DK2137336T3 - Fremgangsmåde til fotonablation af et mål og en belægningsfremgangsmåde - Google Patents

Fremgangsmåde til fotonablation af et mål og en belægningsfremgangsmåde

Info

Publication number
DK2137336T3
DK2137336T3 DK08718536.9T DK08718536T DK2137336T3 DK 2137336 T3 DK2137336 T3 DK 2137336T3 DK 08718536 T DK08718536 T DK 08718536T DK 2137336 T3 DK2137336 T3 DK 2137336T3
Authority
DK
Denmark
Prior art keywords
target
coating method
photon ablation
ablation
photon
Prior art date
Application number
DK08718536.9T
Other languages
English (en)
Inventor
Jari Ruuttu
Vesa Myllymäki
Reijo Lappalainen
Lasse Pulli
Juha Mäkitalo
Sampo Ylätalo
Original Assignee
Picodeon Ltd Oy
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from FI20070158A external-priority patent/FI20070158A7/fi
Application filed by Picodeon Ltd Oy filed Critical Picodeon Ltd Oy
Application granted granted Critical
Publication of DK2137336T3 publication Critical patent/DK2137336T3/da

Links

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00Working by laser beam, e.g. welding, cutting or boring
    • B23K26/08Devices involving relative movement between laser beam and workpiece
    • B23K26/082Scanning systems, i.e. devices involving movement of the laser beam relative to the laser head
    • B23K26/0821Scanning systems, i.e. devices involving movement of the laser beam relative to the laser head using multifaceted mirrors, e.g. polygonal mirror
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00Working by laser beam, e.g. welding, cutting or boring
    • B23K26/02Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
    • B23K26/06Shaping the laser beam, e.g. by masks or multi-focusing
    • B23K26/062Shaping the laser beam, e.g. by masks or multi-focusing by direct control of the laser beam
    • B23K26/0622Shaping the laser beam, e.g. by masks or multi-focusing by direct control of the laser beam by shaping pulses
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00Working by laser beam, e.g. welding, cutting or boring
    • B23K26/02Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
    • B23K26/06Shaping the laser beam, e.g. by masks or multi-focusing
    • B23K26/067Dividing the beam into multiple beams, e.g. multi-focusing
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00Working by laser beam, e.g. welding, cutting or boring
    • B23K26/02Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
    • B23K26/06Shaping the laser beam, e.g. by masks or multi-focusing
    • B23K26/067Dividing the beam into multiple beams, e.g. multi-focusing
    • B23K26/0673Dividing the beam into multiple beams, e.g. multi-focusing into independently operating sub-beams, e.g. beam multiplexing to provide laser beams for several stations
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00Working by laser beam, e.g. welding, cutting or boring
    • B23K26/08Devices involving relative movement between laser beam and workpiece
    • B23K26/082Scanning systems, i.e. devices involving movement of the laser beam relative to the laser head
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24Vacuum evaporation
    • C23C14/28Vacuum evaporation by wave energy or particle radiation
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32Gas-filled discharge tubes
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32Gas-filled discharge tubes
    • H01J37/32009Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32321Discharge generated by other radiation
    • H01J37/32339Discharge generated by other radiation using electromagnetic radiation

Landscapes

  • Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Plasma & Fusion (AREA)
  • Mechanical Engineering (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Analytical Chemistry (AREA)
  • Electromagnetism (AREA)
  • Laser Beam Processing (AREA)
  • Physical Vapour Deposition (AREA)
  • Coating By Spraying Or Casting (AREA)
  • X-Ray Techniques (AREA)
DK08718536.9T 2007-02-23 2008-02-22 Fremgangsmåde til fotonablation af et mål og en belægningsfremgangsmåde DK2137336T3 (da)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
FI20070158A FI20070158A7 (fi) 2006-02-23 2007-02-23 Järjestely
PCT/FI2008/050083 WO2008102062A2 (en) 2007-02-23 2008-02-22 Method and arrangement for photon ablation of a target

