DK161858C - Fremgangsmaade og apparat til analyse af en overflade - Google Patents

Fremgangsmaade og apparat til analyse af en overflade

Info

Publication number
DK161858C
DK161858C DK381385A DK381385A DK161858C DK 161858 C DK161858 C DK 161858C DK 381385 A DK381385 A DK 381385A DK 381385 A DK381385 A DK 381385A DK 161858 C DK161858 C DK 161858C
Authority
DK
Denmark
Prior art keywords
analysis
Prior art date
Application number
DK381385A
Other languages
Danish (da)
English (en)
Other versions
DK381385A (da
DK381385D0 (da
DK161858B (da
Inventor
Christopher H Becker
Keith T Gillen
Jr Sidney E Buttrill
Original Assignee
Stanford Res Inst Int
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Stanford Res Inst Int filed Critical Stanford Res Inst Int
Publication of DK381385A publication Critical patent/DK381385A/da
Publication of DK381385D0 publication Critical patent/DK381385D0/da
Publication of DK161858B publication Critical patent/DK161858B/da
Application granted granted Critical
Publication of DK161858C publication Critical patent/DK161858C/da

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005Apparatus not specifically provided for elsewhere
    • H01L21/67242Apparatus for monitoring, sorting or marking
    • H01L21/67253Process monitoring, e.g. flow or thickness monitoring
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005Apparatus not specifically provided for elsewhere
    • H01L21/67242Apparatus for monitoring, sorting or marking

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Other Investigation Or Analysis Of Materials By Electrical Means (AREA)
  • Electron Tubes For Measurement (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
  • Investigating Or Analyzing Materials By The Use Of Ultrasonic Waves (AREA)
DK381385A 1983-12-23 1985-08-22 Fremgangsmaade og apparat til analyse af en overflade DK161858C (da)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
US56494983A 1983-12-23 1983-12-23
US56494983 1983-12-23
US8401509 1984-09-20
PCT/US1984/001509 WO1985002907A1 (en) 1983-12-23 1984-09-20 Method and apparatus for surface diagnostics

Publications (4)

Publication Number Publication Date
DK381385A DK381385A (da) 1985-08-22
DK381385D0 DK381385D0 (da) 1985-08-22
DK161858B DK161858B (da) 1991-08-19
DK161858C true DK161858C (da) 1992-01-20

Family

ID=24256568

Family Applications (1)

Application Number Title Priority Date Filing Date
DK381385A DK161858C (da) 1983-12-23 1985-08-22 Fremgangsmaade og apparat til analyse af en overflade

Country Status (10)

Country Link
EP (1) EP0167561B1 (fi)
JP (1) JP2640935B2 (fi)
AU (1) AU570531B2 (fi)
CA (1) CA1220879A (fi)
DE (2) DE3490595T (fi)
DK (1) DK161858C (fi)
FI (1) FI83463C (fi)
GB (1) GB2160014B (fi)
SE (1) SE452676B (fi)
WO (1) WO1985002907A1 (fi)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2211020A (en) * 1987-10-10 1989-06-21 Wallach Eric Robert Microprobe mass analyser
US4920264A (en) * 1989-01-17 1990-04-24 Sri International Method for preparing samples for mass analysis by desorption from a frozen solution
US5019208A (en) * 1990-03-23 1991-05-28 Air Products And Chemicals, Inc. Method for determining the depth of permeation of a modifier into the interior of a thermoplastic article
DE4036115C2 (de) * 1990-11-13 1997-12-11 Max Planck Gesellschaft Verfahren und Einrichtung zur quantitativen nichtresonanten Photoionisation von Neutralteilchen und Verwendung einer solchen Einrichtung

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3727047A (en) * 1971-07-22 1973-04-10 Avco Corp Time of flight mass spectrometer comprising a reflecting means which equalizes time of flight of ions having same mass to charge ratio
FR2279093A1 (fr) * 1974-06-28 1976-02-13 Anvar Procede et dispositif d'analyse chimique locale des solides
JPS54123163A (en) * 1978-03-16 1979-09-25 Mitsuboshi Belting Ltd Acrylic rubber composition
DE3015352A1 (de) * 1980-04-22 1981-11-05 Kernforschungsanlage Jülich GmbH, 5170 Jülich Verfahren und vorrichtung zum spektoskopischen naschweis von an der oberflaeche eines festkoerpers befindlichen elementen
JPS58119148A (ja) * 1982-01-09 1983-07-15 Jeol Ltd 質量分析装置のイオン源
US4442354A (en) * 1982-01-22 1984-04-10 Atom Sciences, Inc. Sputter initiated resonance ionization spectrometry
JPS5981854A (ja) * 1982-10-31 1984-05-11 Shimadzu Corp 二次イオン質量分析装置
JPS60114753A (ja) * 1983-11-25 1985-06-21 ジー・サムエル ハースト 構成元素の定量分析法およびその装置

Also Published As

Publication number Publication date
SE452676B (sv) 1987-12-07
DK381385A (da) 1985-08-22
DE3490595C2 (de) 1995-10-26
GB2160014B (en) 1987-12-16
EP0167561A1 (en) 1986-01-15
DE3490595T (de) 1985-11-28
FI83463C (fi) 1991-07-10
GB8518083D0 (en) 1985-08-21
CA1220879A (en) 1987-04-21
SE8503901D0 (sv) 1985-08-21
JP2640935B2 (ja) 1997-08-13
GB2160014A (en) 1985-12-11
WO1985002907A1 (en) 1985-07-04
JPS61500866A (ja) 1986-05-01
DK381385D0 (da) 1985-08-22
AU570531B2 (en) 1988-03-17
FI853242L (fi) 1985-08-22
AU3744785A (en) 1985-07-12
DK161858B (da) 1991-08-19
FI853242A0 (fi) 1985-08-22
SE8503901L (sv) 1985-08-21
FI83463B (fi) 1991-03-28
EP0167561B1 (en) 1989-12-06

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Legal Events

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PBP Patent lapsed