DE69919230D1 - Verfahren zur oberflächenmodifizierung von einem strukturierten wafer - Google Patents
Verfahren zur oberflächenmodifizierung von einem strukturierten waferInfo
- Publication number
- DE69919230D1 DE69919230D1 DE69919230T DE69919230T DE69919230D1 DE 69919230 D1 DE69919230 D1 DE 69919230D1 DE 69919230 T DE69919230 T DE 69919230T DE 69919230 T DE69919230 T DE 69919230T DE 69919230 D1 DE69919230 D1 DE 69919230D1
- Authority
- DE
- Germany
- Prior art keywords
- phase
- surface modification
- modified
- structured wafer
- abrasive article
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 238000000034 method Methods 0.000 title abstract 2
- 238000012986 modification Methods 0.000 title 1
- 230000004048 modification Effects 0.000 title 1
- 239000000463 material Substances 0.000 abstract 1
- 229920000642 polymer Polymers 0.000 abstract 1
- 239000002002 slurry Substances 0.000 abstract 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
- H01L21/304—Mechanical treatment, e.g. grinding, polishing, cutting
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B37/00—Lapping machines or devices; Accessories
- B24B37/11—Lapping tools
- B24B37/20—Lapping pads for working plane surfaces
- B24B37/24—Lapping pads for working plane surfaces characterised by the composition or properties of the pad materials
- B24B37/245—Pads with fixed abrasives
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24D—TOOLS FOR GRINDING, BUFFING OR SHARPENING
- B24D3/00—Physical features of abrasive bodies, or sheets, e.g. abrasive surfaces of special nature; Abrasive bodies or sheets characterised by their constituents
- B24D3/02—Physical features of abrasive bodies, or sheets, e.g. abrasive surfaces of special nature; Abrasive bodies or sheets characterised by their constituents the constituent being used as bonding agent
- B24D3/20—Physical features of abrasive bodies, or sheets, e.g. abrasive surfaces of special nature; Abrasive bodies or sheets characterised by their constituents the constituent being used as bonding agent and being essentially organic
Landscapes
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Mechanical Treatment Of Semiconductor (AREA)
- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
- Manufacture Of Macromolecular Shaped Articles (AREA)
- Polishing Bodies And Polishing Tools (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US328916 | 1999-06-09 | ||
US09/328,916 US6234875B1 (en) | 1999-06-09 | 1999-06-09 | Method of modifying a surface |
PCT/US1999/024445 WO2000074896A1 (en) | 1999-06-09 | 1999-10-18 | Method of modifying a surface of a structured wafer |
Publications (2)
Publication Number | Publication Date |
---|---|
DE69919230D1 true DE69919230D1 (de) | 2004-09-09 |
DE69919230T2 DE69919230T2 (de) | 2005-08-04 |
Family
ID=23283024
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE69919230T Expired - Fee Related DE69919230T2 (de) | 1999-06-09 | 1999-10-18 | Verfahren zur oberflächenmodifizierung von einem strukturierten wafer |
Country Status (14)
Country | Link |
---|---|
US (1) | US6234875B1 (de) |
EP (1) | EP1189729B1 (de) |
JP (1) | JP2003501820A (de) |
KR (1) | KR100638289B1 (de) |
CN (1) | CN1352589A (de) |
AT (1) | ATE272465T1 (de) |
AU (1) | AU1317500A (de) |
BR (1) | BR9917355A (de) |
CA (1) | CA2374004A1 (de) |
DE (1) | DE69919230T2 (de) |
ES (1) | ES2224717T3 (de) |
HK (1) | HK1044504B (de) |
TW (1) | TWI231245B (de) |
WO (1) | WO2000074896A1 (de) |
Families Citing this family (42)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6390890B1 (en) | 1999-02-06 | 2002-05-21 | Charles J Molnar | Finishing semiconductor wafers with a fixed abrasive finishing element |
US6641463B1 (en) | 1999-02-06 | 2003-11-04 | Beaver Creek Concepts Inc | Finishing components and elements |
US6413153B1 (en) | 1999-04-26 | 2002-07-02 | Beaver Creek Concepts Inc | Finishing element including discrete finishing members |
TW501197B (en) * | 1999-08-17 | 2002-09-01 | Hitachi Chemical Co Ltd | Polishing compound for chemical mechanical polishing and method for polishing substrate |
US7736687B2 (en) | 2006-01-31 | 2010-06-15 | Advance Bio Prosthetic Surfaces, Ltd. | Methods of making medical devices |
US6976905B1 (en) * | 2000-06-16 | 2005-12-20 | Cabot Microelectronics Corporation | Method for polishing a memory or rigid disk with a phosphate ion-containing polishing system |
CN100484718C (zh) * | 2000-12-01 | 2009-05-06 | 东洋橡膠工业株式会社 | 研磨垫用缓冲层 |
US6572463B1 (en) * | 2000-12-27 | 2003-06-03 | Lam Research Corp. | Methods for making reinforced wafer polishing pads utilizing direct casting and apparatuses implementing the same |
US6561889B1 (en) | 2000-12-27 | 2003-05-13 | Lam Research Corporation | Methods for making reinforced wafer polishing pads and apparatuses implementing the same |
US6612916B2 (en) * | 2001-01-08 | 2003-09-02 | 3M Innovative Properties Company | Article suitable for chemical mechanical planarization processes |
US6612917B2 (en) * | 2001-02-07 | 2003-09-02 | 3M Innovative Properties Company | Abrasive article suitable for modifying a semiconductor wafer |
US6632129B2 (en) * | 2001-02-15 | 2003-10-14 | 3M Innovative Properties Company | Fixed abrasive article for use in modifying a semiconductor wafer |
US6627550B2 (en) * | 2001-03-27 | 2003-09-30 | Micron Technology, Inc. | Post-planarization clean-up |
US6629879B1 (en) * | 2001-05-08 | 2003-10-07 | Advanced Micro Devices, Inc. | Method of controlling barrier metal polishing processes based upon X-ray fluorescence measurements |
US6811470B2 (en) | 2001-07-16 | 2004-11-02 | Applied Materials Inc. | Methods and compositions for chemical mechanical polishing shallow trench isolation substrates |
US7199056B2 (en) * | 2002-02-08 | 2007-04-03 | Applied Materials, Inc. | Low cost and low dishing slurry for polysilicon CMP |
US6943114B2 (en) * | 2002-02-28 | 2005-09-13 | Infineon Technologies Ag | Integration scheme for metal gap fill, with fixed abrasive CMP |
US7063597B2 (en) | 2002-10-25 | 2006-06-20 | Applied Materials | Polishing processes for shallow trench isolation substrates |
US6908366B2 (en) * | 2003-01-10 | 2005-06-21 | 3M Innovative Properties Company | Method of using a soft subpad for chemical mechanical polishing |
EP1590127A1 (de) | 2003-01-10 | 2005-11-02 | 3M Innovative Properties Company | Unterlagenkonstruktionen für chemisch-mechanische planarisierungsanwendungen |
US6951504B2 (en) * | 2003-03-20 | 2005-10-04 | 3M Innovative Properties Company | Abrasive article with agglomerates and method of use |
CN1816422B (zh) * | 2003-06-03 | 2011-06-22 | 尼克斯普勒公司 | 用于化学机械平整化的功能分级垫的合成 |
DE602005006326T2 (de) * | 2004-02-05 | 2009-07-09 | Jsr Corp. | Chemisch-mechanisches Polierkissen und Polierverfahren |
US7086939B2 (en) * | 2004-03-19 | 2006-08-08 | Saint-Gobain Performance Plastics Corporation | Chemical mechanical polishing retaining ring with integral polymer backing |
US7485028B2 (en) | 2004-03-19 | 2009-02-03 | Saint-Gobain Performance Plastics Corporation | Chemical mechanical polishing retaining ring, apparatuses and methods incorporating same |
US20050252547A1 (en) * | 2004-05-11 | 2005-11-17 | Applied Materials, Inc. | Methods and apparatus for liquid chemical delivery |
