DE69841032D1 - Oxydsupraleitender Draht und Verfahren zu dessen Herstellung - Google Patents

Oxydsupraleitender Draht und Verfahren zu dessen Herstellung

Info

Publication number
DE69841032D1
DE69841032D1 DE69841032T DE69841032T DE69841032D1 DE 69841032 D1 DE69841032 D1 DE 69841032D1 DE 69841032 T DE69841032 T DE 69841032T DE 69841032 T DE69841032 T DE 69841032T DE 69841032 D1 DE69841032 D1 DE 69841032D1
Authority
DE
Germany
Prior art keywords
production
superconducting wire
oxide superconducting
oxide
wire
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69841032T
Other languages
English (en)
Inventor
Kaname Matsumoto
Naoki Koshizuka
Yasuzo Tanaka
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Furukawa Electric Co Ltd
International Superconductivity Technology Center
Original Assignee
Furukawa Electric Co Ltd
International Superconductivity Technology Center
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Furukawa Electric Co Ltd, International Superconductivity Technology Center filed Critical Furukawa Electric Co Ltd
Application granted granted Critical
Publication of DE69841032D1 publication Critical patent/DE69841032D1/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N60/00—Superconducting devices
    • H10N60/01—Manufacture or treatment
    • H10N60/0268—Manufacture or treatment of devices comprising copper oxide
    • H10N60/0296—Processes for depositing or forming copper oxide superconductor layers
    • H10N60/0576—Processes for depositing or forming copper oxide superconductor layers characterised by the substrate
    • H10N60/0632—Intermediate layers, e.g. for growth control
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S505/00—Superconductor technology: apparatus, material, process
    • Y10S505/70—High TC, above 30 k, superconducting device, article, or structured stock
    • Y10S505/701—Coated or thin film device, i.e. active or passive
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S505/00—Superconductor technology: apparatus, material, process
    • Y10S505/70—High TC, above 30 k, superconducting device, article, or structured stock
    • Y10S505/704—Wire, fiber, or cable
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T29/00—Metal working
    • Y10T29/49—Method of mechanical manufacture
    • Y10T29/49002—Electrical device making
    • Y10T29/49014—Superconductor

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Superconductors And Manufacturing Methods Therefor (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
DE69841032T 1997-06-10 1998-06-08 Oxydsupraleitender Draht und Verfahren zu dessen Herstellung Expired - Lifetime DE69841032D1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP15241097A JP3587956B2 (ja) 1997-06-10 1997-06-10 酸化物超電導線材およびその製造方法

Publications (1)

Publication Number Publication Date
DE69841032D1 true DE69841032D1 (de) 2009-09-17

Family

ID=15539913

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69841032T Expired - Lifetime DE69841032D1 (de) 1997-06-10 1998-06-08 Oxydsupraleitender Draht und Verfahren zu dessen Herstellung

Country Status (4)

Country Link
US (1) US6226858B1 (de)
EP (1) EP0884787B1 (de)
JP (1) JP3587956B2 (de)
DE (1) DE69841032D1 (de)

