PL2319955T3 - Palnik do zdalnego osadzania ze spalania i/lub powiązane metody - Google Patents

Palnik do zdalnego osadzania ze spalania i/lub powiązane metody

Info

Publication number
PL2319955T3
PL2319955T3 PL10190212T PL10190212T PL2319955T3 PL 2319955 T3 PL2319955 T3 PL 2319955T3 PL 10190212 T PL10190212 T PL 10190212T PL 10190212 T PL10190212 T PL 10190212T PL 2319955 T3 PL2319955 T3 PL 2319955T3
Authority
PL
Poland
Prior art keywords
related methods
deposition burner
combustion deposition
remote combustion
remote
Prior art date
Application number
PL10190212T
Other languages
English (en)
Inventor
David D. Mclean
Original Assignee
Guardian Glass, LLC
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Guardian Glass, LLC filed Critical Guardian Glass, LLC
Publication of PL2319955T3 publication Critical patent/PL2319955T3/pl

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/453—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating passing the reaction gases through burners or torches, e.g. atmospheric pressure CVD
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/001—General methods for coating; Devices therefor
    • C03C17/002—General methods for coating; Devices therefor for flat glass, e.g. float glass
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/22—Surface treatment of glass, not in the form of fibres or filaments, by coating with other inorganic material
    • C03C17/23—Oxides
    • C03C17/245—Oxides by deposition from the vapour phase
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/40—Oxides
    • C23C16/401—Oxides containing silicon
    • C23C16/402—Silicon dioxide
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C23C16/45502—Flow conditions in reaction chamber
    • C23C16/45504—Laminar flow
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F23—COMBUSTION APPARATUS; COMBUSTION PROCESSES
    • F23D—BURNERS
    • F23D14/00—Burners for combustion of a gas, e.g. of a gas stored under pressure as a liquid
    • F23D14/12—Radiant burners
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F23—COMBUSTION APPARATUS; COMBUSTION PROCESSES
    • F23D—BURNERS
    • F23D14/00—Burners for combustion of a gas, e.g. of a gas stored under pressure as a liquid
    • F23D14/12—Radiant burners
    • F23D14/125—Radiant burners heating a wall surface to incandescence
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F23—COMBUSTION APPARATUS; COMBUSTION PROCESSES
    • F23D—BURNERS
    • F23D14/00—Burners for combustion of a gas, e.g. of a gas stored under pressure as a liquid
    • F23D14/12—Radiant burners
    • F23D14/14—Radiant burners using screens or perforated plates
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F23—COMBUSTION APPARATUS; COMBUSTION PROCESSES
    • F23D—BURNERS
    • F23D14/00—Burners for combustion of a gas, e.g. of a gas stored under pressure as a liquid
    • F23D14/46—Details, e.g. noise reduction means
    • F23D14/48—Nozzles
    • F23D14/56—Nozzles for spreading the flame over an area, e.g. for desurfacing of solid material, for surface hardening, or for heating workpieces
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F23—COMBUSTION APPARATUS; COMBUSTION PROCESSES
    • F23D—BURNERS
    • F23D91/00—Burners specially adapted for specific applications, not otherwise provided for
    • F23D91/02—Burners specially adapted for specific applications, not otherwise provided for for use in particular heating operations
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00—Coatings on glass
    • C03C2217/70—Properties of coatings
    • C03C2217/73—Anti-reflective coatings with specific characteristics
    • C03C2217/732—Anti-reflective coatings with specific characteristics made of a single layer
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2218/00—Methods for coating glass
    • C03C2218/10—Deposition methods
    • C03C2218/15—Deposition methods from the vapour phase

