DK146896C - Fotosensibelt harpiksmateriale til fremstilling af en flexografisk trykkeplade - Google Patents

Fotosensibelt harpiksmateriale til fremstilling af en flexografisk trykkeplade

Info

Publication number
DK146896C
DK146896C DK318476A DK318476A DK146896C DK 146896 C DK146896 C DK 146896C DK 318476 A DK318476 A DK 318476A DK 318476 A DK318476 A DK 318476A DK 146896 C DK146896 C DK 146896C
Authority
DK
Denmark
Prior art keywords
photosensible
preparing
resin material
print plate
flexographic print
Prior art date
Application number
DK318476A
Other languages
English (en)
Other versions
DK318476A (da
DK146896B (da
Inventor
Kiyomi Sakurai
Original Assignee
Nippon Paint Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP8790275A external-priority patent/JPS5212004A/ja
Priority claimed from JP13954175A external-priority patent/JPS5264301A/ja
Application filed by Nippon Paint Co Ltd filed Critical Nippon Paint Co Ltd
Publication of DK318476A publication Critical patent/DK318476A/da
Publication of DK146896B publication Critical patent/DK146896B/da
Application granted granted Critical
Publication of DK146896C publication Critical patent/DK146896C/da

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Printing Plates And Materials Therefor (AREA)
DK318476A 1975-07-17 1976-07-14 Fotosensibelt harpiksmateriale til fremstilling af en flexografisk trykkeplade DK146896C (da)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP8790275 1975-07-17
JP8790275A JPS5212004A (en) 1975-07-17 1975-07-17 Photoosensitive resin composition for flexo graphic plate
JP13954175A JPS5264301A (en) 1975-11-19 1975-11-19 Flexo graphic press plate
JP13954175 1975-11-19

Publications (3)

Publication Number Publication Date
DK318476A DK318476A (da) 1977-01-18
DK146896B DK146896B (da) 1984-01-30
DK146896C true DK146896C (da) 1984-07-16

Family

ID=26429132

Family Applications (1)

Application Number Title Priority Date Filing Date
DK318476A DK146896C (da) 1975-07-17 1976-07-14 Fotosensibelt harpiksmateriale til fremstilling af en flexografisk trykkeplade

Country Status (6)

Country Link
AU (1) AU500110B2 (da)
CA (1) CA1056190A (da)
DE (1) DE2631837C2 (da)
DK (1) DK146896C (da)
FR (1) FR2318441A1 (da)
GB (1) GB1552653A (da)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS607261B2 (ja) * 1978-10-02 1985-02-23 旭化成株式会社 感光性エラストマ−組成物
JPS55135838A (en) * 1979-04-12 1980-10-23 Asahi Chem Ind Co Ltd Surface treating method for photosensitive elastomer printing plate
DE2942183A1 (de) 1979-10-18 1981-05-07 Basf Ag, 6700 Ludwigshafen Fotopolymerisierbare gemische und elemente daraus
JPS57208556A (en) * 1981-06-18 1982-12-21 Nippon Paint Co Ltd Photosensitive printing plate material
US4394435A (en) * 1981-10-01 1983-07-19 Uniroyal, Inc. Syndiotactic polybutadiene composition for a photosensitive printing plate
DE69225277T2 (de) * 1991-02-15 1998-12-24 Asahi Kasei Kogyo K.K., Osaka Lichtempfindliche Elastomerzusammensetzung
DE4202332A1 (de) * 1992-01-29 1993-08-05 Basf Lacke & Farben Lichtempfindliches gemisch zur herstellung von relief- und druckformen
KR960008405A (ko) 1994-08-10 1996-03-22 알베르투스 빌헬무스·요아네스 째스트라텐 광경화가능한 탄성중합체 조성물로부터의 플렉서 인쇄판
DE10118987A1 (de) 2001-04-18 2002-10-24 Basf Drucksysteme Gmbh Lasergravierbare Flexodruckelemente mit reliefbildenden elastomeren Schichten enthaltend syndiotaktisches 1,2,-Polybutadien

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CA1099435A (en) * 1971-04-01 1981-04-14 Gwendyline Y. Y. T. Chen Photosensitive block copolymer composition and elements
DE2250105B2 (de) * 1971-10-13 1977-04-14 Meisei Churchill Co. Ltd., Sakai, Osaka (Japan) Lichthaertende kunststoffmasse
DE2300371C3 (de) * 1973-01-05 1979-04-19 Basf Ag, 6700 Ludwigshafen Photopolymerisierbare Druckplatte für den Flexodruck
DE2301175A1 (de) * 1973-01-11 1974-08-01 Basf Ag Verfahren zur herstellung von druckformen fuer den flexodruck und mehrschichtenplatten hierfuer
US3960572A (en) * 1973-02-21 1976-06-01 Asahi Kasei Kogyo Kabushiki Kaisha Photosensitive compositions comprising a polyester-polyether block polymer
JPS5228041B2 (da) * 1973-04-06 1977-07-23

Also Published As

Publication number Publication date
DE2631837C2 (de) 1983-06-16
DK318476A (da) 1977-01-18
DK146896B (da) 1984-01-30
FR2318441A1 (fr) 1977-02-11
AU500110B2 (en) 1979-05-10
AU1597976A (en) 1978-01-19
DE2631837A1 (de) 1977-02-03
FR2318441B1 (da) 1981-10-09
GB1552653A (en) 1979-09-19
CA1056190A (en) 1979-06-12

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