Families Citing this family (33)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3607149A1 (de) * 1986-03-05 1987-09-10 Bosch Gmbh Robert Kugelgelenk
US6316391B1 (en) * 1994-09-20 2001-11-13 Hitachi, Ltd. Oxide superconducting wire and method of manufacturing the same
GB2336849B (en) * 1998-04-27 2003-02-26 Telcon Ltd Substrate materials
JP3521182B2 (ja) * 1999-02-26 2004-04-19 株式会社東芝 酸化物超電導線材及び超電導装置
US6743533B1 (en) * 1999-04-15 2004-06-01 Fujikura Ltd. Oxide superconductor, manufacturing method thereof, and base substrate therefor
JP2001110256A (ja) * 1999-10-14 2001-04-20 Toshiba Corp 超電導複合体及び超電導複合体の製造方法
JP4619475B2 (ja) * 2000-02-21 2011-01-26 株式会社フジクラ 酸化物超電導導体
JP2002063815A (ja) * 2000-08-15 2002-02-28 Fujikura Ltd 酸化物超電導導体とその製造方法
DE50112012D1 (de) * 2000-12-07 2007-03-22 Leibniz Inst Fuer Festkoerper Metallband für epitaktische beschichtungen und verfahren zu dessen herstellung
WO2004015787A1 (en) * 2001-04-19 2004-02-19 Imperial College Innovations Limited Long superconductor fabrication
GB2374557A (en) * 2001-04-19 2002-10-23 Imperial College Producing superconductors by epitaxial growth
EP1391543A1 (de) * 2001-05-15 2004-02-25 International Superconductivity technology Center, The Juridical Foundation Verfahren zur herstellung von oxidkristallfilm; substratverbund und lösung zur verwendung dabei
US6500568B1 (en) * 2001-06-06 2002-12-31 3M Innovative Properties Company Biaxially textured metal substrate with palladium layer
JP2003055095A (ja) * 2001-08-07 2003-02-26 Sumitomo Electric Ind Ltd 薄膜形成方法
DE60236881D1 (de) * 2001-09-06 2010-08-12 Japan Science & Tech Agency Hochtemperatursupraleiter und herstellungsverfahren dafür
DE10148889A1 (de) * 2001-09-21 2003-06-26 Leibniz Inst Fuer Festkoerper Trägermaterial auf Nickelbasis und Verfahren zu dessen Herstellung
JPWO2003050826A1 (ja) * 2001-12-10 2005-04-21 三菱電機株式会社 酸化物超電導厚膜用金属基材およびその製造方法
WO2003065467A1 (en) * 2002-01-29 2003-08-07 Jochen Dieter Mannhart Superconductor with optimized microstructure and method for making such a superconductor
DE10248025A1 (de) * 2002-10-15 2004-05-13 THEVA DüNNSCHICHTTECHNIK GMBH Schichtmaterial sowie Verfahren zur Verbesserung der Stromtragfähigkeit von Hochtemperatur-Supraleiter-Dünnschichten
WO2004088677A1 (ja) * 2003-03-31 2004-10-14 The Furukawa Electric Co., Ltd. 酸化物超電導線材用金属基板、酸化物超電導線材及びその製造方法
JP2006098345A (ja) * 2004-09-30 2006-04-13 Fuji Photo Film Co Ltd センサの固定量測定装置及び方法
JP4794886B2 (ja) * 2005-03-31 2011-10-19 古河電気工業株式会社 酸化物超電導用高強度多結晶金属基板とそれを用いた酸化物超電導線材
JP4716324B2 (ja) * 2005-12-26 2011-07-06 古河電気工業株式会社 超電導体用基材およびその製造方法
KR100738373B1 (ko) 2006-01-04 2007-07-12 재단법인서울대학교산학협력재단 2축 배향성을 갖는 금속 선재를 제조하기 위한 시스템 및방법
JP5323444B2 (ja) * 2007-10-18 2013-10-23 古河電気工業株式会社 酸化物超電導線材用複合基板、その製造方法、及び超電導線材
CN102209804A (zh) 2008-11-12 2011-10-05 东洋钢钣株式会社 磊晶成长膜形成用高分子积层基板及其制造方法
JP5382911B2 (ja) 2008-11-12 2014-01-08 東洋鋼鈑株式会社 酸化物超電導線材用金属積層基板の製造方法及び該基板を用いた酸化物超電導線材
JP5448425B2 (ja) 2008-11-21 2014-03-19 公益財団法人国際超電導産業技術研究センター 超電導膜成膜用基板、超電導線材及びそれらの製造方法
JP5474339B2 (ja) 2008-11-28 2014-04-16 住友電気工業株式会社 超電導線材の前駆体の製造方法、超電導線材の製造方法
JP5376500B2 (ja) * 2008-12-04 2013-12-25 株式会社ノリタケカンパニーリミテド 酸素イオン伝導性セラミック膜材およびその製造方法
WO2011007527A1 (ja) * 2009-07-17 2011-01-20 東洋鋼鈑株式会社 酸化物超電導線材用金属積層基板の製造方法及び酸化物超電導線材用金属積層基板
JP5739972B2 (ja) * 2013-12-06 2015-06-24 住友電気工業株式会社 超電導線材の前駆体および超電導線材
JP2021012828A (ja) * 2019-07-08 2021-02-04 株式会社フジクラ 酸化物超電導線材、酸化物超電導コイル、酸化物超電導線材の製造方法

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5006507A (en) 1989-04-14 1991-04-09 General Atomics Nickel-based substrate for ceramic superconductor
JPH08259386A (ja) * 1995-03-20 1996-10-08 Matsushita Electric Ind Co Ltd 酸化物薄膜の製造方法及びそれに用いる化学蒸着装置
US5741377A (en) * 1995-04-10 1998-04-21 Martin Marietta Energy Systems, Inc. Structures having enhanced biaxial texture and method of fabricating same
US5872080A (en) * 1995-04-19 1999-02-16 The Regents Of The University Of California High temperature superconducting thick films

Also Published As

Publication number Publication date
EP0884787A2 (de) 1998-12-16
US6226858B1 (en) 2001-05-08
JP3587956B2 (ja) 2004-11-10
JPH113620A (ja) 1999-01-06
EP0884787B1 (de) 2009-08-05
EP0884787A3 (de) 2000-09-27

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