FR2318441B1 - - Google Patents

Info

Publication number
FR2318441B1
FR2318441B1 FR7621491A FR7621491A FR2318441B1 FR 2318441 B1 FR2318441 B1 FR 2318441B1 FR 7621491 A FR7621491 A FR 7621491A FR 7621491 A FR7621491 A FR 7621491A FR 2318441 B1 FR2318441 B1 FR 2318441B1
Authority
FR
France
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
FR7621491A
Other languages
French (fr)
Other versions
FR2318441A1 (en
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nippon Paint Co Ltd
Original Assignee
Nippon Paint Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP8790275A external-priority patent/JPS5212004A/en
Priority claimed from JP13954175A external-priority patent/JPS5264301A/en
Application filed by Nippon Paint Co Ltd filed Critical Nippon Paint Co Ltd
Publication of FR2318441A1 publication Critical patent/FR2318441A1/en
Application granted granted Critical
Publication of FR2318441B1 publication Critical patent/FR2318441B1/fr
Granted legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031Organic compounds not covered by group G03F7/029
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Printing Plates And Materials Therefor (AREA)
FR7621491A 1975-07-17 1976-07-13 COMPOSITION Granted FR2318441A1 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP8790275A JPS5212004A (en) 1975-07-17 1975-07-17 Photoosensitive resin composition for flexo graphic plate
JP13954175A JPS5264301A (en) 1975-11-19 1975-11-19 Flexo graphic press plate

Publications (2)

Publication Number Publication Date
FR2318441A1 FR2318441A1 (en) 1977-02-11
FR2318441B1 true FR2318441B1 (en) 1981-10-09

Family

ID=26429132

Family Applications (1)

Application Number Title Priority Date Filing Date
FR7621491A Granted FR2318441A1 (en) 1975-07-17 1976-07-13 COMPOSITION

Country Status (6)

Country Link
AU (1) AU500110B2 (en)
CA (1) CA1056190A (en)
DE (1) DE2631837C2 (en)
DK (1) DK146896C (en)
FR (1) FR2318441A1 (en)
GB (1) GB1552653A (en)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS607261B2 (en) * 1978-10-02 1985-02-23 旭化成株式会社 Photosensitive elastomer composition
JPS55135838A (en) * 1979-04-12 1980-10-23 Asahi Chem Ind Co Ltd Surface treating method for photosensitive elastomer printing plate
JPS57208556A (en) * 1981-06-18 1982-12-21 Nippon Paint Co Ltd Photosensitive printing plate material
US4394435A (en) * 1981-10-01 1983-07-19 Uniroyal, Inc. Syndiotactic polybutadiene composition for a photosensitive printing plate
EP0525206B1 (en) * 1991-02-15 1998-04-29 Asahi Kasei Kogyo Kabushiki Kaisha Photosensitive elastomer composition
DE4202332A1 (en) * 1992-01-29 1993-08-05 Basf Lacke & Farben LIGHT SENSITIVE MIXTURE FOR THE PRODUCTION OF RELIEF AND PRINTING FORMS
JP3510393B2 (en) 1994-08-10 2004-03-29 シエル・インターナシヨナル・リサーチ・マートスハツペイ・ベー・ヴエー Flexographic printing plate obtained from a photocurable elastomer composition
DE10118987A1 (en) 2001-04-18 2002-10-24 Basf Drucksysteme Gmbh Laser-engravable flexographic printing element comprises a relief-forming, thermally and/or photochemically crosslinkable elastomer layer including syndiotactic 1,2-polybutadiene binder

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CA1099435A (en) * 1971-04-01 1981-04-14 Gwendyline Y. Y. T. Chen Photosensitive block copolymer composition and elements
DE2250105B2 (en) * 1971-10-13 1977-04-14 Meisei Churchill Co. Ltd., Sakai, Osaka (Japan) LIGHT-CURING PLASTIC COMPOUND
DE2300371C3 (en) * 1973-01-05 1979-04-19 Basf Ag, 6700 Ludwigshafen Photopolymerizable printing plate for flexographic printing
DE2301175A1 (en) * 1973-01-11 1974-08-01 Basf Ag PROCESS FOR MANUFACTURING PRINTING FORMS FOR FLEXO PRINTING AND MULTI-LAYER PLATES FOR THIS
US3960572A (en) * 1973-02-21 1976-06-01 Asahi Kasei Kogyo Kabushiki Kaisha Photosensitive compositions comprising a polyester-polyether block polymer
JPS5228041B2 (en) * 1973-04-06 1977-07-23

Also Published As

Publication number Publication date
FR2318441A1 (en) 1977-02-11
AU1597976A (en) 1978-01-19
DE2631837A1 (en) 1977-02-03
DE2631837C2 (en) 1983-06-16
CA1056190A (en) 1979-06-12
AU500110B2 (en) 1979-05-10
DK318476A (en) 1977-01-18
DK146896B (en) 1984-01-30
GB1552653A (en) 1979-09-19
DK146896C (en) 1984-07-16

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