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • General Engineering & Computer Science (AREA)
  • General Chemical & Material Sciences (AREA)
  • Combustion & Propulsion (AREA)
  • Metallurgy (AREA)
  • Physics & Mathematics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Plasma & Fusion (AREA)
  • Inorganic Chemistry (AREA)
  • Fluid Mechanics (AREA)
  • Surface Treatment Of Glass (AREA)
PL10190212T 2009-11-10 2010-11-05 Palnik do zdalnego osadzania ze spalania i/lub powiązane metody PL2319955T3 (pl)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US12/591,168 US8563097B2 (en) 2007-12-17 2009-11-10 Remote combustion deposition burner and/or related methods
EP10190212.0A EP2319955B1 (en) 2009-11-10 2010-11-05 Remote combustion deposition burner and/or related methods

Publications (1)

Publication Number Publication Date
PL2319955T3 true PL2319955T3 (pl) 2018-10-31

Family

ID=43640461

Family Applications (1)

Application Number Title Priority Date Filing Date
PL10190212T PL2319955T3 (pl) 2009-11-10 2010-11-05 Palnik do zdalnego osadzania ze spalania i/lub powiązane metody

Country Status (6)

Country Link
US (1) US8563097B2 (pl)
EP (1) EP2319955B1 (pl)
DK (1) DK2319955T3 (pl)
ES (1) ES2675056T3 (pl)
PL (1) PL2319955T3 (pl)
TR (1) TR201810802T4 (pl)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8231730B2 (en) * 2008-06-09 2012-07-31 Guardian Industries Corp. Combustion deposition burner and/or related methods
US10745804B2 (en) * 2017-01-31 2020-08-18 Ofs Fitel, Llc Parallel slit torch for making optical fiber preform

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE78517C (de) F. GRAF, Aachen Bunsenbrenner mit Wasserkühlung
US78407A (en) 1868-05-26 Improvement in wool-boxes
US5101558A (en) 1988-12-08 1992-04-07 The Frymaster Corporation Method for making a flashback resistant infrared gas burner apparatus
JPH06221525A (ja) 1993-01-27 1994-08-09 Noritz Corp 燃焼装置
ES2193156T3 (es) * 1993-03-24 2003-11-01 Georgia Tech Res Inst Procedimiento y aparato para la preparacion de capas y recubrimientos por medio de deposicion quimica en fase de vapor asistida por combustion.
US5858465A (en) 1993-03-24 1999-01-12 Georgia Tech Research Corporation Combustion chemical vapor deposition of phosphate films and coatings
JPH0854528A (ja) 1994-08-10 1996-02-27 Furukawa Electric Co Ltd:The 光導波路の製造方法
JP3268973B2 (ja) 1996-04-19 2002-03-25 株式会社ノリタケカンパニーリミテド ガラス成形体の絵付焼成法及びそのための装置
US6193911B1 (en) 1998-04-29 2001-02-27 Morton International Incorporated Precursor solution compositions for electronic devices using CCVD
KR100308795B1 (ko) 1999-01-27 2001-09-26 최만수 화염과 레이저를 이용한 미세입자 제조방법 및 미세입자 증착방법
ATE497937T1 (de) 2001-11-26 2011-02-15 Prysmian Spa Brenner für ein dampfabscheidungsverfahren
US20060127599A1 (en) 2002-02-12 2006-06-15 Wojak Gregory J Process and apparatus for preparing a diamond substance
AU2002363890A1 (en) 2002-12-20 2004-07-14 Pirelli And C. S.P.A. Burner for chemical vapour deposition of glass
DE102004019575A1 (de) 2004-04-20 2005-11-24 Innovent E.V. Technologieentwicklung Verfahren zur Herstellung von transmissionsverbessernden und/oder reflexionsmindernden optischen Schichten
US8440256B2 (en) 2007-12-17 2013-05-14 Guardian Industries Corp. Combustion deposition of metal oxide coatings deposited via infrared burners

Also Published As

Publication number Publication date
ES2675056T3 (es) 2018-07-06
EP2319955A1 (en) 2011-05-11
US20100129561A1 (en) 2010-05-27
EP2319955B1 (en) 2018-05-02
TR201810802T4 (tr) 2018-08-27
US8563097B2 (en) 2013-10-22
DK2319955T3 (en) 2018-07-16

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