DK190888A - Fremgangsmaade til fremstilling af et superledende lag paa et substrats overflade - Google Patents

Fremgangsmaade til fremstilling af et superledende lag paa et substrats overflade

Info

Publication number
DK190888A
DK190888A DK190888A DK190888A DK190888A DK 190888 A DK190888 A DK 190888A DK 190888 A DK190888 A DK 190888A DK 190888 A DK190888 A DK 190888A DK 190888 A DK190888 A DK 190888A
Authority
DK
Denmark
Prior art keywords
preparing
procedure
substrate surface
supervisory layer
supervisory
Prior art date
Application number
DK190888A
Other languages
English (en)
Other versions
DK190888D0 (da
Inventor
Michal Edith Gross
Catherine Ellen Rice
Original Assignee
American Telephone & Telegraph
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US07/126,448 external-priority patent/US5416063A/en
Application filed by American Telephone & Telegraph filed Critical American Telephone & Telegraph
Publication of DK190888D0 publication Critical patent/DK190888D0/da
Publication of DK190888A publication Critical patent/DK190888A/da

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C26/00—Coating not provided for in groups C23C2/00 - C23C24/00
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N60/00—Superconducting devices
    • H10N60/01—Manufacture or treatment
    • H10N60/0268—Manufacture or treatment of devices comprising copper oxide
    • H10N60/0296—Processes for depositing or forming copper oxide superconductor layers
    • H10N60/0324—Processes for depositing or forming copper oxide superconductor layers from a solution
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N60/00—Superconducting devices
    • H10N60/01—Manufacture or treatment
    • H10N60/0268—Manufacture or treatment of devices comprising copper oxide
    • H10N60/0296—Processes for depositing or forming copper oxide superconductor layers
    • H10N60/0576—Processes for depositing or forming copper oxide superconductor layers characterised by the substrate
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N60/00—Superconducting devices
    • H10N60/01—Manufacture or treatment
    • H10N60/0268—Manufacture or treatment of devices comprising copper oxide
    • H10N60/0296—Processes for depositing or forming copper oxide superconductor layers
    • H10N60/0576—Processes for depositing or forming copper oxide superconductor layers characterised by the substrate
    • H10N60/0604—Monocrystalline substrates, e.g. epitaxial growth
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N60/00—Superconducting devices
    • H10N60/01—Manufacture or treatment
    • H10N60/0268—Manufacture or treatment of devices comprising copper oxide
    • H10N60/0661—Processes performed after copper oxide formation, e.g. patterning
    • H10N60/0688—Etching

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Chemical & Material Sciences (AREA)
  • Mechanical Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Compounds Of Heavy Metals (AREA)
  • Superconductors And Manufacturing Methods Therefor (AREA)
  • Superconductor Devices And Manufacturing Methods Thereof (AREA)
  • Oxygen, Ozone, And Oxides In General (AREA)
DK190888A 1987-04-10 1988-04-08 Fremgangsmaade til fremstilling af et superledende lag paa et substrats overflade DK190888A (da)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US3726487A 1987-04-10 1987-04-10
US07/126,448 US5416063A (en) 1987-04-10 1987-11-30 Method of producing a layer of superconductive oxide

Publications (2)

Publication Number Publication Date
DK190888D0 DK190888D0 (da) 1988-04-08
DK190888A true DK190888A (da) 1988-10-11

Family

ID=26713976

Family Applications (1)

Application Number Title Priority Date Filing Date
DK190888A DK190888A (da) 1987-04-10 1988-04-08 Fremgangsmaade til fremstilling af et superledende lag paa et substrats overflade

Country Status (6)

Country Link
EP (1) EP0287258B1 (da)
JP (1) JPH0829940B2 (da)
AU (1) AU591836B2 (da)
DE (2) DE3872430D1 (da)
DK (1) DK190888A (da)
HK (1) HK96193A (da)

