DE69828613D1 - Ionenstrahlraumladungslneutralisierungsvorrichtung und verfahren - Google Patents

Ionenstrahlraumladungslneutralisierungsvorrichtung und verfahren

Info

Publication number
DE69828613D1
DE69828613D1 DE69828613T DE69828613T DE69828613D1 DE 69828613 D1 DE69828613 D1 DE 69828613D1 DE 69828613 T DE69828613 T DE 69828613T DE 69828613 T DE69828613 T DE 69828613T DE 69828613 D1 DE69828613 D1 DE 69828613D1
Authority
DE
Germany
Prior art keywords
treatment device
ion beam
beam load
load treatment
ion
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69828613T
Other languages
English (en)
Other versions
DE69828613T2 (de
Inventor
Hiroyuki Ito
Stephen Moffatt
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Applied Materials Inc
Original Assignee
Applied Materials Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Applied Materials Inc filed Critical Applied Materials Inc
Application granted granted Critical
Publication of DE69828613D1 publication Critical patent/DE69828613D1/de
Publication of DE69828613T2 publication Critical patent/DE69828613T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J27/00—Ion beam tubes
    • H01J27/02—Ion sources; Ion guns
    • H01J27/028—Negative ion sources
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/08—Ion sources; Ion guns
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/004—Charge control of objects or beams
    • H01J2237/0041—Neutralising arrangements

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Combustion & Propulsion (AREA)
  • Physical Vapour Deposition (AREA)
  • Electron Sources, Ion Sources (AREA)
DE69828613T 1997-07-10 1998-07-10 Ionenstrahlraumladungslneutralisierungsvorrichtung und verfahren Expired - Lifetime DE69828613T2 (de)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
GB9714576 1997-07-10
GBGB9714576.7A GB9714576D0 (en) 1997-07-10 1997-07-10 Method and apparatus for neutralising space charge in an ion beam
PCT/GB1998/002032 WO1999003125A1 (en) 1997-07-10 1998-07-10 Method and apparatus for neutralising space charge in an ion beam

Publications (2)

Publication Number Publication Date
DE69828613D1 true DE69828613D1 (de) 2005-02-17
DE69828613T2 DE69828613T2 (de) 2005-12-29

Family

ID=10815672

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69828613T Expired - Lifetime DE69828613T2 (de) 1997-07-10 1998-07-10 Ionenstrahlraumladungslneutralisierungsvorrichtung und verfahren

Country Status (5)

Country Link
EP (1) EP0995214B1 (de)
JP (1) JP2001509636A (de)
DE (1) DE69828613T2 (de)
GB (1) GB9714576D0 (de)
WO (1) WO1999003125A1 (de)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6891173B2 (en) * 2001-10-26 2005-05-10 Varian Semiconductor Equipment Associates, Inc. Ion implantation systems and methods utilizing a downstream gas source
WO2006047564A2 (en) * 2004-10-25 2006-05-04 Epion Corporation Method and apparatus for arc suppression in scanned ion beam processing equipment
US10202684B2 (en) 2010-08-23 2019-02-12 Exogenesis Corporation Method for neutral beam processing based on gas cluster ion beam technology and articles produced thereby
CA2811750C (en) 2010-08-23 2018-08-07 Exogenesis Corporation Method and apparatus for neutral beam processing based on gas cluster ion beam technology
US10556042B2 (en) 2011-08-19 2020-02-11 Exogenesis Corporation Drug delivery system and method of manufacturing thereof
CA2845762C (en) * 2011-08-22 2019-01-08 Exogenesis Corporation Drug delivery system and method of manufacturing thereof

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0799720B2 (ja) * 1990-08-30 1995-10-25 株式会社荏原製作所 高速原子線源
US5466929A (en) * 1992-02-21 1995-11-14 Hitachi, Ltd. Apparatus and method for suppressing electrification of sample in charged beam irradiation apparatus
JP3305553B2 (ja) * 1995-11-17 2002-07-22 株式会社荏原製作所 高速原子線源

Also Published As

Publication number Publication date
JP2001509636A (ja) 2001-07-24
DE69828613T2 (de) 2005-12-29
WO1999003125A1 (en) 1999-01-21
EP0995214B1 (de) 2005-01-12
GB9714576D0 (en) 1997-09-17
EP0995214A1 (de) 2000-04-26

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition