DK0434797T3 - Apparat til overtrækning af substrater ved katodeforstøvning - Google Patents

Apparat til overtrækning af substrater ved katodeforstøvning

Info

Publication number
DK0434797T3
DK0434797T3 DK90909702.4T DK90909702T DK0434797T3 DK 0434797 T3 DK0434797 T3 DK 0434797T3 DK 90909702 T DK90909702 T DK 90909702T DK 0434797 T3 DK0434797 T3 DK 0434797T3
Authority
DK
Denmark
Prior art keywords
coating substrates
cathode sputtering
cathode
chamber
coating
Prior art date
Application number
DK90909702.4T
Other languages
Danish (da)
English (en)
Inventor
Toni Leyendecker
Oliver Lemmer
Stefan Esser
Original Assignee
Toni Leyendecker
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toni Leyendecker filed Critical Toni Leyendecker
Application granted granted Critical
Publication of DK0434797T3 publication Critical patent/DK0434797T3/da

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3411—Constructional aspects of the reactor
    • H01J37/3438—Electrodes other than cathode
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/564—Means for minimising impurities in the coating chamber such as dust, moisture, residual gases
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3411—Constructional aspects of the reactor
    • H01J37/3447—Collimators, shutters, apertures

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Analytical Chemistry (AREA)
  • Metallurgy (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Plasma Technology (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
  • Prevention Of Electric Corrosion (AREA)
  • Vessels, Lead-In Wires, Accessory Apparatuses For Cathode-Ray Tubes (AREA)
  • Formation Of Various Coating Films On Cathode Ray Tubes And Lamps (AREA)
  • Liquid Crystal (AREA)
  • Electron Sources, Ion Sources (AREA)
DK90909702.4T 1989-06-24 1990-06-22 Apparat til overtrækning af substrater ved katodeforstøvning DK0434797T3 (da)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE3920772A DE3920772A1 (de) 1989-06-24 1989-06-24 Geraet zur beschichtung von substraten durch kathodenzerstaeubung

Publications (1)

Publication Number Publication Date
DK0434797T3 true DK0434797T3 (da) 1995-04-03

Family

ID=6383520

Family Applications (1)

Application Number Title Priority Date Filing Date
DK90909702.4T DK0434797T3 (da) 1989-06-24 1990-06-22 Apparat til overtrækning af substrater ved katodeforstøvning

Country Status (7)

Country Link
EP (1) EP0434797B1 (fr)
JP (1) JP2854130B2 (fr)
AT (1) ATE113668T1 (fr)
DE (2) DE3920772A1 (fr)
DK (1) DK0434797T3 (fr)
ES (1) ES2062536T3 (fr)
WO (1) WO1991000378A1 (fr)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3825399C5 (de) * 1988-07-23 2005-05-12 Cemecon Ag PVD- oder Plasma- CVD-Beschichtung
PL2274763T3 (pl) 2008-04-22 2019-03-29 Oerlikon Surface Solutions Ag, Pfäffikon Sposób wytwarzania obrabianych elementów z wytrawianymi jonowo powierzchniami
DE102008050499B4 (de) 2008-10-07 2014-02-06 Systec System- Und Anlagentechnik Gmbh & Co. Kg PVD-Beschichtungsverfahren, Vorrichtung zur Durchführung des Verfahrens und nach dem Verfahren beschichtete Substrate

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3763031A (en) * 1970-10-01 1973-10-02 Cogar Corp Rf sputtering apparatus
US4131533A (en) * 1977-12-30 1978-12-26 International Business Machines Corporation RF sputtering apparatus having floating anode shield
DE3587369D1 (de) * 1984-01-28 1993-07-01 Philips Patentverwaltung Vorrichtung zur beschichtung eines substrates mittels plasma-chemical vapour deposition oder kathodenzerstaeubung und damit ausgefuehrtes verfahren.

Also Published As

Publication number Publication date
ATE113668T1 (de) 1994-11-15
DE59007630D1 (de) 1994-12-08
WO1991000378A1 (fr) 1991-01-10
ES2062536T3 (es) 1994-12-16
JP2854130B2 (ja) 1999-02-03
EP0434797B1 (fr) 1994-11-02
EP0434797A1 (fr) 1991-07-03
JPH04500391A (ja) 1992-01-23
DE3920772A1 (de) 1991-01-03

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