DE69835310D1 - System zur Versorgung mit Dampf - Google Patents
System zur Versorgung mit DampfInfo
- Publication number
- DE69835310D1 DE69835310D1 DE69835310T DE69835310T DE69835310D1 DE 69835310 D1 DE69835310 D1 DE 69835310D1 DE 69835310 T DE69835310 T DE 69835310T DE 69835310 T DE69835310 T DE 69835310T DE 69835310 D1 DE69835310 D1 DE 69835310D1
- Authority
- DE
- Germany
- Prior art keywords
- supplying steam
- steam
- supplying
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/448—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B9/00—Cleaning hollow articles by methods or apparatus specially adapted thereto
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/4401—Means for minimising impurities, e.g. dust, moisture or residual gas, in the reaction chamber
- C23C16/4407—Cleaning of reactor or reactor parts by using wet or mechanical methods
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S134/00—Cleaning and liquid contact with solids
- Y10S134/902—Semiconductor wafer
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Chemical Vapour Deposition (AREA)
- Cleaning In General (AREA)
- Cleaning By Liquid Or Steam (AREA)
Applications Claiming Priority (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2987597 | 1997-01-08 | ||
JP2987597 | 1997-01-08 | ||
JP21134097A JPH1133303A (ja) | 1997-07-22 | 1997-07-22 | トラップ装置 |
JP21134097 | 1997-07-22 |
Publications (2)
Publication Number | Publication Date |
---|---|
DE69835310D1 true DE69835310D1 (de) | 2006-09-07 |
DE69835310T2 DE69835310T2 (de) | 2007-08-02 |
Family
ID=26368126
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE69835310T Expired - Fee Related DE69835310T2 (de) | 1997-01-08 | 1998-01-08 | System zur Versorgung mit Dampf |
Country Status (5)
Country | Link |
---|---|
US (1) | US5950646A (de) |
EP (1) | EP0852970B1 (de) |
KR (1) | KR100520417B1 (de) |
DE (1) | DE69835310T2 (de) |
TW (1) | TW471031B (de) |
Families Citing this family (15)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TW415970B (en) * | 1997-01-08 | 2000-12-21 | Ebara Corp | Vapor-phase film growth apparatus and gas ejection head |
TW582050B (en) | 1999-03-03 | 2004-04-01 | Ebara Corp | Apparatus and method for processing substrate |
JP3448613B2 (ja) * | 1999-06-29 | 2003-09-22 | オメガセミコン電子株式会社 | 乾燥装置 |
GB2358791A (en) * | 2000-02-04 | 2001-08-08 | Versar Inc | Method composition and apparatus for cleaning internal surfaces of oxygen converters and cylinders |
WO2002080244A2 (en) * | 2001-02-12 | 2002-10-10 | Asm America, Inc. | Improved process for deposition of semiconductor films |
EP1854559A2 (de) * | 2001-11-15 | 2007-11-14 | L'AIR LIQUIDE, Société Anonyme pour l'Etude et l'Exploitation des Procédés Georges Claude | Verfahren zum Reinigen einer Flüssigkeits-Zuleitung |
JP3828821B2 (ja) * | 2002-03-13 | 2006-10-04 | 株式会社堀場エステック | 液体材料気化供給装置 |
JP4187599B2 (ja) * | 2003-07-03 | 2008-11-26 | 東京エレクトロン株式会社 | 減圧処理装置及び減圧処理方法並びに圧力調整バルブ |
JP4842771B2 (ja) * | 2006-11-15 | 2011-12-21 | 東京エレクトロン株式会社 | 処理システムと処理方法および記録媒体 |
JP4954728B2 (ja) * | 2007-01-26 | 2012-06-20 | 東京エレクトロン株式会社 | ゲートバルブの洗浄方法及び基板処理システム |
