ATE248934T1 - Nano-material - Google Patents

Nano-material

Info

Publication number
ATE248934T1
ATE248934T1 AT01946906T AT01946906T ATE248934T1 AT E248934 T1 ATE248934 T1 AT E248934T1 AT 01946906 T AT01946906 T AT 01946906T AT 01946906 T AT01946906 T AT 01946906T AT E248934 T1 ATE248934 T1 AT E248934T1
Authority
AT
Austria
Prior art keywords
magnetic substance
nano material
ferro
clusters
thin film
Prior art date
Application number
AT01946906T
Other languages
English (en)
Inventor
Derek Eastham
Original Assignee
Council Cent Lab Res Councils
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Council Cent Lab Res Councils filed Critical Council Cent Lab Res Councils
Application granted granted Critical
Publication of ATE248934T1 publication Critical patent/ATE248934T1/de

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/14—Metallic material, boron or silicon
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y25/00—Nanomagnetism, e.g. magnetoimpedance, anisotropic magnetoresistance, giant magnetoresistance or tunneling magnetoresistance
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00—Manufacture or treatment of nanostructures
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
    • H01F10/00—Thin magnetic films, e.g. of one-domain structure
    • H01F10/007—Thin magnetic films, e.g. of one-domain structure ultrathin or granular films
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
    • H01F10/00—Thin magnetic films, e.g. of one-domain structure
    • H01F10/32—Spin-exchange-coupled multilayers, e.g. nanostructured superlattices
    • H01F10/3227—Exchange coupling via one or more magnetisable ultrathin or granular films
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
    • H01F41/00—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties
    • H01F41/14—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for applying magnetic films to substrates
    • H01F41/30—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for applying magnetic films to substrates for applying nanostructures, e.g. by molecular beam epitaxy [MBE]
    • H01F41/301—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for applying magnetic films to substrates for applying nanostructures, e.g. by molecular beam epitaxy [MBE] for applying ultrathin or granular layers

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Nanotechnology (AREA)
  • Power Engineering (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Metallurgy (AREA)
  • Mechanical Engineering (AREA)
  • Materials Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Organic Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Physical Vapour Deposition (AREA)
  • Manufacturing Of Micro-Capsules (AREA)
  • Manufacturing Of Magnetic Record Carriers (AREA)
  • Carbon And Carbon Compounds (AREA)
  • Lubricants (AREA)
  • Magnetic Record Carriers (AREA)
  • Thin Magnetic Films (AREA)
AT01946906T 2000-01-28 2001-01-29 Nano-material ATE248934T1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
GBGB0001950.5A GB0001950D0 (en) 2000-01-28 2000-01-28 Nano-material
PCT/GB2001/000361 WO2001055474A1 (en) 2000-01-28 2001-01-29 Nano-material

Publications (1)

Publication Number Publication Date
ATE248934T1 true ATE248934T1 (de) 2003-09-15

Family

ID=9884502

Family Applications (1)

Application Number Title Priority Date Filing Date
AT01946906T ATE248934T1 (de) 2000-01-28 2001-01-29 Nano-material

Country Status (11)

Country Link
US (1) US20020187257A1 (de)
EP (1) EP1250470B1 (de)
JP (1) JP2003520902A (de)
AT (1) ATE248934T1 (de)
AU (1) AU2001228685A1 (de)
DE (1) DE60100705T2 (de)
DK (1) DK1250470T3 (de)
ES (1) ES2202291T3 (de)
GB (1) GB0001950D0 (de)
PT (1) PT1250470E (de)
WO (1) WO2001055474A1 (de)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2994443B1 (fr) * 2012-08-10 2015-02-27 Commissariat Energie Atomique Procede de synthese d'un materiau composite nanostructure et dispositif de mise en oeuvre associe.

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3064353D1 (en) * 1979-02-23 1983-09-01 Seikisui Chemical Co Ltd A process for producing a magnetic recording medium
DE3803000A1 (de) * 1988-02-02 1989-08-10 Basf Ag Flaechenfoermiges, mehrschichtiges magneto-optisches aufzeichnungsmaterial
AU4535793A (en) * 1992-06-16 1994-01-04 Regents Of The University Of California, The Giant magnetoresistant single film alloys
JPH06283332A (ja) * 1993-01-26 1994-10-07 Hitachi Ltd 薄膜磁性体とその製法およびそれを用いたマイクロ磁気デバイス
JPH09111419A (ja) * 1995-10-16 1997-04-28 Alps Electric Co Ltd 磁気抵抗効果材料および磁気抵抗効果多層膜
US5695617A (en) * 1995-11-22 1997-12-09 Dow Corning Corporation Silicon nanoparticles
US6531704B2 (en) * 1998-09-14 2003-03-11 Nanoproducts Corporation Nanotechnology for engineering the performance of substances

Also Published As

Publication number Publication date
JP2003520902A (ja) 2003-07-08
EP1250470A1 (de) 2002-10-23
DE60100705D1 (en) 2003-10-09
AU2001228685A1 (en) 2001-08-07
PT1250470E (pt) 2003-11-28
DE60100705T2 (de) 2004-07-08
DK1250470T3 (da) 2004-01-05
EP1250470B1 (de) 2003-09-03
US20020187257A1 (en) 2002-12-12
WO2001055474A1 (en) 2001-08-02
GB0001950D0 (en) 2000-03-22
ES2202291T3 (es) 2004-04-01

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