DE69841923D1 - Verfahren zur Herstellung einer Kondensatorelektrode aus Polysilizium - Google Patents
Verfahren zur Herstellung einer Kondensatorelektrode aus PolysiliziumInfo
- Publication number
- DE69841923D1 DE69841923D1 DE69841923T DE69841923T DE69841923D1 DE 69841923 D1 DE69841923 D1 DE 69841923D1 DE 69841923 T DE69841923 T DE 69841923T DE 69841923 T DE69841923 T DE 69841923T DE 69841923 D1 DE69841923 D1 DE 69841923D1
- Authority
- DE
- Germany
- Prior art keywords
- producing
- capacitor electrode
- polysilicon capacitor
- polysilicon
- electrode
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L28/00—Passive two-terminal components without a potential-jump or surface barrier for integrated circuits; Details thereof; Multistep manufacturing processes therefor
- H01L28/40—Capacitors
- H01L28/60—Electrodes
- H01L28/75—Electrodes comprising two or more layers, e.g. comprising a barrier layer and a metal layer
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10B—ELECTRONIC MEMORY DEVICES
- H10B12/00—Dynamic random access memory [DRAM] devices
- H10B12/01—Manufacture or treatment
- H10B12/02—Manufacture or treatment for one transistor one-capacitor [1T-1C] memory cells
- H10B12/03—Making the capacitor or connections thereto
- H10B12/033—Making the capacitor or connections thereto the capacitor extending over the transistor
- H10B12/0335—Making a connection between the transistor and the capacitor, e.g. plug
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S438/00—Semiconductor device manufacturing: process
- Y10S438/914—Doping
- Y10S438/922—Diffusion along grain boundaries
Landscapes
- Engineering & Computer Science (AREA)
- Power Engineering (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Semiconductor Memories (AREA)
- Semiconductor Integrated Circuits (AREA)
- Electrodes Of Semiconductors (AREA)
- Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US08/994,275 US6228701B1 (en) | 1997-12-19 | 1997-12-19 | Apparatus and method for minimizing diffusion in stacked capacitors formed on silicon plugs |
Publications (1)
Publication Number | Publication Date |
---|---|
DE69841923D1 true DE69841923D1 (de) | 2010-11-18 |
Family
ID=25540496
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE69841923T Expired - Lifetime DE69841923D1 (de) | 1997-12-19 | 1998-12-18 | Verfahren zur Herstellung einer Kondensatorelektrode aus Polysilizium |
Country Status (7)
Country | Link |
---|---|
US (1) | US6228701B1 (de) |
EP (1) | EP0926717B1 (de) |
JP (1) | JPH11261031A (de) |
KR (1) | KR100596832B1 (de) |
CN (1) | CN1167118C (de) |
DE (1) | DE69841923D1 (de) |
TW (1) | TW406408B (de) |
Families Citing this family (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TW437010B (en) * | 1998-09-08 | 2001-05-28 | Siemens Ag | A layer-arrangement with a material-layer and a diffusion-barrier against diffusable material-components |
KR100351451B1 (ko) * | 1999-12-30 | 2002-09-09 | 주식회사 하이닉스반도체 | 반도체메모리장치의 커패시터제조방법 |
US6833329B1 (en) | 2000-06-22 | 2004-12-21 | Micron Technology, Inc. | Methods of forming oxide regions over semiconductor substrates |
US6686298B1 (en) * | 2000-06-22 | 2004-02-03 | Micron Technology, Inc. | Methods of forming structures over semiconductor substrates, and methods of forming transistors associated with semiconductor substrates |
US6649543B1 (en) | 2000-06-22 | 2003-11-18 | Micron Technology, Inc. | Methods of forming silicon nitride, methods of forming transistor devices, and transistor devices |