US20130220221A1 (en) * | 2012-02-23 | 2013-08-29 | Applied Materials, Inc. | Method and apparatus for precursor delivery |
US9448155B2 (en) * | 2014-06-25 | 2016-09-20 | The United States Of America As Represented By The Secretary Of The Army | System for sampling and/or analysis of particles in a gaseous environment |
KR102506307B1 (ko) * | 2016-06-29 | 2023-03-07 | (주)지오엘리먼트 | 케미컬 회수 시스템 |
JP6943911B2 (ja) * | 2019-03-07 | 2021-10-06 | 古河電気工業株式会社 | 気化器の洗浄方法および気化装置 |
CN112266161B (zh) * | 2020-10-30 | 2023-04-14 | 烽火通信科技股份有限公司 | 一种用于d4液体原材料的汽化装置及方法 |
Family Cites Families (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4380308A (en) * | 1980-12-23 | 1983-04-19 | Greenwood David L | Self-cleaning adhesive dispensing apparatus |
US4573586A (en) * | 1983-05-02 | 1986-03-04 | Helmer Michael T | Easter egg dyeing and drying device |
US4541249A (en) * | 1984-11-28 | 1985-09-17 | Clint Graves | Cryogenic trap and pump system |
IT1222018B (it) * | 1987-07-13 | 1990-08-31 | Tetra Dev Co | Un dispositivo per macchine di confezionamento |
FR2620954A1 (fr) * | 1987-09-29 | 1989-03-31 | Bernard Peyrot Des Gachons | Procede pour nettoyer des surfaces d'un objet, de depots souillants, notamment de pipes et systeme pour la mise en oeuvre du procede |
US4911411A (en) * | 1989-04-10 | 1990-03-27 | Cryolab, Inc. | Clean gas valve using a metal-to-metal seal |
US4909271A (en) * | 1989-04-14 | 1990-03-20 | Cryolab, Inc. | Ultrahigh purity gas valve with encapsulated bellows |
US5362328A (en) * | 1990-07-06 | 1994-11-08 | Advanced Technology Materials, Inc. | Apparatus and method for delivering reagents in vapor form to a CVD reactor, incorporating a cleaning subsystem |
DE4108539A1 (de) * | 1991-03-15 | 1992-09-17 | Hoesch Metall & Kunststoffwerk | Verfahren zur desinfektion von rohrleitungssystemen sanitaerer anlagen und whirlpool-anlagen zur durchfuehrung des verfahrens |
JP3080753B2 (ja) * | 1992-02-03 | 2000-08-28 | 三菱重工業株式会社 | スケールの洗浄装置 |
SE9301135L (sv) * | 1993-04-06 | 1994-10-07 | Arjo Hospital Equipment Ab | Duschanordning |
US5558841A (en) * | 1993-04-26 | 1996-09-24 | Olympus Optical Co., Ltd. | Washing/sterilizing apparatus for an endoscope and method for washing/sterilizing its water supplying system |
JP3158264B2 (ja) * | 1993-08-11 | 2001-04-23 | 東京エレクトロン株式会社 | ガス処理装置 |
JP3390517B2 (ja) * | 1994-03-28 | 2003-03-24 | 三菱電機株式会社 | 液体原料用cvd装置 |
-
1998
- 1998-01-05 TW TW087100062A patent/TW471031B/zh not_active IP Right Cessation
- 1998-01-08 EP EP98100218A patent/EP0852970B1/de not_active Expired - Lifetime
- 1998-01-08 US US09/003,947 patent/US5950646A/en not_active Expired - Fee Related
- 1998-01-08 DE DE69835310T patent/DE69835310T2/de not_active Expired - Fee Related
- 1998-01-08 KR KR1019980000237A patent/KR100520417B1/ko not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
TW471031B (en) | 2002-01-01 |
EP0852970A2 (de) | 1998-07-15 |
KR19980070392A (ko) | 1998-10-26 |
KR100520417B1 (ko) | 2006-01-27 |
US5950646A (en) | 1999-09-14 |
DE69835310T2 (de) | 2007-08-02 |
EP0852970B1 (de) | 2006-07-26 |
EP0852970A3 (de) | 2000-11-02 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition | ||
8339 | Ceased/non-payment of the annual fee |