DE69902311D1 - Plasma-CVD-Apparat - Google Patents
Plasma-CVD-ApparatInfo
- Publication number
- DE69902311D1 DE69902311D1 DE69902311T DE69902311T DE69902311D1 DE 69902311 D1 DE69902311 D1 DE 69902311D1 DE 69902311 T DE69902311 T DE 69902311T DE 69902311 T DE69902311 T DE 69902311T DE 69902311 D1 DE69902311 D1 DE 69902311D1
- Authority
- DE
- Germany
- Prior art keywords
- plasma cvd
- cvd apparatus
- plasma
- cvd
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32082—Radio frequency generated discharge
- H01J37/32174—Circuits specially adapted for controlling the RF discharge
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
- C23C16/505—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using radio frequency discharges
- C23C16/509—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using radio frequency discharges using internal electrodes
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32082—Radio frequency generated discharge
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Plasma & Fusion (AREA)
- Analytical Chemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Chemical Vapour Deposition (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP9598998 | 1998-04-08 |
Publications (2)
Publication Number | Publication Date |
---|---|
DE69902311D1 true DE69902311D1 (de) | 2002-09-05 |
DE69902311T2 DE69902311T2 (de) | 2003-03-13 |
Family
ID=14152553
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE1999602311 Expired - Lifetime DE69902311T2 (de) | 1998-04-08 | 1999-02-12 | Plasma-CVD-Apparat |
Country Status (4)
Country | Link |
---|---|
EP (1) | EP0949352B1 (de) |
AU (1) | AU726151B2 (de) |
DE (1) | DE69902311T2 (de) |
ES (1) | ES2181327T3 (de) |
Families Citing this family (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2961103B1 (ja) | 1998-04-28 | 1999-10-12 | 三菱重工業株式会社 | プラズマ化学蒸着装置 |
AU725612B2 (en) * | 1998-05-29 | 2000-10-12 | Mitsubishi Heavy Industries, Ltd. | Plasma CVD apparatus |
JP3276346B2 (ja) * | 1999-06-17 | 2002-04-22 | 三菱重工業株式会社 | 放電電極、高周波プラズマ発生装置、給電方法および半導体製造方法 |
TW507256B (en) * | 2000-03-13 | 2002-10-21 | Mitsubishi Heavy Ind Ltd | Discharge plasma generating method, discharge plasma generating apparatus, semiconductor device fabrication method, and semiconductor device fabrication apparatus |
ES2336303T3 (es) * | 2000-05-17 | 2010-04-12 | Ihi Corporation | Aparato y procedimiento de cvd por plasma. |
KR20030028296A (ko) * | 2001-09-28 | 2003-04-08 | 학교법인 한양학원 | 플라즈마 화학기상증착 장치 및 이를 이용한 탄소나노튜브제조방법 |
US8409991B2 (en) | 2007-12-20 | 2013-04-02 | Oerlikon Solar Ag, Trubbach | Method for manufacturing large-area vacuum plasma treated substrates and vacuum plasma treatment apparatus |
EP2293343A4 (de) * | 2008-06-06 | 2012-05-02 | Ulvac Inc | Vorrichtung zur herstellung einer dünnfilmsolarzelle |
JP5506826B2 (ja) | 2009-02-10 | 2014-05-28 | ヘリッセン,サール | 大面積プラズマ処理装置 |
-
1999
- 1999-02-11 AU AU16387/99A patent/AU726151B2/en not_active Ceased
- 1999-02-12 DE DE1999602311 patent/DE69902311T2/de not_active Expired - Lifetime
- 1999-02-12 EP EP19990102642 patent/EP0949352B1/de not_active Expired - Lifetime
- 1999-02-12 ES ES99102642T patent/ES2181327T3/es not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
EP0949352A1 (de) | 1999-10-13 |
AU726151B2 (en) | 2000-11-02 |
DE69902311T2 (de) | 2003-03-13 |
EP0949352B1 (de) | 2002-07-31 |
ES2181327T3 (es) | 2003-02-16 |
AU1638799A (en) | 1999-10-21 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition |