AU500110B2 - Photosensitive resin composition - Google Patents

Photosensitive resin composition

Info

Publication number
AU500110B2
AU500110B2 AU15979/76A AU1597976A AU500110B2 AU 500110 B2 AU500110 B2 AU 500110B2 AU 15979/76 A AU15979/76 A AU 15979/76A AU 1597976 A AU1597976 A AU 1597976A AU 500110 B2 AU500110 B2 AU 500110B2
Authority
AU
Australia
Prior art keywords
resin composition
photosensitive resin
photosensitive
composition
resin
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
AU15979/76A
Other versions
AU1597976A (en
Inventor
Sakurai Kiyomi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nippon Paint Co Ltd
Original Assignee
Nippon Paint Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP8790275A external-priority patent/JPS5212004A/en
Priority claimed from JP13954175A external-priority patent/JPS5264301A/en
Application filed by Nippon Paint Co Ltd filed Critical Nippon Paint Co Ltd
Publication of AU1597976A publication Critical patent/AU1597976A/en
Application granted granted Critical
Publication of AU500110B2 publication Critical patent/AU500110B2/en
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Printing Plates And Materials Therefor (AREA)
AU15979/76A 1975-07-17 1976-07-16 Photosensitive resin composition Expired AU500110B2 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JPJP87902/75 1975-07-17
JP8790275A JPS5212004A (en) 1975-07-17 1975-07-17 Photoosensitive resin composition for flexo graphic plate
JP13954175A JPS5264301A (en) 1975-11-19 1975-11-19 Flexo graphic press plate

Publications (2)

Publication Number Publication Date
AU1597976A AU1597976A (en) 1978-01-19
AU500110B2 true AU500110B2 (en) 1979-05-10

Family

ID=26429132

Family Applications (1)

Application Number Title Priority Date Filing Date
AU15979/76A Expired AU500110B2 (en) 1975-07-17 1976-07-16 Photosensitive resin composition

Country Status (6)

Country Link
AU (1) AU500110B2 (en)
CA (1) CA1056190A (en)
DE (1) DE2631837C2 (en)
DK (1) DK146896C (en)
FR (1) FR2318441A1 (en)
GB (1) GB1552653A (en)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS607261B2 (en) * 1978-10-02 1985-02-23 旭化成株式会社 Photosensitive elastomer composition
JPS55135838A (en) * 1979-04-12 1980-10-23 Asahi Chem Ind Co Ltd Surface treating method for photosensitive elastomer printing plate
JPS57208556A (en) * 1981-06-18 1982-12-21 Nippon Paint Co Ltd Photosensitive printing plate material
US4394435A (en) * 1981-10-01 1983-07-19 Uniroyal, Inc. Syndiotactic polybutadiene composition for a photosensitive printing plate
WO1992015046A1 (en) * 1991-02-15 1992-09-03 Asahi Kasei Kogyo Kabushiki Kaisha Photosensitive elastomer composition
DE4202332A1 (en) * 1992-01-29 1993-08-05 Basf Lacke & Farben LIGHT SENSITIVE MIXTURE FOR THE PRODUCTION OF RELIEF AND PRINTING FORMS
KR960008405A (en) 1994-08-10 1996-03-22 알베르투스 빌헬무스·요아네스 째스트라텐 Flexure printing plate from photocurable elastomeric composition
DE10118987A1 (en) * 2001-04-18 2002-10-24 Basf Drucksysteme Gmbh Laser-engravable flexographic printing element comprises a relief-forming, thermally and/or photochemically crosslinkable elastomer layer including syndiotactic 1,2-polybutadiene binder

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CA1099435A (en) * 1971-04-01 1981-04-14 Gwendyline Y. Y. T. Chen Photosensitive block copolymer composition and elements
DE2250105B2 (en) * 1971-10-13 1977-04-14 Meisei Churchill Co. Ltd., Sakai, Osaka (Japan) LIGHT-CURING PLASTIC COMPOUND
DE2300371C3 (en) * 1973-01-05 1979-04-19 Basf Ag, 6700 Ludwigshafen Photopolymerizable printing plate for flexographic printing
DE2301175A1 (en) * 1973-01-11 1974-08-01 Basf Ag PROCESS FOR MANUFACTURING PRINTING FORMS FOR FLEXO PRINTING AND MULTI-LAYER PLATES FOR THIS
US3960572A (en) * 1973-02-21 1976-06-01 Asahi Kasei Kogyo Kabushiki Kaisha Photosensitive compositions comprising a polyester-polyether block polymer
JPS5228041B2 (en) * 1973-04-06 1977-07-23

Also Published As

Publication number Publication date
FR2318441A1 (en) 1977-02-11
DE2631837A1 (en) 1977-02-03
DE2631837C2 (en) 1983-06-16
DK146896B (en) 1984-01-30
FR2318441B1 (en) 1981-10-09
DK318476A (en) 1977-01-18
CA1056190A (en) 1979-06-12
GB1552653A (en) 1979-09-19
DK146896C (en) 1984-07-16
AU1597976A (en) 1978-01-19

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