US6660657B1 (en) | 2000-08-07 | 2003-12-09 | Micron Technology, Inc. | Methods of incorporating nitrogen into silicon-oxide-containing layers |
US6383943B1 (en) * | 2000-10-16 | 2002-05-07 | Taiwan Semiconductor Manufacturing Company | Process for improving copper fill integrity |
US6399401B1 (en) * | 2001-07-24 | 2002-06-04 | Advanced Micro Devices, In. | Test structures for electrical linewidth measurement and processes for their formation |
US6878585B2 (en) | 2001-08-29 | 2005-04-12 | Micron Technology, Inc. | Methods of forming capacitors |
US6723599B2 (en) * | 2001-12-03 | 2004-04-20 | Micron Technology, Inc. | Methods of forming capacitors and methods of forming capacitor dielectric layers |
KR100543655B1 (ko) * | 2003-06-30 | 2006-01-20 | 주식회사 하이닉스반도체 | 반도체 소자의 제조방법 |
CN104465519B (zh) * | 2013-09-23 | 2017-07-28 | 中芯国际集成电路制造(上海)有限公司 | 嵌入式源/漏mos晶体管的制造方法 |
Family Cites Families (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2786071B2 (ja) * | 1993-02-17 | 1998-08-13 | 日本電気株式会社 | 半導体装置の製造方法 |
US5392189A (en) * | 1993-04-02 | 1995-02-21 | Micron Semiconductor, Inc. | Capacitor compatible with high dielectric constant materials having two independent insulative layers and the method for forming same |
US5381302A (en) | 1993-04-02 | 1995-01-10 | Micron Semiconductor, Inc. | Capacitor compatible with high dielectric constant materials having a low contact resistance layer and the method for forming same |
JPH0714993A (ja) * | 1993-06-18 | 1995-01-17 | Mitsubishi Electric Corp | 半導体装置およびその製造方法 |
JPH0794600A (ja) * | 1993-06-29 | 1995-04-07 | Mitsubishi Electric Corp | 半導体装置およびその製造方法 |
US5504041A (en) | 1994-08-01 | 1996-04-02 | Texas Instruments Incorporated | Conductive exotic-nitride barrier layer for high-dielectric-constant materials |
KR0168346B1 (ko) * | 1994-12-29 | 1998-12-15 | 김광호 | 고유전율 재료를 이용한 커패시터 및 그 제조방법 |
US5612574A (en) | 1995-06-06 | 1997-03-18 | Texas Instruments Incorporated | Semiconductor structures using high-dielectric-constant materials and an adhesion layer |
US5786248A (en) * | 1995-10-12 | 1998-07-28 | Micron Technology, Inc. | Semiconductor processing method of forming a tantalum oxide containing capacitor |
KR100285066B1 (ko) * | 1997-12-06 | 2001-04-02 | 윤종용 | 고유전체 물질을 갖는 커패시터의 형성방법 |
US6037235A (en) * | 1998-09-14 | 2000-03-14 | Applied Materials, Inc. | Hydrogen anneal for curing defects of silicon/nitride interfaces of semiconductor devices |
-
1997
- 1997-12-19 US US08/994,275 patent/US6228701B1/en not_active Expired - Lifetime
-
1998
- 1998-12-16 CN CNB981255590A patent/CN1167118C/zh not_active Expired - Lifetime
- 1998-12-17 JP JP10359305A patent/JPH11261031A/ja active Pending
- 1998-12-18 EP EP98310441A patent/EP0926717B1/de not_active Expired - Lifetime
- 1998-12-18 DE DE69841923T patent/DE69841923D1/de not_active Expired - Lifetime
- 1998-12-19 KR KR1019980056378A patent/KR100596832B1/ko not_active IP Right Cessation
- 1998-12-23 TW TW087121177A patent/TW406408B/zh not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
CN1225506A (zh) | 1999-08-11 |
JPH11261031A (ja) | 1999-09-24 |
CN1167118C (zh) | 2004-09-15 |
EP0926717B1 (de) | 2010-10-06 |
KR100596832B1 (ko) | 2006-11-30 |
EP0926717A2 (de) | 1999-06-30 |
KR19990063238A (ko) | 1999-07-26 |
TW406408B (en) | 2000-09-21 |
EP0926717A3 (de) | 2003-04-02 |
US6228701B1 (en) | 2001-05-08 |
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