Families Citing this family (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
AU598113B2 (en) * 1987-03-14 1990-06-14 Sumitomo Electric Industries, Ltd. Process for depositing a superconducting thin film
US5189009A (en) * 1987-03-27 1993-02-23 Massachusetts Institute Of Technology Preparation of superconducting oxides and oxide-metal composites
US5204318A (en) * 1987-03-27 1993-04-20 Massachusetts Institute Of Technology Preparation of superconducting oxides and oxide-metal composites
US4880770A (en) * 1987-05-04 1989-11-14 Eastman Kodak Company Metalorganic deposition process for preparing superconducting oxide films
US4994433A (en) * 1987-05-22 1991-02-19 Massachusetts Institute Of Technology Preparation of thin film superconducting oxides
FR2625614A1 (fr) * 1987-05-22 1989-07-07 Massachusetts Inst Technology Pellicules minces d'oxydes supraconducteurs
AU607219B2 (en) * 1987-05-29 1991-02-28 Toray Industries, Inc. Method of forming superconductive thin films and solutions for forming the same
US5041420A (en) * 1987-06-26 1991-08-20 Hewlett-Packard Company Method for making superconductor films from organometallic precursors
US4908346A (en) * 1987-07-01 1990-03-13 Eastman Kodak Company Crystalline rare earth alkaline earth copper oxide thick film circuit element with superconducting onset transition temperature in excess of 77%
US5149682A (en) * 1987-09-11 1992-09-22 W. R. Grace & Co. -Conn. Manufacturing method for superconducting ceramics and products thereof
GB2215548B (en) * 1988-02-26 1991-10-23 Gen Electric Co Plc A method of fabricating superconducting electronic devices
CA2029789A1 (en) * 1989-12-04 1991-06-05 Kenton D. Budd Flexible superconductor coated zirconia fibers
JPH07118012A (ja) * 1992-06-22 1995-05-09 Kokusai Chodendo Sangyo Gijutsu Kenkyu Center 酸化物超電導体およびその製造方法
RU2124069C1 (ru) * 1998-02-09 1998-12-27 Егоров Олег Георгиевич Рельсовый плазматрон для получения покрытий на поверхности диэлектрических материалов
JP5421561B2 (ja) 2008-08-20 2014-02-19 住友電気工業株式会社 酸化物超電導薄膜の製造方法
CN109554656B (zh) * 2018-12-13 2020-10-09 西安交通大学 一种常温大气氛围下致密陶瓷涂层的制备方法和系统

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US37264A (en) * 1862-12-23 Improvement in passenger-tickets
US4346131A (en) * 1979-08-10 1982-08-24 Westinghouse Electric Corp. Polymerized solutions for depositing optical oxide coatings
US4278632A (en) * 1980-02-08 1981-07-14 Westinghouse Electric Corp. Method of conforming clear vitreous gal of silica-titania material
US4286024A (en) * 1980-04-28 1981-08-25 Westinghouse Electric Corp. Transparent high temperature resistant aluminum silicon oxide monolithic member or coating
US4482644A (en) * 1983-04-18 1984-11-13 Exxon Research & Engineering Co. Oxygen-deficient, barium-containing perovskites
KR880009453A (ko) * 1987-01-30 1988-09-15 원본미기재 초전도성 재료와 그 제조방법
JPH0664950B2 (ja) * 1987-03-18 1994-08-22 工業技術院長 酸化物超電導材の製造方法
JPS63239150A (ja) * 1987-03-27 1988-10-05 Sumitomo Electric Ind Ltd 超電導セラミツクス薄膜の製造方法
JPS63250881A (ja) * 1987-04-07 1988-10-18 Semiconductor Energy Lab Co Ltd 超電導体の作製方法
JPH0710008B2 (ja) * 1987-05-26 1995-02-01 理化学研究所 超伝導体薄膜の形成法
JPS6414825A (en) * 1987-07-09 1989-01-19 Mitsubishi Electric Corp Formation of fine electrical conductor layer pattern and device therefor
JPH01111713A (ja) * 1987-10-23 1989-04-28 Tanaka Kikinzoku Kogyo Kk 超電導体インク
JPH0453817A (ja) * 1990-06-20 1992-02-21 Dainippon Ink & Chem Inc ロジン変性フェノール樹脂の製造方法
JPH0476323A (ja) * 1990-07-16 1992-03-11 Matsushita Seiko Co Ltd 空気調和機の露受皿
JPH0476324A (ja) * 1990-07-17 1992-03-11 Matsushita Electric Ind Co Ltd 空気調和装置

Also Published As

Publication number Publication date
JPH0829940B2 (ja) 1996-03-27
AU591836B2 (en) 1989-12-14
DK190888D0 (da) 1988-04-08
HK96193A (en) 1993-09-24
EP0287258A1 (en) 1988-10-19
JPS6448325A (en) 1989-02-22
AU1435788A (en) 1988-11-03
DE3872430D1 (de) 1992-08-06
EP0287258B1 (en) 1992-07-01
DE3872430T2 (de) 1992-12-03

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Legal Events

Date Code Title Description
AHB Application shelved due to non-payment