US7150770B2 (en) * | 2004-06-18 | 2006-12-19 | 3M Innovative Properties Company | Coated abrasive article with tie layer, and method of making and using the same |
US7150771B2 (en) * | 2004-06-18 | 2006-12-19 | 3M Innovative Properties Company | Coated abrasive article with composite tie layer, and method of making and using the same |
US20050282029A1 (en) * | 2004-06-18 | 2005-12-22 | 3M Innovative Properties Company | Polymerizable composition and articles therefrom |
US20060088976A1 (en) * | 2004-10-22 | 2006-04-27 | Applied Materials, Inc. | Methods and compositions for chemical mechanical polishing substrates |
US7344574B2 (en) * | 2005-06-27 | 2008-03-18 | 3M Innovative Properties Company | Coated abrasive article, and method of making and using the same |
US7344575B2 (en) * | 2005-06-27 | 2008-03-18 | 3M Innovative Properties Company | Composition, treated backing, and abrasive articles containing the same |
TWI292185B (en) * | 2005-07-11 | 2008-01-01 | Fujitsu Ltd | Manufacture of semiconductor device with cmp |
US8016644B2 (en) * | 2007-07-13 | 2011-09-13 | UNIVERSITé LAVAL | Method and apparatus for micro-machining a surface |
US20090215266A1 (en) * | 2008-02-22 | 2009-08-27 | Thomas Terence M | Polishing Copper-Containing patterned wafers |
DE102009025242B4 (de) * | 2009-06-17 | 2013-05-23 | Siltronic Ag | Verfahren zum beidseitigen chemischen Schleifen einer Halbleiterscheibe |
DE102009033206A1 (de) * | 2009-07-15 | 2011-01-27 | Brand, Guido | Polierverfahren und Poliervorrichtung zur Korrektur von geometrischen Abweichungsfehlern auf Präzisionsoberflächen |
BR112013017967A2 (pt) * | 2011-01-22 | 2020-10-27 | Rud. Starcke Gmbh & Co. Kg | corpo abrasivo |
JP5934053B2 (ja) * | 2012-08-14 | 2016-06-15 | セイコープレシジョン株式会社 | X線処理装置 |
JP6640106B2 (ja) | 2014-04-03 | 2020-02-05 | スリーエム イノベイティブ プロパティズ カンパニー | 研磨パッド及びシステム、並びにその作製方法及び使用方法 |
TWI769988B (zh) | 2015-10-07 | 2022-07-11 | 美商3M新設資產公司 | 拋光墊與系統及其製造與使用方法 |
CN111087973B (zh) * | 2019-12-17 | 2021-07-27 | 吉林大学 | 一种植物纤维发酵改性增强摩擦材料制备装置及制备方法 |
Family Cites Families (26)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4244775A (en) | 1979-04-30 | 1981-01-13 | Bell Telephone Laboratories, Incorporated | Process for the chemical etch polishing of semiconductors |
DE3677735D1 (de) | 1985-12-17 | 1991-04-04 | Max Planck Gesellschaft | Verfahren zur herstellung von halbleitersubstraten. |
JPS62259769A (ja) * | 1986-05-02 | 1987-11-12 | Nec Corp | シリコンウエハの加工方法 |
US5399528A (en) | 1989-06-01 | 1995-03-21 | Leibovitz; Jacques | Multi-layer fabrication in integrated circuit systems |
US5152917B1 (en) | 1991-02-06 | 1998-01-13 | Minnesota Mining & Mfg | Structured abrasive article |
TW307801B (de) | 1992-03-19 | 1997-06-11 | Minnesota Mining & Mfg | |
MY114512A (en) | 1992-08-19 | 2002-11-30 | Rodel Inc | Polymeric substrate with polymeric microelements |
JPH0811050A (ja) | 1994-06-28 | 1996-01-16 | Sony Corp | 研磨布及びこれを用いた半導体装置の製造方法 |
AU687598B2 (en) * | 1994-09-30 | 1998-02-26 | Minnesota Mining And Manufacturing Company | Coated abrasive article, method for preparing the same, and method of using |
US5643044A (en) | 1994-11-01 | 1997-07-01 | Lund; Douglas E. | Automatic chemical and mechanical polishing system for semiconductor wafers |
US5791969A (en) | 1994-11-01 | 1998-08-11 | Lund; Douglas E. | System and method of automatically polishing semiconductor wafers |
US5609517A (en) | 1995-11-20 | 1997-03-11 | International Business Machines Corporation | Composite polishing pad |
JPH09148285A (ja) | 1995-11-27 | 1997-06-06 | Sony Corp | 化学的機械研磨粒子及び半導体装置の製造方法 |