Publications (1)

Publication Number Publication Date
DK2137336T3 true DK2137336T3 (da) 2014-07-07

Family

ID=39636924

Family Applications (1)

Application Number Title Priority Date Filing Date
DK08718536.9T DK2137336T3 (da) 2007-02-23 2008-02-22 Fremgangsmåde til fotonablation af et mål og en belægningsfremgangsmåde

Country Status (8)

Country Link
US (1) US8828506B2 (da)
EP (1) EP2137336B1 (da)
JP (1) JP5666138B2 (da)
KR (1) KR101565099B1 (da)
DK (1) DK2137336T3 (da)
IL (1) IL199623A0 (da)
IN (1) IN2009KN02420A (da)
WO (1) WO2008102062A2 (da)

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ATE534876T1 (de) * 2004-09-21 2011-12-15 Iglesias Vives Joan Verfahren und maschine zum sintern und/oder trocknen von pulvermaterialien unter verwendung von infrarotstrahlung
EP1993774A2 (en) * 2006-02-23 2008-11-26 Picodeon Ltd OY Coating on a medical substrate and a coated medical product
EP1993777A2 (en) * 2006-02-23 2008-11-26 Picodeon Ltd OY Coating on a stone or ceramic substrate and a coated stone or ceramic product
FI20070889A7 (fi) * 2007-11-21 2009-05-22 Picodeon Ltd Oy Pinnankäsittelymenetelmä
SI2159300T1 (sl) * 2008-08-25 2012-05-31 Solmates Bv Postopek za odlaganje materiala
US9283638B2 (en) * 2011-11-25 2016-03-15 Rofin-Baasel Lasertech Gmbh & Co. Kg Device for forming longitudinally spaced grooves or slits into a material web with a focused laser beam
US10835313B2 (en) * 2014-01-30 2020-11-17 Medlumics S.L. Radiofrequency ablation catheter with optical tissue evaluation
FI126769B (en) 2014-12-23 2017-05-15 Picodeon Ltd Oy Lighthouse type scanner with rotating mirror and annular focus
US10683381B2 (en) 2014-12-23 2020-06-16 Bridgestone Americas Tire Operations, Llc Actinic radiation curable polymeric mixtures, cured polymeric mixtures and related processes
ITRM20150111A1 (it) * 2015-03-16 2016-09-16 Lorusso Alessio Sistema di movimentazione meccatronica per una macchina per la prototipazione rapida
DE102015004163B4 (de) * 2015-04-01 2017-03-23 Primes Gmbh Vorrichtung und Verfahren zur Bestimmung von Eigenschaften eines Laserstrahls
US11049702B2 (en) 2015-04-27 2021-06-29 Advanced Energy Industries, Inc. Rate enhanced pulsed DC sputtering system
US9812305B2 (en) 2015-04-27 2017-11-07 Advanced Energy Industries, Inc. Rate enhanced pulsed DC sputtering system
US10522300B2 (en) 2015-05-26 2019-12-31 National Research Council Of Canada Metallic surface with karstified relief, forming same, and high surface area metallic electrochemical interface
US10373811B2 (en) * 2015-07-24 2019-08-06 Aes Global Holdings, Pte. Ltd Systems and methods for single magnetron sputtering
EP3390006B1 (en) 2015-12-17 2021-01-27 Bridgestone Americas Tire Operations, LLC Additive manufacturing cartridges and processes for producing cured polymeric products by additive manufacturing
EP3532267B1 (en) 2016-10-27 2023-03-01 Bridgestone Americas Tire Operations, LLC Processes for producing cured polymeric products by additive manufacturing
KR101906854B1 (ko) * 2017-07-25 2018-10-11 한전원자력연료 주식회사 이동형 핵연료 집합체 구조 변형 측정장비
EP3540090A1 (en) 2018-03-12 2019-09-18 Solmates B.V. Method for pulsed laser deposition
DE102018003675A1 (de) * 2018-05-04 2019-11-07 Siltectra Gmbh Verfahren zum Abtrennen von Festkörperschichten von Kompositstrukturen aus SiC und einer metallischen Beschichtung oder elektrischen Bauteilen
EP3587620A1 (en) * 2018-06-28 2020-01-01 Solmates B.V. Device for pulsed laser deposition and a substrate with a substrate surface for reduction of particles on the substrate
DE202019005592U1 (de) * 2019-01-22 2021-02-08 Hegla Gmbh & Co. Kg Vorrichtung zum Bearbeiten und zum Trennen einer Verbundsicherheitsglastafel
EP3921453A4 (en) * 2019-03-05 2022-11-30 Xefco Pty Ltd Improved vapour deposition system, method and moisture control device
US12099217B2 (en) * 2020-09-23 2024-09-24 Innoviz Technologies Ltd. Ultra-light optical element
WO2022161605A1 (en) * 2021-01-27 2022-08-04 MAX-PLANCK-Gesellschaft zur Förderung der Wissenschaften e.V. Thermal laser evaporation system
US12104885B2 (en) * 2022-03-29 2024-10-01 United States Of America As Represented By The Secretary Of The Navy Laser induced plasma targets for use as an electromagnetic testbed

