JPS5269612A - Photosensitive composition - Google Patents
Photosensitive compositionInfo
- Publication number
- JPS5269612A JPS5269612A JP14655775A JP14655775A JPS5269612A JP S5269612 A JPS5269612 A JP S5269612A JP 14655775 A JP14655775 A JP 14655775A JP 14655775 A JP14655775 A JP 14655775A JP S5269612 A JPS5269612 A JP S5269612A
- Authority
- JP
- Japan
- Prior art keywords
- photosensitive composition
- photosensitive
- composition
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP14655775A JPS5820421B2 (en) | 1975-12-09 | 1975-12-09 | Kankousei Soseibutsu |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP14655775A JPS5820421B2 (en) | 1975-12-09 | 1975-12-09 | Kankousei Soseibutsu |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5269612A true JPS5269612A (en) | 1977-06-09 |
JPS5820421B2 JPS5820421B2 (en) | 1983-04-22 |
Family
ID=15410351
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP14655775A Expired JPS5820421B2 (en) | 1975-12-09 | 1975-12-09 | Kankousei Soseibutsu |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5820421B2 (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6463954A (en) * | 1987-09-03 | 1989-03-09 | Fuji Photo Film Co Ltd | Photosensitive composition |
WO2014148241A1 (en) * | 2013-03-22 | 2014-09-25 | Jsr株式会社 | Radiation-sensitive resin composition, resist pattern forming method, polymer and method for producing compound |
-
1975
- 1975-12-09 JP JP14655775A patent/JPS5820421B2/en not_active Expired
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6463954A (en) * | 1987-09-03 | 1989-03-09 | Fuji Photo Film Co Ltd | Photosensitive composition |
WO2014148241A1 (en) * | 2013-03-22 | 2014-09-25 | Jsr株式会社 | Radiation-sensitive resin composition, resist pattern forming method, polymer and method for producing compound |
US9703195B2 (en) | 2013-03-22 | 2017-07-11 | Jsr Corporation | Radiation-sensitive resin composition, resist pattern-forming method, polymer, and method for producing compound |
Also Published As
Publication number | Publication date |
---|---|
JPS5820421B2 (en) | 1983-04-22 |
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