JP3440665B2 (ja) | 1995-12-20 | 2003-08-25 | ソニー株式会社 | 研磨布およびその製造方法 |
US5778481A (en) | 1996-02-15 | 1998-07-14 | International Business Machines Corporation | Silicon wafer cleaning and polishing pads |
TW349896B (en) | 1996-05-02 | 1999-01-11 | Applied Materials Inc | Apparatus and chemical mechanical polishing system for polishing a substrate |
US5692950A (en) | 1996-08-08 | 1997-12-02 | Minnesota Mining And Manufacturing Company | Abrasive construction for semiconductor wafer modification |
US5759427A (en) | 1996-08-28 | 1998-06-02 | International Business Machines Corporation | Method and apparatus for polishing metal surfaces |
US5759917A (en) | 1996-12-30 | 1998-06-02 | Cabot Corporation | Composition for oxide CMP |
KR100487455B1 (ko) | 1997-01-13 | 2005-05-09 | 롬 앤드 하스 일렉트로닉 머티리얼스 씨엠피 홀딩스, 인코포레이티드 | 사진석판술에 의해 유도된 표면 패턴(들)이 있는 연마용 중합체 패드 및 이에 관련된 방법 |
US6328642B1 (en) | 1997-02-14 | 2001-12-11 | Lam Research Corporation | Integrated pad and belt for chemical mechanical polishing |
US6022268A (en) | 1998-04-03 | 2000-02-08 | Rodel Holdings Inc. | Polishing pads and methods relating thereto |
EP1016133B1 (de) | 1997-04-30 | 2009-10-07 | Minnesota Mining And Manufacturing Company | Verfahren zum planarisieren der oberfläche eines halbleiterwafers |
US6224465B1 (en) | 1997-06-26 | 2001-05-01 | Stuart L. Meyer | Methods and apparatus for chemical mechanical planarization using a microreplicated surface |
US6121143A (en) * | 1997-09-19 | 2000-09-19 | 3M Innovative Properties Company | Abrasive articles comprising a fluorochemical agent for wafer surface modification |
US6056794A (en) * | 1999-03-05 | 2000-05-02 | 3M Innovative Properties Company | Abrasive articles having bonding systems containing abrasive particles |
-
1999
- 1999-06-09 US US09/328,916 patent/US6234875B1/en not_active Expired - Lifetime
- 1999-10-18 CA CA002374004A patent/CA2374004A1/en not_active Abandoned
- 1999-10-18 EP EP99956604A patent/EP1189729B1/de not_active Expired - Lifetime
- 1999-10-18 AU AU13175/00A patent/AU1317500A/en not_active Abandoned
- 1999-10-18 ES ES99956604T patent/ES2224717T3/es not_active Expired - Lifetime
- 1999-10-18 CN CN99816713A patent/CN1352589A/zh active Pending
- 1999-10-18 JP JP2001501410A patent/JP2003501820A/ja active Pending
- 1999-10-18 BR BR9917355-7A patent/BR9917355A/pt active Search and Examination
- 1999-10-18 DE DE69919230T patent/DE69919230T2/de not_active Expired - Fee Related
- 1999-10-18 KR KR1020017015751A patent/KR100638289B1/ko not_active IP Right Cessation
- 1999-10-18 AT AT99956604T patent/ATE272465T1/de not_active IP Right Cessation
- 1999-10-18 WO PCT/US1999/024445 patent/WO2000074896A1/en active IP Right Grant
-
2000
- 2000-05-30 TW TW089110529A patent/TWI231245B/zh not_active IP Right Cessation
-
2002
- 2002-08-23 HK HK02106259.1A patent/HK1044504B/zh not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
TWI231245B (en) | 2005-04-21 |
HK1044504A1 (en) | 2002-10-25 |
BR9917355A (pt) | 2002-02-26 |
KR20020011435A (ko) | 2002-02-08 |
JP2003501820A (ja) | 2003-01-14 |
AU1317500A (en) | 2000-12-28 |
CA2374004A1 (en) | 2000-12-14 |
KR100638289B1 (ko) | 2006-10-26 |
WO2000074896A8 (en) | 2001-03-29 |
WO2000074896A1 (en) | 2000-12-14 |
CN1352589A (zh) | 2002-06-05 |
ATE272465T1 (de) | 2004-08-15 |
EP1189729A1 (de) | 2002-03-27 |
EP1189729B1 (de) | 2004-08-04 |
US6234875B1 (en) | 2001-05-22 |
DE69919230T2 (de) | 2005-08-04 |
ES2224717T3 (es) | 2005-03-01 |
HK1044504B (zh) | 2005-06-30 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition | ||
8339 | Ceased/non-payment of the annual fee |