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US4987007A (en) * 1988-04-18 1991-01-22 Board Of Regents, The University Of Texas System Method and apparatus for producing a layer of material from a laser ion source
JP3336682B2 (ja) * 1992-07-02 2002-10-21 住友電気工業株式会社 硬質炭素膜
JP3255469B2 (ja) * 1992-11-30 2002-02-12 三菱電機株式会社 レーザ薄膜形成装置
JPH0855821A (ja) * 1994-08-16 1996-02-27 Nec Corp 薄膜形成装置および薄膜形成方法
CN1134555C (zh) 1995-10-09 2004-01-14 社团法人高等技术研究院研究组合 大面积金钢石薄膜的制造装置及制造方法
AUPO912797A0 (en) * 1997-09-11 1997-10-02 Australian National University, The Ultrafast laser deposition method
AU6431199A (en) * 1998-10-12 2000-05-01 Regents Of The University Of California, The Laser deposition of thin films
JP2004188437A (ja) 2002-12-09 2004-07-08 Fuji Photo Film Co Ltd 微細傾斜面の加工方法
JP2005097698A (ja) 2003-09-26 2005-04-14 Kansai Electric Power Co Inc:The 酸化物薄膜の形成方法
JP4436162B2 (ja) 2004-03-16 2010-03-24 株式会社リコー レーザ加工装置
JP4534543B2 (ja) 2004-03-19 2010-09-01 凸版印刷株式会社 超短パルスレーザーによる材料加工方法
MX2007001159A (es) 2004-07-30 2007-09-25 Mitsuboshi Diamond Ind Co Ltd Metodo para formar una grieta media en un sustrato y aparato para formar una grieta media en un sustrato.
WO2007006850A2 (en) 2005-07-13 2007-01-18 Picodeon Ltd Oy Radiation arrangement
FI20060178L (fi) 2006-02-23 2007-08-24 Picodeon Ltd Oy Pinnoitusmenetelmä

Also Published As

Publication number Publication date
KR101565099B1 (ko) 2015-11-03
IL199623A0 (en) 2010-04-15
US8828506B2 (en) 2014-09-09
JP2010519051A (ja) 2010-06-03
IN2009KN02420A (da) 2015-08-07
EP2137336A2 (en) 2009-12-30
JP5666138B2 (ja) 2015-02-12
US20100196624A1 (en) 2010-08-05
KR20090116740A (ko) 2009-11-11
WO2008102062A2 (en) 2008-08-28
WO2008102062A3 (en) 2009-03-12
EP2137336B1 (en) 2014-04-02

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