DK1250470T3 - Nanomateriale - Google Patents

Nanomateriale

Info

Publication number
DK1250470T3
DK1250470T3 DK01946906T DK01946906T DK1250470T3 DK 1250470 T3 DK1250470 T3 DK 1250470T3 DK 01946906 T DK01946906 T DK 01946906T DK 01946906 T DK01946906 T DK 01946906T DK 1250470 T3 DK1250470 T3 DK 1250470T3
Authority
DK
Denmark
Prior art keywords
magnetic substance
ferro
clusters
thin film
nanomaterials
Prior art date
Application number
DK01946906T
Other languages
English (en)
Inventor
Derek Eastham
Original Assignee
Council Cent Lab Res Councils
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Council Cent Lab Res Councils filed Critical Council Cent Lab Res Councils
Application granted granted Critical
Publication of DK1250470T3 publication Critical patent/DK1250470T3/da

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y25/00—Nanomagnetism, e.g. magnetoimpedance, anisotropic magnetoresistance, giant magnetoresistance or tunneling magnetoresistance
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/14—Metallic material, boron or silicon
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00—Manufacture or treatment of nanostructures
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
    • H01F10/00—Thin magnetic films, e.g. of one-domain structure
    • H01F10/007—Thin magnetic films, e.g. of one-domain structure ultrathin or granular films
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
    • H01F10/00—Thin magnetic films, e.g. of one-domain structure
    • H01F10/32—Spin-exchange-coupled multilayers, e.g. nanostructured superlattices
    • H01F10/3227—Exchange coupling via one or more magnetisable ultrathin or granular films
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
    • H01F41/00—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties
    • H01F41/14—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for applying magnetic films to substrates
    • H01F41/30—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for applying magnetic films to substrates for applying nanostructures, e.g. by molecular beam epitaxy [MBE]
    • H01F41/301—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for applying magnetic films to substrates for applying nanostructures, e.g. by molecular beam epitaxy [MBE] for applying ultrathin or granular layers

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Nanotechnology (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Power Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Physical Vapour Deposition (AREA)
  • Manufacturing Of Magnetic Record Carriers (AREA)
  • Manufacturing Of Micro-Capsules (AREA)
  • Thin Magnetic Films (AREA)
  • Magnetic Record Carriers (AREA)
  • Carbon And Carbon Compounds (AREA)
  • Lubricants (AREA)
DK01946906T 2000-01-28 2001-01-29 Nanomateriale DK1250470T3 (da)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
GBGB0001950.5A GB0001950D0 (en) 2000-01-28 2000-01-28 Nano-material
PCT/GB2001/000361 WO2001055474A1 (en) 2000-01-28 2001-01-29 Nano-material

Publications (1)

Publication Number Publication Date
DK1250470T3 true DK1250470T3 (da) 2004-01-05

Family

ID=9884502

Family Applications (1)

Application Number Title Priority Date Filing Date
DK01946906T DK1250470T3 (da) 2000-01-28 2001-01-29 Nanomateriale

Country Status (11)

Country Link
US (1) US20020187257A1 (da)
EP (1) EP1250470B1 (da)
JP (1) JP2003520902A (da)
AT (1) ATE248934T1 (da)
AU (1) AU2001228685A1 (da)
DE (1) DE60100705T2 (da)
DK (1) DK1250470T3 (da)
ES (1) ES2202291T3 (da)
GB (1) GB0001950D0 (da)
PT (1) PT1250470E (da)
WO (1) WO2001055474A1 (da)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2994443B1 (fr) * 2012-08-10 2015-02-27 Commissariat Energie Atomique Procede de synthese d'un materiau composite nanostructure et dispositif de mise en oeuvre associe.

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
AU531847B2 (en) * 1979-02-23 1983-09-08 Sekisui Kagaku Kogyo Kabushiki Kaisha Magnetic recording medium + process for production thereof
DE3803000A1 (de) * 1988-02-02 1989-08-10 Basf Ag Flaechenfoermiges, mehrschichtiges magneto-optisches aufzeichnungsmaterial
JPH07508133A (ja) * 1992-06-16 1995-09-07 ザ リージェンツ オブ ザ ユニバーシティ オブ カリフォルニア 巨大な磁気抵抗性の単一膜合金
JPH06283332A (ja) * 1993-01-26 1994-10-07 Hitachi Ltd 薄膜磁性体とその製法およびそれを用いたマイクロ磁気デバイス
JPH09111419A (ja) * 1995-10-16 1997-04-28 Alps Electric Co Ltd 磁気抵抗効果材料および磁気抵抗効果多層膜
US5695617A (en) * 1995-11-22 1997-12-09 Dow Corning Corporation Silicon nanoparticles
US6531704B2 (en) * 1998-09-14 2003-03-11 Nanoproducts Corporation Nanotechnology for engineering the performance of substances

Also Published As

Publication number Publication date
WO2001055474A1 (en) 2001-08-02
ES2202291T3 (es) 2004-04-01
DE60100705T2 (de) 2004-07-08
EP1250470A1 (en) 2002-10-23
DE60100705D1 (en) 2003-10-09
PT1250470E (pt) 2003-11-28
EP1250470B1 (en) 2003-09-03
JP2003520902A (ja) 2003-07-08
GB0001950D0 (en) 2000-03-22
ATE248934T1 (de) 2003-09-15
AU2001228685A1 (en) 2001-08-07
US20020187257A1 (en) 2002-12-12

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