10-31
ES2675056T3 (es) 2018-07-06

Similar Documents

Publication Publication Date Title
US8231730B2 (en) Combustion deposition burner and/or related methods
JP6110004B2 (ja) 薄膜コーティングを被覆するための装置およびこのような装置を用いた被覆方法
CN102010138B (zh) 用于形成气溶胶的装置以及用于涂覆玻璃的方法和设备
EP2473651B1 (en) Process and apparatus for controlling coating deposition
US8440256B2 (en) Combustion deposition of metal oxide coatings deposited via infrared burners
JP5662561B2 (ja) 基材上にニオブドープチタニアフィルムを蒸着させる方法およびこれにより作製された被覆基材
US8795773B2 (en) Nano-particle loaded metal oxide matrix coatings deposited via combustion deposition
DK2319955T3 (da) Fjernforbrændingsaflejring-brænder og/eller relaterede fremgangsmåder
EP2268849B1 (en) In situ nano-particle matrix loading of metal oxide coatings via combustion deposition
KR20100035158A (ko) 증착 방법
JP5730215B2 (ja) ガラスをコーティングする方法及び装置
US9637820B2 (en) Flame guard and exhaust system for large area combustion deposition line, and associated methods
US20110159199A1 (en) Large area combustion deposition line, and associated methods
WO2011161311A1 (en) Coating apparatus
EP2103574B2 (en) Combustion deposition using aqueous precursor solutions to deposit titanium dioxide coatings